CN113913156B - 研磨液、玻璃基板的制造方法以及磁盘的制造方法 - Google Patents
研磨液、玻璃基板的制造方法以及磁盘的制造方法 Download PDFInfo
- Publication number
- CN113913156B CN113913156B CN202111254736.8A CN202111254736A CN113913156B CN 113913156 B CN113913156 B CN 113913156B CN 202111254736 A CN202111254736 A CN 202111254736A CN 113913156 B CN113913156 B CN 113913156B
- Authority
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- China
- Prior art keywords
- polishing
- glass substrate
- particle size
- polishing liquid
- magnetic disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000005498 polishing Methods 0.000 title claims abstract description 243
- 239000011521 glass Substances 0.000 title claims abstract description 191
- 239000000758 substrate Substances 0.000 title claims abstract description 161
- 239000007788 liquid Substances 0.000 title claims abstract description 81
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 43
- 239000002245 particle Substances 0.000 claims abstract description 159
- 238000009826 distribution Methods 0.000 claims abstract description 64
- 229910000420 cerium oxide Inorganic materials 0.000 claims abstract description 51
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract description 51
- 230000001186 cumulative effect Effects 0.000 claims abstract description 7
- 238000007561 laser diffraction method Methods 0.000 claims abstract description 6
- 238000000790 scattering method Methods 0.000 claims abstract description 6
- 239000006061 abrasive grain Substances 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 12
- 239000002002 slurry Substances 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 description 20
- 230000008859 change Effects 0.000 description 16
- 230000007547 defect Effects 0.000 description 14
- 238000007517 polishing process Methods 0.000 description 13
- 230000007423 decrease Effects 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000003426 chemical strengthening reaction Methods 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 238000003892 spreading Methods 0.000 description 3
- 230000007480 spreading Effects 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- -1 polybutylene terephthalate Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- UNJPQTDTZAKTFK-UHFFFAOYSA-K cerium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Ce+3] UNJPQTDTZAKTFK-UHFFFAOYSA-K 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
- B24B7/245—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass discontinuous
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/02—Lapping machines or devices; Accessories designed for working surfaces of revolution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/241—Methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-210817 | 2017-10-31 | ||
| JP2017210817 | 2017-10-31 | ||
| PCT/JP2018/040610 WO2019088209A1 (ja) | 2017-10-31 | 2018-10-31 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
| CN201880060448.9A CN111094502B (zh) | 2017-10-31 | 2018-10-31 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880060448.9A Division CN111094502B (zh) | 2017-10-31 | 2018-10-31 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113913156A CN113913156A (zh) | 2022-01-11 |
| CN113913156B true CN113913156B (zh) | 2022-06-24 |
Family
ID=66331926
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111254736.8A Active CN113913156B (zh) | 2017-10-31 | 2018-10-31 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
| CN201880060448.9A Active CN111094502B (zh) | 2017-10-31 | 2018-10-31 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880060448.9A Active CN111094502B (zh) | 2017-10-31 | 2018-10-31 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US11214713B2 (https=) |
| JP (3) | JP6692006B2 (https=) |
| CN (2) | CN113913156B (https=) |
| SG (1) | SG11202001636RA (https=) |
| WO (1) | WO2019088209A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6692006B2 (ja) | 2017-10-31 | 2020-05-13 | Hoya株式会社 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
| CN112266729A (zh) * | 2020-11-17 | 2021-01-26 | 云南光电辅料有限公司 | 一种超低色散玻璃镜片用抛光液及其制备方法 |
| CN114800055A (zh) * | 2022-04-28 | 2022-07-29 | 浙江美迪凯光学半导体有限公司 | 一种方形片的抛光工艺 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013069720A1 (ja) * | 2011-11-09 | 2013-05-16 | Dowaエコシステム株式会社 | 研磨剤リサイクル方法 |
| CN104137181A (zh) * | 2012-03-30 | 2014-11-05 | Hoya株式会社 | 磁盘用玻璃基板的制造方法 |
| CN106479371A (zh) * | 2016-08-15 | 2017-03-08 | 惠州市米特仑科技有限公司 | 一种高精度复合抛光液及其制备方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3960914B2 (ja) | 2000-10-02 | 2007-08-15 | 三井金属鉱業株式会社 | セリウム系研摩材及びセリウム系研摩材の製造方法 |
| JP4885352B2 (ja) * | 2000-12-12 | 2012-02-29 | 昭和電工株式会社 | 研磨材スラリー及び研磨微粉 |
| JP4807905B2 (ja) * | 2001-04-05 | 2011-11-02 | 昭和電工株式会社 | 研磨材スラリー及び研磨微粉 |
| JP2002371267A (ja) * | 2001-06-15 | 2002-12-26 | Mitsui Mining & Smelting Co Ltd | セリウム系研摩材粒子の製造方法及びセリウム系研摩材粒子 |
| JP4033440B2 (ja) * | 2001-09-17 | 2008-01-16 | 三井金属鉱業株式会社 | セリウム系研摩材スラリー及びセリウム系研摩材スラリーの製造方法 |
| JP5256832B2 (ja) * | 2007-04-17 | 2013-08-07 | 日立化成株式会社 | 研磨剤及びその製造方法 |
| MY154861A (en) * | 2008-12-22 | 2015-08-14 | Kao Corp | Polishing liquid composition for magnetic-disk substrate |
| CN101486879A (zh) * | 2009-02-20 | 2009-07-22 | 包头迅博新材料有限公司 | 一种稀土精细抛光材料及其制造工艺 |
| JP2011110637A (ja) * | 2009-11-25 | 2011-06-09 | Asahi Glass Co Ltd | 磁気ディスク用ガラス基板の製造方法 |
| CN102079950A (zh) * | 2009-11-27 | 2011-06-01 | 东莞市卓越研磨材料有限公司 | 单分散稀土抛光粉制备方法 |
| AU2011216058A1 (en) * | 2010-02-10 | 2012-08-30 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic particles and methods for making the same |
| JP5736681B2 (ja) * | 2010-07-15 | 2015-06-17 | 旭硝子株式会社 | 研磨液及び磁気ディスク用ガラス基板の製造方法 |
| JP5695068B2 (ja) * | 2010-09-30 | 2015-04-01 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法および情報記録媒体の製造方法 |
| US8421536B2 (en) * | 2011-09-21 | 2013-04-16 | Analog Devices, Inc. | Apparatus and methods for electronic amplification |
| CN104603878B (zh) | 2012-08-29 | 2016-10-12 | Hoya株式会社 | 磁盘用玻璃基板、磁盘 |
| SG11201507820WA (en) | 2013-04-09 | 2015-10-29 | Dowa Eco System Co Ltd | Method for manufacturing regenerated cerium oxide-based abrasive particles, and regenerated particles |
| US20160239913A1 (en) | 2013-08-13 | 2016-08-18 | Cfph, Llc | Foreign exchange trading |
| JP6063611B2 (ja) * | 2014-06-30 | 2017-01-18 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| TWI654288B (zh) | 2015-01-12 | 2019-03-21 | 美商慧盛材料美國責任有限公司 | 用於化學機械平坦化組合物之複合硏磨粒及其使用方法 |
| JP6692006B2 (ja) * | 2017-10-31 | 2020-05-13 | Hoya株式会社 | 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法 |
-
2018
- 2018-10-31 JP JP2019550479A patent/JP6692006B2/ja active Active
- 2018-10-31 SG SG11202001636RA patent/SG11202001636RA/en unknown
- 2018-10-31 US US16/641,185 patent/US11214713B2/en active Active
- 2018-10-31 CN CN202111254736.8A patent/CN113913156B/zh active Active
- 2018-10-31 WO PCT/JP2018/040610 patent/WO2019088209A1/ja not_active Ceased
- 2018-10-31 CN CN201880060448.9A patent/CN111094502B/zh active Active
-
2020
- 2020-04-13 JP JP2020071965A patent/JP7201639B2/ja active Active
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2021
- 2021-12-30 US US17/566,200 patent/US11680187B2/en active Active
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2022
- 2022-12-22 JP JP2022205494A patent/JP7547449B2/ja active Active
-
2023
- 2023-05-22 US US18/321,385 patent/US12252633B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013069720A1 (ja) * | 2011-11-09 | 2013-05-16 | Dowaエコシステム株式会社 | 研磨剤リサイクル方法 |
| CN104137181A (zh) * | 2012-03-30 | 2014-11-05 | Hoya株式会社 | 磁盘用玻璃基板的制造方法 |
| CN106479371A (zh) * | 2016-08-15 | 2017-03-08 | 惠州市米特仑科技有限公司 | 一种高精度复合抛光液及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7201639B2 (ja) | 2023-01-10 |
| WO2019088209A1 (ja) | 2019-05-09 |
| JP2023052035A (ja) | 2023-04-11 |
| US20230287244A1 (en) | 2023-09-14 |
| CN111094502A (zh) | 2020-05-01 |
| JP2020128539A (ja) | 2020-08-27 |
| US20220119680A1 (en) | 2022-04-21 |
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