CN113517349A - 鳍式场效应晶体管源漏寄生电阻分解结构及测试结构 - Google Patents
鳍式场效应晶体管源漏寄生电阻分解结构及测试结构 Download PDFInfo
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- CN113517349A CN113517349A CN202110798892.4A CN202110798892A CN113517349A CN 113517349 A CN113517349 A CN 113517349A CN 202110798892 A CN202110798892 A CN 202110798892A CN 113517349 A CN113517349 A CN 113517349A
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- 238000012360 testing method Methods 0.000 title claims abstract description 215
- 230000003071 parasitic effect Effects 0.000 title claims abstract description 93
- 230000005669 field effect Effects 0.000 title claims abstract description 38
- 238000000354 decomposition reaction Methods 0.000 title claims abstract description 23
- 238000000605 extraction Methods 0.000 abstract description 10
- 238000000034 method Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 7
- 238000013461 design Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/08—Measuring resistance by measuring both voltage and current
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2607—Circuits therefor
- G01R31/2621—Circuits therefor for testing field effect transistors, i.e. FET's
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/785—Field effect transistors with field effect produced by an insulated gate having a channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
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CN202110798892.4A CN113517349B (zh) | 2021-07-15 | 2021-07-15 | 鳍式场效应晶体管源漏寄生电阻分解结构及测试结构 |
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CN202110798892.4A CN113517349B (zh) | 2021-07-15 | 2021-07-15 | 鳍式场效应晶体管源漏寄生电阻分解结构及测试结构 |
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CN113517349A true CN113517349A (zh) | 2021-10-19 |
CN113517349B CN113517349B (zh) | 2023-07-21 |
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060074580A1 (en) * | 2004-09-28 | 2006-04-06 | Kevin Gearhardt | Four point measurement technique for programmable impedance drivers RapidChip and ASIC devices |
US20160035723A1 (en) * | 2014-07-30 | 2016-02-04 | Globalfoundries Inc. | Macro design of device characterization for 14nm and beyond technologies |
CN106611782A (zh) * | 2016-12-27 | 2017-05-03 | 上海集成电路研发中心有限公司 | 一种降低FinFET寄生电阻的方法 |
CN206349362U (zh) * | 2016-12-30 | 2017-07-21 | 中芯国际集成电路制造(北京)有限公司 | 接触电阻测试结构 |
CN108155111A (zh) * | 2016-12-02 | 2018-06-12 | 中芯国际集成电路制造(上海)有限公司 | 半导体测试结构及其形成方法 |
CN108563801A (zh) * | 2017-12-21 | 2018-09-21 | 上海集成电路研发中心有限公司 | 一种提取FinFET寄生电阻模型的测试结构和方法 |
CN109427747A (zh) * | 2017-08-22 | 2019-03-05 | 台湾积体电路制造股份有限公司 | 半导体测试装置、其制造及使用其测量接触电阻的方法 |
CN111029329A (zh) * | 2019-12-17 | 2020-04-17 | 杭州广立微电子有限公司 | 应用于FinFET工艺中监控EPI的测试结构及方法 |
-
2021
- 2021-07-15 CN CN202110798892.4A patent/CN113517349B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060074580A1 (en) * | 2004-09-28 | 2006-04-06 | Kevin Gearhardt | Four point measurement technique for programmable impedance drivers RapidChip and ASIC devices |
US20160035723A1 (en) * | 2014-07-30 | 2016-02-04 | Globalfoundries Inc. | Macro design of device characterization for 14nm and beyond technologies |
CN108155111A (zh) * | 2016-12-02 | 2018-06-12 | 中芯国际集成电路制造(上海)有限公司 | 半导体测试结构及其形成方法 |
CN106611782A (zh) * | 2016-12-27 | 2017-05-03 | 上海集成电路研发中心有限公司 | 一种降低FinFET寄生电阻的方法 |
CN206349362U (zh) * | 2016-12-30 | 2017-07-21 | 中芯国际集成电路制造(北京)有限公司 | 接触电阻测试结构 |
CN109427747A (zh) * | 2017-08-22 | 2019-03-05 | 台湾积体电路制造股份有限公司 | 半导体测试装置、其制造及使用其测量接触电阻的方法 |
CN108563801A (zh) * | 2017-12-21 | 2018-09-21 | 上海集成电路研发中心有限公司 | 一种提取FinFET寄生电阻模型的测试结构和方法 |
CN111029329A (zh) * | 2019-12-17 | 2020-04-17 | 杭州广立微电子有限公司 | 应用于FinFET工艺中监控EPI的测试结构及方法 |
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