CN112424400B - 镀粗糙化镍的板 - Google Patents

镀粗糙化镍的板 Download PDF

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Publication number
CN112424400B
CN112424400B CN201980047842.3A CN201980047842A CN112424400B CN 112424400 B CN112424400 B CN 112424400B CN 201980047842 A CN201980047842 A CN 201980047842A CN 112424400 B CN112424400 B CN 112424400B
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CN
China
Prior art keywords
nickel
roughened
plating
layer
roughened nickel
Prior art date
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Application number
CN201980047842.3A
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English (en)
Chinese (zh)
Other versions
CN112424400A (zh
Inventor
堀江慎一郎
堤悦郎
小柳利文
吉冈兴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Kohan Co Ltd
Original Assignee
Toyo Kohan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of CN112424400A publication Critical patent/CN112424400A/zh
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B32B15/015—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium the said other metal being copper or nickel or an alloy thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/16—Electroplating with layers of varying thickness
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/406—Bright, glossy, shiny surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/538—Roughness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/72—Density
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/36—Pretreatment of metallic surfaces to be electroplated of iron or steel
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12944—Ni-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Laminated Bodies (AREA)
CN201980047842.3A 2018-07-19 2019-07-19 镀粗糙化镍的板 Active CN112424400B (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2018-135582 2018-07-19
JP2018135582 2018-07-19
JP2019015942 2019-01-31
JP2019-015942 2019-01-31
JP2019108779 2019-06-11
JP2019-108779 2019-06-11
PCT/JP2019/028562 WO2020017655A1 (ja) 2018-07-19 2019-07-19 粗化ニッケルめっき板

Publications (2)

Publication Number Publication Date
CN112424400A CN112424400A (zh) 2021-02-26
CN112424400B true CN112424400B (zh) 2023-12-05

Family

ID=69164947

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980047842.3A Active CN112424400B (zh) 2018-07-19 2019-07-19 镀粗糙化镍的板

Country Status (6)

Country Link
US (1) US11760063B2 (https=)
JP (2) JP7330187B2 (https=)
KR (2) KR102746732B1 (https=)
CN (1) CN112424400B (https=)
DE (1) DE112019003641T5 (https=)
WO (1) WO2020017655A1 (https=)

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* Cited by examiner, † Cited by third party
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KR102746732B1 (ko) * 2018-07-19 2024-12-24 도요 고한 가부시키가이샤 조화 니켈 도금판
CN113930811A (zh) * 2020-06-29 2022-01-14 比亚迪股份有限公司 一种铜基金属件、金属塑胶复合材料及其制备方法
CN113930810B (zh) * 2020-06-29 2024-02-27 比亚迪股份有限公司 一种铁基金属件、金属塑胶复合材料及其制备方法
CN115698388B (zh) 2020-07-16 2025-05-16 东洋钢钣株式会社 电解铁箔
EP4183905A4 (en) 2020-07-16 2024-10-23 Toyo Kohan Co., Ltd. ELECTROLYTIC IRON FOIL
WO2022210654A1 (ja) * 2021-03-31 2022-10-06 日鉄ケミカル＆マテリアル株式会社 集電体用鋼箔、電極、及び、電池
DE112022002379T5 (de) 2021-04-28 2024-02-15 Toyo Kohan Co., Ltd. Oberflächenbehandelte Stahlfolie
WO2022231008A1 (ja) 2021-04-28 2022-11-03 東洋鋼鈑株式会社 集電体用表面処理鋼箔
JP7578802B2 (ja) 2021-04-28 2024-11-06 東洋鋼鈑株式会社 集電体用表面処理鋼箔及びその製造方法
JP7568342B2 (ja) 2021-09-29 2024-10-16 ミネベアパワーデバイス株式会社 めっき欠陥推定方法および半導体装置の製造方法
JP2023098448A (ja) * 2021-12-28 2023-07-10 株式会社豊田自動織機 金属水素化物電池のバイポーラ電極、及びそのバイポーラ電極を備えた金属水素化物電池
JP2023098440A (ja) * 2021-12-28 2023-07-10 東洋鋼鈑株式会社 集電体用表面処理金属箔
EP4516971A4 (en) 2022-04-29 2026-04-29 Toyo Kohan Co Ltd Method for producing rolled surface-treated steel sheet, and rolled surface-treated steel sheet
WO2023210832A1 (ja) 2022-04-29 2023-11-02 東洋鋼鈑株式会社 ニッケルめっき鋼板及びその製造方法
JP7354345B1 (ja) * 2022-05-16 2023-10-02 Ｊｘ金属株式会社 非水電解質電池用タブリード
JP7354347B1 (ja) 2022-05-16 2023-10-02 Ｊｘ金属株式会社 非水電解質電池用タブリード
JP7354346B1 (ja) * 2022-05-16 2023-10-02 Ｊｘ金属株式会社 非水電解質電池用タブリード
JP7354348B1 (ja) 2022-05-16 2023-10-02 Ｊｘ金属株式会社 非水電解質電池用タブリード
KR20250136307A (ko) 2023-01-16 2025-09-16 도요 고한 가부시키가이샤 니켈 도금 금속재
KR20250085212A (ko) * 2023-12-05 2025-06-12 주식회사 포스코 도금강판 및 그 제조방법

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JP2013095991A (ja) * 2011-11-04 2013-05-20 Fukuda Metal Foil & Powder Co Ltd 高放射率金属箔
US9707738B1 (en) * 2016-01-14 2017-07-18 Chang Chun Petrochemical Co., Ltd. Copper foil and methods of use

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TWI510362B (zh) * 2013-04-30 2015-12-01 Nippon Steel & Sumitomo Metal Corp 鍍Ｎｉ鋼板及鍍Ｎｉ鋼板之製造方法
KR102479919B1 (ko) * 2016-09-13 2022-12-20 도요 고한 가부시키가이샤 전지 용기용 표면 처리 강판의 제조 방법
KR102746732B1 (ko) 2018-07-19 2024-12-24 도요 고한 가부시키가이샤 조화 니켈 도금판

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011021216A (ja) * 2009-07-14 2011-02-03 Furukawa Electric Co Ltd:The 抵抗層付銅箔、該銅箔の製造方法および積層基板
JP2013095991A (ja) * 2011-11-04 2013-05-20 Fukuda Metal Foil & Powder Co Ltd 高放射率金属箔
US9707738B1 (en) * 2016-01-14 2017-07-18 Chang Chun Petrochemical Co., Ltd. Copper foil and methods of use

Also Published As

Publication number Publication date
CN112424400A (zh) 2021-02-26
JP2023156409A (ja) 2023-10-24
US20210268770A1 (en) 2021-09-02
KR20210032397A (ko) 2021-03-24
JP7330187B2 (ja) 2023-08-21
KR102746732B1 (ko) 2024-12-24
KR102684520B1 (ko) 2024-07-11
KR20240113609A (ko) 2024-07-22
JP7710492B2 (ja) 2025-07-18
WO2020017655A1 (ja) 2020-01-23
DE112019003641T5 (de) 2021-05-06
JPWO2020017655A1 (ja) 2021-08-02
US11760063B2 (en) 2023-09-19

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