CN1102623C - 阳离子光固化配方的固化方法 - Google Patents

阳离子光固化配方的固化方法 Download PDF

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Publication number
CN1102623C
CN1102623C CN97196297A CN97196297A CN1102623C CN 1102623 C CN1102623 C CN 1102623C CN 97196297 A CN97196297 A CN 97196297A CN 97196297 A CN97196297 A CN 97196297A CN 1102623 C CN1102623 C CN 1102623C
Authority
CN
China
Prior art keywords
alkyl
photoinitiator
curing
pigment
photosensitizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN97196297A
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English (en)
Chinese (zh)
Other versions
CN1225109A (zh
Inventor
L·米瑟韦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CN1225109A publication Critical patent/CN1225109A/zh
Application granted granted Critical
Publication of CN1102623C publication Critical patent/CN1102623C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN97196297A 1996-07-12 1997-07-01 阳离子光固化配方的固化方法 Expired - Fee Related CN1102623C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP96810459 1996-07-12
EP96810459.6 1996-07-12

Publications (2)

Publication Number Publication Date
CN1225109A CN1225109A (zh) 1999-08-04
CN1102623C true CN1102623C (zh) 2003-03-05

Family

ID=8225648

Family Applications (1)

Application Number Title Priority Date Filing Date
CN97196297A Expired - Fee Related CN1102623C (zh) 1996-07-12 1997-07-01 阳离子光固化配方的固化方法

Country Status (15)

Country Link
US (1) US6235807B1 (enExample)
EP (1) EP0910612B1 (enExample)
JP (1) JP2000515182A (enExample)
KR (1) KR100489245B1 (enExample)
CN (1) CN1102623C (enExample)
AT (1) ATE279481T1 (enExample)
AU (1) AU710383B2 (enExample)
BR (1) BR9710284A (enExample)
CA (1) CA2258076A1 (enExample)
CZ (1) CZ295709B6 (enExample)
DE (1) DE69731198T2 (enExample)
ES (1) ES2229371T3 (enExample)
RU (1) RU2180669C2 (enExample)
TW (1) TW460509B (enExample)
WO (1) WO1998002493A1 (enExample)

Cited By (1)

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CN1321100C (zh) * 2005-07-18 2007-06-13 江南大学 阳离子光引发剂羟基烷氧取代基二苯基碘鎓盐及制备方法

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KR102161333B1 (ko) * 2016-12-28 2020-09-29 주식회사 엘지화학 양이온성 중합성 조성물의 포장 용기 및 이를 사용한 포장 방법
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CN111587274A (zh) * 2017-12-18 2020-08-25 爱克发-格法特公司 用于制造印刷电路板的阻焊喷墨油墨
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1321100C (zh) * 2005-07-18 2007-06-13 江南大学 阳离子光引发剂羟基烷氧取代基二苯基碘鎓盐及制备方法

Also Published As

Publication number Publication date
DE69731198T2 (de) 2006-03-09
AU710383B2 (en) 1999-09-16
RU2180669C2 (ru) 2002-03-20
AU3441097A (en) 1998-02-09
WO1998002493A1 (en) 1998-01-22
CZ295709B6 (cs) 2005-10-12
CZ5799A3 (cs) 1999-04-14
BR9710284A (pt) 1999-08-17
TW460509B (en) 2001-10-21
EP0910612B1 (en) 2004-10-13
KR100489245B1 (ko) 2005-05-17
US6235807B1 (en) 2001-05-22
ATE279481T1 (de) 2004-10-15
ES2229371T3 (es) 2005-04-16
CN1225109A (zh) 1999-08-04
JP2000515182A (ja) 2000-11-14
CA2258076A1 (en) 1998-01-22
KR20000023642A (ko) 2000-04-25
DE69731198D1 (de) 2004-11-18
EP0910612A1 (en) 1999-04-28

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Granted publication date: 20030305

Termination date: 20110701