ATE527304T1 - Neue oberflächenaktive polysiloxanphotoinitiatoren - Google Patents

Neue oberflächenaktive polysiloxanphotoinitiatoren

Info

Publication number
ATE527304T1
ATE527304T1 AT04735241T AT04735241T ATE527304T1 AT E527304 T1 ATE527304 T1 AT E527304T1 AT 04735241 T AT04735241 T AT 04735241T AT 04735241 T AT04735241 T AT 04735241T AT E527304 T1 ATE527304 T1 AT E527304T1
Authority
AT
Austria
Prior art keywords
sub
photoinitiators
new surface
active polysiloxane
polysiloxane
Prior art date
Application number
AT04735241T
Other languages
English (en)
Inventor
Jonathan Rogers
Gisele Baudin
Tunja Jung
Reinhold Oehrlein
Gabriele Baisch
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Application granted granted Critical
Publication of ATE527304T1 publication Critical patent/ATE527304T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT04735241T 2003-06-06 2004-05-28 Neue oberflächenaktive polysiloxanphotoinitiatoren ATE527304T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03405409 2003-06-06
PCT/EP2004/050952 WO2004108799A1 (en) 2003-06-06 2004-05-28 Novel surface-active polysiloxane photoinitiators

Publications (1)

Publication Number Publication Date
ATE527304T1 true ATE527304T1 (de) 2011-10-15

Family

ID=33495664

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04735241T ATE527304T1 (de) 2003-06-06 2004-05-28 Neue oberflächenaktive polysiloxanphotoinitiatoren

Country Status (13)

Country Link
US (1) US20070026509A1 (de)
EP (1) EP1631616B1 (de)
JP (1) JP4767840B2 (de)
KR (1) KR101081758B1 (de)
CN (1) CN100432122C (de)
AT (1) ATE527304T1 (de)
AU (1) AU2004245242A1 (de)
BR (1) BRPI0410985B1 (de)
CA (1) CA2525412A1 (de)
MX (1) MXPA05012854A (de)
RU (1) RU2351615C2 (de)
TW (1) TWI340757B (de)
WO (1) WO2004108799A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004058193A1 (de) * 2004-12-02 2006-06-08 Wacker Chemie Ag Vernetzbare Siloxan-Harnstoff-Copolymere
EP1923038B1 (de) * 2006-11-16 2011-05-18 Ernst Mühlbauer GmbH & Co.KG Silikonabformmasse mit zweistufigem Aushärtungsmechanismus
DE102007031689A1 (de) * 2007-07-06 2009-01-08 Evonik Goldschmidt Gmbh Enzympräparate
EP2235078B1 (de) * 2008-01-17 2011-11-16 Basf Se Modifizierte olefinpolymere
US8846160B2 (en) 2008-12-05 2014-09-30 3M Innovative Properties Company Three-dimensional articles using nonlinear thermal polymerization
US9303129B2 (en) * 2010-06-22 2016-04-05 Coloplast A/S Hydrophilic gels derived from grafted photoinitiators
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
WO2013153183A2 (de) * 2012-04-11 2013-10-17 Ivoclar Vivadent Ag Kompositharz-zusammensetzung und verfahren zur herstellung dentaler bauteile mittels stereolithographie
KR20150051478A (ko) 2013-11-04 2015-05-13 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터 표시판의 제조 방법
ES2818553T5 (es) * 2016-09-22 2023-06-27 Basf Coatings Gmbh Pintura acuosa para capa de base con estabilidad mejorada en tubería anular
WO2018181556A1 (ja) * 2017-03-29 2018-10-04 旭化成株式会社 感光性樹脂組成物
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
CN110028637A (zh) * 2017-08-20 2019-07-19 湖南七纬科技有限公司 一种颜料釉料高分子分散剂的atrp制备法
JP7319279B2 (ja) 2017-12-27 2023-08-01 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン 光学的透明感圧接着剤及びその使用
JP7146409B2 (ja) * 2018-02-20 2022-10-04 ヘンケルジャパン株式会社 Ｕｖ熱硬化型接着剤組成物
GB201807653D0 (en) * 2018-05-11 2018-06-27 Fujifilm Speciality Ink Systems Ltd A printing ink
CN112114502B (zh) * 2020-08-27 2024-08-16 江苏中德电子材料科技有限公司 一种cf返工液
JP7335217B2 (ja) * 2020-09-24 2023-08-29 信越化学工業株式会社 感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
JP3189275B2 (ja) * 1990-08-31 2001-07-16 大日本インキ化学工業株式会社 活性エネルギー線硬化型樹脂組成物
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
CN1270614A (zh) * 1997-08-21 2000-10-18 洛克泰特公司 双重固化硅氧烷组合物
DE19850507C1 (de) * 1998-11-03 2000-05-04 Goldschmidt Ag Th Verfahren zur Herstellung von Acrylsäureestern und/oder Methacrylsäureestern von hydroxyfunktionellen Siloxanen und/oder polyoxyalkylenmodifizierten Siloxanen und deren Verwendung
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
DE60138488D1 (de) * 2000-11-20 2009-06-04 Ciba Holding Inc Fluorierte photoinitiatoren in dual-cure-harzen
MXPA03005227A (es) * 2000-12-13 2003-09-25 Ciba Sc Holding Ag Fotoiniciadores de actividad superficial.
BR0116141A (pt) * 2000-12-13 2003-10-21 Ciba Sc Holding Ag Fotoiniciadores tensoativos
DE60136005D1 (en) * 2000-12-13 2008-11-13 Ciba Holding Inc Oberflächenaktive photoinitiatoren
EP1487881A2 (de) * 2002-02-04 2004-12-22 Ciba SC Holding AG Oberflächen-aktive photoinitiatoren
KR100898877B1 (ko) * 2002-02-04 2009-05-25 시바 홀딩 인크 고도로 플루오르화된 단량체 내의 플루오르화 광개시제
DE60322345D1 (en) * 2002-02-04 2008-09-04 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
KR20040099302A (ko) * 2002-03-06 2004-11-26 시바 스페셜티 케미칼스 홀딩 인크. 유기규소 그룹 함유 광개시제를 제조하기 위한 효소적 방법

Also Published As

Publication number Publication date
RU2351615C2 (ru) 2009-04-10
TWI340757B (en) 2011-04-21
MXPA05012854A (es) 2006-02-22
KR20060021878A (ko) 2006-03-08
EP1631616A1 (de) 2006-03-08
WO2004108799A1 (en) 2004-12-16
CA2525412A1 (en) 2004-12-16
US20070026509A1 (en) 2007-02-01
TW200502338A (en) 2005-01-16
RU2005141515A (ru) 2006-07-27
BRPI0410985A (pt) 2006-07-04
EP1631616B1 (de) 2011-10-05
CN1798793A (zh) 2006-07-05
KR101081758B1 (ko) 2011-11-10
CN100432122C (zh) 2008-11-12
JP4767840B2 (ja) 2011-09-07
JP2007526923A (ja) 2007-09-20
AU2004245242A1 (en) 2004-12-16
BRPI0410985B1 (pt) 2014-07-22

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