CN110204306B - 绢质细腻亚光陶瓷砖及其制备方法 - Google Patents

绢质细腻亚光陶瓷砖及其制备方法 Download PDF

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Publication number
CN110204306B
CN110204306B CN201910277756.3A CN201910277756A CN110204306B CN 110204306 B CN110204306 B CN 110204306B CN 201910277756 A CN201910277756 A CN 201910277756A CN 110204306 B CN110204306 B CN 110204306B
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China
Prior art keywords
glaze
percent
ceramic tile
silk
frit
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CN110204306A (zh
Inventor
古战文
王彦君
邓江文
肖惠银
杨权
潘超宪
王永强
刘学斌
蒋俊军
王俊
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Chongqing Wonderful Ceramics Co ltd
Guangdong Jia Mei Ceramic Co
Dongguan City Wonderful Ceramics Industrial Park Co Ltd
Jiangxi Hemei Ceramics Co Ltd
Jiangxi Wonderful Ceramics Co Ltd
Original Assignee
Chongqing Wonderful Ceramics Co ltd
Guangdong Jia Mei Ceramic Co
Dongguan City Wonderful Ceramics Industrial Park Co Ltd
Jiangxi Hemei Ceramics Co Ltd
Jiangxi Wonderful Ceramics Co Ltd
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Application filed by Chongqing Wonderful Ceramics Co ltd, Guangdong Jia Mei Ceramic Co, Dongguan City Wonderful Ceramics Industrial Park Co Ltd, Jiangxi Hemei Ceramics Co Ltd, Jiangxi Wonderful Ceramics Co Ltd filed Critical Chongqing Wonderful Ceramics Co ltd
Priority to CN201910277756.3A priority Critical patent/CN110204306B/zh
Priority to PCT/CN2019/092693 priority patent/WO2020206843A1/zh
Priority to US16/762,916 priority patent/US20210198150A1/en
Publication of CN110204306A publication Critical patent/CN110204306A/zh
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Publication of CN110204306B publication Critical patent/CN110204306B/zh
Priority to US18/228,666 priority patent/US20230382804A1/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B11/00—Apparatus or processes for treating or working the shaped or preshaped articles
    • B28B11/04—Apparatus or processes for treating or working the shaped or preshaped articles for coating or applying engobing layers
    • B28B11/044—Apparatus or processes for treating or working the shaped or preshaped articles for coating or applying engobing layers with glaze or engobe or enamel or varnish
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B11/00—Apparatus or processes for treating or working the shaped or preshaped articles
    • B28B11/24—Apparatus or processes for treating or working the shaped or preshaped articles for curing, setting or hardening
    • B28B11/243—Setting, e.g. drying, dehydrating or firing ceramic articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B3/00—Producing shaped articles from the material by using presses; Presses specially adapted therefor
    • B28B3/02—Producing shaped articles from the material by using presses; Presses specially adapted therefor wherein a ram exerts pressure on the material in a moulding space; Ram heads of special form
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    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
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    • C03C3/00—Glass compositions
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    • C03C8/06—Frit compositions, i.e. in a powdered or comminuted form containing halogen
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    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/22—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions containing two or more distinct frits having different compositions
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Abstract

本发明涉及绢质细腻亚光陶瓷砖及其制备方法。陶瓷砖坯料由以下组份组成：霞石粉：10％～15％；高碳泥：5％～10％；低碳泥：20％～25％；中高碳泥：10％～15％；回收废坯：5％～10％；钾钠石粉：5％～10％；铺路钠长石粉：20％～25％；废瓷粉：5％～10％；脱硫废渣：0～7％；磨边抛光废渣：20％～30％；液体解胶剂：0.3％～1.0％；液体增强剂：0.2％～0.8％。制备工艺流程：坯体原料配料与球磨→喷雾干燥→陈腐→坯体压制成型→干燥→抛坯→喷水→施釉→图案装饰→烧成。

Description

绢质细腻亚光陶瓷砖及其制备方法
技术领域
本发明涉及一种陶瓷生产领域，特别涉及一种绢质细腻亚光陶瓷砖及其制备方法。
背景技术
CN201710408570.8公开了一种生料哑光釉及其制备方法和应用,它的目的是解决哑光釉系列产品的手感粗糙、耐腐蚀性不稳定以及喷墨墨水发色不良等问题。该技术方案:所述生料哑光釉制备方法，包括步骤：按质量份计，取氧化锌1～5份、碳酸钡15～35份、钾长石15～30份、钠长石10～15份、白云石0～10份、高岭土3～10份、石英4～15份和磷酸钙4～15份，然后加入三聚磷酸钠及羧甲基纤维素，再加入50～70份水，球磨至过325目筛，陈腐24小时以上，即得产品。其不足之处是:制造方法相对复杂。而CN201110292141.1、CN201310076559.8、CN201710408570.8、CN201710321330.4、CN201810053256.7等方法中，其釉料配方中都使用了不同量的碳酸钡、锶化合物、氧化锡或二氧化钛，这些化工料具有不同程度的毒性，在配料使用中，容易对人体身心健康产生不良的影响。2017年10月27日，世界卫生组织国际癌症研究机构公布的致癌物清单，二氧化钛被列为2B类致癌物。另外，釉中含有二氧化钛，容易使产品釉面发黄，不利于图案的装饰丰富性表现。
发明内容
本发明的目的是提供一种采用一次施釉方式，减少釉料的消耗，减少产品缺陷产生的可能，简化产品工艺流程，降低生产难度；采用对人身健康安全影响比较小的原材物料，同时大量地消耗多种固体废渣，绿色环保的绢质细腻亚光陶瓷砖制备方法。
本发明的技术解决方案是所述绢质细腻亚光陶瓷砖，其特殊之处在于，所述陶瓷砖坯料由以下组份组成：
Figure BDA0002020608290000011
作为优选：所述磨边抛光废渣选择下列中的一种或几种：SiO2、Al2O3、CaO、K2O、Na2O、MgO、MgCl2、SiC；所述磨边抛光废渣含水率32～36％。
作为优选：所述液体解胶剂选择下列中的一种或几种：甲基丙烯酸、甲基丙烯磺酸钠、过硫酸钠、对苯二酚、聚酰亚胺、氢氧化钠、氯化钠、碳酸钠；所述液体解胶剂的PH值：7.0～9.0。
作为优选：所述液体增强剂选择下列中的一种或几种：改性木质素、聚乙烯醇、聚丙烯酸酯、聚丙烯酸钠、水玻璃、磷酸盐。
本发明的另一技术解决方案是所述绢质细腻亚光陶瓷砖的制备方法，其特殊之处在于，包括以下步骤：
5、一种绢质细腻亚光陶瓷砖的制备方法，其特征在于，包括以下步骤：
⑴坯体原料配料：坯体以磨边抛光废渣、脱硫废渣、废瓷粉、霞石粉、钾钠石粉、铺路钠长石粉、高碳泥、低碳泥为原料，以设定的比例配料，直接送入三级连续球磨机，按泥浆的水分的32％～35％比例加入水，连续球磨2～5小时；
⑵喷雾干燥：连续球磨设备所加工出来的泥浆，储存于地下浆池，经陈腐均化后，由阻塞泵送入干燥塔进行喷粉造粒，容重1.0～1.1，水份6.0～6.5％；
⑶陈腐：从喷雾干燥出来的粉料用皮带直接输送到粉料仓，压制成型前，粉料需在料仓中陈腐48小时以上，水份5.0～6.0％；
⑷坯体压制成型：将陈腐后的坯体粉料输送到压机顶上料斗，运用栅格布料器将坯体粉料推装入压机模框中，在压机上加压作用下，坯体粉料内空隙中的气体部分排出，粉料颗粒发生位移、逐步靠拢，并借内摩擦力牢固地结合，形成设定形状的坯体，其坯体最终形成截面与模具截面相同、上下两面形状由模框中的上下压模形状决定；
⑸干燥：采用3～5层辊道窑进行坯体干燥，干燥最高温度为160～200℃，干燥时间为30～60min；经干燥后的坯体强度为1.2Mpa～1.8Mpa，干燥坯体含水率为＜0.1％；
⑹抛坯：利用抛坯机对辊道干燥窑出来坯体进行表面打磨处理；
⑺喷水：采用高压喷水柜对坯体表面进行喷水，高压喷水柜所装备的喷枪喷嘴大小0.36MM，喷水压力为12～18bar,喷水量为：55～100g/m2；
⑻施釉：采用直线淋釉器进行施釉，其工艺参数为：釉浆比重为1.45～1.80，釉浆流速为18～30S；釉层厚度为0.03～0.1MM；
⑼图案装饰：择一选用丝网、胶辊、喷墨打印的方式对坯体釉表面进行图案装饰；
⑽烧成：成品送入烧成窑炉进行烧制，烧制温度为1050～1170℃，烧成时间为50～80分钟，其中中高温阶段的烧成时间为6～10分钟。
作为优选：步骤⑴中所述脱硫废渣是采用湿法脱硫法处理瓷砖窑炉烟气产生的脱硫石膏，主要成分为二水硫酸钙晶体CaSO4·2H2O、其主要杂质为碳酸钙；脱硫石膏纯度在90％～95％之间，含水率为10％～15％，粒径主要为30～50nm。
作为优选：步骤⑴中所述高碳泥，碳含量≥3.0％，需搭配低碳泥使用,含水率为19％～21％；所述低碳泥，碳含量≤0.5％，可单独作为配方原料或搭配中高碳泥使用，其含水率为17％～20％。
作为优选：步骤⑻中所述施釉为绢质亚光釉浆，其由流平剂和亚光细腻釉浆组成；
所述流平剂选用：聚丙烯酸流平剂、磷酸酯改性丙烯酸流平剂、氟改性丙烯酸流平剂、丙烯酸丁酯类流平剂、有机硅流平剂、聚醚聚酯改性有机硅氧烷、聚醚改性有机硅、聚甲基烷基硅氧烷、烷基改性有机硅氧烷、端基改性有机硅、氟碳化合物类流平剂中的一种或几种，其加入量为0.1％～0.5％；
所述亚光细腻釉浆由亚光釉粉64％～74％、添加剂0.2％～1.2％、水25％～35％，经球磨5～8小时制备而成；其釉浆细度控制为325目筛余0.8％～1.2％。
作为优选：所述亚光釉粉由以下组份组成：
Figure BDA0002020608290000031
作为优选：所述FMC633熔块系为引入钙、镁于配方中，其所包含的主要化学成分的重量百分比为：
Figure BDA0002020608290000032
所述FMC633熔块为低温熔块，有利于产品釉的平整度和晶体光泽；
所述FMC689熔块系为引入铝、钙于配方中，其所包含的主要化学成分的重量百分比为：
Figure BDA0002020608290000041
所述FMC689熔块为高温熔块，在产品釉中起到光滑平整和控制光泽作用；
所述FMC053熔块系为引入锌、锆于配方中，其所包含的主要化学成分的重量百分比为：
Figure BDA0002020608290000042
所述FMC053熔块为中高温熔块，在产品釉中起到光滑细腻和增白作用；
所述刮边回收料由坯料、釉料组成，其中釉料包含底釉和透明釉，刮边回收料其水分为9～13％，刮边回收料细度为＜1％，其化学成分的重量百分比为：
Figure BDA0002020608290000043
所述超细氧化锆的粒度为D50值并控制在0.47μm以下、D90值控制在1.0μm以下，ZrO2：≥93.27％，折射率1.93～2.01，熔点2370～2700℃。
与现有技术相比，本发明的有益效果:
⑴本发明的制备过程，采用对人身健康安全影响比较小的原材物料，同时大量地消耗多种固体废渣，绿色环保，具有循环生产的经济效益；并采用一次施釉方式，减少釉料的消耗，减少产品缺陷产生的可能，简化产品工艺流程，降低生产难度。
⑵本发明采用调整泥浆细度与水分，粉料颗粒级配、容重(表征粉料的实心度)、均匀布料技术、抛坯技术等保证了坯体表面的平整光滑度；多种熔块组合式的绢质亚光釉料，熔块在高温时的产生流动性好液相，能快速地助熔其他物料，快速地流平，同时也大大地拓宽了产品烧成范围，适应于不同窑炉工艺条件，使产品釉面效果比较容易获得绢质细腻平滑的质感，其釉面光泽度为9～15度。
⑶本发明的产品釉面平整度、产品内质性能都优于其他同类型产品。抗化学腐蚀性能和耐污染性能达到国标最高级；对蓝墨水、红墨水、黑墨水、水性或油性记号笔所污染的釉面都容易擦洗，易清洁，耐脏污；产品耐磨性能达到国家质量控制标准，并采用磨耗来进一步用数值精准地表征产品耐磨性能，本发明方法所制造的产品磨耗＜0.25g/m3(产品在12000转时的磨损量)。
⑷本发明的刮边回收料，是在砖坯施釉工序后，入窑炉烧成前，用刀片对正在输送线前进的坯体沾釉边进行刮边处理而所得到的原料；对坯体有釉边进行刮边处理的作用是防止坯体边部的釉料在高温烧成中，流淌的液相釉粘贴于辊棒上而形成棒钉，划伤或顶起在窑炉烧成中的产品，从而使产品出现开裂、中心裂、波浪变形等缺陷。
⑸本发明的膨润土和球土，粒度细，具有良好的增稠性、悬浮稳定性、润滑性、成膜性、耐水性、烧结白度高、高温稳定性及化学稳定性，能提高釉浆悬浮性能，使釉面获得良好的遮盖和平滑效果,并有利于增强坯釉结合减少釉面缺陷。
⑹本发明绢质亚光釉中的流平剂具有滑爽、防粘、润湿、低表面张力、流平速度快、与釉浆料具有良好的相溶性等特点。按一定比例量加入釉浆中后，显著降低釉浆体系的表面张力，改善其流动、流平性，具有排泡、消泡功能，能促使绢质亚光釉浆在坯体表面干燥过程中，快速消除沙眼、缩孔、针孔、表面橘皮、火山口等缺陷，从而形成一个平整、光滑、均匀的釉膜，提高了釉面平整度，使釉表面有丝绸般镜面的触感与光泽。
⑺本发明的液体增强剂可增加坯体干燥强度,确保砖坯进窑炉前不易破裂，并且能在中高温时完全挥发,不会对瓷砖成品质量，如溶洞、气泡、色差、变形等。
⑻本发明的格栅布料器，其边框上设置的可调螺栓锁紧机构，保证框体内各个方向的粉料厚度均匀一致性；另外，还在与模框表面接触的边框上设置了弹簧钢，确保格栅布料器与压机模框表面的充分柔韧性接触，克服了格栅布料器载重粉料运行布料中容易变形的缺陷，使布料更加均匀。格栅布料器的格栅筋条表面涂覆聚四氟乙烯，以避免坯体粉料粘于格栅布料器而影响布料，大大提高生产速率和坯体布料均匀质量度。
⑼本发明压机顶的料斗正中间安装的粉料均料器由上、下两个漏斗组成，上下两个漏斗以相离10-20CM距离成相反安装；即上漏斗的大口(其直径大小为压机顶料斗的直径的1/3-2/5)朝上，小口(其直径大小为压机顶料斗的直径的1/8-1/6)朝下，以铁架固定在压机顶的料斗正中心；而下漏斗的小口(其直径大小为压机顶料斗的直径的1/12-1/10)朝上，大口(其直径大小为压机顶料斗的直径的1/6-1/4)朝下，固定在料斗内不锈钢隔板交叉中心点的正上方。当输送皮带将不同料仓下落的同一种料经斜斗送到压机顶的料斗顶时，经过粉料均料器可以均匀分配到各个小隔料仓中，均化压制前的粉料，使压制时的粉料干湿度、颗粒级配的状况一致。这样可以提升坯面光滑平整度、坯体致密均匀度，减少坯体夹层、鼓包等缺陷的产生。
⑽本发明通过设定抛磨组数逐步对砖坯进行抛切打磨达到抛切量，多个抛削打磨组的设置保证干燥坯体的表面有更好的光滑度和平整度、降低砖坯的破损。
具体实施方式
本发明下面将结合实施例作进一步详述：
所述绢质细腻亚光陶瓷砖坯料由以下组份组成：
Figure BDA0002020608290000061
本实施例中，所述磨边抛光废渣选择下列中的一种或几种：SiO2、Al2O3、CaO、K2O、Na2O、MgO、MgCl2、SiC；所述磨边抛光废渣含水率32～36％。
所述磨边抛光废渣主要来源于瓷砖后期冷加工——研磨、抛光、磨边、倒角等系列工序后，经过絮凝、沉淀及压滤等工艺处理而产生的固体废渣，这些固体废渣包含了瓷砖被抛光或磨掉的细屑——坯料、釉料、磨头被磨掉的细屑等；所述回收废坯为生产制造过程中产生碰缺角或破碎的泥坯(未经过烧制的)，其经过用水化浆或直接球磨，可重复利用于坯体泥浆料；所述废瓷粉，是将有缺陷的瓷砖成品进行一系列的破碎处理后，过筛得到所需粒径大小的物料；
本实施例中，所述液体解胶剂选择下列中的一种或几种：甲基丙烯酸、甲基丙烯磺酸钠、过硫酸钠、对苯二酚、聚酰亚胺、氢氧化钠、氯化钠、碳酸钠；所述液体解胶剂的PH值：7.0～9.0。
本实施例中，所述液体增强剂选择下列中的一种或几种：改性木质素、聚乙烯醇、聚丙烯酸酯、聚丙烯酸钠、水玻璃、磷酸盐。
所述液体增强剂增加了坯体干燥强度,确保砖坯进窑炉前不易破裂，并且能在中高温时完全挥发,不会对瓷砖成品质量，如溶洞、气泡、色差、变形等。
所述绢质细腻亚光陶瓷砖的制备方法，包括以下步骤：
⑴坯体原料配料：坯体以磨边抛光废渣、脱硫废渣、废瓷粉、霞石粉、钾钠石粉、铺路钠长石粉、高碳泥、低碳泥为原料，以设定的比例配料，直接送入三级连续球磨机，按泥浆的水分的32％～35％比例加入水，连续球磨2～5小时；所述脱硫废渣是采用湿法脱硫法处理瓷砖窑炉烟气产生的脱硫石膏，主要成分为二水硫酸钙晶体CaSO4·2H2O、其主要杂质为碳酸钙；脱硫石膏纯度在90％～95％之间，含水率为10％～15％，粒径主要为30～50nm；所述高碳泥，碳含量≥3.0％，需搭配低碳泥使用,含水率为19％～21％；所述低碳泥，碳含量≤0.5％，可单独作为配方原料或搭配中高碳泥使用，其含水率为17％～20％；
⑵喷雾干燥：连续球磨设备所加工出来的泥浆，储存于地下浆池，经陈腐均化后，由阻塞泵送入干燥塔进行喷粉造粒，容重1.0～1.1，水份6.0～6.5％；
⑶陈腐：从喷雾干燥出来的粉料用皮带直接输送到粉料仓，压制成型前，粉料需在料仓中陈腐48小时以上，水份5.0～6.0％；
⑷坯体压制成型：将陈腐后的坯体粉料输送到压机顶上料斗，运用栅格布料器将坯体粉料推装入压机模框中，在压机上加压作用下，坯体粉料内空隙中的气体部分排出，粉料颗粒发生位移、逐步靠拢，并借内摩擦力牢固地结合，形成设定形状的坯体，其坯体最终形成截面与模具截面相同、上下两面形状由模框中的上下压模形状决定；
⑸干燥：采用3～5层辊道窑进行坯体干燥，干燥最高温度为160～200℃，干燥时间为30～60min；经干燥后的坯体强度为1.2Mpa～1.8Mpa，干燥坯体含水率为＜0.1％；
⑹抛坯：利用抛坯机对辊道干燥窑出来坯体进行表面打磨处理；
⑺喷水：采用高压喷水柜对坯体表面进行喷水，高压喷水柜所装备的喷枪喷嘴大小0.36MM，喷水压力为12～18bar,喷水量为：55～100g/m2；
⑻施釉：采用直线淋釉器进行施釉，其工艺参数为：釉浆比重为1.45～1.80，釉浆流速为18～30S；釉层厚度为0.03～0.1MM；所述施釉为绢质亚光釉浆，其由流平剂和亚光细腻釉浆组成；
所述流平剂选用：聚丙烯酸流平剂、磷酸酯改性丙烯酸流平剂、氟改性丙烯酸流平剂、丙烯酸丁酯类流平剂、有机硅流平剂、聚醚聚酯改性有机硅氧烷、聚醚改性有机硅、聚甲基烷基硅氧烷、烷基改性有机硅氧烷、端基改性有机硅、氟碳化合物类流平剂中的一种或几种，其加入量为0.1％～0.5％；
所述亚光细腻釉浆由亚光釉粉、添加剂、水经球磨5～8小时制备而成；其釉浆细度控制为325目筛余0.8％～1.2％；
所述亚光釉粉由以下组份组成：
Figure BDA0002020608290000081
所述FMC633熔块系为引入钙、镁于配方中，其所包含的主要化学成分的重量百分比为：
Figure BDA0002020608290000082
所述FMC633熔块为低温熔块，有利于产品釉的平整度和晶体光泽；
所述FMC689熔块系为引入铝、钙于配方中，其所包含的主要化学成分的重量百分比为：
Figure BDA0002020608290000083
所述FMC689熔块为高温熔块，在产品釉中起到光滑平整和控制光泽作用；
所述FMC053熔块系为引入锌、锆于配方中，其所包含的主要化学成分的重量百分比为：
Figure BDA0002020608290000084
所述FMC053熔块为中高温熔块，在产品釉中起到光滑细腻和增白作用；
所述刮边回收料由坯料、釉料组成，其中釉料包含底釉和透明釉，刮边回收料其水分为9～13％，刮边回收料细度为＜1％，其化学成分的重量百分比为：
Figure BDA0002020608290000091
所述超细氧化锆的粒度控制为D50值控制在0.47μm以下、D90控制在1.0μm以下，ZrO2：≥93.27％，折射率1.93～2.01，熔点2370～2700℃；
⑼图案装饰：择一选用丝网、胶辊、喷墨打印的方式对坯体釉表面进行图案装饰；
⑽烧成：成品送入烧成窑炉进行烧制，烧制温度为1050～1170℃，烧成时间为50～80分钟，其中中高温阶段的烧成时间为6～10分钟。
以上所述仅为本发明的较佳实施例，凡依本发明权利要求范围所做的均等变化与修饰，皆应属本发明权利要求的涵盖范围。

Claims (7)

1.一种绢质细腻亚光陶瓷砖，其特征在于，所述陶瓷砖坯料由以下组份组成：
Figure FDA0003460049600000011
亚光细腻釉浆由亚光釉粉64％～74％、添加剂0.2％～1.2％、水25％～35％，经球磨5～8小时制备而成；其釉浆细度控制为325目筛余0.8％～1.2％；
所述亚光釉粉由以下组份组成：
Figure FDA0003460049600000012
所述FMC633熔块系为引入钙、镁于配方中，其所包含的主要化学成分的重量百分比为：
I.L≤0.05 SiO2 51.35 Al2O3 11.97
Fe2O3 0.05 CaO 17.92 MgO 8.25
K2O 2.86 Na2O 2.39 ZrO2 5.16
所述FMC633熔块为低温熔块，有利于产品釉的平整度和晶体光泽；
所述FMC689熔块系为引入铝、钙于配方中，其所包含的主要化学成分的重量百分比为：
I.L≤0.05 SiO2 54.52 Al2O3 21.73
Fe2O3 0.07 CaO 15.11 MgO 0.23
K2O 3.49 Na2O 2.43 B2O3 1.89
ZnO 0.48
所述FMC689熔块为高温熔块，在产品釉中起到光滑平整和控制光泽作用；
所述FMC053熔块系为引入锌、锆于配方中，其所包含的主要化学成分的重量百分比为：
Figure FDA0003460049600000013
所述FMC053熔块为中高温熔块，在产品釉中起到光滑细腻和增白作用；
所述刮边回收料由坯料、釉料组成，其中釉料包含底釉和透明釉，刮边回收料其水分为9～13％，其化学成分的重量百分比为：
Figure FDA0003460049600000021
所述超细氧化锆的粒度为D50值并控制在0.47μm以下、D90值控制在1.0μm以下，ZrO2：≥93.27％，折射率1.93～2.01，熔点2370～2700℃。
2.根据权利要求1所述绢质细腻亚光陶瓷砖，其特征在于，所述磨边抛光废渣选择下列中的一种或几种：SiO2、Al2O3、CaO、MgO、SiC；
所述磨边抛光废渣含水率32～36％。
3.根据权利要求1所述绢质细腻亚光陶瓷砖，其特征在于，所述液体解胶剂选择下列中的一种或几种：甲基丙烯酸、甲基丙烯磺酸钠、过硫酸钠、对苯二酚、聚酰亚胺、氢氧化钠、氯化钠、碳酸钠；
所述液体解胶剂的PH值：7.0～9.0。
4.根据权利要求1所述绢质细腻亚光陶瓷砖，其特征在于，所述液体增强剂选择下列中的一种或几种：改性木质素、聚乙烯醇、聚丙烯酸酯、聚丙烯酸钠、水玻璃、磷酸盐。
5.根据权利要求1所述绢质细腻亚光陶瓷砖，其特征在于，所述脱硫废渣是采用湿法脱硫法处理瓷砖窑炉烟气产生的脱硫石膏，主要成分为二水硫酸钙晶体CaSO4·2H2O、其主要杂质为碳酸钙；脱硫石膏纯度在90％～95％之间，含水率为10％～15％，粒径主要为30～50nm。
6.根据权利要求1所述绢质细腻亚光陶瓷砖，其特征在于，所述高碳泥，碳含量≥3.0％，需搭配低碳泥使用,含水率为19％～21％；所述低碳泥，碳含量≤0.5％，可单独作为配方原料或搭配中高碳泥使用，其含水率为17％～20％。
7.根据权利要求1所述绢质细腻亚光陶瓷砖，其特征在于，所述亚光细腻釉浆和流平剂组成绢质亚光釉浆；
所述流平剂选用：聚丙烯酸流平剂、磷酸酯改性丙烯酸流平剂、氟改性丙烯酸流平剂、丙烯酸丁酯类流平剂、有机硅流平剂、聚醚聚酯改性有机硅氧烷、聚醚改性有机硅、聚甲基烷基硅氧烷、烷基改性有机硅氧烷、端基改性有机硅、氟碳化合物类流平剂中的一种或几种，其加入量为0.1％～0.5％。
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