CN110033879A - 透明导电性薄膜及其制造方法 - Google Patents

透明导电性薄膜及其制造方法 Download PDF

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Publication number
CN110033879A
CN110033879A CN201910322990.3A CN201910322990A CN110033879A CN 110033879 A CN110033879 A CN 110033879A CN 201910322990 A CN201910322990 A CN 201910322990A CN 110033879 A CN110033879 A CN 110033879A
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CN
China
Prior art keywords
transparent conductive
conductive layer
layer
polymer film
indium
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Pending
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CN201910322990.3A
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English (en)
Chinese (zh)
Inventor
川上梨恵
梨木智刚
藤野望
佐佐和明
待永广宣
黑濑爱美
松田知也
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Nitto Denko Corp
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Nitto Denko Corp
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Publication of CN110033879A publication Critical patent/CN110033879A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
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    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
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    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/302—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising aromatic vinyl (co)polymers, e.g. styrenic (co)polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • H—ELECTRICITY
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    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Non-Insulated Conductors (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Physical Vapour Deposition (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • General Physics & Mathematics (AREA)
CN201910322990.3A 2014-05-20 2015-05-15 透明导电性薄膜及其制造方法 Pending CN110033879A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014104184 2014-05-20
JP2014-104184 2014-05-20
CN201580002175.9A CN105637111A (zh) 2014-05-20 2015-05-15 透明导电性薄膜及其制造方法

Related Parent Applications (1)

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Publications (1)

Publication Number Publication Date
CN110033879A true CN110033879A (zh) 2019-07-19

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN201580002175.9A Pending CN105637111A (zh) 2014-05-20 2015-05-15 透明导电性薄膜及其制造方法
CN201910322990.3A Pending CN110033879A (zh) 2014-05-20 2015-05-15 透明导电性薄膜及其制造方法

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Country Status (6)

Country Link
US (1) US20160300632A1 (enExample)
JP (2) JP6134443B2 (enExample)
KR (1) KR20170008196A (enExample)
CN (2) CN105637111A (enExample)
TW (1) TWI580582B (enExample)
WO (1) WO2015178298A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115298022A (zh) * 2020-03-19 2022-11-04 日东电工株式会社 透明导电性薄膜
CN115667573A (zh) * 2020-05-25 2023-01-31 日东电工株式会社 透光性导电性片的制造方法
CN115666928A (zh) * 2020-05-25 2023-01-31 日东电工株式会社 透光性导电性片、接触式传感器、调光元件、光电转换元件、热线控制构件、天线、电磁波屏蔽构件和图像显示装置
CN116547139A (zh) * 2021-09-17 2023-08-04 日东电工株式会社 透明导电性薄膜
US12156330B2 (en) 2020-03-19 2024-11-26 Nitto Denko Corporation Light-transmitting electroconductive film and transparent electroconductive film

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TWI629693B (zh) * 2017-03-08 2018-07-11 南臺科技大學 軟性透明導電膜及其製造方法
US10650935B2 (en) 2017-08-04 2020-05-12 Vitro Flat Glass Llc Transparent conductive oxide having an embedded film
JP2019059170A (ja) * 2017-09-27 2019-04-18 日東電工株式会社 結晶化フィルム
JP6999899B2 (ja) * 2017-11-24 2022-01-19 日本電気硝子株式会社 透明導電膜付きガラスロール及び透明導電膜付きガラスシートの製造方法
EP3503208A1 (en) * 2017-12-21 2019-06-26 Beijing Juntai Innovation Technology Co., Ltd Thin film assembly and method of preparing the same, and hetero-junction solar cell including thin film assembly
CN108766630B (zh) * 2018-05-29 2020-02-21 五邑大学 一种基于金属纳米线的柔性传感器、及其制备方法
JP7280036B2 (ja) * 2018-12-17 2023-05-23 日東電工株式会社 導電性フィルムの製造方法
JP7502000B2 (ja) 2019-06-21 2024-06-18 日東電工株式会社 透明導電性フィルム
JP7492916B2 (ja) * 2019-06-27 2024-05-30 日東電工株式会社 透明導電性フィルム
JP7605745B2 (ja) 2019-09-30 2024-12-24 日東電工株式会社 透明導電膜、積層体、及び透明導電膜を製造する方法
CN115280430B (zh) * 2020-03-19 2024-06-14 日东电工株式会社 透明导电层和透明导电性片
JP7068558B2 (ja) * 2020-03-19 2022-05-16 日東電工株式会社 透明導電性フィルム
KR102834024B1 (ko) 2020-12-15 2025-07-14 닛토덴코 가부시키가이샤 투명 도전성 필름
CN113463048B (zh) * 2021-06-18 2023-07-14 安徽立光电子材料股份有限公司 一种柔性膜制作方法

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CN103314127A (zh) * 2010-12-27 2013-09-18 日东电工株式会社 透明导电性薄膜及其制造方法
CN103345962A (zh) * 2011-10-06 2013-10-09 日东电工株式会社 透明导电性薄膜
WO2013172055A1 (ja) * 2012-05-17 2013-11-21 株式会社カネカ 透明電極付き基板およびその製造方法、ならびにタッチパネル

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