CN108706887A - 减反射玻璃制品及其制备和使用方法 - Google Patents
减反射玻璃制品及其制备和使用方法 Download PDFInfo
- Publication number
- CN108706887A CN108706887A CN201810709662.4A CN201810709662A CN108706887A CN 108706887 A CN108706887 A CN 108706887A CN 201810709662 A CN201810709662 A CN 201810709662A CN 108706887 A CN108706887 A CN 108706887A
- Authority
- CN
- China
- Prior art keywords
- glass
- product
- anti reflection
- convex member
- glass baseplate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 190
- 238000002360 preparation method Methods 0.000 title abstract description 4
- 238000002310 reflectometry Methods 0.000 claims abstract description 29
- 239000000463 material Substances 0.000 claims description 78
- 239000010410 layer Substances 0.000 claims description 50
- 230000003667 anti-reflective effect Effects 0.000 claims description 46
- 239000000758 substrate Substances 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 32
- 230000010354 integration Effects 0.000 claims description 27
- 239000002105 nanoparticle Substances 0.000 claims description 18
- 239000002356 single layer Substances 0.000 claims description 16
- 239000003595 mist Substances 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 10
- 238000010998 test method Methods 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 6
- 238000005259 measurement Methods 0.000 claims description 4
- 230000004313 glare Effects 0.000 claims description 2
- 230000009477 glass transition Effects 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000001228 spectrum Methods 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000001027 hydrothermal synthesis Methods 0.000 description 54
- 239000002585 base Substances 0.000 description 52
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 44
- 239000011248 coating agent Substances 0.000 description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 21
- 230000004927 fusion Effects 0.000 description 20
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 14
- 238000005342 ion exchange Methods 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 14
- 239000002245 particle Substances 0.000 description 14
- 238000012545 processing Methods 0.000 description 14
- 229910052593 corundum Inorganic materials 0.000 description 13
- 229910001845 yogo sapphire Inorganic materials 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- 229910001413 alkali metal ion Inorganic materials 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 9
- 238000003618 dip coating Methods 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229910052783 alkali metal Inorganic materials 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 7
- 150000001340 alkali metals Chemical class 0.000 description 7
- 238000000137 annealing Methods 0.000 description 7
- 229910052681 coesite Inorganic materials 0.000 description 7
- 229910052906 cristobalite Inorganic materials 0.000 description 7
- 239000005357 flat glass Substances 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 229910021645 metal ion Inorganic materials 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 229910052682 stishovite Inorganic materials 0.000 description 7
- 229910052905 tridymite Inorganic materials 0.000 description 7
- 238000005299 abrasion Methods 0.000 description 6
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 235000010215 titanium dioxide Nutrition 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000005543 nano-size silicon particle Substances 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 4
- 239000002313 adhesive film Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000003426 chemical strengthening reaction Methods 0.000 description 4
- 238000000280 densification Methods 0.000 description 4
- 230000003670 easy-to-clean Effects 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- 238000004904 shortening Methods 0.000 description 4
- 210000000498 stratum granulosum Anatomy 0.000 description 4
- 238000001429 visible spectrum Methods 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- 238000003723 Smelting Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 230000000845 anti-microbial effect Effects 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- 238000010335 hydrothermal treatment Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000000985 reflectance spectrum Methods 0.000 description 3
- 229910052701 rubidium Inorganic materials 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000005368 silicate glass Substances 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical class OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 229910000323 aluminium silicate Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 2
- 239000006119 easy-to-clean coating Substances 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000036571 hydration Effects 0.000 description 2
- 238000006703 hydration reaction Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 230000003678 scratch resistant effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- 229910001948 sodium oxide Inorganic materials 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- 229910016341 Al2O3 ZrO2 Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 241000445129 Eremomyces bilateralis Species 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 241000283984 Rodentia Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 241001661355 Synapsis Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- -1 alkali metal cation Chemical class 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PZZYQPZGQPZBDN-UHFFFAOYSA-N aluminium silicate Chemical compound O=[Al]O[Si](=O)O[Al]=O PZZYQPZGQPZBDN-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000000541 cathodic arc deposition Methods 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000004851 dishwashing Methods 0.000 description 1
- 229910001409 divalent cation oxide Inorganic materials 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000009881 electrostatic interaction Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 235000013569 fruit product Nutrition 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 238000003286 fusion draw glass process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- NCCSSGKUIKYAJD-UHFFFAOYSA-N rubidium(1+) Chemical compound [Rb+] NCCSSGKUIKYAJD-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000003283 slot draw process Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000007655 standard test method Methods 0.000 description 1
- 239000006058 strengthened glass Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000012956 testing procedure Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/465—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase having a specific shape
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/48—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase having a specific function
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Composite Materials (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261731924P | 2012-11-30 | 2012-11-30 | |
| US61/731,924 | 2012-11-30 | ||
| CN201380071214.1A CN105143134B (zh) | 2012-11-30 | 2013-11-26 | 减反射玻璃制品及其制备和使用方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380071214.1A Division CN105143134B (zh) | 2012-11-30 | 2013-11-26 | 减反射玻璃制品及其制备和使用方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108706887A true CN108706887A (zh) | 2018-10-26 |
Family
ID=49880960
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810709662.4A Pending CN108706887A (zh) | 2012-11-30 | 2013-11-26 | 减反射玻璃制品及其制备和使用方法 |
| CN201380071214.1A Expired - Fee Related CN105143134B (zh) | 2012-11-30 | 2013-11-26 | 减反射玻璃制品及其制备和使用方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380071214.1A Expired - Fee Related CN105143134B (zh) | 2012-11-30 | 2013-11-26 | 减反射玻璃制品及其制备和使用方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10961147B2 (https=) |
| EP (1) | EP2925696B1 (https=) |
| JP (2) | JP6376607B2 (https=) |
| KR (1) | KR102243475B1 (https=) |
| CN (2) | CN108706887A (https=) |
| TW (2) | TWI609003B (https=) |
| WO (1) | WO2014085414A1 (https=) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102243475B1 (ko) * | 2012-11-30 | 2021-04-23 | 코닝 인코포레이티드 | 반사 감소된 유리 물품 및 이를 제조하는 방법 및 용도 |
| TWI556002B (zh) * | 2014-08-05 | 2016-11-01 | 群創光電股份有限公司 | 抗反射結構及電子裝置 |
| US10338276B2 (en) | 2014-09-12 | 2019-07-02 | Fujifilm Corporation | Antireflective film, polarizing plate, cover glass, image display device, and method of manufacturing antireflective film |
| DE102014013528B4 (de) * | 2014-09-12 | 2022-06-23 | Schott Ag | Beschichtetes Glas-oder Glaskeramiksubstrat mit beständigen multifunktionellen Oberflächeneigenschaften, Verfahren zu dessen Herstellung und dessen Verwendung |
| KR20180016431A (ko) | 2015-06-02 | 2018-02-14 | 코닝 인코포레이티드 | 표면 디스플레이 유닛용 다-기능 물질 시스템 |
| WO2017022566A1 (ja) * | 2015-07-31 | 2017-02-09 | 富士フイルム株式会社 | 反射防止フィルムの製造方法、及び反射防止フィルム |
| WO2017143324A1 (en) * | 2016-02-19 | 2017-08-24 | Intevac, Inc. | Smudge, scratch and wear resistant glass via ion implantation |
| CN109641790A (zh) * | 2016-04-12 | 2019-04-16 | 旭硝子欧洲玻璃公司 | 具有减少的内部反射率的玻璃基板及其制造方法 |
| EA201892252A1 (ru) * | 2016-04-12 | 2019-03-29 | Агк Гласс Юроп | Противоотражающая устойчивая к царапанию стеклянная подложка и способ ее изготовления |
| JPWO2018025818A1 (ja) | 2016-08-02 | 2019-02-28 | 富士フイルム株式会社 | 積層体、反射防止物品、及びそれらの製造方法 |
| CN109964153A (zh) * | 2016-11-15 | 2019-07-02 | 赫普维科有限公司 | 硬薄膜 |
| DE102016125689A1 (de) * | 2016-12-23 | 2018-06-28 | Schott Ag | Substrat umfassend Anti-Reflex-Beschichtungssystem mit Hartstoffbeschichtung sowie Verfahren zu dessen Herstellung |
| NL2020896B1 (en) | 2018-05-08 | 2019-11-14 | Corning Inc | Water-containing glass-based articles with high indentation cracking threshold |
| US20210087106A1 (en) * | 2018-03-05 | 2021-03-25 | Agc Glass Europe | Anti-glare glass sheet |
| US20200407274A1 (en) * | 2018-03-07 | 2020-12-31 | Corning Incorporated | Textured glass surfaces for reduced electrostatic charging |
| US11426818B2 (en) | 2018-08-10 | 2022-08-30 | The Research Foundation for the State University | Additive manufacturing processes and additively manufactured products |
| TWI891613B (zh) | 2018-11-16 | 2025-08-01 | 美商康寧公司 | 用於透過蒸氣處理而強化之玻璃成分及方法 |
| CN111204989A (zh) * | 2018-11-22 | 2020-05-29 | 康宁股份有限公司 | 低翘曲的强化制品以及制造其的不对称离子交换方法 |
| WO2020131400A1 (en) * | 2018-12-21 | 2020-06-25 | Corning Incorporated | Strengthened 3d printed surface features and methods of making the same |
| US12404204B2 (en) | 2019-05-16 | 2025-09-02 | Corning Incorporated | Glasses with modified young's modulus profile |
| US12122711B2 (en) | 2019-05-16 | 2024-10-22 | Corning Incorporated | Steam strengthenable glass compositions with low phosphorous content |
| WO2020231961A1 (en) | 2019-05-16 | 2020-11-19 | Corning Incorporated | Glass compositions and methods with steam treatment haze resistance |
| CN110240415A (zh) * | 2019-05-31 | 2019-09-17 | 山东建筑大学 | 一种太阳光全波段超低反射玻璃的制备方法 |
| JP7400350B2 (ja) * | 2019-10-30 | 2023-12-19 | カシオ計算機株式会社 | ソーラーパネル及び電子機器 |
| CN115996898B (zh) * | 2020-05-14 | 2025-08-19 | 康宁股份有限公司 | 抗反射和抗眩光的玻璃层压体 |
| US12147009B2 (en) | 2020-07-09 | 2024-11-19 | Corning Incorporated | Textured region to reduce specular reflectance including a low refractive index substrate with higher elevated surfaces and lower elevated surfaces and a high refractive index material disposed on the lower elevated surfaces |
| KR20230104183A (ko) * | 2020-11-06 | 2023-07-07 | 코닝 인코포레이티드 | 개선된 정전기적 성능을 갖는 기판 |
| TW202248010A (zh) * | 2021-03-30 | 2022-12-16 | 美商康寧公司 | 具有多孔層之抗反射紅外線傳輸積層玻璃製品 |
| WO2023171605A1 (ja) * | 2022-03-09 | 2023-09-14 | 日本電気硝子株式会社 | 入力装置用部材、入力装置、及び入力装置用カバー部材の製造方法 |
| WO2025038140A2 (en) * | 2023-04-05 | 2025-02-20 | University Of Florida Research Foundation, Inc. | Antireflection coatings, methods of making, and methods of use |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3847583A (en) * | 1969-08-13 | 1974-11-12 | Jenaer Glaswerk Schott & Gen | Process for the manufacture of multi-component substances |
| US5189337A (en) * | 1988-09-09 | 1993-02-23 | Hitachi, Ltd. | Ultrafine particles for use in a cathode ray tube or an image display face plate |
| EP1167313A1 (en) * | 1999-12-13 | 2002-01-02 | Nippon Sheet Glass Co., Ltd. | Low-reflection glass article |
| CN101693519A (zh) * | 2009-10-21 | 2010-04-14 | 吉林大学 | 二氧化硅纳米锥阵列的制备方法 |
| CN102153291A (zh) * | 2010-12-14 | 2011-08-17 | 吉林大学 | 无后化学修饰法制备减反射防雾耐磨涂层的方法 |
| US20120281292A1 (en) * | 2011-05-02 | 2012-11-08 | Adra Smith Baca | Glass Article Having Antireflective Layer and Method of Making |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3039937B2 (ja) * | 1988-09-09 | 2000-05-08 | 株式会社日立製作所 | 超微粒子 |
| JPH0687632A (ja) | 1992-07-31 | 1994-03-29 | Asahi Glass Co Ltd | 防眩効果を有する低反射導電膜及びその製造方法 |
| JP2859783B2 (ja) | 1992-08-31 | 1999-02-24 | 住友大阪セメント株式会社 | 帯電防止・高屈折率膜形成用塗料および帯電防止・反射防止膜付き透明材料積層体および表示装置 |
| US5492769A (en) | 1992-09-17 | 1996-02-20 | Board Of Governors Of Wayne State University | Method for the production of scratch resistance articles and the scratch resistance articles so produced |
| CA2285944A1 (en) | 1997-04-10 | 1998-10-15 | Corning Incorporated | Optical article with anti-reflecting coating, corresponding coating material and coating method |
| JP2000191948A (ja) * | 1998-12-25 | 2000-07-11 | Hitachi Chem Co Ltd | 色純度向上機能を有する膜を形成するための組成物 |
| JP2001159701A (ja) | 1999-09-22 | 2001-06-12 | Nippon Electric Glass Co Ltd | 導電性反射防止膜およびそれが被覆形成された陰極線管用ガラスパネル |
| JP4527272B2 (ja) * | 1999-12-13 | 2010-08-18 | 日本板硝子株式会社 | 低反射ガラス物品 |
| JP2002139603A (ja) | 2000-11-06 | 2002-05-17 | Nippon Sheet Glass Co Ltd | 低反射基板の製造方法、低反射基板、透明電極基板及び抵抗膜式透明タッチパネル |
| US6896928B2 (en) | 2002-06-07 | 2005-05-24 | Corning Incorporated | Two-layer protective coating system for LCD glass |
| EP1539378A2 (en) | 2002-09-19 | 2005-06-15 | Optimax Technology Corp. | Antiglare and antireflection coatings of surface active nanoparticles |
| JP2005250309A (ja) | 2004-03-08 | 2005-09-15 | Optimax Technology Corp | 反射防止フィルム |
| JP2006119390A (ja) | 2004-10-22 | 2006-05-11 | Hokuto Seisakusho:Kk | 低反射性部品及びその製造方法並びに表示装置 |
| EP1818694A1 (en) | 2006-02-14 | 2007-08-15 | DSMIP Assets B.V. | Picture frame with an anti reflective glass plate |
| US7842352B2 (en) * | 2006-08-09 | 2010-11-30 | Massachusetts Institute Of Technology | Nanoparticle coatings and methods of making |
| JP2011527661A (ja) | 2008-07-11 | 2011-11-04 | コーニング インコーポレイテッド | 民生用途のための圧縮面を有するガラス |
| WO2010014163A1 (en) | 2008-07-29 | 2010-02-04 | Corning Incorporated | Dual stage ion exchange for chemical strengthening of glass |
| US8439808B2 (en) | 2008-09-08 | 2013-05-14 | Brian H Hamilton | Bicycle trainer with variable resistance to pedaling |
| DE102008056792B4 (de) | 2008-11-11 | 2018-06-28 | Schott Ag | Verfahren zum Aufbringen einer porösen selbstreinigenden Entspiegelungsschicht sowie Glas mit dieser Entspiegelungsschicht und Verwendung einer selbstreinigenden porösen Entspiegelungsschicht |
| TWM359148U (en) | 2009-01-05 | 2009-06-11 | Samya Technology Co Ltd | Universal battery charger |
| US8553333B2 (en) | 2009-01-23 | 2013-10-08 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Nanostructured anti-reflective coatings for substrates |
| JP5572803B2 (ja) | 2009-03-25 | 2014-08-20 | 国立大学法人 香川大学 | 撥水撥油防汚性ガラスとその製造方法並びにそれらを用いたガラス窓、太陽エネルギー利用装置及び光学機器 |
| CN101665014B (zh) | 2009-09-18 | 2013-01-02 | 浙江大学 | 全角度宽波长范围使用的减反射薄膜及其制备方法 |
| TW201123508A (en) | 2009-12-22 | 2011-07-01 | Univ Nat Chiao Tung | Antireflection layer, method for fabricating antireflection surface, and photovoltaic device applying the same |
| EP2375452A1 (en) | 2010-04-06 | 2011-10-12 | FOM Institute for Atomic and Moleculair Physics | Nanoparticle antireflection layer |
| TWI531811B (zh) | 2010-10-28 | 2016-05-01 | 康寧公司 | 影像螢幕保護玻璃照明 |
| JP5660500B2 (ja) | 2011-04-14 | 2015-01-28 | 国立大学法人 香川大学 | 耐摩耗性超撥水撥油防汚性ガラスとその製造方法並びにそれらを用いたガラス窓、太陽エネルギー利用装置、光学機器および表示装置 |
| JP5825055B2 (ja) | 2011-09-29 | 2015-12-02 | 王子ホールディングス株式会社 | 反射防止体、静電容量式タッチパネルおよび静電容量式タッチパネル付き表示装置 |
| US9957609B2 (en) | 2011-11-30 | 2018-05-01 | Corning Incorporated | Process for making of glass articles with optical and easy-to-clean coatings |
| US10077207B2 (en) | 2011-11-30 | 2018-09-18 | Corning Incorporated | Optical coating method, apparatus and product |
| TWI661065B (zh) | 2011-11-30 | 2019-06-01 | 美商康寧公司 | 磁性基板載體與磁性載體 |
| JP2015506893A (ja) | 2011-11-30 | 2015-03-05 | コーニング インコーポレイテッド | 光学コーティングとクリーニング容易なコーティングを有するガラス物品を製造する方法 |
| US10059622B2 (en) | 2012-05-07 | 2018-08-28 | Guardian Glass, LLC | Anti-reflection glass with tin oxide nanoparticles |
| KR102243475B1 (ko) * | 2012-11-30 | 2021-04-23 | 코닝 인코포레이티드 | 반사 감소된 유리 물품 및 이를 제조하는 방법 및 용도 |
| CN105555729A (zh) | 2013-09-18 | 2016-05-04 | 旭硝子株式会社 | 带低反射膜的强化玻璃板及其制造方法 |
| JP6152761B2 (ja) | 2013-09-18 | 2017-06-28 | 日本電気硝子株式会社 | 膜付部材及びその製造方法 |
-
2013
- 2013-11-26 KR KR1020157016811A patent/KR102243475B1/ko not_active Expired - Fee Related
- 2013-11-26 WO PCT/US2013/071927 patent/WO2014085414A1/en not_active Ceased
- 2013-11-26 EP EP13812255.1A patent/EP2925696B1/en active Active
- 2013-11-26 CN CN201810709662.4A patent/CN108706887A/zh active Pending
- 2013-11-26 CN CN201380071214.1A patent/CN105143134B/zh not_active Expired - Fee Related
- 2013-11-26 JP JP2015545178A patent/JP6376607B2/ja not_active Expired - Fee Related
- 2013-11-26 US US14/648,075 patent/US10961147B2/en not_active Expired - Fee Related
- 2013-11-29 TW TW102143845A patent/TWI609003B/zh not_active IP Right Cessation
- 2013-11-29 TW TW106138082A patent/TWI658019B/zh not_active IP Right Cessation
-
2018
- 2018-07-19 JP JP2018135726A patent/JP6684319B2/ja not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3847583A (en) * | 1969-08-13 | 1974-11-12 | Jenaer Glaswerk Schott & Gen | Process for the manufacture of multi-component substances |
| US5189337A (en) * | 1988-09-09 | 1993-02-23 | Hitachi, Ltd. | Ultrafine particles for use in a cathode ray tube or an image display face plate |
| EP1167313A1 (en) * | 1999-12-13 | 2002-01-02 | Nippon Sheet Glass Co., Ltd. | Low-reflection glass article |
| CN101693519A (zh) * | 2009-10-21 | 2010-04-14 | 吉林大学 | 二氧化硅纳米锥阵列的制备方法 |
| CN102153291A (zh) * | 2010-12-14 | 2011-08-17 | 吉林大学 | 无后化学修饰法制备减反射防雾耐磨涂层的方法 |
| US20120281292A1 (en) * | 2011-05-02 | 2012-11-08 | Adra Smith Baca | Glass Article Having Antireflective Layer and Method of Making |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6684319B2 (ja) | 2020-04-22 |
| JP6376607B2 (ja) | 2018-08-22 |
| KR20150091344A (ko) | 2015-08-10 |
| KR102243475B1 (ko) | 2021-04-23 |
| TW201429915A (zh) | 2014-08-01 |
| US10961147B2 (en) | 2021-03-30 |
| EP2925696B1 (en) | 2021-07-07 |
| WO2014085414A1 (en) | 2014-06-05 |
| US20150299035A1 (en) | 2015-10-22 |
| JP2018165245A (ja) | 2018-10-25 |
| TWI658019B (zh) | 2019-05-01 |
| TW201803825A (zh) | 2018-02-01 |
| JP2016504260A (ja) | 2016-02-12 |
| EP2925696A1 (en) | 2015-10-07 |
| CN105143134A (zh) | 2015-12-09 |
| CN105143134B (zh) | 2018-07-27 |
| TWI609003B (zh) | 2017-12-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108706887A (zh) | 减反射玻璃制品及其制备和使用方法 | |
| TWI676608B (zh) | 經塗佈之防指紋型化學強化玻璃基板的製造方法及所製成之玻璃基板 | |
| KR101945067B1 (ko) | 반사방지층을 갖는 유리 제품 및 이의 제조방법 | |
| CN103328398B (zh) | 具有压缩应力平衡的防眩光玻璃片及其方法 | |
| TWI641570B (zh) | 抗反射玻璃製品及製造與使用該製品的方法 | |
| US10741725B2 (en) | Transparent substrate and process for producing it | |
| CN111727178A (zh) | 玻璃盖片和内嵌式液晶显示装置 | |
| KR20200054243A (ko) | 내스크래치성을 갖는 텍스쳐링된 유리-계 물품 및 이를 제조하는 방법 | |
| WO2015041257A1 (ja) | 低反射膜付き強化ガラス板およびその製造方法 | |
| CN105392627A (zh) | 使用低玻璃转换温度包覆层的纹理化玻璃分层 | |
| TW201326075A (zh) | 耐污玻璃製品及製造和使用其之方法 | |
| CN116282942A (zh) | 防眩光玻璃及制备方法、应用、显示装置、电子设备 | |
| JP7414524B2 (ja) | 膜付きガラス基板、物品、および膜付きガラス基板の製造方法 | |
| CN113454040A (zh) | 带防污层的玻璃基体和带防污层的玻璃基体的制造方法 | |
| TW201841856A (zh) | 具有光滑抗指紋塗層之玻璃、玻璃陶瓷及陶瓷物件與其製造方法 | |
| CN115734950A (zh) | 具有孔隙度分级层的抗反射玻璃制品及制造其的方法 | |
| TWI515453B (zh) | 基板結構、其製造方法、觸控面板及顯示器裝置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| AD01 | Patent right deemed abandoned | ||
| AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20220909 |