CN107275347A - 一种阵列基板、其制备方法及显示面板 - Google Patents

一种阵列基板、其制备方法及显示面板 Download PDF

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CN107275347A
CN107275347A CN201710525619.8A CN201710525619A CN107275347A CN 107275347 A CN107275347 A CN 107275347A CN 201710525619 A CN201710525619 A CN 201710525619A CN 107275347 A CN107275347 A CN 107275347A
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underlay substrate
grid
light blocking
orthographic projection
blocking layer
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CN107275347B (zh
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韦东梅
何小祥
童振霄
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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Abstract

本发明公开了一种阵列基板、其制备方法及显示面板，该阵列基板包括：依次位于衬底基板上的栅极、有源层、源极和漏极；还包括：挡光层；所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠；有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内；栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。这样可以降低栅极与源漏电极之间的寄生电容，同时通过栅极与挡光层遮挡有源层，避免有源层因感光而产生光漏电的问题。

Description

一种阵列基板、其制备方法及显示面板
技术领域
本发明涉及显示技术领域，尤其涉及一种阵列基板、其制备方法及显示面板。
背景技术
与传统的阴极射线显示器(CRT，Cathode ray tube)相比，液晶显示器(LCD，Liquid Crystal Display)可以被制造得较小且质轻，目前被广泛应用于电视、手机以及公共信息的显示。目前，在液晶显示面板中，可以通过向两个电极施加电压，在液晶层上产生电场，并通过调节产生的电场的强度，以调节穿过液晶层的光的透过率，从而可以得到显示图像。
液晶显示面板的阵列基板的结构如图1所示，主要包括：位于衬底基板1上的栅极2、栅绝缘层3、有源层4、源电极5、漏电极6、像素电极7、钝化层8和公共电极9；其中，主要由栅极2、有源层4、源电极5和漏电极6组成用于控制各像素开关的薄膜晶体管(TFT，ThinFilm Transistor)。由于现有的TFT中栅极与源漏电极之间交叠的面积较多，从而会在栅极与源漏电极之间产生较大的寄生电容，而较大的寄生电容使得液晶显示面板驱动显示过程中负载大，因此会造成显示面板整体的功耗较大的问题。另外，如图1所示，在TFT关闭时，由于栅极对应的沟道区域感应出大量电荷；且如图2所示，栅极2与源电极5和漏电极6之间具有较多的交叠面积；因此如图3所示，感应出的电荷可以与两侧的源电极5和漏电极6的金属接触，从而形成电流通路，最终导致显示面板存在侧壁漏电的问题。
因此，如何降低显示面板的功耗，提高显示面板的显示效果，是本领域技术人员亟待解决的问题。
发明内容
本发明实施例提供了一种阵列基板、其制备方法及显示面板，用以解决现有技术中存在的显示面板的功耗较大的问题。
本发明实施例提供了一种阵列基板，包括：依次位于衬底基板上的栅极、有源层、源极和漏极；还包括：挡光层；
所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠；
所述有源层在所述衬底基板上的正投影位于所述挡光层与所述栅极在所述衬底基板上的正投影区域内；
所述栅极在所述衬底基板上的正投影面积小于所述有源层在所述衬底基板上的正投影面积。
在一种可能的实施方式中，本发明实施例提供的上述阵列基板中，所述栅极在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影不交叠或者部分交叠。
在一种可能的实施方式中，本发明实施例提供的上述阵列基板中，所述挡光层位于所述衬底基板与所述栅极之间。
在一种可能的实施方式中，本发明实施例提供的上述阵列基板中，所述源极的形状为U形。
在一种可能的实施方式中，本发明实施例提供的上述阵列基板中，所述挡光层的材料为金属材料。
在一种可能的实施方式中，本发明实施例提供的上述阵列基板中，还包括：像素电极、钝化层和公共电极；其中，
所述像素电极与所述有源层同层设置且与所述漏极电性相连；
所述钝化层位于所述源极和所述漏极之上；
所述公共电极位于所述钝化层之上。
本发明实施例提供了一种显示面板，包括本发明实施例提供的上述阵列基板。
本发明实施例提供了一种本发明实施例提供的上述阵列基板的制备方法，包括：
在所述衬底基板上形成所述挡光层的图形；
在形成有所述挡光层的图形的衬底基板上，形成包括所述栅极、所述有源层、所述源极和所述漏极的图形；
其中，
所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠；
所述有源层在所述衬底基板上的正投影位于所述挡光层与所述栅极在所述衬底基板上的正投影区域内；
所述栅极在所述衬底基板上的正投影面积小于所述有源层在所述衬底基板上的正投影面积。
在一种可能的实施方式中，本发明实施例提供的上述制备方法中，所述栅极在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影不交叠或者部分交叠。
在一种可能的实施方式中，本发明实施例提供的上述制备方法中，还包括：
在形成有所述挡光层的图形的衬底基板上，形成包括所述像素电极、所述钝化层和所述公共电极的图形。
本发明实施例的有益效果包括：
本发明实施例提供了一种阵列基板、其制备方法及显示面板，该阵列基板包括：依次位于衬底基板上的栅极、有源层、源极和漏极；还包括：挡光层；所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠，有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内；栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。这样本发明通过在衬底基板上设置挡光层，使挡光层与栅极均与有源层具有交叠区域，从而可以减小栅极与有源层的交叠区域，进而减小栅极与源漏电极的交叠区域，即通过增加挡光层来减少栅极的宽度，使栅极与源漏电极的交叠面积减小，降低栅极与源漏电极之间的寄生电容，从而降低显示面板的功耗；同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内，这样可以通过栅极和挡光层遮挡有源层，避免有源层因感光而产生光生载流子即光漏电的问题。
附图说明
图1为现有技术中阵列基板的结构示意图；
图2为现有技术中阵列基板的平面结构示意图；
图3为现有技术中沟道区域的感应电荷分布示意图；
图4为本发明实施例提供的阵列基板的结构示意图；
图5为本发明实施例提供的阵列基板的平面结构示意图；
图6为本发明实施例提供的道区域的感应电荷分布示意图；
图7为本发明实施例提供的阵列基板的制备方法流程图；
图8a-图8g分别为本发明实施例提供的阵列基板的制备过程示意图。
具体实施方式
下面结合附图，对本发明实施例提供的阵列基板、其制备方法及显示面板的具体实施方式进行详细的说明。
本发明实施例提供了一种阵列基板，如图4所示，可以包括：依次位于衬底基板01上的栅极02、有源层03、源极04和漏极05；还可以包括：挡光层06；有源层03在所述衬底基板上01的正投影与所述挡光层06在所述衬底基板01上的正投影以及所述栅极02在所述衬底基板01上的正投影均有交叠；有源层03在衬底基板01上的正投影位于挡光层06与栅极02在衬底基板上的正投影区域内；栅极02在衬底基板01上的正投影面积小于有源层03在衬底基板01上的正投影面积。
本发明实施例提供的上述阵列基板中，通过在衬底基板上设置挡光层06，使挡光层06与栅极02均与有源层03具有交叠区域，如图5所示(沿俯视图5中A-A切割线切割，可以得到截面图4)，从而可以减小栅极与有源层的交叠区域，进而减小栅极与源漏电极的交叠区域，即通过增加挡光层来减少栅极的宽度，使栅极与源漏电极的交叠面积减小，降低栅极与源漏电极之间的寄生电容，从而降低显示面板的功耗；同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内，这样可以通过栅极和挡光层在垂直于衬底基板的方向上完全遮挡有源层，避免有源层因感光而产生光生载流子即光漏电的问题。并且，如图6所示，栅极的宽度减小后，有源层中感应出的电荷只存在于栅极正对的区域，这样可以减少感应电荷与源极和漏极的直接接触，降低空穴漏电，从而改善了显示面板侧壁漏电的问题。
在具体实施时，本发明实施例提供的上述阵列基板中，可以设置栅极在衬底基板上的正投影与挡光层在衬底基板上的正投影部分交叠，或者不交叠。具体地，本发明实施例提供的上述阵列基板中，将栅极与挡光层设置为无交叠，进而可以使得栅极和源漏极交叠的区域与挡光层和源漏极交叠的区域无重合，这样可以将与源漏极交叠的区域由挡光层和栅极分担，从而减少栅极的宽度，进而减小栅极与源漏极的交叠，从而降低栅极与源漏电极之间的寄生电容，降低显示面板的功耗；同时挡光层和栅极不交叠，还可以避免挡光层和栅极之间形成寄生电容。
在具体实施时，本发明实施例提供的上述阵列基板中，挡光层可以位于衬底基板与栅极之间，且可以将源极的形状设置为U形。具体地，本发明实施例提供的上述阵列基板中，如图2所示，串联的两个U形源极5的大部分区域与栅极2交叠，这样栅极与源极之间就会因为交叠的区域过大，造成寄生电容过大，因此本发明通过设置挡光层，如图5所示，挡光层06可以在围绕栅极02对应的区域设置，从而可以实现对有源层03的遮挡，这样栅极02无需做的过大，造成与U形源极04的交叠，从而有效降低栅极与源电极之间的寄生电容，降低显示面板的功耗。
在具体实施时，本发明实施例提供的上述阵列基板中，挡光层的材料可以为不透光的金属材料。具体地，本发明实施例提供的上述阵列基板中，采用非透光的金属材料制作挡光层，既可以遮挡外界光线对有源层的影响，防止有源层产生光生载流子，又可以减小栅极与源漏电极的交叠面积，从而降低栅极与源漏电极之间的寄生电容，从而降低显示面板的功耗。
在具体实施时，挡光层可以浮空；也可以接如相应信号，如可以作为公共电极线输入公共电极信号，或者也可以接入触摸信号，根据实际需要，遮光层可以和其他功能层同时制作，如可以和公共电极线，或者触摸引线通过同一次构图工艺制作等，本申请不做限制。
在具体实施时，本发明实施例提供的上述阵列基板中，如图4所示，还可以包括：像素电极07、钝化层08和公共电极09；其中，像素电极07与有源层同层设置且与漏极05电性相连；钝化层08位于源极04和漏极05之上；公共电极09位于钝化层08之上。具体地，本发明实施例提供的上述阵列基板中，还包括像素电极、钝化层和公共电极等多个必要膜层结构，从而实现阵列基板的驱动显示功能。各膜层的功能与结构设计均匀现有技术相同，在此不作详述。
基于同一发明构思，本发明实施例提供了一种显示面板，包括本发明实施例提供的上述阵列基板。该显示面板可以应用于手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。由于该显示面板解决问题的原理与阵列基板相似，因此该显示面板的实施可以参见上述阵列基板的实施，重复之处不再赘述。
基于同一发明构思，本发明实施例提供了一种本发明实施例提供的上述阵列基板的制备方法，如图7所示，可以具体包括：
S101、在衬底基板上形成挡光层的图形；
S102、在形成有挡光层的图形的衬底基板上，形成包括栅极、有源层、源极和漏极的图形；
其中，所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠；有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内；
栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。
本发明实施例提供的上述制备方法中，还可以包括制作像素电极、钝化层和公共电极等多个必要膜层的过程，具体地，各膜层的制作过程具体如下，
第一步骤：在衬底基板01上通过构图工艺形成挡光层06的图形，形成挡光层的衬底基板如图8a所示；
第二步骤：在形成有挡光层06的衬底基板01上通过构图工艺形成栅极02的图形，其中还包括形成绝缘层10的图形；形成栅极的衬底基板如图8b所示；
第三步骤：在形成有栅极02的衬底基板01上通过构图工艺形成有源层03的图形，其中还包括形成栅绝缘层11的图形；形成有源层的衬底基板如图8c所示；
第四步骤：在形成有源层03的衬底基板01上通过构图工艺形成像素电极07的图形；形成像素电极的衬底基板如图8d所示；
第五步骤：在形成有像素电极07的衬底基板01上通过构图工艺形成源极04和漏极05的图形；形成源极和漏极的衬底基板如图8e所示；
第六步骤：在形成有源极04和漏极05的衬底基板01上通过构图工艺形成钝化层08的图形；形成钝化层的衬底基板如图8f所示；
第七步骤：在形成有钝化层08的衬底基板01上通过构图工艺形成公共电极09的图形；形成公共电极的衬底基板如图8g所示。
本发明实施例提供的上述制备方法中，通过在衬底基板上制作挡光层，使挡光层与栅极均与有源层具有交叠区域，从而可以减小栅极与有源层的交叠区域，进而减小栅极与源漏电极的交叠区域，即通过增加挡光层来减少栅极的宽度，使栅极与源漏电极的交叠面积减小，降低栅极与源漏电极之间的寄生电容，从而降低显示面板的功耗；同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内，这样在垂直于衬底基板的方向上栅极和挡光层完全遮挡有源层，避免有源层因感光而产生光生载流子即光漏电的问题。
在具体实施时，本发明实施例提供的上述制备方法中，形成的栅极在衬底基板上的正投影与挡光层在衬底基板上的正投影不交叠或者部分交叠，。具体地，将栅极与挡光层设置为无交叠，进而可以使得栅极和源漏极交叠的区域与挡光层和源漏极交叠的区域无重合，这样可以将与源漏极交叠的区域由挡光层和栅极分担，从而减少栅极的宽度，进而减小栅极与源漏极的交叠，从而降低栅极与源漏电极之间的寄生电容，降低显示面板的功耗；同时挡光层和栅极不交叠，还可以避免挡光层和栅极之间形成寄生电容。
本发明实施例提供了一种阵列基板、其制备方法及显示面板，该阵列基板包括：依次位于衬底基板上的栅极、有源层、源极和漏极；还包括：挡光层；所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠；有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内；栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。这样本发明通过在衬底基板上设置挡光层，使挡光层与栅极均与有源层具有交叠区域，从而可以减小栅极与有源层的交叠区域，进而减小栅极与源漏电极的交叠区域，即通过增加挡光层来减少栅极的宽度，使栅极与源漏电极的交叠面积减小，降低栅极与源漏电极之间的寄生电容，从而降低显示面板的功耗；同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内，这样可以通过栅极和挡光层遮挡有源层，避免有源层因感光而产生光生载流子即光漏电的问题。
显然，本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。

Claims (10)

1.一种阵列基板，包括：依次位于衬底基板上的栅极、有源层、源极和漏极；其特征在于，还包括：挡光层；
所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠；
所述有源层在所述衬底基板上的正投影位于所述挡光层与所述栅极在所述衬底基板上的正投影区域内；
所述栅极在所述衬底基板上的正投影面积小于所述有源层在所述衬底基板上的正投影面积。
2.如权利要求1所述的阵列基板，其特征在于，所述栅极在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影不交叠或者部分交叠。
3.如权利要求1所述的阵列基板，其特征在于，所述挡光层位于所述衬底基板与所述栅极之间。
4.如权利要求1所述的阵列基板，其特征在于，所述源极的形状为U形。
5.如权利要求1-4任一项所述的阵列基板，其特征在于，所述挡光层的材料为金属材料。
6.如权利要求5所述的阵列基板，其特征在于，还包括：像素电极、钝化层和公共电极；其中，
所述像素电极与所述有源层同层设置且与所述漏极电性相连；
所述钝化层位于所述源极和所述漏极之上；
所述公共电极位于所述钝化层之上。
7.一种显示面板，其特征在于，包括如权利要求1-6任一项所述的阵列基板。
8.一种如权利要求1-6任一项所述的阵列基板的制备方法，其特征在于，包括：
在所述衬底基板上形成所述挡光层的图形；
在形成有所述挡光层的图形的衬底基板上，形成包括所述栅极、所述有源层、所述源极和所述漏极的图形；
其中，所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠；
所述有源层在所述衬底基板上的正投影位于所述挡光层与所述栅极在所述衬底基板上的正投影区域内；
所述栅极在所述衬底基板上的正投影面积小于所述有源层在所述衬底基板上的正投影面积。
9.如权利要求8所述的制备方法，其特征在于，所述栅极在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影不交叠或者部分交叠。
10.如权利要求8或9所述的制备方法，其特征在于，还包括：
在形成有所述挡光层的图形的衬底基板上，形成包括所述像素电极、所述钝化层和所述公共电极的图形。
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CN109037242B (zh) * 2018-08-01 2021-04-06 京东方科技集团股份有限公司 阵列基板及其制造方法、显示面板
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