CN107109631A - 圆筒形靶材的制造方法、圆筒形溅镀靶及烧制用辅助具 - Google Patents

圆筒形靶材的制造方法、圆筒形溅镀靶及烧制用辅助具 Download PDF

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Publication number
CN107109631A
CN107109631A CN201580073047.3A CN201580073047A CN107109631A CN 107109631 A CN107109631 A CN 107109631A CN 201580073047 A CN201580073047 A CN 201580073047A CN 107109631 A CN107109631 A CN 107109631A
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CN
China
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cylindrical shape
formed body
target
bracket
firing
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Pending
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CN201580073047.3A
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English (en)
Chinese (zh)
Inventor
石田新太郎
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Mitsui Mining and Smelting Co Ltd
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Mitsui Mining and Smelting Co Ltd
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Publication of CN107109631A publication Critical patent/CN107109631A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
CN201580073047.3A 2015-02-25 2015-12-09 圆筒形靶材的制造方法、圆筒形溅镀靶及烧制用辅助具 Pending CN107109631A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015-035839 2015-02-25
JP2015035839 2015-02-25
PCT/JP2015/084567 WO2016136088A1 (ja) 2015-02-25 2015-12-09 円筒形ターゲット材の製造方法、円筒形スパッタリングターゲットおよび焼成用治具

Publications (1)

Publication Number Publication Date
CN107109631A true CN107109631A (zh) 2017-08-29

Family

ID=56789359

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580073047.3A Pending CN107109631A (zh) 2015-02-25 2015-12-09 圆筒形靶材的制造方法、圆筒形溅镀靶及烧制用辅助具

Country Status (4)

Country Link
JP (1) JP6678157B2 (ja)
CN (1) CN107109631A (ja)
TW (1) TWI723974B (ja)
WO (1) WO2016136088A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021106258A1 (ja) * 2019-11-29 2021-06-03 三井金属鉱業株式会社 円筒形スパッタリングターゲットの製造方法及び該製造方法に用いる焼成治具
CN113277835B (zh) * 2020-02-20 2022-10-11 广州市尤特新材料有限公司 定位工装和平面靶材的烧结方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10114567A (ja) * 1996-10-04 1998-05-06 Ngk Insulators Ltd 焼成用支持台
JP2001348264A (ja) * 2000-06-06 2001-12-18 Takahama Industry Co Ltd 焼成用治具の支持板の反転方法およびその装置
JP2004250241A (ja) * 2003-02-18 2004-09-09 Nec Tokin Corp 焼成用セッター及び焼成方法
JP2005281862A (ja) * 2004-03-05 2005-10-13 Tosoh Corp 円筒形スパッタリングターゲット並びにセラミックス焼結体及びその製造方法
CN102165092A (zh) * 2008-09-25 2011-08-24 东曹株式会社 圆筒形溅镀靶及其制造方法
JP2013147368A (ja) * 2012-01-18 2013-08-01 Mitsui Mining & Smelting Co Ltd セラミックス円筒形スパッタリングターゲット材およびその製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS575519Y2 (ja) * 1976-12-25 1982-02-02
JPS59107953A (ja) * 1982-12-08 1984-06-22 東洋ゴム工業株式会社 多孔性セラミツクス円筒体の焼成法
JPH03103363A (ja) * 1989-09-14 1991-04-30 Showa Denko Kk セラミックス成形体の焼結方法および焼結用治具
JP2828750B2 (ja) * 1990-08-21 1998-11-25 日本碍子株式会社 金属溶湯用濾材の焼成方法及びそれに用いる焼成用治具
JP2000086358A (ja) * 1998-06-04 2000-03-28 Ngk Spark Plug Co Ltd 有底円筒状セラミックス焼結体の製造方法
KR20060043427A (ko) * 2004-03-05 2006-05-15 토소가부시키가이샤 원통형 스퍼터링 타겟, 세라믹 소결체와 그 제조방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10114567A (ja) * 1996-10-04 1998-05-06 Ngk Insulators Ltd 焼成用支持台
JP2001348264A (ja) * 2000-06-06 2001-12-18 Takahama Industry Co Ltd 焼成用治具の支持板の反転方法およびその装置
JP2004250241A (ja) * 2003-02-18 2004-09-09 Nec Tokin Corp 焼成用セッター及び焼成方法
JP2005281862A (ja) * 2004-03-05 2005-10-13 Tosoh Corp 円筒形スパッタリングターゲット並びにセラミックス焼結体及びその製造方法
CN102165092A (zh) * 2008-09-25 2011-08-24 东曹株式会社 圆筒形溅镀靶及其制造方法
JP2013147368A (ja) * 2012-01-18 2013-08-01 Mitsui Mining & Smelting Co Ltd セラミックス円筒形スパッタリングターゲット材およびその製造方法

Also Published As

Publication number Publication date
JPWO2016136088A1 (ja) 2017-12-07
WO2016136088A1 (ja) 2016-09-01
TW201702411A (zh) 2017-01-16
JP6678157B2 (ja) 2020-04-08
TWI723974B (zh) 2021-04-11

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