CN106660914B - 烷撑二醇单烷基醚的分离回收方法、抗蚀剂组合物处理废液的再利用方法和抗蚀剂组合物处理液的循环使用方法 - Google Patents

烷撑二醇单烷基醚的分离回收方法、抗蚀剂组合物处理废液的再利用方法和抗蚀剂组合物处理液的循环使用方法 Download PDF

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Publication number
CN106660914B
CN106660914B CN201580033942.2A CN201580033942A CN106660914B CN 106660914 B CN106660914 B CN 106660914B CN 201580033942 A CN201580033942 A CN 201580033942A CN 106660914 B CN106660914 B CN 106660914B
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China
Prior art keywords
solvent
agent composition
corrosion agent
waste liquid
recycling
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Chinese (zh)
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CN106660914A (zh
Inventor
三河泰广
绪方不二麿
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Lishennoco Co ltd
Resonac Holdings Corp
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Showa Denko KK
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
    • C07C41/01—Preparation of ethers
    • C07C41/34—Separation; Purification; Stabilisation; Use of additives
    • C07C41/40—Separation; Purification; Stabilisation; Use of additives by change of physical state, e.g. by crystallisation
    • C07C41/42—Separation; Purification; Stabilisation; Use of additives by change of physical state, e.g. by crystallisation by distillation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
    • C07C41/01—Preparation of ethers
    • C07C41/34—Separation; Purification; Stabilisation; Use of additives
    • C07C41/44—Separation; Purification; Stabilisation; Use of additives by treatments giving rise to a chemical modification
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04—Saturated ethers
    • C07C43/13—Saturated ethers containing hydroxy or O-metal groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
CN201580033942.2A 2014-07-30 2015-07-08 烷撑二醇单烷基醚的分离回收方法、抗蚀剂组合物处理废液的再利用方法和抗蚀剂组合物处理液的循环使用方法 Active CN106660914B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014-155104 2014-07-30
JP2014155104 2014-07-30
PCT/JP2015/069667 WO2016017387A1 (ja) 2014-07-30 2015-07-08 アルキレングリコールモノアルキルエーテルの分離回収方法、レジスト組成物処理廃液の再利用方法及びレジスト組成物処理液のリサイクル方法

Publications (2)

Publication Number Publication Date
CN106660914A CN106660914A (zh) 2017-05-10
CN106660914B true CN106660914B (zh) 2019-06-04

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Country Status (4)

Country Link
JP (1) JP6602301B2 (ja)
CN (1) CN106660914B (ja)
TW (1) TWI588123B (ja)
WO (1) WO2016017387A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109180425B (zh) * 2018-10-29 2024-03-19 江阴市大洋固废处置利用有限公司 含环戊酮和丙二醇甲醚醋酸酯回收液的精制工艺及系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5589236A (en) * 1978-12-28 1980-07-05 Yotsukaichi Gosei Kk Purification of crude glycol ether
JP2005247816A (ja) * 2004-03-08 2005-09-15 Sanwa Yuka Kogyo Kk アルキレングリコールモノアルキルエーテルの分離回収方法
KR20100000495A (ko) * 2008-06-25 2010-01-06 덕산약품공업주식회사 포토레지스트 제거용 폐액으로부터 유기용제의 회수 방법

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JPS5195008A (ja) * 1975-02-14 1976-08-20 Echirengurikooruarukirueeteruno seiseihoho
JPH01180844A (ja) * 1988-01-12 1989-07-18 Daicel Chem Ind Ltd ジグリセリンの精製方法
JP2553146B2 (ja) * 1988-04-27 1996-11-13 協和油化株式会社 グリコールエーテルの精製法
DE4309741A1 (de) * 1993-03-25 1994-09-29 Henkel Kgaa Verfahren zum Herstellen von Diglycerin
JPH08231991A (ja) * 1994-12-27 1996-09-10 Hitachi Ltd 洗浄用組成物、洗浄方法および洗浄液の製造方法
JP2001064221A (ja) * 1999-08-30 2001-03-13 Lion Corp 匂いの改良された（ポリ）エチレングリコールモノアルキルエーテル系溶剤及びその製造方法
JP4089141B2 (ja) * 2000-08-07 2008-05-28 三菱化学株式会社 段塔式反応装置及びそれを用いたポリアルキレンエーテルグリコールの製造方法
CN101223483B (zh) * 2005-07-19 2011-07-27 昭和电工株式会社 用于光敏性组合物的清除溶液
JP4475664B2 (ja) * 2005-12-27 2010-06-09 東京応化工業株式会社 ホトリソグラフィ用洗浄液およびその循環使用方法
US9187392B2 (en) * 2008-01-17 2015-11-17 Lyondell Chemical Technology, L.P. Production of propylene glycol monoalkyl ether
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates
JP5433279B2 (ja) * 2009-03-31 2014-03-05 東京応化工業株式会社 再生レジストの製造方法
KR101102574B1 (ko) * 2009-09-30 2012-01-03 조양래 1,4-이치환시클로헥산 유도체의 제조방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5589236A (en) * 1978-12-28 1980-07-05 Yotsukaichi Gosei Kk Purification of crude glycol ether
JP2005247816A (ja) * 2004-03-08 2005-09-15 Sanwa Yuka Kogyo Kk アルキレングリコールモノアルキルエーテルの分離回収方法
KR20100000495A (ko) * 2008-06-25 2010-01-06 덕산약품공업주식회사 포토레지스트 제거용 폐액으로부터 유기용제의 회수 방법

Also Published As

Publication number Publication date
JPWO2016017387A1 (ja) 2017-05-18
JP6602301B2 (ja) 2019-11-06
TW201619105A (zh) 2016-06-01
CN106660914A (zh) 2017-05-10
WO2016017387A1 (ja) 2016-02-04
TWI588123B (zh) 2017-06-21

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Address after: Tokyo, Japan

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Patentee before: Showa electrical materials Co.,Ltd.

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Effective date of registration: 20230508

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Patentee after: Showa electrical materials Co.,Ltd.

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Patentee before: SHOWA DENKO Kabushiki Kaisha