TWI588123B - Method for separating and recovering alkanediol monoalkyl ether, method for reusing photoresist composition waste liquid, and method for recovering photoresist composition treating liquid - Google Patents

Method for separating and recovering alkanediol monoalkyl ether, method for reusing photoresist composition waste liquid, and method for recovering photoresist composition treating liquid Download PDF

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Publication number
TWI588123B
TWI588123B TW104123876A TW104123876A TWI588123B TW I588123 B TWI588123 B TW I588123B TW 104123876 A TW104123876 A TW 104123876A TW 104123876 A TW104123876 A TW 104123876A TW I588123 B TWI588123 B TW I588123B
Authority
TW
Taiwan
Prior art keywords
solvent
photoresist composition
waste liquid
recovering
hydroxide
Prior art date
Application number
TW104123876A
Other languages
English (en)
Chinese (zh)
Other versions
TW201619105A (zh
Inventor
Yasuhiro Mikawa
Fujimaro Ogata
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Publication of TW201619105A publication Critical patent/TW201619105A/zh
Application granted granted Critical
Publication of TWI588123B publication Critical patent/TWI588123B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
    • C07C41/01—Preparation of ethers
    • C07C41/34—Separation; Purification; Stabilisation; Use of additives
    • C07C41/40—Separation; Purification; Stabilisation; Use of additives by change of physical state, e.g. by crystallisation
    • C07C41/42—Separation; Purification; Stabilisation; Use of additives by change of physical state, e.g. by crystallisation by distillation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
    • C07C41/01—Preparation of ethers
    • C07C41/34—Separation; Purification; Stabilisation; Use of additives
    • C07C41/44—Separation; Purification; Stabilisation; Use of additives by treatments giving rise to a chemical modification
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04—Saturated ethers
    • C07C43/13—Saturated ethers containing hydroxy or O-metal groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
TW104123876A 2014-07-30 2015-07-23 Method for separating and recovering alkanediol monoalkyl ether, method for reusing photoresist composition waste liquid, and method for recovering photoresist composition treating liquid TWI588123B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014155104 2014-07-30

Publications (2)

Publication Number Publication Date
TW201619105A TW201619105A (zh) 2016-06-01
TWI588123B true TWI588123B (zh) 2017-06-21

Family

ID=55217292

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104123876A TWI588123B (zh) 2014-07-30 2015-07-23 Method for separating and recovering alkanediol monoalkyl ether, method for reusing photoresist composition waste liquid, and method for recovering photoresist composition treating liquid

Country Status (4)

Country Link
JP (1) JP6602301B2 (ja)
CN (1) CN106660914B (ja)
TW (1) TWI588123B (ja)
WO (1) WO2016017387A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109180425B (zh) * 2018-10-29 2024-03-19 江阴市大洋固废处置利用有限公司 含环戊酮和丙二醇甲醚醋酸酯回收液的精制工艺及系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005247816A (ja) * 2004-03-08 2005-09-15 Sanwa Yuka Kogyo Kk アルキレングリコールモノアルキルエーテルの分離回収方法
TW200720861A (en) * 2005-07-19 2007-06-01 Showa Denko Kk Removing solution for photosensitive composition
TW201034765A (en) * 2009-03-31 2010-10-01 Tokyo Ohka Kogyo Co Ltd Regenerated photoresist and manufacturing method of regenerated photoresist

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5195008A (ja) * 1975-02-14 1976-08-20 Echirengurikooruarukirueeteruno seiseihoho
JPS5589236A (en) * 1978-12-28 1980-07-05 Yotsukaichi Gosei Kk Purification of crude glycol ether
JPH01180844A (ja) * 1988-01-12 1989-07-18 Daicel Chem Ind Ltd ジグリセリンの精製方法
JP2553146B2 (ja) * 1988-04-27 1996-11-13 協和油化株式会社 グリコールエーテルの精製法
DE4309741A1 (de) * 1993-03-25 1994-09-29 Henkel Kgaa Verfahren zum Herstellen von Diglycerin
JPH08231991A (ja) * 1994-12-27 1996-09-10 Hitachi Ltd 洗浄用組成物、洗浄方法および洗浄液の製造方法
JP2001064221A (ja) * 1999-08-30 2001-03-13 Lion Corp 匂いの改良された（ポリ）エチレングリコールモノアルキルエーテル系溶剤及びその製造方法
JP4089141B2 (ja) * 2000-08-07 2008-05-28 三菱化学株式会社 段塔式反応装置及びそれを用いたポリアルキレンエーテルグリコールの製造方法
JP4475664B2 (ja) * 2005-12-27 2010-06-09 東京応化工業株式会社 ホトリソグラフィ用洗浄液およびその循環使用方法
US9187392B2 (en) * 2008-01-17 2015-11-17 Lyondell Chemical Technology, L.P. Production of propylene glycol monoalkyl ether
KR100997743B1 (ko) * 2008-06-25 2010-12-01 덕산약품공업주식회사 포토레지스트 제거용 폐액으로부터 유기용제의 회수 방법
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates
KR101102574B1 (ko) * 2009-09-30 2012-01-03 조양래 1,4-이치환시클로헥산 유도체의 제조방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005247816A (ja) * 2004-03-08 2005-09-15 Sanwa Yuka Kogyo Kk アルキレングリコールモノアルキルエーテルの分離回収方法
TW200720861A (en) * 2005-07-19 2007-06-01 Showa Denko Kk Removing solution for photosensitive composition
TW201034765A (en) * 2009-03-31 2010-10-01 Tokyo Ohka Kogyo Co Ltd Regenerated photoresist and manufacturing method of regenerated photoresist

Also Published As

Publication number Publication date
JPWO2016017387A1 (ja) 2017-05-18
CN106660914B (zh) 2019-06-04
JP6602301B2 (ja) 2019-11-06
TW201619105A (zh) 2016-06-01
CN106660914A (zh) 2017-05-10
WO2016017387A1 (ja) 2016-02-04

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