CN106587623A - 颜料/熔料混合物 - Google Patents
颜料/熔料混合物 Download PDFInfo
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- CN106587623A CN106587623A CN201610906017.2A CN201610906017A CN106587623A CN 106587623 A CN106587623 A CN 106587623A CN 201610906017 A CN201610906017 A CN 201610906017A CN 106587623 A CN106587623 A CN 106587623A
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- 239000000049 pigment Substances 0.000 title claims abstract description 147
- 239000000203 mixture Substances 0.000 title claims abstract description 63
- 239000000463 material Substances 0.000 claims abstract description 27
- 239000000919 ceramic Substances 0.000 claims abstract description 26
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 438
- 239000000758 substrate Substances 0.000 claims description 179
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 146
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 138
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 127
- 229910052681 coesite Inorganic materials 0.000 claims description 74
- 229910052906 cristobalite Inorganic materials 0.000 claims description 74
- 239000000377 silicon dioxide Substances 0.000 claims description 74
- 229910052682 stishovite Inorganic materials 0.000 claims description 74
- 229910052905 tridymite Inorganic materials 0.000 claims description 74
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 31
- 229910052593 corundum Inorganic materials 0.000 claims description 31
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 30
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 30
- 239000008187 granular material Substances 0.000 claims description 23
- 229910044991 metal oxide Inorganic materials 0.000 claims description 23
- 150000004706 metal oxides Chemical class 0.000 claims description 23
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims description 20
- 239000000155 melt Substances 0.000 claims description 20
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 17
- 238000005245 sintering Methods 0.000 claims description 16
- QDOXWKRWXJOMAK-UHFFFAOYSA-N chromium(III) oxide Inorganic materials O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims description 12
- 238000002360 preparation method Methods 0.000 claims description 6
- 230000009467 reduction Effects 0.000 claims description 6
- 229910005451 FeTiO3 Inorganic materials 0.000 claims description 5
- 229910003087 TiOx Inorganic materials 0.000 claims description 5
- 229910000421 cerium(III) oxide Inorganic materials 0.000 claims description 5
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims description 5
- 229910052863 mullite Inorganic materials 0.000 claims description 5
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 5
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 4
- 239000011449 brick Substances 0.000 claims description 4
- 239000010445 mica Substances 0.000 claims description 3
- 229910052618 mica group Inorganic materials 0.000 claims description 3
- 229910052845 zircon Inorganic materials 0.000 claims description 3
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 claims description 2
- 229910052915 alkaline earth metal silicate Inorganic materials 0.000 claims description 2
- 210000003298 dental enamel Anatomy 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 229910003079 TiO5 Inorganic materials 0.000 claims 11
- 229910002588 FeOOH Inorganic materials 0.000 claims 1
- 229910052976 metal sulfide Inorganic materials 0.000 claims 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 48
- 230000000694 effects Effects 0.000 description 22
- 239000002585 base Substances 0.000 description 19
- 238000000576 coating method Methods 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 18
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 7
- 239000003086 colorant Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 150000004767 nitrides Chemical class 0.000 description 7
- 238000004040 coloring Methods 0.000 description 6
- 230000004907 flux Effects 0.000 description 6
- 229910052573 porcelain Inorganic materials 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 5
- 229910001512 metal fluoride Inorganic materials 0.000 description 5
- 229910052914 metal silicate Inorganic materials 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910000906 Bronze Inorganic materials 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 239000010974 bronze Substances 0.000 description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000005457 optimization Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 239000011451 fired brick Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- YDZQQRWRVYGNER-UHFFFAOYSA-N iron;titanium;trihydrate Chemical compound O.O.O.[Ti].[Fe] YDZQQRWRVYGNER-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 241001132374 Asta Species 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910020442 SiO2—TiO2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910009973 Ti2O3 Inorganic materials 0.000 description 1
- 229910009815 Ti3O5 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- SMYKVLBUSSNXMV-UHFFFAOYSA-K aluminum;trihydroxide;hydrate Chemical compound O.[OH-].[OH-].[OH-].[Al+3] SMYKVLBUSSNXMV-UHFFFAOYSA-K 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(II,III) oxide Inorganic materials [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical group O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000006253 efflorescence Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052909 inorganic silicate Inorganic materials 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000289 melt material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- TWWDDFFHABKNMQ-UHFFFAOYSA-N oxosilicon;hydrate Chemical compound O.[Si]=O TWWDDFFHABKNMQ-UHFFFAOYSA-N 0.000 description 1
- -1 oxygen Nitride Chemical class 0.000 description 1
- IYVLHQRADFNKAU-UHFFFAOYSA-N oxygen(2-);titanium(4+);hydrate Chemical compound O.[O-2].[O-2].[Ti+4] IYVLHQRADFNKAU-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000019612 pigmentation Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 206010037844 rash Diseases 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000005315 stained glass Substances 0.000 description 1
- 230000000475 sunscreen effect Effects 0.000 description 1
- 239000000516 sunscreening agent Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/03—Powdery paints
- C09D5/031—Powdery paints characterised by particle size or shape
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/0072—Heat treatment
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
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Abstract
本发明涉及用于陶瓷釉的熔料或熔料混合物连同珠光颜料,其在高于1000℃是稳定的。
Description
技术领域
本发明涉及用于陶瓷釉的熔料(frit)或熔料混合物连同珠光颜料,其在高于1000℃是稳定的。
背景技术
通常,陶瓷釉中的装饰应用使用颜料(例如效果颜料)和陶瓷熔料/熔料混合物的混合物。特别是当在高于1000℃的温度范围用于陶瓷釉时,例如
在1100–1200℃下用于一次烧成的墙砖,
在1100–1250℃下用于一次烧成的地砖,
在1100–1300℃下用于瓷器,和在1050–1080℃下两次烧成(如也采用的),特别是在装饰瓷砖或瓷器的情况下,会发生问题,即颜料特别是来自珠光颜料类别的代表,通常在由烧结过程中不会幸免于由氧化熔体(熔料组分)和高温组成的侵蚀性条件下而没有损害。
因此,过去已经作出努力通过用绝缘性保护层(用于这种类型的热和化学极高要求的应用)覆盖而稳定所述效果颜料,特别是珠光颜料。
现有技术已知,当在>1000℃的区域中使用的陶瓷釉中使用珠光颜料时,必然预期着色力和珠光效果的显著损失。为了防止这种情况,这些颜料要么必须包封在另外的保护层中,或者在该高温应用区使用珠光颜料限于特别是在改性的釉底料或焊剂中的氧化铁涂覆的珠光颜料。
EP 220 509 A1描述了例如通过SnO2和/或CeO2层稳定珠光颜料。
EP 307 771 A1公开了用经Au-掺杂的SnO2层包封珠光颜料,用于稳定和新颖的装饰效果的组合。为了实现所需的稳定,在这两种情况下必须施加大量的所提及的氧化物/氧化物组合。因此,已经证明基于整个颜料,以约5–30重量%的量施加保护涂层是有利的。
DE 39 32 424 C1公开了有和没有另外的吸收颜料的珠光颜料/熔料组合。然而,着色玻璃熔料的使用范围最多只有700-900℃。
GB 2 096 592 A描述了在包含熔料的陶瓷焊剂中使用珠光颜料。这里既没有讨论目标烧结温度,也没有讨论当在>1000℃的温度下使用珠光颜料时的特定问题。
美国专利5,783,506描述了在陶瓷焊剂中使用经TiO2-或Fe2O3-涂覆的云母颜料,其能够“漂浮(leafing)”,即具有限定粘度的由熔料、分散剂、粘结剂、云母和基于云母的珠光颜料组成的制剂。此美国专利的发明在于,由于加入云母,该珠光颜料迁移到釉的表面(漂浮(“leafing”))。
US 4,353,991公开了在“烧结玻璃搪瓷”中以0.5-25.0重量%的浓度范围使用粒度为1-200μm的珠光颜料,基于所述熔料/颜料混合物的重量。然而,这些混合物只可以在高达最大538-760℃的温度下使用。
EP 0 419 843 A1描述了在玻璃熔料中以5-20重量%的使用浓度使用珠光颜料。对于快速烧结使用温度给定为800-900℃,或者对于标准烧结为700-800℃。
CN 101462895A公开了在1000-1200℃下在釉中使用10-60重量%的金色珠光颜料。这里采用的熔料包含以下:
SiO2:55~80%
Al2O3:5~20%
CaO:0.5–3%
MgO:0–2%
Na2O:1~5%
K2O:<5%
B2O3:3~15%。
这里不利的是,所述使用专门限于基于云母的特定的金色珠光颜料,而没有公开金色珠光颜料的层结构。因此在CN 101462895A中可以使用的颜料的颜色数量和选择受到非常大的限制。
DE 198 59 420 A1公开了具有珠光效果的改性的釉底料。为了通过细度或颜色改进表面(对表面上底漆(prime)),陶器和陶瓷器的涂覆通常是使用釉底料进行。改性的釉底料实现釉底料对烧结或未烧结的瓷砖、陶器和陶瓷器更好的附着力。釉底料包含用于600-1200℃烧结范围的熔料和一种或多种珠光颜料。
现有技术已知的解决方案例如颜料的包封,生产复杂,因为在生产中必须进行另外的施加保护层的处理步骤。此外,可能发生不利的影响,例如釉的浑浊和颜料颜色变化或者在应用介质中较差的色彩效果控制,这取决于保护层的组成。第二解决方案——使用具有氧化铁层的珠光颜料——在颜色方面非常受限于可以通过经氧化铁涂覆的珠光颜料实现的色彩效果。
发明内容
因此,目的是找到熔料和珠光颜料易于控制的组合,特别地,其从应用的观点来看是可靠的,并且在高于1000℃的温度下是稳定的,并同时导致釉中珠光颜料的最佳的平面平行排列(alignment),从而当在高温范围即在>1000℃的温度下用于陶瓷釉时显著改进珠光颜料的色彩效果。此外,可根据本发明使用的颜色的范围应显著扩大到包括TiO2干涉银白色、TiO2干涉色(金色、铜色、红色、紫色、蓝色、青绿色和绿色),和在金色、青铜色、铜色和红色区域中氧化铁干涉颜色。
令人惊讶地,现已发现,在熔料/珠光颜料与富Al2O3-熔料(所谓的“硬”熔料)组合中,基于薄片状基材的珠光颜料在>1000℃的温度的使用范围中特别稳定,并且由此实现特别有吸引力的和容易控制的色彩效果。
因此,本发明涉及一种珠光颜料/熔料混合物,其中基于该混合物,珠光颜料在该混合物中的比例为5-95重量%,且熔料包含至少5%的Al2O3。
使用“硬”熔料导致珠光颜料在所述釉中显著改善的平面平行排列,并由此导致釉的优化的光学效果,特别是在颜色和光泽方面。珠光颜料优化的平面平行排列还由根据本发明的珠光颜料和硬熔料的组合支持,并促使了>30重量%的高颜料使用浓度,优选>50重量%,特别是60-95重量%。此外,本发明的颜料/熔料混合物,其对在应用中的目标温度范围进行了优化,促使了陶瓷釉中珠光颜料的用户可靠的可用性,这归因于颜色恒常性,其伴随着的色彩效果的容易调节。
根据本发明的珠光颜料/熔料混合物还使颜色的范围扩大到包括具有吸引人的银白色与彩色干涉色调的TiO2干涉颜料,和具有主色调、金色、青铜色、铜色和红色色调(shade)的Fe2O3干涉颜料。最后,针对应用中的目标温度范围进行优化的本发明的组合促使了这些颜料的用户可靠可用性。
如果在珠光颜料/熔料混合物中基于颜料/熔料混合物颜料的重量比例为5-95重量%,特别优选为20-85重量%,和特别是30-80重量%,则在基于所述熔料计Al2O3含量≥5重量%的所谓的“硬”熔料中,珠光颜料显示出单独的珠光颜料颗粒的明显高度平面平行排列。
在预先规定的层厚度和相当的粒度的情况下,熔料的高着色(pigmentation)有利于大致平面平行排列,这导致显著更好的珠光效果。在较低的颜料浓度的情况下,呈现出排列的随机分布,如图1和2中所示。在这两个图(其显示在烧结操作之前通过着色的熔料层的侧剖视图)中,所述熔料的颗粒表示为圆形或椭圆形颗粒且所述珠光颜料表示为棒。
如果珠光颜料的厚度与熔料颗粒的尺寸的比率平均至少大约为0.01–2,特别是0.5-1.5和非常特别为1,则珠光颜料的高度平面平行排列(其对于色彩效果的优化是有利的)还可以另外地受到青睐。这里熔料颗粒通常是薄片状(由纵横比=颗粒直径与颗粒厚度的比率≥4:1来限定)、球形、椭圆形或不规则形状的。对于排列而言的关键因素是在至少一个维度的尺寸。
例如,如果珠光颜料的厚度为700nm,则它应优选与具有以下尺寸的熔料颗粒混合:厚度为700nm的薄片状熔料,直径为700nm的球形熔料,或平均粒度为700nm的椭圆形或不规则形状的熔料颗粒。
参照一些示例性实例,熔料和珠光颜料的优选尺寸如下所示:
1)颜料厚度:800nm,熔料颗粒在至少一个维度的尺寸为800nm,比率:1
2)颜料厚度:800nm,熔料颗粒在至少一个维度的尺寸为1600nm,比率:0.5
3)颜料厚度:800nm,熔料颗粒在至少一个维度的尺寸为400nm,比率:2
4)颜料厚度:1600nm,熔料颗粒在至少一个维度的尺寸为1600nm,比率:1
5)颜料厚度:1600nm,熔料颗粒在至少一个维度的尺寸为3200nm,比率:0.5
6)颜料厚度:1600nm,熔料颗粒在至少一个维度的尺寸为800nm,比率:2。
在值大于2时,颜料颗粒的排列没有显著改善通常是显然的。釉中珠光颜料的平面平行排列(其对于所希望的强烈珠光效果是有利的)受到不利影响越小,熔料颗粒平均相对于颜料颗粒越小,如在图3-5中图解式地描绘。此外,薄片状熔料颗粒通常对同样薄片状珠光颜料的平面平行排列具有非常积极的影响。在这些图中,椭圆形或圆形颗粒代表熔料颗粒,而棒是基于薄片状基材的珠光颜料。
如在图3中所描绘的,使用粗熔料导致不排列,而使用更细的熔料,即熔料颗粒在至少一个维度上的尺寸比珠光颜料更小或者与其大致相同,其在图4和5中图解式地描绘,通常导致珠光颜料非常良好的排列。在更细的熔料的情况下,熔料颗粒优选具有大约(inthe order of)颜料厚度的尺寸,即10-2,000nm,和特别是50-1500nm。
如已经提到的,珠光颜料的最佳平面平行排列是由根据本发明的珠光颜料和硬熔料的组合支持的,这是由于这支持>30重量%的特别高的颜料使用浓度。随颜料浓度增加(从≥30重量%经由≥50重量%至≥90重量%),效果通常连续增加,并且如果熔料比例太低,仅由来自釉的颜料的粉化的发生限制。
除了各珠光颜料颗粒的最佳排列之外,温度稳定性和对化学高反应性的介质(熔料熔体)的稳定性还对颜料/熔料混合物的使用发挥关键的作用。使用含Al2O3的熔料显著增加温度稳定性。熔料中Al2O3的含量优选≥5重量%,特别是≥7重量%,和非常特别优选≥9重量%,基于所述熔料。
市售熔料通常包含熔料中通常的组分,例如Al2O3、SiO2、B2O3、TiO2、ZrO2、Sb2O3、P2O5、Fe2O3,、碱金属氧化物和碱土金属氧化物。
优选的熔料包含
-(Na2O+K2O+Li2O)<10重量%
-Al2O3>5重量%
-SiO2>50重量%
其中,熔料的所有成分的总比例是100%。
基于所述熔料Al2O3的含量≥5重量%的合适的熔料是市售的。作为实例,而不限制可以使用的熔料/焊剂的数量,可以提及来自Ferro的FLUX 101911、FLUX DSDC101915、熔料DA4193或熔料DA4113。
如果在已经预先施加到工件(体)的釉底料上采用根据本发明的颜料/熔料混合物,则温度稳定性可以纯任选地另外增加。釉底料是混合物,其可包含熔融的陶瓷熔料、陶瓷原料或矿物、玻璃或陶器瓷器粉末和无机遮光剂。这些釉底料可以研磨形式作为水性悬浮液(釉浆(slip))施加到陶瓷基材上,以掩盖基材的色调和改善后续的涂层或层的处理,而同时不会对成品的附着性或表面质量产生不利影响。使用釉底料使使用温度进一步增加了40-80K,例如从1120-1160℃至1180-1200℃。
然而,根据本发明的珠光颜料/熔料混合物还可以优选直接烧结到工件上,并然后在高目标温度范围即在1150-1200℃下显示高度彩色效果。由此产生另外的优点,即仅使用单个印刷步骤可以将彩色图案施加到工件,而第二印刷步骤对于釉底料会是必需的。
最后,如果使用基于在高温下稳定的薄片状基材的珠光颜料,通常实现特别高的温度稳定性。这里可以提到的实例是:刚玉-Al2O3,金刚砂-SiC,氮化硼-BN,石墨和赤铁矿-Fe2O3。
也可以采用不同基材的混合物或具有不同粒度的相同基材的混合物。所述基材可以以任意的重量比彼此混合。优选采用10:1至1:10的混合物,特别是1:1的混合物。特别优选的是由具有不同粒度的基材薄片组成的基材混合物,特别是S级分(fraction)(10-200μm)、N级分(10-60μm)和F级分(5-25μm)的混合物,以及F级分(5-25μm)和M级分(1-15μm)的混合物。
基础基材的尺寸本身不是关键,并且可以匹配于特定的应用和期望的目标效果/目标纹理:例如,似缎子的(satin)或高度闪光的。
通常,薄片状基材的厚度为0.05–5μm,优选0.1–2μm,特别是0.1–1μm。在其它两个维度的尺寸通常为1–500μm,优选1–250μm,特别是1–60μm。
珠光颜料的基础基材上至少一个单独层的厚度对于颜料的光学特性是重要的,如在许多专利和专利申请中已经描述的,例如在DE 14 67 468、DE 19 59 988、DE 20 09566、DE 22 14 545、DE 22 15 191、DE 22 44 298、DE 23 13 331、DE 25 22 572、DE 31 37808、DE 31 37 809、DE 31 51 343、DE 31 51 354、DE 31 51 355、DE 32 11 602、DE 32 35017中或还在本领域技术人员公知的其他专利文献和其他出版物中。
颜料必须具有至少一个光学活性层,优选高折射率层(例如TiO2、Fe2O3、SnO2等)。这里的高折射率层是指折射率n≥1.8、优选n≥2.0的所有层。
在根据本发明的珠光颜料/熔料混合物中,非常特别优选使用基于合成云母薄片、天然云母薄片的珠光颜料,和非常特别优选基于耐高温的薄片例如Al2O3、SiC、B4C、BN、石墨、TiO2和Fe2O3薄片的珠光颜料。
用于珠光颜料的合适的基材薄片可以是掺杂或未掺杂的。如果它们是掺杂的,则掺杂优选为Al、N、B、Ti、Zr、Si、In、Sn或Zn或其混合物。此外,来自过渡金属(V、Cr、Mn、Fe、Co、Ni、Cu、Y、Nb、Mo、Hf、Ta、W)的其他的离子和来自镧系元素的离子可充当掺杂剂。
在Al2O3的情况下,基材优选是未掺杂的或者用TiO2、ZrO2或者ZnO掺杂的。该Al2O3薄片优选为刚玉。合适的Al2O3薄片优选是掺杂的或未掺杂的α-Al2O3薄片,特别是TiO2掺杂的α-Al2O3薄片。如果基材是掺杂的,则掺杂的比例优选为0.01-5.00重量%,特别是0.10-3.00重量%,基于所述基材。
合适的Al2O3薄片具有等价直径分布,根据其90%的颗粒在5-45μm,优选5-40μm的范围内。
Al2O3薄片的D50值优选为15-30μm,非常特别优选为15-25μm。
D10值优选为5-15μm,非常特别优选为6-10μm。
整个申请中,使用Malvern MS 2000测定D10、D50和D90值。
Al2O3薄片的厚度优选为50-1200nm,优选150-800nm,和特别是200-450nm。
在非常特别优选的实施方式中,Al2O3薄片的厚度<500nm,优选150-450nm,和特别是150-400nm。
Al2O3薄片的纵横比(直径/厚度比)优选为10-1000,特别是50-500。
在进一步优选的实施方式中,Al2O3薄片的纵横比为30-200,特别是50-150。
在优选的实施方式中,薄片状基材涂布有一个或多个包含金属氧化物、金属氧化物水合物、金属硅酸盐、低价金属氧化物、金属、金属氟化物、金属氮化物、金属氧氮化物或这些材料的混合物的透明的、半透明的和/或不透明的层。金属氧化物、金属氧化物水合物、金属硅酸盐、低价金属氧化物、金属、金属氟化物、金属氮化物或金属氧氮化物层或它们的混合物可以具有低折射率(折射率<1.8)或高折射率(折射率≥1.8)。合适的金属氧化物和金属氧化物水合物是本领域技术人员已知的所有的金属氧化物或金属氧化物水合物,例如氧化铝、氧化铝水合物、氧化硅、氧化硅水合物、氧化铁、氧化锡、氧化铈、氧化锌、氧化锆、氧化铬、硅酸锆ZrSiO4、莫来石、氧化钛,特别是二氧化钛,氧化钛水合物以及它们的混合物,例如钛铁矿或铁板钛矿。可以使用的低价金属氧化物例如是低价钛氧化物(例如Ti2O3或γ-Ti3O5)。合适的金属硅酸盐是铝硅酸盐、Mg硅酸盐、Ca硅酸盐或Ba硅酸盐;混合的碱土金属硅酸盐,例如Ca/Mg硅酸盐、Zr硅酸盐或所述硅酸盐的混合物。合适的金属是例如铬、铝、镍、银、金、钛、铜或合金,以及合适的金属氟化物例如氟化镁。可以使用的金属氮化物或金属氧氮化物例如是金属钛、锆和/或钽的氮化物或氧氮化物。优选将金属氧化物、金属、金属氟化物和/或金属氧化物水合物的层和非常特别优选金属氧化物和/或金属氧化物水合物的层施加到载体上。此外,也可以存在包含高和低折射率的金属氧化物、金属氧化物水合物、金属或金属氟化物层的多层结构,其中高和低折射率层优选交替。特别优选的是包含高折射率层和低折射率层的层包(layer package),其中这些层包的一个或多个可被施加到载体。这里的高和低折射率层的顺序可以与载体匹配以将载体引入到多层结构中。在进一步的实施方式中,金属氧化物、金属硅酸盐、金属氧化物水合物、低价金属氧化物、金属、金属氟化物、金属氮化物或金属氧氮化物层可以混合或掺杂有着色剂或其他元素。合适的着色剂或其它元素例如是无机着色颜料,如着色的金属氧化物,例如磁铁矿、铬(III)氧化物或着色的颜料,例如Thenard's Blue(Co/Al尖晶石)或元素例如钇或锑,和通常地来自钙钛矿、烧绿石、金红石和尖晶石结构类的颜料。包含这些层的珠光颜料在它们的主色调方面显示出大的颜色变化,且归因于干涉在很多情况下可表现出颜色(随角异色(colour flop))角度依赖性的变化。
在优选的实施方式中,载体上的外层是高折射率的金属氧化物。这个外层可以另外是在上述层包上,或在高折射率载体的情况下,也可以是层包的一部分,并且由例如TiO2、低价钛氧化物、Fe2O3、SnO2、ZnO、ZrO2、Ce2O3、CoO、Co3O4、V2O5、Cr2O3和/或它们的混合物(例如钛铁矿或铁板钛矿)组成。
金属氧化物、金属氧化物水合物、金属硅酸盐、低价金属氧化物、金属、金属氟化物、金属氮化物或金属氧氮化物层或者它们的混合物的厚度通常为3到300nm,并且在该金属氧化物、金属氧化物水合物、低价金属氧化物、金属氟化物、金属氮化物或金属氧氮化物层或者它们的混合物的情况下,优选为20至200nm。金属层的厚度优选为4至50nm。
光学层优选由TiO2、ZrO2、Fe2O3、Fe3O4、SnO2、ZnO或它们的混合物或组合组成。该层可以是未掺杂的或者掺杂的。合适的掺杂剂例如是碱土金属或它们的化合物,特别是钙和镁。掺杂比例通常是最大5重量%,基于各个层。
光学层特别优选是TiO2层、Fe2O3层、TiO2/Fe2O3混合层、铁板钛矿层(Fe2TiO5)或在多层体系中这些层的组合,例如TiO2-SiO2-TiO2或者Fe2O3-SiO2-Fe2O3。
二氧化钛可以金红石或锐钛矿变型存在于高折射率涂层中,优选以金红石形式。金红石的制备方法描述于例如现有技术中,在U.S.5,433,779、U.S.4,038,099、U.S.6,626,989、DE 25 22 572 C2和EP 0 271 767 B1中。薄的氧化锡层(<10nm)(其充当添加剂以将TiO2转化成金红石)优选在TiO2沉淀之前施加到基材薄片。
在每种情况下光学活性层的厚度优选为30-350nm,特别是50至250nm。
对于根据本发明的颜料/熔料混合物特别优选的基于薄片状基材的珠光颜料如下所示:
基材薄片+TiO2
基材薄片+Fe2O3
基材薄片+Fe3O4
基材薄片+TiO2/Fe2O3
基材薄片+FeTiO3
基材薄片+Fe2TiO5
基材薄片+ZrO2
基材薄片+ZnO
基材薄片+SnO2
基材薄片+Cr2O3
基材薄片+Ce2O3
基材薄片+TiOx(还原的),其中x=1.50–1.95
基材薄片+TiO2+Fe2O3
基材薄片+TiO2+Fe3O4
基材薄片+Fe2O3+TiO2
基材薄片+TiO2+SiO2+TiO2
基材薄片+TiO2+SnO2+TiO2
基材薄片+TiO2+Al2O3+TiO2
基材薄片+Fe2O3+SiO2+TiO2
基材薄片+TiO2/Fe2O3+SiO2+TiO2
基材薄片+TiO2/Fe2O3+SiO2+TiO2/Fe2O3
基材薄片+TiO2/Fe2O3+SiO2+TiO2+TiO2/Fe2O3
基材薄片+TiO2+SiO2+TiO2/Fe2O3
基材薄片+TiO2+SiO2
基材薄片+TiO2+Al2O3
基材薄片+TiO2+MgO x SiO2+TiO2
基材薄片+Fe2O3+MgO x SiO2+TiO2
基材薄片+TiO2/Fe2O3+MgO x SiO2+TiO2
基材薄片+TiO2/Fe2O3+MgO x SiO2+TiO2/Fe2O3
基材薄片+TiO2/Fe2O3+MgO x SiO2+TiO2+TiO2/Fe2O3
基材薄片+TiO2+MgO x SiO2+TiO2/Fe2O3
基材薄片+SnO2+TiO2+SiO2+SnO2+TiO2
基材薄片+SnO2+TiO2+SnO2+TiO2
基材薄片+SnO2+TiO2+Fe2O3+SiO2+SnO2+TiO2+Fe2O3
基材薄片+Fe2O3+SnO2+TiO2
基材薄片+Fe2O3+SnO2+Fe2O3
基材薄片+TiO2+SnO2+TiO2
基材薄片+TiO2/Fe2O3+SnO2+TiO2
基材薄片+TiO2/Fe2O3+SnO2+TiO2/Fe2O3
基材薄片+SnO2+TiO2+Fe2O3+SnO2+TiO2+Fe2O3.
基材薄片+Fe2TiO5+SnO2+Fe2TiO5
基材薄片+Fe2TiO5+SiO2+Fe2TiO5
在进一步优选的实施方式中,首先将第一低折射率层施加到基材薄片。在本申请中的低折射率层意指具有<1.8的折射率的层。
基材上的低折射率层优选选自Al2O3、SiO2、硅酸锆ZrSiO4、莫来石3Al2O3x 2SiO2或者2Al2O3x SiO2(烧结或熔铸(fused)的莫来石),或碱土金属硅酸盐(MSiO3,其中M=Mg2+、Ca2+、Sr2+或Ba2+,或者M2Si3O8,其中M=Mg2+、Ca2+、Sr2+或者Ba2+)。
基材表面上优选的具有低折射率层(LRL)的颜料的特征在于以下结构:
基材薄片+LRL+TiO2
基材薄片+LRL+Fe2O3
基材薄片+LRL+Fe3O4
基材薄片+LRL+TiO2/Fe2O3
基材薄片+LRL+FeTiO3
基材薄片+LRL+Fe2TiO5
基材薄片+LRL+ZrO2
基材薄片+LRL+ZnO
基材薄片+LRL+SnO2
基材薄片+LRL+Cr2O3
基材薄片+LRL+Ce2O3
基材薄片+LRL+TiOx(还原的),其中x=1.50–1.95
基材薄片+LRL+TiO2+Fe2O3
基材薄片+LRL+TiO2+Fe3O4
基材薄片+LRL+Fe2O3+TiO2
基材薄片+LRL+TiO2+SiO2+TiO2
基材薄片+LRL+TiO2+SnO2+TiO2
基材薄片+LRL+TiO2+Al2O3+TiO2
基材薄片+LRL+Fe2O3+SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2/Fe2O3+SiO2+TiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2+SiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2+SiO2
基材薄片+LRL+TiO2+Al2O3
基材薄片+LRL+TiO2+MgO x SiO2+TiO2
基材薄片+LRL+Fe2O3+MgO x SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+MgO x SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+MgO x SiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2/Fe2O3+MgO x SiO2+TiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2+MgO x SiO2+TiO2/Fe2O3
基材薄片+LRL+SnO2+TiO2+SiO2+SnO2+TiO2
基材薄片+LRL+SnO2+TiO2+SnO2+TiO2
基材薄片+LRL+SnO2+TiO2+Fe2O3+SiO2+SnO2+TiO2+Fe2O3
基材薄片+LRL+Fe2O3+SnO2+TiO2
基材薄片+LRL+Fe2O3+SnO2+Fe2O3
基材薄片+LRL+TiO2+SnO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SnO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SnO2+TiO2/Fe2O3
基材薄片+LRL+SnO2+TiO2+Fe2O3+SnO2+TiO2+Fe2O3
基材薄片+LRL+Fe2TiO5+SnO2+Fe2TiO5
基材薄片+LRL+Fe2TiO5+SiO2+Fe2TiO5
在根据本发明的珠光颜料/熔料混合物中也可以使用不同的珠光颜料作为混合物。优选地,仅采用一种类型的珠光颜料。
在本申请中层或涂层是指薄片状基材的完全覆盖。
珠光颜料可以相对容易地制备。基材薄片的覆盖优选通过湿化学方法进行,其中可以使用为制备珠光颜料开发的湿法化学涂覆方法。这类方法例如描述于DE 14 67 468、DE 19 59 988、DE 20 09 566、DE 22 14 545、DE 22 15 191、DE 22 44 298、DE 23 13331、DE 25 22 572、DE 31 37 808、DE 31 37 809、DE 31 51 343、DE 31 51 354、DE 31 51355、DE 32 11 602、DE 32 35 017中,或还在本领域技术人员已知的其它专利文献中以及其它出版物中。
此外,基材的涂覆也可以通过气相涂覆在流化床反应器中进行,其中可以相应地使用EP 0 045 851 A1和EP 0 106 235 A1中提出的用于制备珠光颜料的方法。
在湿涂的情况下,将基材颗粒悬浮在水中,并在适合于水解的pH下加入一种或多种可溶性金属盐,选择pH使得金属氧化物或金属氧化物水合物直接沉淀到薄片上而不出现二次沉淀。pH通常是通过同时计量加入碱或酸而保持恒定。随后将颜料分离、洗涤、干燥和任选地煅烧,其中煅烧温度可以相对于在每种情况下存在的涂层进行优化。通常,煅烧温度在250和1000℃之间,优选350和900℃之间。如果需要的话,可以在施涂各涂层之后分离颜料,干燥,并任选地煅烧,并然后再悬浮以用于其他层的沉淀。
例如,如果TiO2或者TiO2/Fe2O3层待被还原,则成品珠光颜料的还原优选在干燥之后通过随后在还原条件下,优选在合成气体(N2/H2)下,在500-1200℃、优选500-1000℃、特别是500-800℃下煅烧颜料0.5-5h、优选0.5-2h而进行。然而,当使用已经在釉中在还原条件下煅烧的颜料时,已经证明选择在用于待上釉的工件的烧结条件下的还原条件是同样有用的。
为了改善与印刷介质的润湿性和/或相容性,取决于应用领域,经常可取的是对成品珠光颜料进行无机或有机后涂覆或后处理。适合的后涂覆或后处理是例如描述于DE专利22 15 191、DE-A 31 51 354、DE-A 32 35 017或DE-A 33 34 598中的工艺。这种后涂覆简化了颜料的处理,特别是引入到各种介质中。为了改善与应用介质的润湿性、分散性和/或相容性,包含无机或合并的有机/无机后涂层的功能涂层是可能的,例如用硅烷,例如描述在DE 10348174、EP 0090259、EP 0 342 533、EP 0 632 109、EP 0 888 410、EP 0 634 459、EP 1 203795、WO 94/01498、WO 96/32446、WO 99/57204、WO 2004/092284、U.S.5,759,255、U.S.5,571,851、WO 01/92425或在J.J.Ponjeé,Philips Technical Review,Vol.44,No.3,81ff.和P.H.Harding J.C.Berg,J.Adhesion Sci.Technol.Vol.11No.4,pp.471-493中。基于所述珠光颜料,后涂层仅占0.1-5重量%、优选0.5-3重量%的比例。
在本发明的特定实施方式中,珠光颜料是疏水或两亲性后涂覆的,当经由印刷糊剂施加时,其导致在印刷介质中更均匀分布的优点,并由此导致在工件上更均匀的颜色分布。
根据本发明的珠光颜料/熔料混合物通过吸引人的干涉色(银色、金色、青铜色、铜色、红色、紫色、蓝色、青绿色、绿色),和用所谓的主色调珠光颜料(其特征在于干涉和吸收颜色的组合,特别是在金色、黄铜色、青铜色、铜色、红色和绿色色调的区域)扩大以下的颜色范围:烧结或不烧结砖上的着色的陶瓷釉,室内或室外使用的地砖和墙砖,卫生陶瓷如浴缸、脸盆和坐便器(toilet pan),瓷器陶器,陶器和陶瓷器。另外,其还促使了完全新颖的色彩效果,如视角依赖性的所谓的随角异色效果。所述珠光颜料的选择还促使了新型光学效果,如火花/闪光效果和粗或细的结构。
本发明还涉及根据本发明的珠光颜料/熔料混合物用于在烧结或烧结砖上的陶瓷釉,用于室内或室外使用的地砖和墙砖,卫生陶瓷,瓷器,陶器和陶瓷器的用途。
因此,本发明还涉及包含根据本发明的珠光颜料/熔料混合物的制剂。
附图说明
图1和2示出了在烧结操作之前通过着色的熔料层的侧剖视图。
图3-5图解式地描绘了釉中珠光颜料的平面平行排列(其对于所希望的强烈珠光效果是有利的)受到不利影响越小,熔料颗粒平均相对于颜料颗粒越小。
图6描绘了作为时间的函数的温度程序。
具体实施方式
以下实施例旨在解释本发明,而非对其限制。
实施例
根据本发明的颜料/熔料混合物的制备和表征分成四个步骤:
1)印刷糊剂的制备:
为了借助于陶瓷颜色,在陶瓷基材上制备细色彩网格(grid)和浮雕状的印记(print),使用丝网印刷油(printing oil),其防止在印刷后颜色糊剂的流动(run)并产生具有清晰的轮廓的印记。为此,使用用于已知的粘结剂的添加剂,其由细分散的天然和合成蜡组成,和/或由细分散的无机硅酸盐或氧化物质组成,其在烧结过程中能够并入到焊剂的硅酸盐结构中。称出珠光颜料连同相应量的熔料和印刷介质(在实施例中使用丝网印刷油221-ME和Screenprint Bulk 803035 MR—均为来自Ferro的市售产品),并均质化以用于一系列实验(见表1)。
称出根据实施例1至275的效果颜料,并与相应量的下列组成的熔料均质化:
熔料 | CaO | Na2O | K2O | BaO | Al2O3 | SiO2 | B2O3 |
wt.% | 9.7 | 5.2 | 1.1 | 1.3 | 10.1 | 69.6 | 3.0 |
用于制备糊剂的相应原材料即珠光颜料、熔料和印刷油的重量示于下表中:
在表中使用的珠光颜料都是市售的,并具有以下组成(在“粒度”栏中,在每种情况下d10–d90值是使用Malvern测得):
以下步骤2-4独立于所述印刷糊剂的组成。
2)瓷砖的印刷
可以将得到的印刷糊剂通过标准印刷方法、涂釉浆(slip)方法、喷涂或转印施用于瓷砖。在所有情况下,在60-110℃的温度下,在干燥箱或通风橱中干燥印制瓷砖,以蒸发掉印刷油中存在的溶剂。在根据本发明的实施例中,借助于刮刀和丝网印刷将印刷糊剂施用到瓷砖。
3)印制瓷砖的烧结
然后通过根据图6中的温度曲线将印制和干燥的瓷砖在烧结炉中烧结。
180分钟:加热至1100℃,
3分钟:在1100℃保持,
120分钟:快速冷却至600℃,
300分钟:缓慢冷却至室温。
温度程序作为时间的函数描绘在图6中。
实施例1至275的釉面砖的特征在于以下事实,即所期望的光学效过在>1100℃的高温应用下是稳定的和以可再现的方式可实现的。
Claims (15)
1.颜料/熔料混合物,其特征在于,所述混合物中珠光混合物的比例为5-95重量%,且所述熔料包含基于所述熔料至少5重量%的Al2O3。
2.根据权利要求1的颜料/熔料混合物,其特征在于,所述珠光颜料是基于薄片状基材。
3.根据权利要求1或2的颜料/熔料混合物,其特征在于,所述薄片状基材选自合成云母薄片、天然云母薄片、Al2O3薄片、SiO2薄片、Fe2O3薄片、B4C薄片、TiO2薄片、SiC薄片、BN薄片和石墨薄片。
4.根据权利要求1至3的一项或多项的颜料/熔料混合物,其特征在于,所述薄片覆盖有一层或多层一种或多种金属氧化物、金属硫化物、稀土金属氧化物和/或一种或多种金属或者它们的混合物。
5.根据权利要求1至4的一项或多项的颜料/熔料混合物,其特征在于,所述薄片的表面上覆盖有选自TiO2、Fe2O3、ZrO2、SnO2、TiO2/Fe2O3、Fe2TiO5、FeTiO3、FeOOH、Fe3O4、Cr2O3和TiOx的一个或多个层,其中x=1.50–1.95。
6.根据权利要求1至5的一项或多项的颜料/熔料混合物,其特征在于,所述薄片的颗粒厚度为0.05–5.0μm。
7.根据权利要求1至6的一项或多项的颜料/熔料混合物,其特征在于,所述熔料颗粒的粒度为1–500μm。
8.根据权利要求1至7的一项或多项的颜料/熔料混合物,其特征在于,所述熔料包含CaO、Na2O、K2O、BaO、Al2O3、SiO2或B2O3。
9.根据权利要求1至8的一项或多项的颜料/熔料混合物,其特征在于,所述熔料包含基于所述熔料计≥5重量%的Al2O3和≥50重量%的SiO2,其中所述熔料的所有成分的总和为100%。
10.根据权利要求1至9的一项或多项的颜料/熔料混合物,其特征在于,所述珠光颜料选自下列组的颜料:
基材薄片+TiO2
基材薄片+Fe2O3
基材薄片+Fe3O4
基材薄片+TiO2/Fe2O3
基材薄片+FeTiO3
基材薄片+Fe2TiO5
基材薄片+ZrO2
基材薄片+ZnO
基材薄片+SnO2
基材薄片+Cr2O3
基材薄片+Ce2O3
基材薄片+TiOx(还原的),其中x=1.50–1.95
基材薄片+TiO2+Fe2O3
基材薄片+TiO2+Fe3O4
基材薄片+Fe2O3+TiO2
基材薄片+TiO2+SiO2+TiO2
基材薄片+TiO2+SnO2+TiO2
基材薄片+TiO2+Al2O3+TiO2
基材薄片+Fe2O3+SiO2+TiO2
基材薄片+TiO2/Fe2O3+SiO2+TiO2
基材薄片+TiO2/Fe2O3+SiO2+TiO2/Fe2O3
基材薄片+TiO2/Fe2O3+SiO2+TiO2+TiO2/Fe2O3
基材薄片+TiO2+SiO2+TiO2/Fe2O3
基材薄片+TiO2+SiO2
基材薄片+TiO2+Al2O3
基材薄片+TiO2+MgO x SiO2+TiO2
基材薄片+Fe2O3+MgO x SiO2+TiO2
基材薄片+TiO2/Fe2O3+MgO x SiO2+TiO2
基材薄片+TiO2/Fe2O3+MgO x SiO2+TiO2/Fe2O3
基材薄片+TiO2/Fe2O3+MgO x SiO2+TiO2+TiO2/Fe2O3
基材薄片+TiO2+MgO x SiO2+TiO2/Fe2O3
基材薄片+SnO2+TiO2+SiO2+SnO2+TiO2
基材薄片+SnO2+TiO2+SnO2+TiO2
基材薄片+SnO2+TiO2+Fe2O3+SiO2+SnO2+TiO2+Fe2O3
基材薄片+Fe2O3+SnO2+TiO2
基材薄片+Fe2O3+SnO2+Fe2O3
基材薄片+TiO2+SnO2+TiO2
基材薄片+TiO2/Fe2O3+SnO2+TiO2
基材薄片+TiO2/Fe2O3+SnO2+TiO2/Fe2O3
基材薄片+SnO2+TiO2+Fe2O3+SnO2+TiO2+Fe2O3.
基材薄片+Fe2TiO5+SnO2+Fe2TiO5
基材薄片+Fe2TiO5+SiO2+Fe2TiO5。
11.根据权利要求1至10的一项或多项的颜料/熔料混合物,其特征在于,在所述基材薄片上的珠光颜料具有包含Al2O3、SiO2、硅酸锆ZrSiO4、莫来石3Al2O3 x 2SiO2或者2Al2O3 xSiO2(烧结或熔铸的莫来石)或碱土金属硅酸盐(MSiO3,其中M=Mg2+、Ca2+、Sr2+或者Ba2+,或者M2Si3O8,其中M=Mg2+、Ca2+、Sr2+或者Ba2+)的第一低折射率层(=LRL),并且选自以下组的颜料:
基材薄片+LRL+TiO2
基材薄片+LRL+Fe2O3
基材薄片+LRL+Fe3O4
基材薄片+LRL+TiO2/Fe2O3
基材薄片+LRL+FeTiO3
基材薄片+LRL+Fe2TiO5
基材薄片+LRL+ZrO2
基材薄片+LRL+ZnO
基材薄片+LRL+SnO2
基材薄片+LRL+Cr2O3
基材薄片+LRL+Ce2O3
基材薄片+LRL+TiOx(还原的),其中x=1.50–1.95
基材薄片+LRL+TiO2+Fe2O3
基材薄片+LRL+TiO2+Fe3O4
基材薄片+LRL+Fe2O3+TiO2
基材薄片+LRL+TiO2+SiO2+TiO2
基材薄片+LRL+TiO2+SnO2+TiO2
基材薄片+LRL+TiO2+Al2O3+TiO2
基材薄片+LRL+Fe2O3+SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2/Fe2O3+SiO2+TiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2+SiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2+SiO2
基材薄片+LRL+TiO2+Al2O3
基材薄片+LRL+TiO2+MgO x SiO2+TiO2
基材薄片+LRL+Fe2O3+MgO x SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+MgO x SiO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+MgO x SiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2/Fe2O3+MgO x SiO2+TiO2+TiO2/Fe2O3
基材薄片+LRL+TiO2+MgO x SiO2+TiO2/Fe2O3
基材薄片+LRL+SnO2+TiO2+SiO2+SnO2+TiO2
基材薄片+LRL+SnO2+TiO2+SnO2+TiO2
基材薄片+LRL+SnO2+TiO2+Fe2O3+SiO2+SnO2+TiO2+Fe2O3
基材薄片+LRL+Fe2O3+SnO2+TiO2
基材薄片+LRL+Fe2O3+SnO2+Fe2O3
基材薄片+LRL+TiO2+SnO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SnO2+TiO2
基材薄片+LRL+TiO2/Fe2O3+SnO2+TiO2/Fe2O3
基材薄片+LRL+SnO2+TiO2+Fe2O3+SnO2+TiO2+Fe2O3
基材薄片+LRL+Fe2TiO5+SnO2+Fe2TiO5
基材薄片+LRL+Fe2TiO5+SiO2+Fe2TiO5。
12.根据权利要求1至11的一项或多项的颜料/熔料混合物在未烧结或烧结的砖、未烧结或烧结的陶器和陶瓷器或陶瓷釉中的用途。
13.根据权利要求12的颜料/熔料混合物用于装饰瓷砖的用途。
14.根据权利要求12的颜料/熔料混合物用于瓷釉的用途。
15.包含根据权利要求1至11的一项或多项的颜料/熔料混合物的制剂。
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DE102015013400.0A DE102015013400A1 (de) | 2015-10-19 | 2015-10-19 | Pigment/Fritten-Gemisch |
DE102015013400.0 | 2015-10-19 |
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US (1) | US10214651B2 (zh) |
EP (1) | EP3159380B1 (zh) |
KR (1) | KR20170045729A (zh) |
CN (1) | CN106587623A (zh) |
DE (1) | DE102015013400A1 (zh) |
ES (1) | ES2754653T3 (zh) |
MX (1) | MX2016013714A (zh) |
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CN110437646A (zh) * | 2018-05-04 | 2019-11-12 | 默克专利股份有限公司 | 陶瓷色料 |
CN113767151A (zh) * | 2019-04-30 | 2021-12-07 | 默克专利股份有限公司 | 效果颜料 |
CN113767151B (zh) * | 2019-04-30 | 2023-07-04 | 默克专利股份有限公司 | 效果颜料 |
CN110283479A (zh) * | 2019-08-02 | 2019-09-27 | 四川赛和新材料科技有限责任公司 | 一种超白复合绢云母及其制备方法 |
CN113087395A (zh) * | 2019-12-23 | 2021-07-09 | 默克专利股份有限公司 | 电子制品 |
Also Published As
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US20170107379A1 (en) | 2017-04-20 |
KR20170045729A (ko) | 2017-04-27 |
EP3159380A1 (de) | 2017-04-26 |
EP3159380B1 (de) | 2019-08-07 |
MX2016013714A (es) | 2017-04-18 |
ES2754653T3 (es) | 2020-04-20 |
US10214651B2 (en) | 2019-02-26 |
DE102015013400A1 (de) | 2017-04-20 |
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