CN106237934B - 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 - Google Patents
由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 Download PDFInfo
- Publication number
- CN106237934B CN106237934B CN201610643193.1A CN201610643193A CN106237934B CN 106237934 B CN106237934 B CN 106237934B CN 201610643193 A CN201610643193 A CN 201610643193A CN 106237934 B CN106237934 B CN 106237934B
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- boron
- reaction
- temperature
- trap
- reaction chamber
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- 238000000034 method Methods 0.000 title description 63
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- 238000006243 chemical reaction Methods 0.000 claims abstract description 191
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- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 134
- 229910052796 boron Inorganic materials 0.000 claims description 129
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- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 169
- 229910015900 BF3 Inorganic materials 0.000 description 156
- 239000007789 gas Substances 0.000 description 70
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- BLIQUJLAJXRXSG-UHFFFAOYSA-N 1-benzyl-3-(trifluoromethyl)pyrrolidin-1-ium-3-carboxylate Chemical compound C1C(C(=O)O)(C(F)(F)F)CCN1CC1=CC=CC=C1 BLIQUJLAJXRXSG-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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- 229910052580 B4C Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 101000911390 Homo sapiens Coagulation factor VIII Proteins 0.000 description 1
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- KPSZQYZCNSCYGG-UHFFFAOYSA-N [B].[B] Chemical compound [B].[B] KPSZQYZCNSCYGG-UHFFFAOYSA-N 0.000 description 1
- LIQLLTGUOSHGKY-UHFFFAOYSA-N [B].[F] Chemical class [B].[F] LIQLLTGUOSHGKY-UHFFFAOYSA-N 0.000 description 1
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- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 102000057593 human F8 Human genes 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
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- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/0285—Heating or cooling the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
- B01J8/0446—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical
- B01J8/0461—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical annular shaped beds
- B01J8/0465—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical annular shaped beds the beds being concentric
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/06—Boron halogen compounds
- C01B35/061—Halides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
- B01J2208/00389—Controlling the temperature using electric heating or cooling elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
- B01J2208/00433—Controlling the temperature using electromagnetic heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00539—Pressure
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37837510P | 2010-08-30 | 2010-08-30 | |
| US61/378,375 | 2010-08-30 | ||
| CN201180052929.3A CN103201824B (zh) | 2010-08-30 | 2011-08-28 | 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180052929.3A Division CN103201824B (zh) | 2010-08-30 | 2011-08-28 | 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106237934A CN106237934A (zh) | 2016-12-21 |
| CN106237934B true CN106237934B (zh) | 2019-08-27 |
Family
ID=45697555
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610643193.1A Active CN106237934B (zh) | 2010-08-30 | 2011-08-28 | 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 |
| CN201180052929.3A Active CN103201824B (zh) | 2010-08-30 | 2011-08-28 | 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180052929.3A Active CN103201824B (zh) | 2010-08-30 | 2011-08-28 | 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9205392B2 (enExample) |
| EP (1) | EP2612349A4 (enExample) |
| JP (2) | JP5908476B2 (enExample) |
| KR (1) | KR101902022B1 (enExample) |
| CN (2) | CN106237934B (enExample) |
| TW (2) | TWI575574B (enExample) |
| WO (1) | WO2012030679A2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7722832B2 (en) | 2003-03-25 | 2010-05-25 | Crystaphase International, Inc. | Separation method and assembly for process streams in component separation units |
| KR101297917B1 (ko) * | 2005-08-30 | 2013-08-27 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법,및 주입을 위한 대형 수소화붕소의 형성 방법 |
| US8598022B2 (en) | 2009-10-27 | 2013-12-03 | Advanced Technology Materials, Inc. | Isotopically-enriched boron-containing compounds, and methods of making and using same |
| CN106237934B (zh) | 2010-08-30 | 2019-08-27 | 恩特格里斯公司 | 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法 |
| TWI583442B (zh) * | 2011-10-10 | 2017-05-21 | 恩特葛瑞斯股份有限公司 | Ｂ２ｆ４之製造程序 |
| US10744426B2 (en) | 2015-12-31 | 2020-08-18 | Crystaphase Products, Inc. | Structured elements and methods of use |
| US10054140B2 (en) | 2016-02-12 | 2018-08-21 | Crystaphase Products, Inc. | Use of treating elements to facilitate flow in vessels |
| CN110656024B (zh) * | 2018-06-29 | 2024-06-04 | 厦门大学 | 微流控芯片和生化检测装置 |
| US11052363B1 (en) | 2019-12-20 | 2021-07-06 | Crystaphase Products, Inc. | Resaturation of gas into a liquid feedstream |
| EP4210865A1 (en) | 2020-09-09 | 2023-07-19 | Crystaphase Products Inc. | Process vessel entry zones |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1168349A (zh) * | 1996-02-20 | 1997-12-24 | 日本石油化学株式会社 | 三氟化硼的分离和回收方法 |
| CN101195489A (zh) * | 2006-12-06 | 2008-06-11 | 气体产品与化学公司 | 氢硼化物氟化的方法 |
| CN101291742A (zh) * | 2005-08-30 | 2008-10-22 | 先进科技材料公司 | 使用替代的氟化含硼前驱体的硼离子注入和用于注入的大氢化硼的形成 |
Family Cites Families (86)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5064172A (enExample) * | 1973-10-12 | 1975-05-31 | ||
| JPS588071A (ja) | 1981-07-08 | 1983-01-18 | Nippon Iyakuhin Kogyo Kk | ２−ベンゾチアゾリノン−３−酢酸アミド誘導体またはその薬学的に活性な塩類の製造法 |
| US4459427A (en) | 1981-10-31 | 1984-07-10 | The British Petroleum Company P.L.C. | Process for the conversion of an alkane to a mixture of an alcohol and a ketone |
| JPS60221566A (ja) | 1984-04-18 | 1985-11-06 | Agency Of Ind Science & Technol | 薄膜形成装置 |
| JPS60251928A (ja) * | 1984-05-29 | 1985-12-12 | Toyota Motor Corp | 金属化合物超微粒子の製造方法 |
| US4722978A (en) | 1985-08-30 | 1988-02-02 | The B. F. Goodrich Company | Allyl terminated macromolecular monomers of polyethers |
| US4680358A (en) | 1985-11-08 | 1987-07-14 | The B F Goodrich Company | Styryl terminated macromolecular monomers of polyethers |
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| JP2016120496A (ja) | 2016-07-07 |
| JP2013542901A (ja) | 2013-11-28 |
| JP5908476B2 (ja) | 2016-04-26 |
| US20120051994A1 (en) | 2012-03-01 |
| CN106237934A (zh) | 2016-12-21 |
| EP2612349A4 (en) | 2016-09-14 |
| US9764298B2 (en) | 2017-09-19 |
| US20160107136A1 (en) | 2016-04-21 |
| EP2612349A2 (en) | 2013-07-10 |
| KR101902022B1 (ko) | 2018-09-27 |
| US9205392B2 (en) | 2015-12-08 |
| TW201218254A (en) | 2012-05-01 |
| TWI575574B (zh) | 2017-03-21 |
| TW201630055A (zh) | 2016-08-16 |
| WO2012030679A3 (en) | 2012-07-05 |
| KR20130101035A (ko) | 2013-09-12 |
| TWI538020B (zh) | 2016-06-11 |
| CN103201824A (zh) | 2013-07-10 |
| WO2012030679A2 (en) | 2012-03-08 |
| CN103201824B (zh) | 2016-09-07 |
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