CN105826168B - 基板处理装置 - Google Patents

基板处理装置 Download PDF

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Publication number
CN105826168B
CN105826168B CN201610046871.6A CN201610046871A CN105826168B CN 105826168 B CN105826168 B CN 105826168B CN 201610046871 A CN201610046871 A CN 201610046871A CN 105826168 B CN105826168 B CN 105826168B
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CN
China
Prior art keywords
substrate
gas
gas supply
supply part
process chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610046871.6A
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English (en)
Chinese (zh)
Other versions
CN105826168A (zh
Inventor
高原龙平
西部幸伸
矶明典
坂下健司
松田大辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of CN105826168A publication Critical patent/CN105826168A/zh
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Publication of CN105826168B publication Critical patent/CN105826168B/zh
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment

Landscapes

  • Drying Of Solid Materials (AREA)
  • Coating Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CN201610046871.6A 2015-01-28 2016-01-25 基板处理装置 Active CN105826168B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015-014155 2015-01-28
JP2015014155 2015-01-28
JP2015184630A JP6209572B2 (ja) 2015-01-28 2015-09-18 基板処理装置
JP2015-184630 2015-09-18

Publications (2)

Publication Number Publication Date
CN105826168A CN105826168A (zh) 2016-08-03
CN105826168B true CN105826168B (zh) 2018-10-26

Family

ID=56686152

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610046871.6A Active CN105826168B (zh) 2015-01-28 2016-01-25 基板处理装置

Country Status (3)

Country Link
JP (2) JP6209572B2 (https=)
CN (1) CN105826168B (https=)
TW (1) TWI618905B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108807215B (zh) * 2017-04-28 2021-01-29 苏州均晟豪智能科技有限公司 处理装置
CN107065433B (zh) * 2017-05-08 2021-01-26 京东方科技集团股份有限公司 干燥装置
JP7031831B1 (ja) 2021-03-16 2022-03-08 株式会社アルフテクノ 乾燥装置
CN115513095B (zh) * 2022-09-19 2025-04-04 京东方科技集团股份有限公司 一种高密度清洗设备
CN118482549B (zh) * 2024-07-15 2024-09-20 江苏徕阳氢能源科技有限公司 一种电解水制氢用电极板干燥运输一体化装置
CN118856845B (zh) * 2024-09-19 2024-11-29 黄骅聚金五金制品有限公司 一种球化线烘干装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1396007A (zh) * 2001-07-05 2003-02-12 日本电气株式会社 药液涂敷方法及其涂敷装置
CN100440446C (zh) * 2005-03-30 2008-12-03 大日本网目版制造株式会社 基板处理装置
CN101114576B (zh) * 2006-07-26 2010-07-21 芝浦机械电子株式会社 基板的处理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5919273Y2 (ja) * 1979-10-03 1984-06-04 株式会社阪田商会 乾燥装置
JP3070511B2 (ja) * 1997-03-31 2000-07-31 日本電気株式会社 基板乾燥装置
JP2002022359A (ja) * 2000-07-07 2002-01-23 Matsushita Electric Ind Co Ltd 基板の乾燥装置
JP3754905B2 (ja) * 2001-09-10 2006-03-15 東京エレクトロン株式会社 基板乾燥装置
JP4229670B2 (ja) * 2002-09-30 2009-02-25 株式会社日本設計工業 薄板状材の搬送方法及び装置
JP3865717B2 (ja) * 2003-06-27 2007-01-10 東京応化工業株式会社 基板乾燥装置および基板乾燥方法
JP4272230B2 (ja) * 2006-12-22 2009-06-03 東京エレクトロン株式会社 減圧乾燥装置
CN201561627U (zh) * 2009-12-17 2010-08-25 无锡尚德太阳能电力有限公司 硅片吹干系统
JP2013045877A (ja) * 2011-08-24 2013-03-04 Tokyo Electron Ltd 基板処理装置
CN203672080U (zh) * 2014-01-06 2014-06-25 宇宙电路板设备(深圳)有限公司 触控面板用烘干装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1396007A (zh) * 2001-07-05 2003-02-12 日本电气株式会社 药液涂敷方法及其涂敷装置
CN100440446C (zh) * 2005-03-30 2008-12-03 大日本网目版制造株式会社 基板处理装置
CN101114576B (zh) * 2006-07-26 2010-07-21 芝浦机械电子株式会社 基板的处理装置

Also Published As

Publication number Publication date
JP6495986B2 (ja) 2019-04-03
JP2016145702A (ja) 2016-08-12
CN105826168A (zh) 2016-08-03
JP6209572B2 (ja) 2017-10-04
JP2017211178A (ja) 2017-11-30
TWI618905B (zh) 2018-03-21
TW201706548A (zh) 2017-02-16

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