CN104685603B - 电子显微镜及电子显微镜用试样保持装置 - Google Patents

电子显微镜及电子显微镜用试样保持装置 Download PDF

Info

Publication number
CN104685603B
CN104685603B CN201380039786.1A CN201380039786A CN104685603B CN 104685603 B CN104685603 B CN 104685603B CN 201380039786 A CN201380039786 A CN 201380039786A CN 104685603 B CN104685603 B CN 104685603B
Authority
CN
China
Prior art keywords
sample
capillary
electron microscope
gas
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201380039786.1A
Other languages
English (en)
Chinese (zh)
Other versions
CN104685603A (zh
Inventor
矢口纪惠
长久保康平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Publication of CN104685603A publication Critical patent/CN104685603A/zh
Application granted granted Critical
Publication of CN104685603B publication Critical patent/CN104685603B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
CN201380039786.1A 2012-07-27 2013-06-19 电子显微镜及电子显微镜用试样保持装置 Expired - Fee Related CN104685603B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-166492 2012-07-27
JP2012166492A JP6169334B2 (ja) 2012-07-27 2012-07-27 電子顕微鏡および電子顕微鏡用試料保持装置
PCT/JP2013/066776 WO2014017225A1 (ja) 2012-07-27 2013-06-19 電子顕微鏡および電子顕微鏡用試料保持装置

Publications (2)

Publication Number Publication Date
CN104685603A CN104685603A (zh) 2015-06-03
CN104685603B true CN104685603B (zh) 2016-11-16

Family

ID=49997042

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380039786.1A Expired - Fee Related CN104685603B (zh) 2012-07-27 2013-06-19 电子显微镜及电子显微镜用试样保持装置

Country Status (5)

Country Link
US (1) US9378922B2 (enExample)
JP (1) JP6169334B2 (enExample)
CN (1) CN104685603B (enExample)
DE (1) DE112013003328B4 (enExample)
WO (1) WO2014017225A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI546841B (zh) * 2014-12-10 2016-08-21 財團法人工業技術研究院 具有載台的電子顯微鏡
WO2016183443A1 (en) * 2015-05-13 2016-11-17 Protochips, Inc. Method for enabling modular part replacement within an electron microscope sample holder
CN107473179B (zh) * 2016-06-08 2019-04-23 清华大学 一种表征二维纳米材料的方法
WO2019010390A1 (en) * 2017-07-06 2019-01-10 Protochips, Inc. ELECTRONIC MICROSCOPE SAMPLE HOLDER FLUID MANAGEMENT WITH INDEPENDENT PRESSURE AND FLOW CONTROL
WO2021070338A1 (ja) * 2019-10-10 2021-04-15 株式会社日立ハイテク 荷電粒子線装置
US20240186103A1 (en) * 2021-04-13 2024-06-06 Hitachi High-Tech Corporation Transmission Electron Microscope
JP7407771B2 (ja) * 2021-06-21 2024-01-04 日本電子株式会社 電子ビーム検査装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009283477A (ja) * 2009-09-04 2009-12-03 Hitachi High-Technologies Corp 電子線装置及び電子線装置用試料ホルダー
CN102543639A (zh) * 2010-11-09 2012-07-04 Fei公司 用于带电粒子束系统的环境单元

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51267Y2 (enExample) 1971-05-28 1976-01-07
JPH051267A (ja) 1991-06-27 1993-01-08 Minnesota Mining & Mfg Co <3M> 耐熱性の優れたゴム系接着剤組成物
JP2781320B2 (ja) * 1993-01-18 1998-07-30 株式会社蛋白工学研究所 電子顕微鏡等の試料ホルダ
JPH10206748A (ja) 1997-01-17 1998-08-07 Daiichi Seimitsu Kk 顕微鏡のステージ設置用キャピラリユニット並びにキャピラリユニットを具えた顕微鏡用ステージ並びにキャピラリユニットを具えた顕微鏡
JP2003187735A (ja) 2001-12-18 2003-07-04 Jeol Ltd 試料ホルダ
EP1722397A1 (en) * 2005-05-09 2006-11-15 Lee, Bing-Huan Device for operating with gas in vacuum or low-pressure environment of electron microscopes and for observation of the operation
WO2008141147A1 (en) 2007-05-09 2008-11-20 Protochips, Inc. Microscopy support structures
JP5284699B2 (ja) * 2008-03-17 2013-09-11 日本電子株式会社 電子顕微鏡の試料装置
JP5226378B2 (ja) * 2008-04-28 2013-07-03 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡、及び試料観察方法
US8059271B2 (en) * 2009-02-04 2011-11-15 The United States Of America As Represented By The Secretary Of The Army Reusable sample holding device permitting ready loading of very small wet samples
JP5124507B2 (ja) * 2009-02-16 2013-01-23 株式会社日立ハイテクノロジーズ 電子線装置および電子線装置用試料保持装置
JP5442417B2 (ja) * 2009-12-14 2014-03-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5476115B2 (ja) * 2009-12-21 2014-04-23 日本電子株式会社 グリッドを用いた試料ホルダ
JP5260575B2 (ja) * 2010-02-24 2013-08-14 株式会社日立ハイテクノロジーズ 電子顕微鏡、および試料ホルダ
US8178851B2 (en) 2010-07-30 2012-05-15 E.A. Fischione Instruments, Inc. In situ holder assembly

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009283477A (ja) * 2009-09-04 2009-12-03 Hitachi High-Technologies Corp 電子線装置及び電子線装置用試料ホルダー
CN102543639A (zh) * 2010-11-09 2012-07-04 Fei公司 用于带电粒子束系统的环境单元

Also Published As

Publication number Publication date
JP6169334B2 (ja) 2017-07-26
DE112013003328T5 (de) 2015-03-26
DE112013003328B4 (de) 2020-02-06
CN104685603A (zh) 2015-06-03
US20150179396A1 (en) 2015-06-25
US9378922B2 (en) 2016-06-28
WO2014017225A1 (ja) 2014-01-30
JP2014026840A (ja) 2014-02-06

Similar Documents

Publication Publication Date Title
CN104685603A (zh) 电子显微镜及电子显微镜用试样保持装置
CN103477415B (zh) 带电粒子束装置及利用带电粒子束装置进行观察的方法
KR101514190B1 (ko) 하전 입자선 장치
JP5124507B2 (ja) 電子線装置および電子線装置用試料保持装置
JP5634030B2 (ja) 粒子光学装置用環境セル
JP5825964B2 (ja) 検査又は観察装置及び試料の検査又は観察方法
CN105612597B (zh) 带电粒子束装置以及带电粒子束装置用样本保持装置
JP5930922B2 (ja) 荷電粒子線装置及び試料観察方法
CN109755097B (zh) 一种四极杆质谱仪及其使用方法
CN104798173A (zh) 带电粒子线装置、试样台单元以及试样观察方法
US12562337B2 (en) Gas supply device, particle beam apparatus having a gas supply device, and method of operating the gas supply device and the particle beam apparatus
CN105190824B (zh) 带电粒子线装置
JP6522133B2 (ja) 観察支援ユニットおよびこれを用いた試料観察方法、荷電粒子線装置
JP5891030B2 (ja) 電子顕微鏡
JP5824262B2 (ja) 試料観察方法および圧力測定用ホルダ
JP2017059360A (ja) Ｘ線計測装置、電子線源の交換方法、及び電子銃
JP5919368B2 (ja) 荷電粒子線装置
JP5678134B2 (ja) 荷電粒子線装置
JP2021068643A (ja) 試料ホルダー、荷電粒子線装置、およびガス流量制御装置
WO2016035493A1 (ja) 電子線装置および電子線装置用ガス供給装置
JP2016001629A (ja) 試料観察方法
JP2010051769A (ja) Ｘ線拡大撮影用徴小焦点電子顕微鏡アダプター

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20161116

Termination date: 20210619

CF01 Termination of patent right due to non-payment of annual fee