JP6169334B2 - 電子顕微鏡および電子顕微鏡用試料保持装置 - Google Patents

電子顕微鏡および電子顕微鏡用試料保持装置 Download PDF

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Publication number
JP6169334B2
JP6169334B2 JP2012166492A JP2012166492A JP6169334B2 JP 6169334 B2 JP6169334 B2 JP 6169334B2 JP 2012166492 A JP2012166492 A JP 2012166492A JP 2012166492 A JP2012166492 A JP 2012166492A JP 6169334 B2 JP6169334 B2 JP 6169334B2
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JP
Japan
Prior art keywords
sample
capillary
electron beam
holding device
electron microscope
Prior art date
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Active
Application number
JP2012166492A
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English (en)
Japanese (ja)
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JP2014026840A5 (enExample
JP2014026840A (ja
Inventor
矢口　紀恵
紀恵 矢口
康平 長久保
康平 長久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2012166492A priority Critical patent/JP6169334B2/ja
Priority to CN201380039786.1A priority patent/CN104685603B/zh
Priority to PCT/JP2013/066776 priority patent/WO2014017225A1/ja
Priority to DE112013003328.3T priority patent/DE112013003328B4/de
Priority to US14/417,345 priority patent/US9378922B2/en
Publication of JP2014026840A publication Critical patent/JP2014026840A/ja
Publication of JP2014026840A5 publication Critical patent/JP2014026840A5/ja
Application granted granted Critical
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2012166492A 2012-07-27 2012-07-27 電子顕微鏡および電子顕微鏡用試料保持装置 Active JP6169334B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012166492A JP6169334B2 (ja) 2012-07-27 2012-07-27 電子顕微鏡および電子顕微鏡用試料保持装置
CN201380039786.1A CN104685603B (zh) 2012-07-27 2013-06-19 电子显微镜及电子显微镜用试样保持装置
PCT/JP2013/066776 WO2014017225A1 (ja) 2012-07-27 2013-06-19 電子顕微鏡および電子顕微鏡用試料保持装置
DE112013003328.3T DE112013003328B4 (de) 2012-07-27 2013-06-19 Elektronenmikroskop und Elektronenmikroskop-Probenhalter
US14/417,345 US9378922B2 (en) 2012-07-27 2013-06-19 Electron microscope and electron microscope sample retaining device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012166492A JP6169334B2 (ja) 2012-07-27 2012-07-27 電子顕微鏡および電子顕微鏡用試料保持装置

Publications (3)

Publication Number Publication Date
JP2014026840A JP2014026840A (ja) 2014-02-06
JP2014026840A5 JP2014026840A5 (enExample) 2015-04-16
JP6169334B2 true JP6169334B2 (ja) 2017-07-26

Family

ID=49997042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012166492A Active JP6169334B2 (ja) 2012-07-27 2012-07-27 電子顕微鏡および電子顕微鏡用試料保持装置

Country Status (5)

Country Link
US (1) US9378922B2 (enExample)
JP (1) JP6169334B2 (enExample)
CN (1) CN104685603B (enExample)
DE (1) DE112013003328B4 (enExample)
WO (1) WO2014017225A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI546841B (zh) * 2014-12-10 2016-08-21 財團法人工業技術研究院 具有載台的電子顯微鏡
WO2016183443A1 (en) * 2015-05-13 2016-11-17 Protochips, Inc. Method for enabling modular part replacement within an electron microscope sample holder
CN107473179B (zh) * 2016-06-08 2019-04-23 清华大学 一种表征二维纳米材料的方法
WO2019010390A1 (en) * 2017-07-06 2019-01-10 Protochips, Inc. ELECTRONIC MICROSCOPE SAMPLE HOLDER FLUID MANAGEMENT WITH INDEPENDENT PRESSURE AND FLOW CONTROL
WO2021070338A1 (ja) * 2019-10-10 2021-04-15 株式会社日立ハイテク 荷電粒子線装置
US20240186103A1 (en) * 2021-04-13 2024-06-06 Hitachi High-Tech Corporation Transmission Electron Microscope
JP7407771B2 (ja) * 2021-06-21 2024-01-04 日本電子株式会社 電子ビーム検査装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51267Y2 (enExample) 1971-05-28 1976-01-07
JPH051267A (ja) 1991-06-27 1993-01-08 Minnesota Mining & Mfg Co <3M> 耐熱性の優れたゴム系接着剤組成物
JP2781320B2 (ja) * 1993-01-18 1998-07-30 株式会社蛋白工学研究所 電子顕微鏡等の試料ホルダ
JPH10206748A (ja) 1997-01-17 1998-08-07 Daiichi Seimitsu Kk 顕微鏡のステージ設置用キャピラリユニット並びにキャピラリユニットを具えた顕微鏡用ステージ並びにキャピラリユニットを具えた顕微鏡
JP2003187735A (ja) 2001-12-18 2003-07-04 Jeol Ltd 試料ホルダ
EP1722397A1 (en) * 2005-05-09 2006-11-15 Lee, Bing-Huan Device for operating with gas in vacuum or low-pressure environment of electron microscopes and for observation of the operation
WO2008141147A1 (en) 2007-05-09 2008-11-20 Protochips, Inc. Microscopy support structures
JP5284699B2 (ja) * 2008-03-17 2013-09-11 日本電子株式会社 電子顕微鏡の試料装置
JP5226378B2 (ja) * 2008-04-28 2013-07-03 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡、及び試料観察方法
US8059271B2 (en) * 2009-02-04 2011-11-15 The United States Of America As Represented By The Secretary Of The Army Reusable sample holding device permitting ready loading of very small wet samples
JP5124507B2 (ja) * 2009-02-16 2013-01-23 株式会社日立ハイテクノロジーズ 電子線装置および電子線装置用試料保持装置
JP5119224B2 (ja) * 2009-09-04 2013-01-16 株式会社日立ハイテクノロジーズ 電子線装置及び電子線装置用試料ホルダー
JP5442417B2 (ja) * 2009-12-14 2014-03-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5476115B2 (ja) * 2009-12-21 2014-04-23 日本電子株式会社 グリッドを用いた試料ホルダ
JP5260575B2 (ja) * 2010-02-24 2013-08-14 株式会社日立ハイテクノロジーズ 電子顕微鏡、および試料ホルダ
US8178851B2 (en) 2010-07-30 2012-05-15 E.A. Fischione Instruments, Inc. In situ holder assembly
US9679741B2 (en) * 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system

Also Published As

Publication number Publication date
DE112013003328T5 (de) 2015-03-26
DE112013003328B4 (de) 2020-02-06
CN104685603A (zh) 2015-06-03
US20150179396A1 (en) 2015-06-25
US9378922B2 (en) 2016-06-28
WO2014017225A1 (ja) 2014-01-30
CN104685603B (zh) 2016-11-16
JP2014026840A (ja) 2014-02-06

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