CN104480440A - 小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备 - Google Patents

小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备 Download PDF

Info

Publication number
CN104480440A
CN104480440A CN201410612086.3A CN201410612086A CN104480440A CN 104480440 A CN104480440 A CN 104480440A CN 201410612086 A CN201410612086 A CN 201410612086A CN 104480440 A CN104480440 A CN 104480440A
Authority
CN
China
Prior art keywords
small size
film plating
magnetic body
iron boron
neodymium iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410612086.3A
Other languages
English (en)
Inventor
彭众杰
杨昆昆
贾道宁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yantai Shougang Magnetic Materials Inc
Original Assignee
Yantai Shougang Magnetic Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yantai Shougang Magnetic Materials Inc filed Critical Yantai Shougang Magnetic Materials Inc
Priority to CN201410612086.3A priority Critical patent/CN104480440A/zh
Publication of CN104480440A publication Critical patent/CN104480440A/zh
Priority to JP2015209944A priority patent/JP2016089271A/ja
Priority to EP15192897.5A priority patent/EP3020848B1/en
Priority to US14/933,516 priority patent/US10208376B2/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment

Abstract

本发明公开了一种小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备，将小尺寸钕铁硼磁体试样与钢珠一起放入专用真空镀膜设备的滚筒中，抽真空至6-9×10-3pa，开启滚筒转动并继续抽真空至3-6×10-3pa后，通入氩气至真空度为3-6×10-1pa后，开启靶源，开始真空镀膜；专用镀膜设备炉体结构为卧式，真空炉体内装有网状滚筒，滚筒的一端固定在后炉壁上并由转轴带动，靶源分别设定在炉体两侧，靶面对准滚筒；此种镀膜方法的特点是无污染，对磁体无损伤，专用镀膜设备结构简单，对试样形状限定小，镀膜效率高；主要用于小尺寸钕铁硼磁体表面金属防腐膜层的制备。

Description

小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备
技术领域：
本发明主要涉及钕铁硼磁体表面防腐技术领域，具体地讲是小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备。
背景技术：
钕铁硼磁体由于富钕相和Nd2Fe14B相之间电位差的存在，以及钕铁硼磁体的吸氢作用使得其极易发生腐蚀，一般采用在钕铁硼磁体表面制备防腐膜层的方式对其进行防腐，常见的钕铁硼磁体表面防腐膜层的制备方式有电泳、喷涂、真空镀膜和电镀。
目前对于小尺寸钕铁硼磁体，由于难以采用普通夹具快速固定磁体试样的原因，一般均采用滚动电镀或滚动喷涂的方式在其表面生成一层防腐膜层，但电镀中酸、碱的存在会对磁体产生损伤，喷涂过程会对人体和环境造成一定的损害。
目前，在一些颗粒状的金属和非金属零件上，有利用斜卧式磁控多弧离子镀膜机内安装滚筒的方式进行的镀膜的实例，但炉体结构复杂，对试样形状要求较严且在钕铁硼真空镀膜领域并未应用。
发明内容：
本发明的目的是克服上述已有技术的不足，而提供一种小尺寸钕铁硼磁体表面真空镀膜方法。
本发明的另一目的提供一种小尺寸钕铁硼磁体表面真空镀膜的专用镀膜设备。
本发明主要解决现有的小尺寸钕铁硼磁体表面难以进行真空镀膜的问题。
本发明的技术方案是：小尺寸钕铁硼磁体表面真空镀膜方法，其特殊之处在于，包括如下工艺步骤：将脱脂酸洗后的小尺寸钕铁硼磁体试样与钢珠一起放入专用镀膜设备的滚筒中，关闭炉门抽真空至6-9×10-3pa后，开启滚筒转动使钢珠与磁体混合均匀，滚筒转速为5-20r/min，继续抽真空至3-6×10-3pa后，打开氩气至真空度为3-6×10-1pa后，打开靶源，开始镀膜。
进一步的，所述的小尺寸钕铁硼磁体试样的尺寸范围为厚度、长度和宽度方向均小于15mm，且三个方向的尺寸差异小于10mm。
进一步的，所述的钢珠大小为Φ2mm-Φ6mm，钢珠的重量为小尺寸钕铁硼磁体试样重量的0.25-1.5倍。
进一步的，所述的镀膜方式为多弧离子镀或磁控溅射。
本发明的专用镀膜设备，主体结构为卧式，它包括圆筒形炉壁，圆筒形炉壁一端设后炉壁，形成炉体，炉体下设底架，其特殊之处在于，在圆筒形炉壁上设氩气进气口和真空系统抽气口，圆筒形炉壁的另一端设炉门，炉门上设观察窗；在后炉壁上的转轴上固定滚筒，滚筒为网状，一端密闭，滚筒由后炉壁上的转轴带动旋转，滚筒内壁上设搅拌片，在圆筒形炉壁上设左靶源和右靶源，二者相对应，靶面正对滚筒。
进一步的，所述的搅拌片为等腰三角形或梯形。
本发明所述的小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备与现有技术对比具有突出的实质性特点和显著进步，1、本发明采用将钕铁硼磁体与钢珠混合的方式表面真空镀膜与现有的钕铁硼磁体的电镀和喷涂镀膜相比，对钕铁硼基体损伤小，对人体和环境危害小；2、专用镀膜装置与其它真空滚镀设备相比，结构简单，对样件的形状要求低，镀膜效率高。
附图说明：
图1是本发明的专用镀膜设备的正视结构示意图；
图2是图1的侧视图；
图3是本发明的实施例1中所镀试样外观图；
图4是本发明的实施例1中所镀试样膜层厚度图。
图面说明：
1真空系统抽气口、2转轴、3滚筒、4搅拌片、5左靶源、6右靶源、7观察窗、8氩气进气口、9圆筒形炉壁、10后炉壁、11炉门、12底架。
具体实施方式：
为了更好的理解此发明，下面结合实施案例来解释说明此发明，所举实施例仅用于解释本发明，并非用于限制本发明的范围。
实施例1，参见图1、2，根据设计需要，加工制成圆筒形炉壁9和后炉壁10，圆筒形炉壁9上有氩气进气口８和真空系统抽气口1，在圆筒形炉壁9一端固定后炉壁10，形成炉体，在圆筒形炉壁9的另一端安装炉门11，炉门11上安装观察窗7；在后炉壁10上的转轴2上固定滚筒3，滚筒3为网状不锈钢滚筒，一端密闭，滚筒3由后炉壁10上的转轴2带动旋转，在滚筒3内壁上安装搅拌片4，搅拌片4为等腰三角形或梯形，滚筒3靠近炉门11一端有可开关的圆形开口，钕铁硼磁体样件和钢珠可由此圆形开口处倒入或取出；在圆筒形炉壁9的左侧和右侧各安装两个左靶源5和两个右靶源6，左靶源5与右靶源6相对应，靶面正对滚筒3；在炉体下安装底架12，炉体结构为卧式；形成本发明的专用镀膜设备。
将2kg尺寸为（7mm×1.46mm×0.85mm）的小片钕铁硼磁体和3kg直径为2mm的钢珠一起放入滚筒中，抽真空至8.5-9×10-3pa后，开启滚筒转动，使滚筒处于滚动状态且转速维持在20r/min，滚筒中的搅拌片会使试样一直处于均匀的翻动状态；继续抽真空至3-3.5×10-3pa后，开启氩气进气阀至真空度为5.5-6×10-1pa后，开启安装有铝靶材的多弧离子靶源，设定电压大小为20V，电流大小为60A，开始镀铝膜，镀膜30min后关闭靶源开始冷却。
对上述实施例1制备的钕铁硼磁体铝膜进行表面观察，所得结果如图3所示，图片上可以看出试样表面铝膜层光亮，洁净；对实例1所得试样，利用光学显微镜观察截面，测量铝膜层厚度，结果如图4所示，图中所示铝膜层厚度均匀。
实施例2，采用同实施例1的专用镀膜设备，将2kg尺寸为（8mm×6mm×8mm）的小片钕铁硼磁体和0.5kg直径为6mm的钢珠一起放入滚筒中，抽真空至6 -6.5×10-3pa后，开启滚筒转动，使滚筒处于滚动状态且转速维持在5r/min，滚筒中的搅拌片会使试样一直处于均匀的翻动状态；继续抽真空至5.5-6×10-3pa后，开启氩气进气阀至真空度为3-3.5×10-1pa后，开启安装有铝靶材的多弧离子靶源，设定电压大小为20V，电流大小为60A，开始镀铝膜，镀膜60min后关闭靶源开始冷却。
本发明的钕铁硼磁体表面的真空镀膜方法和专用镀膜设备，可用于制备的金属膜层包括铝膜层、铜膜层、钛膜层、镝膜层、铽膜层、钕膜层或其合金膜层。

Claims (6)

1.小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，包括如下工艺步骤：将脱脂酸洗后的小尺寸钕铁硼磁体试样与钢珠一起放入专用镀膜设备的滚筒中，关闭炉门抽真空至6-9×10-3pa后，开启滚筒转动使钢珠与磁体混合均匀，滚筒转速为5-20r/min，继续抽真空至3-6×10-3pa后，打开氩气至真空度为3-6×10-1pa后，打开靶源，开始镀膜。
2.根据权利要求1所述的小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，所述的小尺寸钕铁硼磁体试样的尺寸范围为厚度、长度和宽度方向均小于15mm，且三个方向的尺寸差异小于10mm。
3.根据权利要求1所述的小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，所述的钢珠大小为Φ2mm-Φ6mm，钢珠的重量为小尺寸钕铁硼磁体试样重量的0.25-1.5倍。
4.根据权利要求1所述的小尺寸钕铁硼磁体表面真空镀膜方法，其特征在于，所述的镀膜方式为多弧离子镀或磁控溅射。
5.实现权利要求1－4的任一小尺寸钕铁硼磁体表面真空镀膜方法的专用镀膜设备，主体结构为卧式，它包括圆筒形炉壁（9），圆筒形炉壁（9）一端设后炉壁（10），形成炉体，炉体下设底架（12），其特征在于，在圆筒形炉壁（9）上设氩气进气口（８）和真空系统抽气口（1），圆筒形炉壁（9）的另一端设炉门（11），炉门（11）上设观察窗（7）；在后炉壁（10）上的转轴（2）上固定滚筒（3），滚筒（3）为网状，一端密闭，滚筒（3）由后炉壁（10）上的转轴（2）带动旋转，滚筒（3）内壁上设搅拌片（4），在圆筒形炉壁（9）上设左靶源（5）和右靶源（6），二者相对应，靶面正对滚筒（3）。
6.根据权利要求5所述的小尺寸钕铁硼磁体表面真空镀膜方法的专用镀膜设备，其特征在于，所述的搅拌片（4）为等腰三角形或梯形。
CN201410612086.3A 2014-11-05 2014-11-05 小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备 Pending CN104480440A (zh)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201410612086.3A CN104480440A (zh) 2014-11-05 2014-11-05 小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备
JP2015209944A JP2016089271A (ja) 2014-11-05 2015-10-26 ネオジム鉄ボロン系磁石の表面真空コーティング方法及び真空コーティング装置
EP15192897.5A EP3020848B1 (en) 2014-11-05 2015-11-04 A vacuum coating device for surface coating of small sized nd-fe-b magnets and a corresponding vacuum coating method
US14/933,516 US10208376B2 (en) 2014-11-05 2015-11-05 Apparatus and method for coating of small Nd-Fe-B magnets

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410612086.3A CN104480440A (zh) 2014-11-05 2014-11-05 小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备

Publications (1)

Publication Number Publication Date
CN104480440A true CN104480440A (zh) 2015-04-01

Family

ID=52755039

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410612086.3A Pending CN104480440A (zh) 2014-11-05 2014-11-05 小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备

Country Status (4)

Country Link
US (1) US10208376B2 (zh)
EP (1) EP3020848B1 (zh)
JP (1) JP2016089271A (zh)
CN (1) CN104480440A (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105185498A (zh) * 2015-08-28 2015-12-23 包头天和磁材技术有限责任公司 稀土永磁材料及其制造方法
CN105301358A (zh) * 2015-11-09 2016-02-03 上海卫星装备研究所 用于真空卷绕镀膜设备上的膜层电阻在线检测装置
CN105821381A (zh) * 2016-04-20 2016-08-03 爱发科东方真空(成都)有限公司 磁性材料真空镀膜装置
CN108774730A (zh) * 2018-09-05 2018-11-09 北京丹鹏表面技术研究中心 一种用于真空镀膜的可移出式滚筒装置
CN109750261A (zh) * 2018-12-01 2019-05-14 温州职业技术学院 一种基于多个回转滚筒的真空镀膜装置
CN114481047A (zh) * 2022-01-26 2022-05-13 广东省新兴激光等离子体技术研究院 小尺寸工件镀膜装置、真空镀膜机及其镀膜方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106086790B (zh) * 2016-06-08 2018-10-12 宁波威霖住宅设施有限公司 一种锌合金仿古铜真空镀膜方法
CN107937879B (zh) * 2017-11-30 2020-08-25 金力永磁(宁波)科技有限公司 一种钕铁硼磁体及钕铁硼磁体表面镀层的方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6149785A (en) * 1996-04-03 2000-11-21 The Regents Of The University Of California Apparatus for coating powders
CN1718845A (zh) * 2005-07-26 2006-01-11 北京航空航天大学 微颗粒表面真空镀金属膜工艺及其设备
CN101805893A (zh) * 2010-03-22 2010-08-18 北京航空航天大学 滚筒式样品台以及用其进行粉体颗粒的磁控溅射镀膜方法
CN103160795A (zh) * 2011-12-19 2013-06-19 北京有色金属研究总院 用于粉体颗粒表面镀膜的对靶磁控溅射装置及镀膜方法
CN103820765A (zh) * 2014-03-22 2014-05-28 沈阳中北真空设备有限公司 一种钕铁硼稀土永磁器件的复合镀膜设备及制造方法
CN204198844U (zh) * 2014-11-05 2015-03-11 烟台首钢磁性材料股份有限公司 小尺寸钕铁硼磁体表面真空镀膜设备

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0644007A (ja) 1992-07-24 1994-02-18 Oki Electric Ind Co Ltd ポインティングデバイスカーソルの移動制御方法
JPH0644007U (ja) * 1992-11-12 1994-06-10 日新電機株式会社 イオン注入装置
JPH09108654A (ja) * 1995-10-16 1997-04-28 Nisshin Steel Co Ltd 浄水用活性炭
EP0969483A4 (en) * 1998-01-23 2002-06-05 Hitachi Metals Ltd BOUND MAGNET, MAGNETIC COIL AND POWDER FERRITE FOR USE IN THEIR PREPARATION AND THEIR PRODUCTION PROCESS
JP3192642B2 (ja) 1998-10-02 2001-07-30 住友特殊金属株式会社 表面処理用支持部材、表面処理用ホルダー、並びに表面処理方法
JP2000133541A (ja) * 1998-10-23 2000-05-12 Sumitomo Special Metals Co Ltd 高耐食性Ｒ−Ｆｅ−Ｂ系ボンド磁石の製造方法
JP2000269016A (ja) * 1999-03-18 2000-09-29 Namiki Precision Jewel Co Ltd 磁性材料粉末の表面処理方法
JP3801418B2 (ja) 1999-05-14 2006-07-26 株式会社Ｎｅｏｍａｘ 表面処理方法
JP2001073198A (ja) 1999-07-01 2001-03-21 Sumitomo Special Metals Co Ltd 電気めっき用装置および該装置を用いた電気めっき方法
EP1136587B1 (en) 2000-03-23 2013-05-15 Hitachi Metals, Ltd. Deposited-film forming apparatus
JP4560971B2 (ja) 2000-03-23 2010-10-13 日立金属株式会社 蒸着被膜形成装置
MY128139A (en) 2000-03-31 2007-01-31 Neomax Co Ltd Blasting apparatus
CN1193115C (zh) 2000-07-07 2005-03-16 日立金属株式会社 电镀铜的r－t－b系磁铁及其电镀方法和电镀铜液
CN1273639C (zh) 2000-07-10 2006-09-06 株式会社新王磁材 阻止在金属沉积薄膜上产生凸起的方法
JP4715047B2 (ja) * 2000-07-10 2011-07-06 日立金属株式会社 金属蒸着被膜における突起物生成の抑制方法
JP4774638B2 (ja) * 2000-07-13 2011-09-14 日立金属株式会社 乾式表面処理用装置およびこの装置を用いた乾式表面処理方法
DE60106527T2 (de) * 2000-07-13 2005-02-24 Neomax Co., Ltd. Vorrichtung zur trockenen Oberflächenbehandlung und Verfahren zur trockenen Oberflächenbehanlung mit dieser Vorrichtung
JP2003100537A (ja) 2001-09-27 2003-04-04 Sumitomo Special Metals Co Ltd 希土類系永久磁石の製造方法
JP3897724B2 (ja) 2003-03-31 2007-03-28 独立行政法人科学技術振興機構 超小型製品用の微小、高性能焼結希土類磁石の製造方法
KR20040052533A (ko) 2004-02-19 2004-06-23 황운학 탄소강에 질화티타늄 박막제조시, 복합 grain(TiNx)의표면밀도를 이용한 최대미소경도 박막 제조 방법
KR100701267B1 (ko) 2005-11-18 2007-03-29 한국생산기술연구원 저전류 구동형 펄스 아크 발생장치
CN101443862B (zh) 2006-03-31 2011-08-31 日立金属株式会社 稀土类永久磁铁的制造方法
CN101681712B (zh) 2007-05-09 2012-05-30 日立金属株式会社 表面具有铝或其合金的蒸镀被膜的R-Fe-B系烧结磁铁和其制造方法
JP5056267B2 (ja) 2007-08-24 2012-10-24 日立金属株式会社 Ｍｇを含むＡｌ被膜を表面に有する希土類系永久磁石およびその製造方法
CN100582290C (zh) 2008-01-28 2010-01-20 河南理工大学 钕铁硼磁体表面磁控电弧离子镀不锈钢防护层的方法
CN102144267B (zh) 2008-07-30 2013-04-03 日立金属株式会社 耐腐蚀性磁铁及其制造方法
JP5381577B2 (ja) 2009-09-30 2014-01-08 日立金属株式会社 耐食性Ｒ−Ｆｅ−Ｂ系焼結磁石の製造方法
JP5423438B2 (ja) 2010-01-29 2014-02-19 日立金属株式会社 蒸着形成される金属被膜の緻密性を向上させる方法
JP5691226B2 (ja) * 2010-03-31 2015-04-01 日立金属株式会社 表面にアルミニウムまたはその合金の蒸着被膜を有する希土類系永久磁石の製造方法
US8480815B2 (en) * 2011-01-14 2013-07-09 GM Global Technology Operations LLC Method of making Nd-Fe-B sintered magnets with Dy or Tb
CN103839641B (zh) * 2014-03-22 2016-10-05 沈阳中北真空设备有限公司 一种钕铁硼稀土永磁器件的混合镀膜设备及制造方法
CN103854819B (zh) 2014-03-22 2016-10-05 沈阳中北通磁科技股份有限公司 一种钕铁硼稀土永磁器件的混合镀膜方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6149785A (en) * 1996-04-03 2000-11-21 The Regents Of The University Of California Apparatus for coating powders
CN1718845A (zh) * 2005-07-26 2006-01-11 北京航空航天大学 微颗粒表面真空镀金属膜工艺及其设备
CN101805893A (zh) * 2010-03-22 2010-08-18 北京航空航天大学 滚筒式样品台以及用其进行粉体颗粒的磁控溅射镀膜方法
CN103160795A (zh) * 2011-12-19 2013-06-19 北京有色金属研究总院 用于粉体颗粒表面镀膜的对靶磁控溅射装置及镀膜方法
CN103820765A (zh) * 2014-03-22 2014-05-28 沈阳中北真空设备有限公司 一种钕铁硼稀土永磁器件的复合镀膜设备及制造方法
CN204198844U (zh) * 2014-11-05 2015-03-11 烟台首钢磁性材料股份有限公司 小尺寸钕铁硼磁体表面真空镀膜设备

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105185498A (zh) * 2015-08-28 2015-12-23 包头天和磁材技术有限责任公司 稀土永磁材料及其制造方法
CN105185498B (zh) * 2015-08-28 2017-09-01 包头天和磁材技术有限责任公司 稀土永磁材料及其制造方法
US10867727B2 (en) 2015-08-28 2020-12-15 Baotou Tianhe Magnetics Technology Co., Ltd. Rare earth permanent magnet material and manufacturing method thereof
CN105301358A (zh) * 2015-11-09 2016-02-03 上海卫星装备研究所 用于真空卷绕镀膜设备上的膜层电阻在线检测装置
CN105821381A (zh) * 2016-04-20 2016-08-03 爱发科东方真空(成都)有限公司 磁性材料真空镀膜装置
CN108774730A (zh) * 2018-09-05 2018-11-09 北京丹鹏表面技术研究中心 一种用于真空镀膜的可移出式滚筒装置
CN108774730B (zh) * 2018-09-05 2024-03-15 北京丹普表面技术有限公司 一种用于真空镀膜的可移出式滚筒装置
CN109750261A (zh) * 2018-12-01 2019-05-14 温州职业技术学院 一种基于多个回转滚筒的真空镀膜装置
CN114481047A (zh) * 2022-01-26 2022-05-13 广东省新兴激光等离子体技术研究院 小尺寸工件镀膜装置、真空镀膜机及其镀膜方法

Also Published As

Publication number Publication date
US20160122864A1 (en) 2016-05-05
JP2016089271A (ja) 2016-05-23
US10208376B2 (en) 2019-02-19
EP3020848A1 (en) 2016-05-18
EP3020848B1 (en) 2018-07-11

Similar Documents

Publication Publication Date Title
CN104480440A (zh) 小尺寸钕铁硼磁体表面真空镀膜方法及专用镀膜设备
Mao et al. Corrosion behaviour of sintered NdFeB deposited with an aluminium coating
CN104651783A (zh) 一种永磁钕铁硼磁钢表面镀铝的方法
CN103710739B (zh) 烧结钕铁硼永磁体表面陶瓷涂层的制备方法
CN104599829A (zh) 一种提高烧结钕铁硼磁体磁性能的方法
CN103820765A (zh) 一种钕铁硼稀土永磁器件的复合镀膜设备及制造方法
CN204198844U (zh) 小尺寸钕铁硼磁体表面真空镀膜设备
JP2016089270A (ja) ネオジム鉄ボロン系磁石表面への硬質アルミニウム被膜の形成方法、及び当該硬質アルミニウム被膜を有するネオジム鉄ボロン系磁石
CN102808168B (zh) 一种微弧氧化多孔膜改性镁基表面室温化学镀镍的方法
EP3057119B1 (en) Coating apparatus and coating process for ndfeb magnets
CN103839641A (zh) 一种钕铁硼稀土永磁器件的混合镀膜设备及制造方法
Tao et al. Anti-corrosion performance of Si-surface-alloying NdFeB magnets obtained with magnetron sputtering and thermal diffusion
CN103643098A (zh) 一种稀土元素合金化的耐蚀性变形镁合金及制备方法
WO2021143086A1 (zh) 一种可同时提高NdFeB粉末和磁体的抗氧化腐蚀性的方法
CN106756876B (zh) 镁合金亲/超疏水区域可控复合膜的制备方法
Hu et al. Effect of grain boundary diffusion in TbF3-Al mixed electrophoresis on properties of sintered Nd-Fe-B magnets
CN109473247A (zh) 一种钕铁硼晶界渗透合金铸片的制备方法
CN201793721U (zh) 真空电子枪镀膜机
CN110983334A (zh) 一种钕铁硼磁体复合镀镍方法
CN104267021A (zh) 辉光光谱仪合金试样及其制样方法
CN204474746U (zh) 一种用于钕铁硼磁体的镀膜设备
CN110484887A (zh) 一种稀土永磁体表面快速真空镀铝方法
KR20110117528A (ko) 알루미늄 박막 코팅 방법
CN201538810U (zh) 铝合金表面氧化处理装置
CN105970181B (zh) 增强型磁控溅射卷绕镀膜设备及方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20150401