CN104347355B - 试验装置、试验方法 - Google Patents

试验装置、试验方法 Download PDF

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Publication number
CN104347355B
CN104347355B CN201410389845.4A CN201410389845A CN104347355B CN 104347355 B CN104347355 B CN 104347355B CN 201410389845 A CN201410389845 A CN 201410389845A CN 104347355 B CN104347355 B CN 104347355B
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China
Prior art keywords
slope
foreign matter
semiconductor chip
test device
test
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CN201410389845.4A
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English (en)
Chinese (zh)
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CN104347355A (zh
Inventor
冈田章
野口贵也
竹迫宪浩
山下钦也
秋山肇
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Publication of CN104347355A publication Critical patent/CN104347355A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02076—Cleaning after the substrates have been singulated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Dicing (AREA)
CN201410389845.4A 2013-08-08 2014-08-08 试验装置、试验方法 Active CN104347355B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-165108 2013-08-08
JP2013165108A JP6064831B2 (ja) 2013-08-08 2013-08-08 試験装置、試験方法

Publications (2)

Publication Number Publication Date
CN104347355A CN104347355A (zh) 2015-02-11
CN104347355B true CN104347355B (zh) 2018-06-19

Family

ID=52448988

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410389845.4A Active CN104347355B (zh) 2013-08-08 2014-08-08 试验装置、试验方法

Country Status (3)

Country Link
US (1) US8980655B2 (enExample)
JP (1) JP6064831B2 (enExample)
CN (1) CN104347355B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI614840B (zh) * 2016-10-14 2018-02-11 電子元件之移載裝置及其應用之測試設備
CN111837299B (zh) * 2018-03-15 2023-08-08 三菱电机株式会社 半导体模块及其制造方法
KR102093641B1 (ko) * 2018-06-22 2020-04-23 주식회사 로보스타 파티클제거팁 및 그것을 이용한 인덱스형 파티클 제거장치
KR102653165B1 (ko) * 2018-11-22 2024-04-01 삼성전자주식회사 반도체 장치, 반도체 칩 및 반도체 기판의 반도체 기판의 소잉 방법
CN113608107B (zh) * 2021-08-06 2024-05-10 深圳市鸿发鑫科技有限公司 具有双通道的电路板测试设备

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CN101752222A (zh) * 2008-12-15 2010-06-23 东京毅力科创株式会社 异物除去装置和异物除去方法

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JPS61172337A (ja) * 1985-01-26 1986-08-04 Nec Kansai Ltd 異物除去方法
JPH01171235A (ja) * 1987-12-25 1989-07-06 Tokyo Electron Ltd テープキャリヤの検査方法
JPH04206848A (ja) 1990-11-30 1992-07-28 Mitsubishi Electric Corp 半導体評価装置
JP2895328B2 (ja) * 1992-10-13 1999-05-24 ローム株式会社 半導体装置の製法
JPH0794563A (ja) 1993-09-20 1995-04-07 Fujitsu Ltd 半導体基板の異物除去装置
JPH07159487A (ja) * 1993-12-07 1995-06-23 Mitsubishi Electric Corp 半導体試験装置及び半導体試験方法
JPH08115931A (ja) * 1994-10-19 1996-05-07 Hitachi Ltd ペレットボンディング装置
JPH091440A (ja) * 1995-06-20 1997-01-07 Fuji Electric Co Ltd 精密加工物のバリ取り方法
US5967882A (en) * 1997-03-06 1999-10-19 Keltech Engineering Lapping apparatus and process with two opposed lapping platens
JPH10261605A (ja) 1997-03-18 1998-09-29 Toshiba Corp 半導体処理装置
TW436635B (en) * 1998-07-24 2001-05-28 Makoto Matsumura Polishing plate
JP3702668B2 (ja) * 1998-09-28 2005-10-05 株式会社村田製作所 電子部品チップ供給装置
US6267650B1 (en) * 1999-08-09 2001-07-31 Micron Technology, Inc. Apparatus and methods for substantial planarization of solder bumps
JP2001237598A (ja) * 2000-02-23 2001-08-31 Sony Corp 半導体装置の位置決め装置
JP4530966B2 (ja) 2005-10-21 2010-08-25 株式会社新川 ボンディング装置及びボンディング方法
JP2007163159A (ja) 2005-12-09 2007-06-28 Japan Electronic Materials Corp プローブのクリーニング方法及びプローブのクリーニング装置
JP4867627B2 (ja) 2006-12-05 2012-02-01 富士電機株式会社 半導体装置の製造方法
JP4312805B2 (ja) 2007-03-27 2009-08-12 Ｏｋｉセミコンダクタ株式会社 半導体製造装置とそれを用いた半導体ウェハの製造方法およびそのプログラムを記録した記録媒体
JP2009018363A (ja) * 2007-07-11 2009-01-29 Ebara Corp 研磨装置
JP2010161211A (ja) 2009-01-08 2010-07-22 Renesas Technology Corp 半導体装置の製造方法および半導体装置の製造装置
JP2010165943A (ja) 2009-01-16 2010-07-29 Renesas Electronics Corp 半導体装置の製造方法およびウェハ処理システム
JP2010245332A (ja) 2009-04-07 2010-10-28 Canon Inc 半導体露光装置
JP5889537B2 (ja) * 2011-03-23 2016-03-22 ファスフォードテクノロジ株式会社 ダイボンダ
JP5523436B2 (ja) * 2011-12-19 2014-06-18 三菱電機株式会社 半導体清浄装置および半導体清浄方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101355019A (zh) * 2007-07-26 2009-01-28 株式会社迅动 基板清洗装置及具有该基板清洗装置的基板处理装置
CN101752222A (zh) * 2008-12-15 2010-06-23 东京毅力科创株式会社 异物除去装置和异物除去方法

Also Published As

Publication number Publication date
JP6064831B2 (ja) 2017-01-25
JP2015034731A (ja) 2015-02-19
US20150044788A1 (en) 2015-02-12
CN104347355A (zh) 2015-02-11
US8980655B2 (en) 2015-03-17

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