CN104159736B - 借助于化学气相沉积的高品质大规模单层和多层石墨烯生产 - Google Patents

借助于化学气相沉积的高品质大规模单层和多层石墨烯生产 Download PDF

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CN104159736B
CN104159736B CN201380004699.2A CN201380004699A CN104159736B CN 104159736 B CN104159736 B CN 104159736B CN 201380004699 A CN201380004699 A CN 201380004699A CN 104159736 B CN104159736 B CN 104159736B
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graphene
chemical vapor
vapor deposition
torr
substrate
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CN104159736A (zh
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I.V.弗拉西欧克
S.N.斯米尔诺夫
W.H.彼得
A.S.萨包
S.戴
P.F.富尔维奥
I.N.伊娃诺夫
N.V.拉夫里克
P.G.达茨科斯
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UT Battelle LLC
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2204/00—Structure or properties of graphene
    • C01B2204/02—Single layer graphene
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2204/00—Structure or properties of graphene
    • C01B2204/04—Specific amount of layers or specific thickness
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2204/00—Structure or properties of graphene
    • C01B2204/20—Graphene characterized by its properties
    • C01B2204/32—Size or surface area
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Composite Materials (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
CN201380004699.2A 2012-01-06 2013-01-04 借助于化学气相沉积的高品质大规模单层和多层石墨烯生产 Expired - Fee Related CN104159736B (zh)

Applications Claiming Priority (4)

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US201261583638P 2012-01-06 2012-01-06
US61/583638 2012-01-06
US61/583,638 2012-01-06
PCT/US2013/020378 WO2013103886A1 (en) 2012-01-06 2013-01-04 High quality large scale single and multilayer graphene production by chemical vapor deposition

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CN104159736A CN104159736A (zh) 2014-11-19
CN104159736B true CN104159736B (zh) 2016-11-09

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US (1) US10023468B2 (enExample)
JP (1) JP6355561B2 (enExample)
KR (1) KR102088540B1 (enExample)
CN (1) CN104159736B (enExample)
DE (1) DE112013000502T5 (enExample)
GB (1) GB2516372B (enExample)
WO (1) WO2013103886A1 (enExample)

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JP6855687B2 (ja) * 2015-07-29 2021-04-07 東京エレクトロン株式会社 基板処理装置、基板処理方法及び基板処理装置のメンテナンス方法及び記憶媒体
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CN109437169B (zh) * 2018-12-04 2020-06-23 中国电子科技集团公司第十三研究所 制备超低褶皱密度石墨烯材料的方法
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KR20140128952A (ko) 2014-11-06
GB201411990D0 (en) 2014-08-20
US10023468B2 (en) 2018-07-17
JP6355561B2 (ja) 2018-07-11
KR102088540B1 (ko) 2020-03-12
GB2516372B (en) 2021-01-13
WO2013103886A1 (en) 2013-07-11
JP2015507599A (ja) 2015-03-12
DE112013000502T5 (de) 2015-01-08
CN104159736A (zh) 2014-11-19
HK1203902A1 (en) 2015-11-06
GB2516372A (en) 2015-01-21
US20130174968A1 (en) 2013-07-11

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