CN103534800B - 在材料中形成断面的方法 - Google Patents

在材料中形成断面的方法 Download PDF

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Publication number
CN103534800B
CN103534800B CN201280021785.XA CN201280021785A CN103534800B CN 103534800 B CN103534800 B CN 103534800B CN 201280021785 A CN201280021785 A CN 201280021785A CN 103534800 B CN103534800 B CN 103534800B
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China
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substrate
lithium
donor substrate
hydrogen
implantation
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Chinese (zh)
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CN103534800A (zh
Inventor
欧拉丽·陶森
弗雷德里克·马曾
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Recrystallisation Techniques (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
CN201280021785.XA 2011-05-02 2012-04-27 在材料中形成断面的方法 Active CN103534800B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1153737 2011-05-02
FR1153737A FR2974944B1 (fr) 2011-05-02 2011-05-02 Procédé de formation d'une fracture dans un matériau
PCT/EP2012/057713 WO2012150184A1 (fr) 2011-05-02 2012-04-27 Procede de formation d'une fracture dans un materiau

Publications (2)

Publication Number Publication Date
CN103534800A CN103534800A (zh) 2014-01-22
CN103534800B true CN103534800B (zh) 2016-12-07

Family

ID=44262789

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280021785.XA Active CN103534800B (zh) 2011-05-02 2012-04-27 在材料中形成断面的方法

Country Status (8)

Country Link
US (1) US9105688B2 (enExample)
EP (1) EP2705529B1 (enExample)
JP (1) JP6019106B2 (enExample)
KR (1) KR101913174B1 (enExample)
CN (1) CN103534800B (enExample)
FR (1) FR2974944B1 (enExample)
SG (1) SG194748A1 (enExample)
WO (1) WO2012150184A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102212296B1 (ko) * 2014-01-23 2021-02-04 글로벌웨이퍼스 씨오., 엘티디. 고 비저항 soi 웨이퍼 및 그 제조 방법
TW201603193A (zh) * 2014-06-19 2016-01-16 Gtat公司 增強用於離子佈植的施體基板的發射性
FR3043248B1 (fr) * 2015-10-30 2017-12-15 Commissariat Energie Atomique Procede d'elimination de defauts dans un film semiconducteur comprenant la formation d'une couche de piegeage d'hydrogene
JP6632462B2 (ja) * 2016-04-28 2020-01-22 信越化学工業株式会社 複合ウェーハの製造方法
FR3079658B1 (fr) * 2018-03-28 2021-12-17 Soitec Silicon On Insulator Procede de detection de la fracture d'un substrat fragilise par implantation d'especes atomiques
FR3091000B1 (fr) * 2018-12-24 2020-12-04 Soitec Silicon On Insulator Procede de fabrication d’un substrat pour un capteur d’image de type face avant
FR3091620B1 (fr) * 2019-01-07 2021-01-29 Commissariat Energie Atomique Procédé de transfert de couche avec réduction localisée d’une capacité à initier une fracture
FR3091619B1 (fr) 2019-01-07 2021-01-29 Commissariat Energie Atomique Procédé de guérison avant transfert d’une couche semi-conductrice
FR3094573B1 (fr) * 2019-03-29 2021-08-13 Soitec Silicon On Insulator Procede de preparation d’une couche mince de materiau ferroelectrique
CN110341291B (zh) * 2019-08-16 2021-04-06 江阴市合助机械科技有限公司 一种复合板材自动剥离方法
CN113311309B (zh) * 2021-07-30 2021-10-12 度亘激光技术（苏州）有限公司 半导体结构的覆盖层剥除方法及半导体结构失效分析方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6544862B1 (en) * 2000-01-14 2003-04-08 Silicon Genesis Corporation Particle distribution method and resulting structure for a layer transfer process
US20050181210A1 (en) * 2004-02-13 2005-08-18 Doering Patrick J. Diamond structure separation
CN1708843A (zh) * 2002-11-07 2005-12-14 S.O.I.泰克绝缘体硅技术公司 在共注入后在中等温度下分离薄膜的方法
CN101449369A (zh) * 2006-03-29 2009-06-03 原子能委员会 通过熔化析出物拆分薄膜的方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE504916C2 (sv) 1995-01-18 1997-05-26 Ericsson Telefon Ab L M Förfarande för att åstadkomma en ohmsk kontakt jämte halvledarkomponent försedd med dylik ohmsk kontakt
US7456080B2 (en) * 2005-12-19 2008-11-25 Corning Incorporated Semiconductor on glass insulator made using improved ion implantation process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6544862B1 (en) * 2000-01-14 2003-04-08 Silicon Genesis Corporation Particle distribution method and resulting structure for a layer transfer process
CN1708843A (zh) * 2002-11-07 2005-12-14 S.O.I.泰克绝缘体硅技术公司 在共注入后在中等温度下分离薄膜的方法
US20050181210A1 (en) * 2004-02-13 2005-08-18 Doering Patrick J. Diamond structure separation
CN101449369A (zh) * 2006-03-29 2009-06-03 原子能委员会 通过熔化析出物拆分薄膜的方法

Also Published As

Publication number Publication date
FR2974944B1 (fr) 2013-06-14
FR2974944A1 (fr) 2012-11-09
WO2012150184A1 (fr) 2012-11-08
US9105688B2 (en) 2015-08-11
EP2705529B1 (fr) 2015-03-11
EP2705529A1 (fr) 2014-03-12
JP6019106B2 (ja) 2016-11-02
SG194748A1 (en) 2013-12-30
KR101913174B1 (ko) 2018-10-30
KR20140040725A (ko) 2014-04-03
US20140113434A1 (en) 2014-04-24
JP2014518010A (ja) 2014-07-24
CN103534800A (zh) 2014-01-22

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