CN103502888B - 负型感光性树脂组合物、固化膜、分隔壁和黑色矩阵及其制造方法、滤色器以及有机el元件 - Google Patents

负型感光性树脂组合物、固化膜、分隔壁和黑色矩阵及其制造方法、滤色器以及有机el元件 Download PDF

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CN103502888B
CN103502888B CN201280020872.3A CN201280020872A CN103502888B CN 103502888 B CN103502888 B CN 103502888B CN 201280020872 A CN201280020872 A CN 201280020872A CN 103502888 B CN103502888 B CN 103502888B
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group
sensitive resin
resin combination
partition wall
negative light
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CN103502888A (zh
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高桥秀幸
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AGC Inc
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Asahi Glass Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Indole Compounds (AREA)
CN201280020872.3A 2011-04-28 2012-04-19 负型感光性树脂组合物、固化膜、分隔壁和黑色矩阵及其制造方法、滤色器以及有机el元件 Active CN103502888B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-102039 2011-04-28
JP2011102039 2011-04-28
PCT/JP2012/060626 WO2012147626A1 (ja) 2011-04-28 2012-04-19 ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子

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CN103502888A CN103502888A (zh) 2014-01-08
CN103502888B true CN103502888B (zh) 2016-05-25

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JP (1) JP5910629B2 (ko)
KR (1) KR101842317B1 (ko)
CN (1) CN103502888B (ko)
TW (1) TWI522746B (ko)
WO (1) WO2012147626A1 (ko)

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JP5890297B2 (ja) * 2011-12-22 2016-03-22 東京応化工業株式会社 感光性樹脂組成物、それを用いたカラーフィルタ及び表示装置、オキシムエステル化合物、並びに光重合開始剤
CN103838084B (zh) * 2012-11-26 2020-06-16 住友化学株式会社 感光性树脂组合物
TWI613221B (zh) * 2012-11-27 2018-02-01 富士軟片股份有限公司 光硬化性組成物、轉印材料、硬化物及其製造方法、樹脂圖案製造方法、硬化膜、液晶顯示裝置、有機ｅｌ顯示裝置及觸控面板顯示裝置
KR102107962B1 (ko) * 2012-11-28 2020-05-07 에이지씨 가부시키가이샤 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자
JP5890355B2 (ja) * 2013-07-31 2016-03-22 東京応化工業株式会社 感光性樹脂組成物
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
JP6269467B2 (ja) * 2013-12-27 2018-01-31 富士フイルム株式会社 カラーフィルターの製造方法および固体撮像素子の製造方法
JP6294689B2 (ja) * 2014-02-06 2018-03-14 株式会社Adeka 光硬化性組成物
JP2015172664A (ja) * 2014-03-12 2015-10-01 株式会社タムラ製作所 感光性樹脂組成物
JP6565904B2 (ja) * 2014-04-25 2019-08-28 Ａｇｃ株式会社 ネガ型感光性樹脂組成物、隔壁、光学素子および光学素子の製造方法
JPWO2015198603A1 (ja) * 2014-06-25 2017-04-20 株式会社Ｊｏｌｅｄ 有機ｅｌ表示パネルの製造方法
CN106444282A (zh) * 2015-08-13 2017-02-22 常州强力先端电子材料有限公司 一种含肟酯类光引发剂的感光性树脂组合物及其应用
JP6421161B2 (ja) * 2015-11-27 2018-11-07 株式会社タムラ製作所 感光性樹脂組成物
TWI761230B (zh) * 2015-12-08 2022-04-11 日商富士軟片股份有限公司 感放射線性樹脂組成物、硬化膜、圖案形成方法、固體攝影元件及影像顯示裝置
KR102025359B1 (ko) * 2016-03-08 2019-09-25 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 컬럼 스페이서 및 컬러필터
CN108475019B (zh) * 2016-03-29 2022-02-11 株式会社艾迪科 黑色感光性树脂组合物
CN107325206B (zh) * 2016-04-12 2018-12-18 常州强力先端电子材料有限公司 一种含硝基咔唑肟酯类光引发剂及其制备方法和应用
KR101976660B1 (ko) * 2016-07-13 2019-05-09 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 디스플레이 장치
JP7043142B2 (ja) * 2016-09-16 2022-03-29 株式会社Adeka 硬化性組成物、硬化物及び硬化物の製造方法
KR101991699B1 (ko) * 2016-09-26 2019-06-21 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
KR102121424B1 (ko) * 2016-12-02 2020-06-10 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
TWI677761B (zh) * 2016-12-23 2019-11-21 奇美實業股份有限公司 黑色矩陣用負型感光性樹脂組成物、黑色矩陣、彩色濾光片以及液晶顯示元件
JP6845469B2 (ja) * 2017-02-27 2021-03-17 三菱ケミカル株式会社 画像表示装置用着色硬化膜、画像表示装置用感光性着色組成物及び画像表示装置
JP2018180168A (ja) * 2017-04-07 2018-11-15 ホヤ レンズ タイランド リミテッドＨＯＹＡ Ｌｅｎｓ Ｔｈａｉｌａｎｄ Ｌｔｄ 処理パターンが形成された光学部材の製造方法
JP7047642B2 (ja) * 2017-09-05 2022-04-05 Jsr株式会社 隔壁形成用感光性組成物、隔壁および表示素子
KR20190094731A (ko) * 2018-02-05 2019-08-14 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치
KR102617582B1 (ko) * 2018-03-14 2023-12-27 도레이 카부시키가이샤 네거티브형 감광성 착색 조성물, 경화막, 그것을 이용한 터치 패널
JP2019178191A (ja) * 2018-03-30 2019-10-17 東ソー株式会社 フッ素系樹脂
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Publication number Publication date
TWI522746B (zh) 2016-02-21
JPWO2012147626A1 (ja) 2014-07-28
KR20140018319A (ko) 2014-02-12
CN103502888A (zh) 2014-01-08
JP5910629B2 (ja) 2016-04-27
KR101842317B1 (ko) 2018-03-26
TW201248326A (en) 2012-12-01
WO2012147626A1 (ja) 2012-11-01

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