CN103180257B - 减少银的电迁移的方法及由其制备的制品 - Google Patents

减少银的电迁移的方法及由其制备的制品 Download PDF

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Publication number
CN103180257B
CN103180257B CN201180051725.8A CN201180051725A CN103180257B CN 103180257 B CN103180257 B CN 103180257B CN 201180051725 A CN201180051725 A CN 201180051725A CN 103180257 B CN103180257 B CN 103180257B
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CN
China
Prior art keywords
conductive member
divalent group
silver
polysilazane
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201180051725.8A
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English (en)
Chinese (zh)
Other versions
CN103180257A (zh
Inventor
S·S·伊耶
杨宇
M·J·佩尔莱特
P·V·纳加卡
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication date
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Publication of CN103180257A publication Critical patent/CN103180257A/zh
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Publication of CN103180257B publication Critical patent/CN103180257B/zh
Expired - Fee Related legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Position Input By Displaying (AREA)
CN201180051725.8A 2010-11-17 2011-10-28 减少银的电迁移的方法及由其制备的制品 Expired - Fee Related CN103180257B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US41468810P 2010-11-17 2010-11-17
US61/414,688 2010-11-17
PCT/US2011/058322 WO2012067789A2 (en) 2010-11-17 2011-10-28 Method of reducing electromigration of silver and article made thereby

Publications (2)

Publication Number Publication Date
CN103180257A CN103180257A (zh) 2013-06-26
CN103180257B true CN103180257B (zh) 2016-02-17

Family

ID=44947239

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180051725.8A Expired - Fee Related CN103180257B (zh) 2010-11-17 2011-10-28 减少银的电迁移的方法及由其制备的制品

Country Status (5)

Country Link
US (1) US20130220682A1 (enExample)
EP (1) EP2640572B1 (enExample)
JP (1) JP6109074B2 (enExample)
CN (1) CN103180257B (enExample)
WO (1) WO2012067789A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103910885A (zh) * 2012-12-31 2014-07-09 第一毛织株式会社 制备间隙填充剂的方法、用其制备的间隙填充剂和使用间隙填充剂制造半导体电容器的方法
JP6475388B1 (ja) * 2018-07-18 2019-02-27 信越化学工業株式会社 ポリシラザン含有組成物
DE102020134437A1 (de) * 2020-12-21 2022-06-23 Deutsches Zentrum für Luft- und Raumfahrt e.V. Passiver Strahlungskühler

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CN1386391A (zh) * 2000-07-24 2002-12-18 Tdk株式会社 发光元件
US20040169005A1 (en) * 2003-02-17 2004-09-02 Hong-Gun Kim Methods for forming a thin film on an integrated circuit including soft baking a silicon glass film
CN1694936A (zh) * 2002-11-01 2005-11-09 克拉里安特国际有限公司 包含聚硅氮烷的涂覆溶液
CN101080282B (zh) * 2004-12-17 2010-05-12 国立大学法人德岛大学 基材表面的改性方法、具有改性表面的基材及其制造方法
JP2010143802A (ja) * 2008-12-19 2010-07-01 Toda Kogyo Corp 酸化ケイ素ゲル体膜、透明導電性膜および透明導電性膜積層基板並びにそれらの製造方法

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US3813519A (en) * 1964-11-09 1974-05-28 Saint Gobain Electrically heated glass window
US3592726A (en) * 1965-04-28 1971-07-13 Corning Glass Works Composite vehicle closure comprising an inner sheet of chemically strengthened glass
US4010311A (en) * 1973-09-14 1977-03-01 Ppg Industries, Inc. Impact-resistant glass-polyesterurethane laminates
JPH02176923A (ja) * 1988-12-28 1990-07-10 Toray Ind Inc 感圧入力タブレット
JPH08133792A (ja) * 1994-10-31 1996-05-28 Central Glass Co Ltd 熱線反射紫外線吸収透明体
JPH08160405A (ja) * 1994-12-09 1996-06-21 Seiko Instr Inc 表示装置及びその製造方法
JPH09142887A (ja) * 1995-11-20 1997-06-03 N E Chemcat Corp 貴金属表面の保護膜
FR2761978B1 (fr) * 1997-04-11 1999-05-07 Saint Gobain Vitrage Composition de verre et substrat en verre trempe chimiquement
JPH11110133A (ja) * 1997-10-01 1999-04-23 Daicel Chem Ind Ltd タッチセンサ用ガラス基板およびタッチパネル
JP3414236B2 (ja) * 1998-01-05 2003-06-09 松下電器産業株式会社 プラズマディスプレイパネル
JPH11236533A (ja) * 1998-02-24 1999-08-31 Hitachi Chem Co Ltd シリカ系被膜形成用塗布液及びシリカ系被膜
KR20010109321A (ko) * 1999-03-24 2001-12-08 추후보정 유기 전광 소자
US6305073B1 (en) * 1999-12-29 2001-10-23 Gm Nameplate, Inc. One-sided electrode arrangement on an intermediate spacer for a touchscreen
DE60136703D1 (de) * 2000-05-04 2009-01-08 Schott Donnelly Llc Verfahren zur Herstellung einer electrochromen Tafel
JP5291275B2 (ja) * 2000-07-27 2013-09-18 有限会社コンタミネーション・コントロール・サービス コーティング膜が施された部材及びコーティング膜の製造方法
US6819316B2 (en) * 2001-04-17 2004-11-16 3M Innovative Properties Company Flexible capacitive touch sensor
US6652978B2 (en) * 2001-05-07 2003-11-25 Kion Corporation Thermally stable, moisture curable polysilazanes and polysiloxazanes
US6961049B2 (en) 2002-06-21 2005-11-01 3M Innovative Properties Company Capacitive touch sensor architecture with unique sensor bar addressing
US6970160B2 (en) 2002-12-19 2005-11-29 3M Innovative Properties Company Lattice touch-sensing system
JP4370139B2 (ja) * 2003-09-30 2009-11-25 三菱重工業株式会社 電波ステルス性および／または電磁波シールド性を有する窓の製造方法並びに電波ステルス性および／または電磁波シールド性を有する窓材
US8068186B2 (en) * 2003-10-15 2011-11-29 3M Innovative Properties Company Patterned conductor touch screen having improved optics
JP2005220378A (ja) * 2004-02-03 2005-08-18 Pc Wave:Kk 装飾品及び装飾品の表面処理方法
DE102005003627A1 (de) * 2005-01-26 2006-07-27 Clariant International Limited Verfahren zur Erzeugung einer permanenten Schutzschicht auf Edelmetalloberflächen durch Beschichten mit Lösungen auf Polysilazanbasis
DE102005008857A1 (de) * 2005-02-26 2006-09-07 Clariant International Limited Verwendung von Polysilazanen als permanente Anit-Fingerprint-Beschichtung
JP4679272B2 (ja) * 2005-07-04 2011-04-27 セントラル硝子株式会社 入出力一体型表示装置及び保護ガラス板
JP2007184445A (ja) * 2006-01-10 2007-07-19 Seiko Epson Corp 配線形成方法、薄膜トランジスタの製造方法及びデバイス製造方法並びに電子機器
KR20090019059A (ko) * 2007-08-20 2009-02-25 전자부품연구원 표면에 글래스 보호층을 갖는 구조물
JP2009047879A (ja) * 2007-08-20 2009-03-05 Seiko Epson Corp 有機エレクトロルミネッセンス装置及びその製造方法、電子機器
JP2010062241A (ja) * 2008-09-02 2010-03-18 Konica Minolta Holdings Inc 有機薄膜トランジスタの製造方法、有機薄膜トランジスタ素子及び表示装置
DE102009013903A1 (de) * 2009-03-19 2010-09-23 Clariant International Limited Solarzellen mit einer Barriereschicht auf Basis von Polysilazan

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1386391A (zh) * 2000-07-24 2002-12-18 Tdk株式会社 发光元件
US20020119675A1 (en) * 2000-12-27 2002-08-29 Samsung Electronics Co., Ltd. Method of forming a spin-on-glass insulation layer
CN1694936A (zh) * 2002-11-01 2005-11-09 克拉里安特国际有限公司 包含聚硅氮烷的涂覆溶液
US20040169005A1 (en) * 2003-02-17 2004-09-02 Hong-Gun Kim Methods for forming a thin film on an integrated circuit including soft baking a silicon glass film
CN101080282B (zh) * 2004-12-17 2010-05-12 国立大学法人德岛大学 基材表面的改性方法、具有改性表面的基材及其制造方法
JP2010143802A (ja) * 2008-12-19 2010-07-01 Toda Kogyo Corp 酸化ケイ素ゲル体膜、透明導電性膜および透明導電性膜積層基板並びにそれらの製造方法

Also Published As

Publication number Publication date
EP2640572A2 (en) 2013-09-25
WO2012067789A2 (en) 2012-05-24
CN103180257A (zh) 2013-06-26
JP2013544222A (ja) 2013-12-12
JP6109074B2 (ja) 2017-04-05
US20130220682A1 (en) 2013-08-29
WO2012067789A3 (en) 2012-07-26
EP2640572B1 (en) 2017-11-22

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Granted publication date: 20160217

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