CN103180029A - 从气体中去除f2和/或of2的方法 - Google Patents

从气体中去除f2和/或of2的方法 Download PDF

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Publication number
CN103180029A
CN103180029A CN2011800440519A CN201180044051A CN103180029A CN 103180029 A CN103180029 A CN 103180029A CN 2011800440519 A CN2011800440519 A CN 2011800440519A CN 201180044051 A CN201180044051 A CN 201180044051A CN 103180029 A CN103180029 A CN 103180029A
Authority
CN
China
Prior art keywords
gas
weight
sliding part
alkali metal
thiosulfate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011800440519A
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English (en)
Chinese (zh)
Inventor
约翰内斯·艾歇尔
弗朗西斯·费斯
菲利普·莫雷勒
奥利维耶罗·黛安娜
彼得·M·普雷迪坎特
埃尔詹·因韦伦
霍尔格·珀尼斯
托马斯·施瓦策
沃尔夫冈·卡尔布雷耶
黑尔格·劳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Solvay SA
Original Assignee
Solvay SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solvay SA filed Critical Solvay SA
Publication of CN103180029A publication Critical patent/CN103180029A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/30—Alkali metal compounds
    • B01D2251/304—Alkali metal compounds of sodium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/30—Alkali metal compounds
    • B01D2251/306—Alkali metal compounds of potassium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/60—Inorganic bases or salts
    • B01D2251/604—Hydroxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/60—Inorganic bases or salts
    • B01D2251/608—Sulfates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/202—Single element halogens
    • B01D2257/2027—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2047—Hydrofluoric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Drying Of Semiconductors (AREA)
CN2011800440519A 2010-09-15 2011-09-13 从气体中去除f2和/或of2的方法 Pending CN103180029A (zh)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US38320410P 2010-09-15 2010-09-15
US61/383,204 2010-09-15
US38353310P 2010-09-16 2010-09-16
EP10177216 2010-09-16
EP10177216.8 2010-09-16
EP10177188 2010-09-16
EP10177206 2010-09-16
EP10177206.9 2010-09-16
EP10177188.9 2010-09-16
US61/383,533 2010-09-16
EP11165500 2011-05-10
EP11165500.7 2011-05-10
PCT/EP2011/065833 WO2012035000A1 (en) 2010-09-15 2011-09-13 Method for the removal of f2 and/or of2 from a gas

Publications (1)

Publication Number Publication Date
CN103180029A true CN103180029A (zh) 2013-06-26

Family

ID=44658734

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011800440519A Pending CN103180029A (zh) 2010-09-15 2011-09-13 从气体中去除f2和/或of2的方法

Country Status (4)

Country Link
JP (1) JP2013539717A (ja)
KR (1) KR20130111554A (ja)
CN (1) CN103180029A (ja)
WO (1) WO2012035000A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015135230A1 (zh) * 2014-03-12 2015-09-17 深圳市华星光电技术有限公司 蚀刻液浓度测量装置及方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015101728A1 (de) * 2015-02-06 2016-08-11 Das Environmental Expert Gmbh Verfahren zum Entfernen von Fluor aus fluorhaltigen Abgasen
US20210162341A1 (en) * 2015-12-01 2021-06-03 Showa Denko K. K. Method for treating exhaust gas containing elemental fluorine
WO2017094418A1 (ja) * 2015-12-01 2017-06-08 昭和電工株式会社 フッ素元素を含有する排ガスの処理方法
JP6895623B2 (ja) * 2017-02-21 2021-06-30 セントラル硝子株式会社 ヨウ素化合物の除去方法

Citations (8)

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US2665190A (en) * 1950-07-28 1954-01-05 Allied Chem & Dye Corp Purification of waste gases containing chlorine by treatment with an alkaline nitrite solution to effect removal of the chlorine constituent therefrom
US20010009652A1 (en) * 1998-05-28 2001-07-26 Jose I. Arno Apparatus and method for point-of-use abatement of fluorocompounds
WO2002016012A1 (fr) * 2000-08-24 2002-02-28 Picosil Procede d'epuration des effluents gazeux fluores
US20040101460A1 (en) * 1997-05-16 2004-05-27 Arno Jose I. Apparatus and method for point-of-use treatment of effluent gas streams
CN1762548A (zh) * 2004-10-07 2006-04-26 日本派欧尼株式会社 排气的处理方法和处理装置
JP2006231105A (ja) * 2005-02-22 2006-09-07 Fujitsu Ltd 酸化性ガスの除去方法
US20070253879A1 (en) * 2004-12-13 2007-11-01 Asahi Glass Company, Limited Method for removing halogen series gas and agent for removing halogen series gas
CN101448560A (zh) * 2006-05-19 2009-06-03 拜尔材料科学股份公司 从包含氯气和二氧化碳的气体中吸收氯气的方法

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JPH0280310A (ja) * 1988-06-01 1990-03-20 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
US4938936A (en) * 1988-09-01 1990-07-03 Mobil Oil Corporation Hydrogen fluoride vapor containment and neutralization
JPH062214B2 (ja) * 1989-03-07 1994-01-12 昭和電工株式会社 フッ素ガスの除去方法
JPH11349304A (ja) * 1998-06-05 1999-12-21 Mitsui Chem Inc 高純度三弗化窒素ガスの精製方法
TW492891B (en) * 1998-12-15 2002-07-01 Atmi Ecosys Corp A scrubbing system and method for point-of-use treatment of effluent gas streams using an aqueous medium and/or gas/liquid contacting article
JP2000271437A (ja) * 1999-03-24 2000-10-03 Ebara Corp 排ガスの処理方法および装置
JP4132614B2 (ja) * 2000-08-28 2008-08-13 三井化学株式会社 高純度ｎｆ３ガスの精製方法
US6857447B2 (en) * 2002-06-10 2005-02-22 Advanced Technology Materials, Inc. Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases
JP4739709B2 (ja) * 2003-08-29 2011-08-03 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード 成膜装置のクリーニング方法
JP2006055806A (ja) * 2004-08-23 2006-03-02 Sharp Corp 排ガスの処理方法及び排ガス処理システム
JP2006130499A (ja) * 2004-10-07 2006-05-25 Japan Pionics Co Ltd 排ガスの処理方法及び処理装置
US20070079849A1 (en) * 2005-10-12 2007-04-12 Richard Hogle Integrated chamber cleaning system
EP3269843A1 (en) 2006-04-10 2018-01-17 Solvay Fluor GmbH Etching process
JP2008031510A (ja) * 2006-07-27 2008-02-14 L'air Liquide-Sa Pour L'etude & L'exploitation Des Procedes Georges Claude 成膜装置のクリーニング方法および成膜装置
CN104979188A (zh) 2007-12-21 2015-10-14 苏威氟有限公司 用于生产微机电系统的方法
US10453986B2 (en) 2008-01-23 2019-10-22 Solvay Fluor Gmbh Process for the manufacture of solar cells

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665190A (en) * 1950-07-28 1954-01-05 Allied Chem & Dye Corp Purification of waste gases containing chlorine by treatment with an alkaline nitrite solution to effect removal of the chlorine constituent therefrom
US20040101460A1 (en) * 1997-05-16 2004-05-27 Arno Jose I. Apparatus and method for point-of-use treatment of effluent gas streams
US20010009652A1 (en) * 1998-05-28 2001-07-26 Jose I. Arno Apparatus and method for point-of-use abatement of fluorocompounds
WO2002016012A1 (fr) * 2000-08-24 2002-02-28 Picosil Procede d'epuration des effluents gazeux fluores
CN1762548A (zh) * 2004-10-07 2006-04-26 日本派欧尼株式会社 排气的处理方法和处理装置
US20070253879A1 (en) * 2004-12-13 2007-11-01 Asahi Glass Company, Limited Method for removing halogen series gas and agent for removing halogen series gas
JP2006231105A (ja) * 2005-02-22 2006-09-07 Fujitsu Ltd 酸化性ガスの除去方法
CN101448560A (zh) * 2006-05-19 2009-06-03 拜尔材料科学股份公司 从包含氯气和二氧化碳的气体中吸收氯气的方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015135230A1 (zh) * 2014-03-12 2015-09-17 深圳市华星光电技术有限公司 蚀刻液浓度测量装置及方法

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Publication number Publication date
WO2012035000A1 (en) 2012-03-22
KR20130111554A (ko) 2013-10-10
JP2013539717A (ja) 2013-10-28

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Application publication date: 20130626