CN102971851B - 固态图像拾取设备 - Google Patents
固态图像拾取设备 Download PDFInfo
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- CN102971851B CN102971851B CN201180033415.3A CN201180033415A CN102971851B CN 102971851 B CN102971851 B CN 102971851B CN 201180033415 A CN201180033415 A CN 201180033415A CN 102971851 B CN102971851 B CN 102971851B
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- H—ELECTRICITY
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- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/10—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors
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- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/018—Manufacture or treatment of image sensors covered by group H10F39/12 of hybrid image sensors
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- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
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- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
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- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/182—Colour image sensors
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- H10F39/10—Integrated devices
- H10F39/12—Image sensors
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- H10F39/80—Constructional details of image sensors
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- H10F39/80—Constructional details of image sensors
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- H10F39/80—Constructional details of image sensors
- H10F39/811—Interconnections
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- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
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- H10W72/941—Dispositions of bond pads
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- H10W72/00—Interconnections or connectors in packages
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- H10W72/951—Materials of bond pads
- H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
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- H10W80/00—Direct bonding of chips, wafers or substrates
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- H10W80/312—Bonding techniques, e.g. hybrid bonding characterised by the direct bonding of electrically conductive pads
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- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/301—Bonding techniques, e.g. hybrid bonding
- H10W80/327—Bonding techniques, e.g. hybrid bonding characterised by the direct bonding of insulating parts, e.g. of silicon oxide layers
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- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/701—Direct bonding of chips, wafers or substrates characterised by the pads after the direct bonding
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/791—Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads
- H10W90/792—Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads between multiple chips
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610164142.0A CN105720067B9 (zh) | 2010-07-09 | 2011-07-04 | 固态图像拾取设备 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010156926A JP5451547B2 (ja) | 2010-07-09 | 2010-07-09 | 固体撮像装置 |
| JP2010-156926 | 2010-07-09 | ||
| PCT/JP2011/003796 WO2012004965A1 (en) | 2010-07-09 | 2011-07-04 | Solid-state image pickup device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610164142.0A Division CN105720067B9 (zh) | 2010-07-09 | 2011-07-04 | 固态图像拾取设备 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102971851A CN102971851A (zh) | 2013-03-13 |
| CN102971851B true CN102971851B (zh) | 2016-04-06 |
Family
ID=45440958
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180033415.3A Active CN102971851B (zh) | 2010-07-09 | 2011-07-04 | 固态图像拾取设备 |
| CN201610164142.0A Active CN105720067B9 (zh) | 2010-07-09 | 2011-07-04 | 固态图像拾取设备 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610164142.0A Active CN105720067B9 (zh) | 2010-07-09 | 2011-07-04 | 固态图像拾取设备 |
Country Status (6)
| Country | Link |
|---|---|
| US (10) | US9166090B2 (enExample) |
| EP (3) | EP4428912A3 (enExample) |
| JP (1) | JP5451547B2 (enExample) |
| CN (2) | CN102971851B (enExample) |
| RU (1) | RU2521224C1 (enExample) |
| WO (1) | WO2012004965A1 (enExample) |
Families Citing this family (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011077580A1 (ja) | 2009-12-26 | 2011-06-30 | キヤノン株式会社 | 固体撮像装置および撮像システム |
| JP5451547B2 (ja) | 2010-07-09 | 2014-03-26 | キヤノン株式会社 | 固体撮像装置 |
| JP5517800B2 (ja) * | 2010-07-09 | 2014-06-11 | キヤノン株式会社 | 固体撮像装置用の部材および固体撮像装置の製造方法 |
| TWI495041B (zh) * | 2011-07-05 | 2015-08-01 | 新力股份有限公司 | 半導體裝置、用於半導體裝置之製造方法及電子設備 |
| US8896125B2 (en) | 2011-07-05 | 2014-11-25 | Sony Corporation | Semiconductor device, fabrication method for a semiconductor device and electronic apparatus |
| JP5994274B2 (ja) * | 2012-02-14 | 2016-09-21 | ソニー株式会社 | 半導体装置、半導体装置の製造方法、及び、電子機器 |
| US10090349B2 (en) | 2012-08-09 | 2018-10-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | CMOS image sensor chips with stacked scheme and methods for forming the same |
| US9153565B2 (en) | 2012-06-01 | 2015-10-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image sensors with a high fill-factor |
| KR101240537B1 (ko) * | 2012-05-07 | 2013-03-11 | (주)실리콘화일 | 이종접합 구조의 칩 적층 이미지센서 및 그 제조방법 |
| JP6012262B2 (ja) | 2012-05-31 | 2016-10-25 | キヤノン株式会社 | 半導体装置の製造方法 |
| US8866250B2 (en) * | 2012-09-05 | 2014-10-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multiple metal film stack in BSI chips |
| US8796805B2 (en) * | 2012-09-05 | 2014-08-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multiple metal film stack in BSI chips |
| TWI595637B (zh) * | 2012-09-28 | 2017-08-11 | 新力股份有限公司 | 半導體裝置及電子機器 |
| JP6128787B2 (ja) * | 2012-09-28 | 2017-05-17 | キヤノン株式会社 | 半導体装置 |
| JP6017297B2 (ja) * | 2012-12-14 | 2016-10-26 | オリンパス株式会社 | 半導体装置の製造方法 |
| KR102136845B1 (ko) | 2013-09-16 | 2020-07-23 | 삼성전자 주식회사 | 적층형 이미지 센서 및 그 제조방법 |
| JP6212720B2 (ja) * | 2013-09-20 | 2017-10-18 | パナソニックIpマネジメント株式会社 | 半導体装置及びその製造方法 |
| TWI676279B (zh) * | 2013-10-04 | 2019-11-01 | 新力股份有限公司 | 半導體裝置及固體攝像元件 |
| CN104810366B (zh) * | 2014-01-26 | 2018-09-11 | 中芯国际集成电路制造(上海)有限公司 | 一种集成电路及其制造方法 |
| CN104241200B (zh) * | 2014-08-28 | 2017-03-08 | 武汉新芯集成电路制造有限公司 | 一种功率器件与控制器件的集成方法 |
| CN104241201B (zh) * | 2014-08-28 | 2017-05-31 | 武汉新芯集成电路制造有限公司 | 一种集成功率器件与控制器件的方法 |
| US10285088B2 (en) * | 2014-09-26 | 2019-05-07 | Nokia Technologies Oy | Methods and apparatus for minimization of drive testing |
| CN104599988B (zh) * | 2015-01-05 | 2017-08-04 | 武汉新芯集成电路制造有限公司 | 集成功率器件与控制器件的方法 |
| US10354975B2 (en) * | 2016-05-16 | 2019-07-16 | Raytheon Company | Barrier layer for interconnects in 3D integrated device |
| US10431614B2 (en) | 2017-02-01 | 2019-10-01 | Semiconductor Components Industries, Llc | Edge seals for semiconductor packages |
| WO2018186198A1 (ja) * | 2017-04-04 | 2018-10-11 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像装置、及び電子機器 |
| JP2018195656A (ja) * | 2017-05-16 | 2018-12-06 | ソニーセミコンダクタソリューションズ株式会社 | 半導体装置の製造方法及び半導体装置 |
| JP7184772B2 (ja) * | 2017-07-18 | 2022-12-06 | ソニーセミコンダクタソリューションズ株式会社 | 撮像装置および撮像装置の製造方法 |
| FR3069371B1 (fr) | 2017-07-19 | 2019-08-30 | Stmicroelectronics (Crolles 2) Sas | Dispositif electronique capteur d'images |
| US10727217B2 (en) * | 2017-09-29 | 2020-07-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of manufacturing semiconductor device that uses bonding layer to join semiconductor substrates together |
| US10879115B2 (en) * | 2017-11-21 | 2020-12-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device and forming method thereof |
| KR102491881B1 (ko) * | 2018-01-16 | 2023-01-27 | 삼성디스플레이 주식회사 | 디스플레이 장치 |
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| JP2019140178A (ja) * | 2018-02-07 | 2019-08-22 | 東芝メモリ株式会社 | 半導体装置 |
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| JP7551277B2 (ja) * | 2019-01-31 | 2024-09-17 | キヤノン株式会社 | 半導体装置、機器 |
| JP7321724B2 (ja) | 2019-03-05 | 2023-08-07 | キヤノン株式会社 | 半導体装置および機器 |
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| JP7679169B2 (ja) * | 2019-08-08 | 2025-05-19 | キヤノン株式会社 | 光電変換装置、光電変換システム |
| JP2021034560A (ja) * | 2019-08-23 | 2021-03-01 | キオクシア株式会社 | 半導体装置およびその製造方法 |
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| JP7417393B2 (ja) * | 2019-09-27 | 2024-01-18 | キヤノン株式会社 | 半導体装置及び半導体ウエハ |
| JP7353121B2 (ja) * | 2019-10-08 | 2023-09-29 | キヤノン株式会社 | 半導体装置および機器 |
| JP7603382B2 (ja) * | 2019-11-18 | 2024-12-20 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子および撮像素子の製造方法 |
| JP7618392B2 (ja) * | 2020-05-14 | 2025-01-21 | キヤノン株式会社 | 光電変換装置、撮像システム、移動体 |
| JP2022018705A (ja) | 2020-07-16 | 2022-01-27 | キヤノン株式会社 | 半導体装置 |
| KR102823325B1 (ko) * | 2020-07-20 | 2025-06-23 | 에스케이하이닉스 주식회사 | 보호 소자를 갖는 이미지 센싱 장치 |
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- 2011-07-04 RU RU2013105505/28A patent/RU2521224C1/ru active
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| US20170186803A1 (en) | 2017-06-29 |
| CN105720067A (zh) | 2016-06-29 |
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