CN102482208B - 含有磺酸烯丙酯阴离子的离子液体 - Google Patents

含有磺酸烯丙酯阴离子的离子液体 Download PDF

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Publication number
CN102482208B
CN102482208B CN201080036756.1A CN201080036756A CN102482208B CN 102482208 B CN102482208 B CN 102482208B CN 201080036756 A CN201080036756 A CN 201080036756A CN 102482208 B CN102482208 B CN 102482208B
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ion
group
allyl ester
general formula
carbonatoms
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Expired - Fee Related
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CN201080036756.1A
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English (en)
Chinese (zh)
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CN102482208A (zh
Inventor
绵引勉
冈本训明
角野元重
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Fujifilm Wako Pure Chemical Corp
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Wako Pure Chemical Industries Ltd
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/20—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic unsaturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
    • C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
    • C07D213/20—Quaternary compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/63—One oxygen atom
    • C07D213/68—One oxygen atom attached in position 4
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
    • C07D233/58—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)
  • Secondary Cells (AREA)
  • Hybrid Cells (AREA)
  • Detergent Compositions (AREA)
CN201080036756.1A 2009-08-31 2010-08-30 含有磺酸烯丙酯阴离子的离子液体 Expired - Fee Related CN102482208B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009-200610 2009-08-31
JP2009200610 2009-08-31
PCT/JP2010/064666 WO2011024988A1 (ja) 2009-08-31 2010-08-30 アリルスルホネートアニオン含有イオン液体

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CN102482208A CN102482208A (zh) 2012-05-30
CN102482208B true CN102482208B (zh) 2014-02-26

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Country Link
US (1) US8546609B2 (enExample)
EP (1) EP2474527B1 (enExample)
JP (1) JP5682564B2 (enExample)
KR (1) KR101788578B1 (enExample)
CN (1) CN102482208B (enExample)
ES (1) ES2616707T3 (enExample)
IN (1) IN2012DN01795A (enExample)
WO (1) WO2011024988A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5323221B2 (ja) * 2011-11-28 2013-10-23 日本乳化剤株式会社 イオン性液体並びにこれを含む帯電防止剤、防曇剤、分散剤または乳化剤、潤滑剤、電解液、およびセルロース溶解剤
US10030155B2 (en) * 2012-05-14 2018-07-24 The University Of Tokyo Graphene nanodispersion and method for preparing same
WO2014175449A1 (ja) * 2013-04-26 2014-10-30 国立大学法人 東京大学 新規グラフェンナノ分散液及びその調製方法
WO2015159635A1 (ja) * 2014-04-17 2015-10-22 株式会社Adeka 層状物質含有液及びその製造方法
CN104324585A (zh) * 2014-11-05 2015-02-04 朱忠良 一种利用离子液体净化高炉烟气的方法
WO2019217854A1 (en) * 2018-05-11 2019-11-14 Wisconsin Alumni Research Foundation An ionic liquid-based nanoemulsion formulation for the efficient delivery of hydrophilic and hydrophobic therapeutic agents
JP7543659B2 (ja) * 2020-03-03 2024-09-03 日清紡ホールディングス株式会社 イオン液体を用いた平滑材料の固定方法
CN115433832B (zh) * 2021-06-02 2024-03-19 中国科学院过程工程研究所 一种镍、钴协同萃取剂及其用途

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0474896A1 (en) * 1989-02-20 1992-03-18 Mitsubishi Rayon Company Ltd. Antistatic thermoplastic resin composition
US5629066A (en) * 1991-06-19 1997-05-13 Teijin Limited Resin article having anti-static property

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Publication number Priority date Publication date Assignee Title
JPS56142528A (en) * 1980-04-08 1981-11-06 Mitsubishi Chem Ind Ltd Developing solution for o-quinone diazide photosensitive material
JPH02225536A (ja) 1989-02-27 1990-09-07 Mitsubishi Rayon Co Ltd 帯電防止性に優れた合成樹脂成形品及びその製造法
US5175059A (en) 1990-09-05 1992-12-29 Mitsubishi Rayon Company Ltd. Synthetic resin molded article having good antistatic property and process for preparation thereof
JP2001172614A (ja) * 1999-12-22 2001-06-26 Takemoto Oil & Fat Co Ltd 合成高分子フィルム用帯電防止剤及び合成高分子フィルムの帯電防止方法
JP3735516B2 (ja) * 2000-03-31 2006-01-18 株式会社東芝 燃料電池
JP4271971B2 (ja) 2003-03-26 2009-06-03 株式会社日本触媒 イオン性化合物
JP2004331521A (ja) 2003-04-30 2004-11-25 Toyo Kasei Kogyo Co Ltd イオン性液体
JP4424660B2 (ja) 2004-02-17 2010-03-03 日華化学株式会社 イオン性液体からなる難燃性溶媒及びその製造方法
JP2005325052A (ja) 2004-05-14 2005-11-24 Sanko Kagaku Kogyo Kk 四級アンモニウムジシアナミドその製造方法及びその用途
JP2007153856A (ja) 2005-12-08 2007-06-21 Sumitomo Bakelite Co Ltd 常温溶融塩及びその製造方法
BRPI0603210A (pt) * 2006-08-15 2008-04-08 Petroleo Brasileiro Sa método de preparação de lìquidos iÈnicos isentos de halogenetos e lìquidos iÈnicos assim preparados
KR101407331B1 (ko) * 2006-09-12 2014-06-13 와코 쥰야꾸 고교 가부시키가이샤 술폰산에스테르의 제조방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0474896A1 (en) * 1989-02-20 1992-03-18 Mitsubishi Rayon Company Ltd. Antistatic thermoplastic resin composition
US5629066A (en) * 1991-06-19 1997-05-13 Teijin Limited Resin article having anti-static property

Non-Patent Citations (1)

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Title
JP平2-225536A 1990.09.07

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Publication number Publication date
JPWO2011024988A1 (ja) 2013-01-31
EP2474527B1 (en) 2017-01-25
KR101788578B1 (ko) 2017-11-15
JP5682564B2 (ja) 2015-03-11
US20120157680A1 (en) 2012-06-21
ES2616707T3 (es) 2017-06-14
EP2474527A4 (en) 2014-06-11
WO2011024988A1 (ja) 2011-03-03
US8546609B2 (en) 2013-10-01
EP2474527A1 (en) 2012-07-11
KR20120046262A (ko) 2012-05-09
IN2012DN01795A (enExample) 2015-06-05
CN102482208A (zh) 2012-05-30

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Address after: Osaka Japan

Patentee after: Fujifilm Wako Pure Chemical Industries, Ltd.

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Patentee before: WAKO PURE CHEMICAL INDUSTRIES, Ltd.

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