CN102253464B - 投射物镜及投射曝光机 - Google Patents

投射物镜及投射曝光机 Download PDF

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Publication number
CN102253464B
CN102253464B CN201110130001.4A CN201110130001A CN102253464B CN 102253464 B CN102253464 B CN 102253464B CN 201110130001 A CN201110130001 A CN 201110130001A CN 102253464 B CN102253464 B CN 102253464B
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China
Prior art keywords
projection objective
diaphragm
edge
optical element
radiation
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CN201110130001.4A
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Chinese (zh)
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CN102253464A (zh
Inventor
尼尔斯.迪克曼
亚历山大.沃尔夫
克里斯琴.霍兰
乌尔里克.洛林
弗朗兹.索格
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN102253464A publication Critical patent/CN102253464A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)
CN201110130001.4A 2010-05-19 2011-05-19 投射物镜及投射曝光机 Active CN102253464B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010021539.2A DE102010021539B4 (de) 2010-05-19 2010-05-19 Projektionsobjektiv mit Blenden
DE102010021539.2 2010-05-19

Publications (2)

Publication Number Publication Date
CN102253464A CN102253464A (zh) 2011-11-23
CN102253464B true CN102253464B (zh) 2014-04-02

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ID=44900450

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110130001.4A Active CN102253464B (zh) 2010-05-19 2011-05-19 投射物镜及投射曝光机

Country Status (6)

Country Link
US (1) US8488104B2 (enExample)
JP (3) JP5622664B2 (enExample)
KR (1) KR101526638B1 (enExample)
CN (1) CN102253464B (enExample)
DE (1) DE102010021539B4 (enExample)
TW (3) TWI631369B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101590743B1 (ko) * 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
DE102010021539B4 (de) * 2010-05-19 2014-10-09 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Blenden
DE102012206153A1 (de) 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102017204619A1 (de) 2016-04-05 2017-10-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie
DE102017211902A1 (de) 2017-07-12 2018-08-02 Carl Zeiss Smt Gmbh Projektionsobjektiv für eine Projektionsbelichtungsanlage für die Mikrolithographie
JP7197354B2 (ja) * 2018-12-28 2022-12-27 Hoya株式会社 レンズユニット及びレンズユニットの製造方法
DE102019209884A1 (de) * 2019-07-04 2021-01-07 Carl Zeiss Smt Gmbh Blende, optisches system und lithographieanlage
DE102021214140A1 (de) * 2021-12-10 2023-06-15 Carl Zeiss Smt Gmbh Fassung für eine linse, anordnung, lithographieanlage sowie verfahren
EP4540645A1 (de) * 2022-06-17 2025-04-23 TRUMPF Lasersystems for Semiconductor Manufacturing GmbH Vorrichtung zum korrigieren eines astigmatismus eines laserstrahls
DE102025100345A1 (de) * 2025-01-08 2025-12-04 Carl Zeiss Smt Gmbh Verfahren

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CN1985206A (zh) * 2004-05-17 2007-06-20 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜

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US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001343582A (ja) * 2000-05-30 2001-12-14 Nikon Corp 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
JP2002083766A (ja) * 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
ATE352052T1 (de) * 2000-08-18 2007-02-15 Nikon Corp Haltevorrichtung für optisches element
US6831282B2 (en) * 2001-02-09 2004-12-14 Nikon Corporation Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
EP1430346A1 (en) * 2001-09-20 2004-06-23 Carl Zeiss SMT AG Catadioptric reduction lens
JP2003270506A (ja) * 2002-03-15 2003-09-25 Fuji Photo Optical Co Ltd 光学機器および遮光方法
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
TWI249082B (en) 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US7081278B2 (en) * 2002-09-25 2006-07-25 Asml Holdings N.V. Method for protection of adhesives used to secure optics from ultra-violet light
JP2004152833A (ja) * 2002-10-29 2004-05-27 Nikon Corp 極端紫外線光学鏡筒、極端紫外線反射光学素子、露光装置及び極端紫外線光学系の検査方法
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JP2006133442A (ja) * 2004-11-05 2006-05-25 Nikon Corp レンズ鏡筒およびこれを備えるカメラ
TWI308644B (en) * 2004-12-23 2009-04-11 Zeiss Carl Smt Ag Hochaperturiges objektiv mlt obskurierter pupille
KR101590743B1 (ko) * 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
JP4827481B2 (ja) * 2005-09-30 2011-11-30 オリンパスメディカルシステムズ株式会社 内視鏡
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US6097537A (en) * 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
CN1985206A (zh) * 2004-05-17 2007-06-20 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜

Non-Patent Citations (1)

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Title
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Also Published As

Publication number Publication date
JP2011248366A (ja) 2011-12-08
US8488104B2 (en) 2013-07-16
TW201812384A (zh) 2018-04-01
CN102253464A (zh) 2011-11-23
TW201534965A (zh) 2015-09-16
KR20110127620A (ko) 2011-11-25
TW201219826A (en) 2012-05-16
TWI615630B (zh) 2018-02-21
JP6545644B2 (ja) 2019-07-17
JP2014209253A (ja) 2014-11-06
JP5982429B2 (ja) 2016-08-31
DE102010021539B4 (de) 2014-10-09
TWI631369B (zh) 2018-08-01
JP2016212436A (ja) 2016-12-15
TWI490539B (zh) 2015-07-01
KR101526638B1 (ko) 2015-06-19
DE102010021539A1 (de) 2011-11-24
KR101526638B9 (ko) 2025-01-08
US20110285979A1 (en) 2011-11-24
JP5622664B2 (ja) 2014-11-12

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