KR101526638B1 - 다이어프램을 갖는 투영 대물렌즈 - Google Patents

다이어프램을 갖는 투영 대물렌즈 Download PDF

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Publication number
KR101526638B1
KR101526638B1 KR1020110047417A KR20110047417A KR101526638B1 KR 101526638 B1 KR101526638 B1 KR 101526638B1 KR 1020110047417 A KR1020110047417 A KR 1020110047417A KR 20110047417 A KR20110047417 A KR 20110047417A KR 101526638 B1 KR101526638 B1 KR 101526638B1
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South Korea
Prior art keywords
diaphragm
optical element
light
false
projection objective
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Expired - Fee Related
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Korean (ko)
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KR20110127620A (ko
KR101526638B9 (ko
Inventor
닐스 디엑크만
알렉산더 울프
크리스챤 홀란드
울리히 로에링
프란츠 소르그
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)
KR1020110047417A 2010-05-19 2011-05-19 다이어프램을 갖는 투영 대물렌즈 Expired - Fee Related KR101526638B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010021539.2A DE102010021539B4 (de) 2010-05-19 2010-05-19 Projektionsobjektiv mit Blenden
DE102010021539.2 2010-05-19

Publications (3)

Publication Number Publication Date
KR20110127620A KR20110127620A (ko) 2011-11-25
KR101526638B1 true KR101526638B1 (ko) 2015-06-19
KR101526638B9 KR101526638B9 (ko) 2025-01-08

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ID=44900450

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110047417A Expired - Fee Related KR101526638B1 (ko) 2010-05-19 2011-05-19 다이어프램을 갖는 투영 대물렌즈

Country Status (6)

Country Link
US (1) US8488104B2 (enExample)
JP (3) JP5622664B2 (enExample)
KR (1) KR101526638B1 (enExample)
CN (1) CN102253464B (enExample)
DE (1) DE102010021539B4 (enExample)
TW (3) TWI490539B (enExample)

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KR101653514B1 (ko) * 2005-06-02 2016-09-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
DE102010021539B4 (de) * 2010-05-19 2014-10-09 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Blenden
DE102012206153A1 (de) 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102017204619A1 (de) 2016-04-05 2017-10-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie
DE102017211902A1 (de) 2017-07-12 2018-08-02 Carl Zeiss Smt Gmbh Projektionsobjektiv für eine Projektionsbelichtungsanlage für die Mikrolithographie
JP7197354B2 (ja) * 2018-12-28 2022-12-27 Hoya株式会社 レンズユニット及びレンズユニットの製造方法
DE102019209884A1 (de) * 2019-07-04 2021-01-07 Carl Zeiss Smt Gmbh Blende, optisches system und lithographieanlage
DE102021214140A1 (de) 2021-12-10 2023-06-15 Carl Zeiss Smt Gmbh Fassung für eine linse, anordnung, lithographieanlage sowie verfahren
WO2023241813A1 (de) * 2022-06-17 2023-12-21 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Vorrichtung zum korrigieren eines astigmatismus eines laserstrahls
DE102025100345A1 (de) * 2025-01-08 2025-12-04 Carl Zeiss Smt Gmbh Verfahren

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JP2003270506A (ja) * 2002-03-15 2003-09-25 Fuji Photo Optical Co Ltd 光学機器および遮光方法
JP2008542829A (ja) * 2005-06-02 2008-11-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影対物レンズ

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JPH02136836A (ja) * 1988-11-18 1990-05-25 Canon Inc 遮光装置
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
DE19733490C1 (de) * 1997-08-01 1999-02-25 Zeiss Carl Fa Optik-Fassung mit UV-Kleber und Schutzschicht
US6097537A (en) * 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001343582A (ja) * 2000-05-30 2001-12-14 Nikon Corp 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
US7154684B2 (en) * 2000-08-18 2006-12-26 Nikon Corporation Optical element holding apparatus
US6831282B2 (en) * 2001-02-09 2004-12-14 Nikon Corporation Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
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WO2004019128A2 (en) 2002-08-23 2004-03-04 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
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JP2004152833A (ja) * 2002-10-29 2004-05-27 Nikon Corp 極端紫外線光学鏡筒、極端紫外線反射光学素子、露光装置及び極端紫外線光学系の検査方法
JP2004157348A (ja) * 2002-11-07 2004-06-03 Chinontec Kk 投射レンズ装置及びプロジェクタ装置
JP2006507672A (ja) * 2002-11-21 2006-03-02 カール・ツアイス・エスエムテイ・アーゲー マイクロリソグラフィ用の投影レンズ
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JP2006119244A (ja) * 2004-10-20 2006-05-11 Canon Inc 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
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TWI308644B (en) * 2004-12-23 2009-04-11 Zeiss Carl Smt Ag Hochaperturiges objektiv mlt obskurierter pupille
JP4827481B2 (ja) * 2005-09-30 2011-11-30 オリンパスメディカルシステムズ株式会社 内視鏡
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JP2002083766A (ja) * 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP2003270506A (ja) * 2002-03-15 2003-09-25 Fuji Photo Optical Co Ltd 光学機器および遮光方法
JP2008542829A (ja) * 2005-06-02 2008-11-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影対物レンズ

Also Published As

Publication number Publication date
JP6545644B2 (ja) 2019-07-17
US20110285979A1 (en) 2011-11-24
TWI615630B (zh) 2018-02-21
JP5622664B2 (ja) 2014-11-12
CN102253464A (zh) 2011-11-23
KR20110127620A (ko) 2011-11-25
KR101526638B9 (ko) 2025-01-08
CN102253464B (zh) 2014-04-02
DE102010021539B4 (de) 2014-10-09
TWI631369B (zh) 2018-08-01
TW201812384A (zh) 2018-04-01
US8488104B2 (en) 2013-07-16
JP2016212436A (ja) 2016-12-15
TW201219826A (en) 2012-05-16
JP2011248366A (ja) 2011-12-08
DE102010021539A1 (de) 2011-11-24
JP2014209253A (ja) 2014-11-06
JP5982429B2 (ja) 2016-08-31
TW201534965A (zh) 2015-09-16
TWI490539B (zh) 2015-07-01

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