TWI490539B - 具有光圈之投射物鏡 - Google Patents
具有光圈之投射物鏡 Download PDFInfo
- Publication number
- TWI490539B TWI490539B TW100117553A TW100117553A TWI490539B TW I490539 B TWI490539 B TW I490539B TW 100117553 A TW100117553 A TW 100117553A TW 100117553 A TW100117553 A TW 100117553A TW I490539 B TWI490539 B TW I490539B
- Authority
- TW
- Taiwan
- Prior art keywords
- aperture
- optical
- projection objective
- stray
- edge
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims description 194
- 238000003384 imaging method Methods 0.000 claims description 90
- 230000005855 radiation Effects 0.000 claims description 76
- 238000005286 illumination Methods 0.000 claims description 34
- 230000036961 partial effect Effects 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 19
- 238000011144 upstream manufacturing Methods 0.000 claims description 15
- 230000002093 peripheral effect Effects 0.000 claims description 10
- 230000002829 reductive effect Effects 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 5
- 238000007493 shaping process Methods 0.000 claims 1
- 238000012216 screening Methods 0.000 description 20
- 230000000694 effects Effects 0.000 description 15
- 230000004075 alteration Effects 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000013461 design Methods 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 210000001747 pupil Anatomy 0.000 description 8
- 101150079532 SLS2 gene Proteins 0.000 description 6
- 101150108455 Sil1 gene Proteins 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000012634 optical imaging Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 101150017313 sls1 gene Proteins 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 230000005499 meniscus Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000002457 bidirectional effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 241000238631 Hexapoda Species 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000002146 bilateral effect Effects 0.000 description 1
- 230000037237 body shape Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
- G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lens Barrels (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010021539.2A DE102010021539B4 (de) | 2010-05-19 | 2010-05-19 | Projektionsobjektiv mit Blenden |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201219826A TW201219826A (en) | 2012-05-16 |
| TWI490539B true TWI490539B (zh) | 2015-07-01 |
Family
ID=44900450
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104117760A TWI615630B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
| TW100117553A TWI490539B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
| TW107100662A TWI631369B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104117760A TWI615630B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107100662A TWI631369B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8488104B2 (enExample) |
| JP (3) | JP5622664B2 (enExample) |
| KR (1) | KR101526638B1 (enExample) |
| CN (1) | CN102253464B (enExample) |
| DE (1) | DE102010021539B4 (enExample) |
| TW (3) | TWI615630B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI873635B (zh) * | 2022-06-17 | 2025-02-21 | 德商創浦半導體製造雷射系統公司 | 校正雷射光束像散的裝置 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006128613A1 (en) * | 2005-06-02 | 2006-12-07 | Carl Zeiss Smt Ag | Microlithography projection objective |
| DE102010021539B4 (de) * | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
| DE102012206153A1 (de) | 2012-04-16 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102017204619A1 (de) | 2016-04-05 | 2017-10-05 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie |
| DE102017211902A1 (de) | 2017-07-12 | 2018-08-02 | Carl Zeiss Smt Gmbh | Projektionsobjektiv für eine Projektionsbelichtungsanlage für die Mikrolithographie |
| JP7197354B2 (ja) * | 2018-12-28 | 2022-12-27 | Hoya株式会社 | レンズユニット及びレンズユニットの製造方法 |
| DE102019209884A1 (de) * | 2019-07-04 | 2021-01-07 | Carl Zeiss Smt Gmbh | Blende, optisches system und lithographieanlage |
| DE102021214140A1 (de) * | 2021-12-10 | 2023-06-15 | Carl Zeiss Smt Gmbh | Fassung für eine linse, anordnung, lithographieanlage sowie verfahren |
| DE102025100345A1 (de) * | 2025-01-08 | 2025-12-04 | Carl Zeiss Smt Gmbh | Verfahren |
| DE102025107496A1 (de) * | 2025-02-27 | 2025-12-31 | Carl Zeiss Smt Gmbh | Optisches system und projektionsbelichtungsanlage |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI308644B (en) * | 2004-12-23 | 2009-04-11 | Zeiss Carl Smt Ag | Hochaperturiges objektiv mlt obskurierter pupille |
| US7518789B2 (en) * | 1996-07-22 | 2009-04-14 | Kla-Tencor Corporation | Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| US20090115986A1 (en) * | 2005-06-02 | 2009-05-07 | Carl Zeiss Smt Ag | Microlithography projection objective |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4733945A (en) * | 1986-01-15 | 1988-03-29 | The Perkin-Elmer Corporation | Precision lens mounting |
| JPH02136836A (ja) * | 1988-11-18 | 1990-05-25 | Canon Inc | 遮光装置 |
| DE19733490C1 (de) * | 1997-08-01 | 1999-02-25 | Zeiss Carl Fa | Optik-Fassung mit UV-Kleber und Schutzschicht |
| US6097537A (en) * | 1998-04-07 | 2000-08-01 | Nikon Corporation | Catadioptric optical system |
| US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
| JP2001343582A (ja) * | 2000-05-30 | 2001-12-14 | Nikon Corp | 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法 |
| JP2002083766A (ja) * | 2000-06-19 | 2002-03-22 | Nikon Corp | 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置 |
| US7154684B2 (en) * | 2000-08-18 | 2006-12-26 | Nikon Corporation | Optical element holding apparatus |
| US6831282B2 (en) * | 2001-02-09 | 2004-12-14 | Nikon Corporation | Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus |
| DE10127227A1 (de) * | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| JP2005504337A (ja) * | 2001-09-20 | 2005-02-10 | カール・ツァイス・エスエムティー・アーゲー | 反射屈折縮小レンズ |
| JP2003270506A (ja) * | 2002-03-15 | 2003-09-25 | Fuji Photo Optical Co Ltd | 光学機器および遮光方法 |
| US20030234918A1 (en) * | 2002-06-20 | 2003-12-25 | Nikon Corporation | Adjustable soft mounts in kinematic lens mounting system |
| TWI249082B (en) | 2002-08-23 | 2006-02-11 | Nikon Corp | Projection optical system and method for photolithography and exposure apparatus and method using same |
| US7081278B2 (en) * | 2002-09-25 | 2006-07-25 | Asml Holdings N.V. | Method for protection of adhesives used to secure optics from ultra-violet light |
| JP2004152833A (ja) * | 2002-10-29 | 2004-05-27 | Nikon Corp | 極端紫外線光学鏡筒、極端紫外線反射光学素子、露光装置及び極端紫外線光学系の検査方法 |
| JP2004157348A (ja) * | 2002-11-07 | 2004-06-03 | Chinontec Kk | 投射レンズ装置及びプロジェクタ装置 |
| CN100399063C (zh) * | 2002-11-21 | 2008-07-02 | 卡尔蔡司Smt股份有限公司 | 带非圆形光阑的微印刷用投影镜头 |
| KR101159867B1 (ko) | 2003-09-12 | 2012-06-26 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투사 노출 장치용 조명 시스템 |
| GB0321918D0 (en) * | 2003-09-19 | 2003-10-22 | Aoti Operating Co Inc | Focusing system and method |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| JP2006119244A (ja) * | 2004-10-20 | 2006-05-11 | Canon Inc | 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 |
| JP2006133442A (ja) * | 2004-11-05 | 2006-05-25 | Nikon Corp | レンズ鏡筒およびこれを備えるカメラ |
| JP4827481B2 (ja) * | 2005-09-30 | 2011-11-30 | オリンパスメディカルシステムズ株式会社 | 内視鏡 |
| JP2007159836A (ja) * | 2005-12-14 | 2007-06-28 | Pentax Corp | 内視鏡の対物レンズ部 |
| US7715016B2 (en) * | 2005-12-15 | 2010-05-11 | Chung Shan Institute Of Science And Technology | Image invariant optical speckle capturing device and method |
| DE102006045075A1 (de) * | 2006-09-21 | 2008-04-03 | Carl Zeiss Smt Ag | Steuerbares optisches Element |
| DE102010021539B4 (de) * | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
-
2010
- 2010-05-19 DE DE102010021539.2A patent/DE102010021539B4/de not_active Expired - Fee Related
-
2011
- 2011-05-13 US US13/107,011 patent/US8488104B2/en active Active
- 2011-05-19 TW TW104117760A patent/TWI615630B/zh not_active IP Right Cessation
- 2011-05-19 TW TW100117553A patent/TWI490539B/zh not_active IP Right Cessation
- 2011-05-19 TW TW107100662A patent/TWI631369B/zh not_active IP Right Cessation
- 2011-05-19 JP JP2011126713A patent/JP5622664B2/ja not_active Expired - Fee Related
- 2011-05-19 CN CN201110130001.4A patent/CN102253464B/zh active Active
- 2011-05-19 KR KR1020110047417A patent/KR101526638B1/ko not_active Expired - Fee Related
-
2014
- 2014-06-17 JP JP2014124134A patent/JP5982429B2/ja not_active Expired - Fee Related
-
2016
- 2016-08-01 JP JP2016151327A patent/JP6545644B2/ja not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7518789B2 (en) * | 1996-07-22 | 2009-04-14 | Kla-Tencor Corporation | Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| TWI308644B (en) * | 2004-12-23 | 2009-04-11 | Zeiss Carl Smt Ag | Hochaperturiges objektiv mlt obskurierter pupille |
| US20090115986A1 (en) * | 2005-06-02 | 2009-05-07 | Carl Zeiss Smt Ag | Microlithography projection objective |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI873635B (zh) * | 2022-06-17 | 2025-02-21 | 德商創浦半導體製造雷射系統公司 | 校正雷射光束像散的裝置 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101526638B9 (ko) | 2025-01-08 |
| JP2011248366A (ja) | 2011-12-08 |
| KR101526638B1 (ko) | 2015-06-19 |
| CN102253464A (zh) | 2011-11-23 |
| JP5622664B2 (ja) | 2014-11-12 |
| JP2014209253A (ja) | 2014-11-06 |
| TW201534965A (zh) | 2015-09-16 |
| DE102010021539B4 (de) | 2014-10-09 |
| TW201219826A (en) | 2012-05-16 |
| KR20110127620A (ko) | 2011-11-25 |
| US8488104B2 (en) | 2013-07-16 |
| TWI615630B (zh) | 2018-02-21 |
| TWI631369B (zh) | 2018-08-01 |
| JP5982429B2 (ja) | 2016-08-31 |
| JP6545644B2 (ja) | 2019-07-17 |
| US20110285979A1 (en) | 2011-11-24 |
| TW201812384A (zh) | 2018-04-01 |
| JP2016212436A (ja) | 2016-12-15 |
| CN102253464B (zh) | 2014-04-02 |
| DE102010021539A1 (de) | 2011-11-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI490539B (zh) | 具有光圈之投射物鏡 | |
| US8228483B2 (en) | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate | |
| US9459435B2 (en) | Catadioptric projection objective comprising deflection mirrors and projection exposure method | |
| JP4373987B2 (ja) | リソグラフィ装置で使用するセンサ | |
| JP6959952B2 (ja) | マイクロリソグラフィのための投影露光方法及び投影露光装置 | |
| JP2011248366A5 (enExample) | ||
| TW201908871A (zh) | 具有光瞳鏡（pupil mirror）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 | |
| JP2012103724A (ja) | マイクロリソグラフィ露光装置のための照明システム | |
| EP2136231A1 (en) | High aperture catadioptric system | |
| US20090086338A1 (en) | High Aperture Folded Catadioptric Projection Objective |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |