DE102010021539B4 - Projektionsobjektiv mit Blenden - Google Patents

Projektionsobjektiv mit Blenden Download PDF

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Publication number
DE102010021539B4
DE102010021539B4 DE102010021539.2A DE102010021539A DE102010021539B4 DE 102010021539 B4 DE102010021539 B4 DE 102010021539B4 DE 102010021539 A DE102010021539 A DE 102010021539A DE 102010021539 B4 DE102010021539 B4 DE 102010021539B4
Authority
DE
Germany
Prior art keywords
optical
optical element
radiation
light
diaphragm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102010021539.2A
Other languages
German (de)
English (en)
Other versions
DE102010021539A1 (de
Inventor
Dr. Dieckmann Nils
Alexander Wolf
Christian Holland
Ulrich Löring
Franz Sorg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102010021539.2A priority Critical patent/DE102010021539B4/de
Priority to US13/107,011 priority patent/US8488104B2/en
Priority to TW100117553A priority patent/TWI490539B/zh
Priority to TW107100662A priority patent/TWI631369B/zh
Priority to KR1020110047417A priority patent/KR101526638B1/ko
Priority to JP2011126713A priority patent/JP5622664B2/ja
Priority to TW104117760A priority patent/TWI615630B/zh
Priority to CN201110130001.4A priority patent/CN102253464B/zh
Publication of DE102010021539A1 publication Critical patent/DE102010021539A1/de
Priority to JP2014124134A priority patent/JP5982429B2/ja
Application granted granted Critical
Publication of DE102010021539B4 publication Critical patent/DE102010021539B4/de
Priority to JP2016151327A priority patent/JP6545644B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)
DE102010021539.2A 2010-05-19 2010-05-19 Projektionsobjektiv mit Blenden Expired - Fee Related DE102010021539B4 (de)

Priority Applications (10)

Application Number Priority Date Filing Date Title
DE102010021539.2A DE102010021539B4 (de) 2010-05-19 2010-05-19 Projektionsobjektiv mit Blenden
US13/107,011 US8488104B2 (en) 2010-05-19 2011-05-13 Projection objective with diaphragms
TW107100662A TWI631369B (zh) 2010-05-19 2011-05-19 具有光圈之投射物鏡
KR1020110047417A KR101526638B1 (ko) 2010-05-19 2011-05-19 다이어프램을 갖는 투영 대물렌즈
JP2011126713A JP5622664B2 (ja) 2010-05-19 2011-05-19 絞りを有する投影対物系
TW104117760A TWI615630B (zh) 2010-05-19 2011-05-19 具有光圈之投射物鏡
TW100117553A TWI490539B (zh) 2010-05-19 2011-05-19 具有光圈之投射物鏡
CN201110130001.4A CN102253464B (zh) 2010-05-19 2011-05-19 投射物镜及投射曝光机
JP2014124134A JP5982429B2 (ja) 2010-05-19 2014-06-17 絞りを有する投影対物系
JP2016151327A JP6545644B2 (ja) 2010-05-19 2016-08-01 絞りを有する投影対物系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102010021539.2A DE102010021539B4 (de) 2010-05-19 2010-05-19 Projektionsobjektiv mit Blenden

Publications (2)

Publication Number Publication Date
DE102010021539A1 DE102010021539A1 (de) 2011-11-24
DE102010021539B4 true DE102010021539B4 (de) 2014-10-09

Family

ID=44900450

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102010021539.2A Expired - Fee Related DE102010021539B4 (de) 2010-05-19 2010-05-19 Projektionsobjektiv mit Blenden

Country Status (6)

Country Link
US (1) US8488104B2 (enExample)
JP (3) JP5622664B2 (enExample)
KR (1) KR101526638B1 (enExample)
CN (1) CN102253464B (enExample)
DE (1) DE102010021539B4 (enExample)
TW (3) TWI490539B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017211902A1 (de) 2017-07-12 2018-08-02 Carl Zeiss Smt Gmbh Projektionsobjektiv für eine Projektionsbelichtungsanlage für die Mikrolithographie

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101483791B1 (ko) * 2005-06-02 2015-01-16 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
DE102010021539B4 (de) * 2010-05-19 2014-10-09 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Blenden
DE102012206153A1 (de) 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102017204619A1 (de) 2016-04-05 2017-10-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie
JP7197354B2 (ja) * 2018-12-28 2022-12-27 Hoya株式会社 レンズユニット及びレンズユニットの製造方法
DE102019209884A1 (de) * 2019-07-04 2021-01-07 Carl Zeiss Smt Gmbh Blende, optisches system und lithographieanlage
DE102021214140A1 (de) * 2021-12-10 2023-06-15 Carl Zeiss Smt Gmbh Fassung für eine linse, anordnung, lithographieanlage sowie verfahren
WO2023241813A1 (de) * 2022-06-17 2023-12-21 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Vorrichtung zum korrigieren eines astigmatismus eines laserstrahls
DE102025100345A1 (de) * 2025-01-08 2025-12-04 Carl Zeiss Smt Gmbh Verfahren

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
US6097536A (en) * 1997-01-08 2000-08-01 Carl-Zeiss-Stiftung Optical mount with UV adhesive and protective layer
US20020163741A1 (en) * 2000-08-18 2002-11-07 Yuichi Shibazaki Optical element holding device
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
US6717746B2 (en) * 2001-05-22 2004-04-06 Carl Zeiss Semiconductor Manufacturing Technologies Ag Catadioptric reduction lens
WO2006128613A1 (en) * 2005-06-02 2006-12-07 Carl Zeiss Smt Ag Microlithography projection objective

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JPH02136836A (ja) * 1988-11-18 1990-05-25 Canon Inc 遮光装置
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US6097537A (en) * 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001343582A (ja) * 2000-05-30 2001-12-14 Nikon Corp 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
JP2002083766A (ja) * 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
US6831282B2 (en) * 2001-02-09 2004-12-14 Nikon Corporation Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus
JP2005504337A (ja) * 2001-09-20 2005-02-10 カール・ツァイス・エスエムティー・アーゲー 反射屈折縮小レンズ
JP2003270506A (ja) * 2002-03-15 2003-09-25 Fuji Photo Optical Co Ltd 光学機器および遮光方法
TWI242691B (en) 2002-08-23 2005-11-01 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US7081278B2 (en) * 2002-09-25 2006-07-25 Asml Holdings N.V. Method for protection of adhesives used to secure optics from ultra-violet light
JP2004152833A (ja) * 2002-10-29 2004-05-27 Nikon Corp 極端紫外線光学鏡筒、極端紫外線反射光学素子、露光装置及び極端紫外線光学系の検査方法
JP2004157348A (ja) * 2002-11-07 2004-06-03 Chinontec Kk 投射レンズ装置及びプロジェクタ装置
AU2002368362A1 (en) * 2002-11-21 2004-06-15 Carl Zeiss Smt Ag Projection lens with non- round diaphragm for microlithography
US7714983B2 (en) 2003-09-12 2010-05-11 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
GB0321918D0 (en) * 2003-09-19 2003-10-22 Aoti Operating Co Inc Focusing system and method
KR101213831B1 (ko) * 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2006119244A (ja) * 2004-10-20 2006-05-11 Canon Inc 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
JP2006133442A (ja) * 2004-11-05 2006-05-25 Nikon Corp レンズ鏡筒およびこれを備えるカメラ
TWI308644B (en) * 2004-12-23 2009-04-11 Zeiss Carl Smt Ag Hochaperturiges objektiv mlt obskurierter pupille
JP4827481B2 (ja) * 2005-09-30 2011-11-30 オリンパスメディカルシステムズ株式会社 内視鏡
JP2007159836A (ja) * 2005-12-14 2007-06-28 Pentax Corp 内視鏡の対物レンズ部
US7715016B2 (en) * 2005-12-15 2010-05-11 Chung Shan Institute Of Science And Technology Image invariant optical speckle capturing device and method
DE102006045075A1 (de) * 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
DE102010021539B4 (de) * 2010-05-19 2014-10-09 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Blenden

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
US6097536A (en) * 1997-01-08 2000-08-01 Carl-Zeiss-Stiftung Optical mount with UV adhesive and protective layer
US20020163741A1 (en) * 2000-08-18 2002-11-07 Yuichi Shibazaki Optical element holding device
US6717746B2 (en) * 2001-05-22 2004-04-06 Carl Zeiss Semiconductor Manufacturing Technologies Ag Catadioptric reduction lens
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
WO2006128613A1 (en) * 2005-06-02 2006-12-07 Carl Zeiss Smt Ag Microlithography projection objective
US20090115986A1 (en) * 2005-06-02 2009-05-07 Carl Zeiss Smt Ag Microlithography projection objective

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017211902A1 (de) 2017-07-12 2018-08-02 Carl Zeiss Smt Gmbh Projektionsobjektiv für eine Projektionsbelichtungsanlage für die Mikrolithographie

Also Published As

Publication number Publication date
JP5622664B2 (ja) 2014-11-12
US8488104B2 (en) 2013-07-16
US20110285979A1 (en) 2011-11-24
JP6545644B2 (ja) 2019-07-17
KR20110127620A (ko) 2011-11-25
JP2011248366A (ja) 2011-12-08
JP2016212436A (ja) 2016-12-15
KR101526638B1 (ko) 2015-06-19
TW201812384A (zh) 2018-04-01
TWI631369B (zh) 2018-08-01
JP5982429B2 (ja) 2016-08-31
TW201534965A (zh) 2015-09-16
TWI490539B (zh) 2015-07-01
TWI615630B (zh) 2018-02-21
JP2014209253A (ja) 2014-11-06
DE102010021539A1 (de) 2011-11-24
CN102253464B (zh) 2014-04-02
KR101526638B9 (ko) 2025-01-08
CN102253464A (zh) 2011-11-23
TW201219826A (en) 2012-05-16

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R016 Response to examination communication
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R018 Grant decision by examination section/examining division
R020 Patent grant now final
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee