TWI631369B - 具有光圈之投射物鏡 - Google Patents
具有光圈之投射物鏡 Download PDFInfo
- Publication number
- TWI631369B TWI631369B TW107100662A TW107100662A TWI631369B TW I631369 B TWI631369 B TW I631369B TW 107100662 A TW107100662 A TW 107100662A TW 107100662 A TW107100662 A TW 107100662A TW I631369 B TWI631369 B TW I631369B
- Authority
- TW
- Taiwan
- Prior art keywords
- aperture
- optical
- projection objective
- radiation
- edge
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 203
- 238000003384 imaging method Methods 0.000 claims abstract description 95
- 230000005855 radiation Effects 0.000 claims abstract description 77
- 238000005286 illumination Methods 0.000 claims description 35
- 230000036961 partial effect Effects 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 19
- 230000002093 peripheral effect Effects 0.000 claims description 10
- 230000002829 reductive effect Effects 0.000 claims description 6
- 238000007493 shaping process Methods 0.000 claims 1
- 238000011144 upstream manufacturing Methods 0.000 abstract description 15
- 101150079532 SLS2 gene Proteins 0.000 abstract description 7
- 101150108455 Sil1 gene Proteins 0.000 abstract description 7
- 101150017313 sls1 gene Proteins 0.000 abstract description 7
- 238000012216 screening Methods 0.000 description 20
- 230000000694 effects Effects 0.000 description 15
- 230000004075 alteration Effects 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000013461 design Methods 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 210000001747 pupil Anatomy 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000012634 optical imaging Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 230000005499 meniscus Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000002457 bidirectional effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 241000238631 Hexapoda Species 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000002146 bilateral effect Effects 0.000 description 1
- 230000037237 body shape Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
- G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lens Barrels (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010021539.2A DE102010021539B4 (de) | 2010-05-19 | 2010-05-19 | Projektionsobjektiv mit Blenden |
| ??102010021539.2 | 2010-05-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201812384A TW201812384A (zh) | 2018-04-01 |
| TWI631369B true TWI631369B (zh) | 2018-08-01 |
Family
ID=44900450
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107100662A TWI631369B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
| TW104117760A TWI615630B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
| TW100117553A TWI490539B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104117760A TWI615630B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
| TW100117553A TWI490539B (zh) | 2010-05-19 | 2011-05-19 | 具有光圈之投射物鏡 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8488104B2 (enExample) |
| JP (3) | JP5622664B2 (enExample) |
| KR (1) | KR101526638B1 (enExample) |
| CN (1) | CN102253464B (enExample) |
| DE (1) | DE102010021539B4 (enExample) |
| TW (3) | TWI631369B (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101590743B1 (ko) * | 2005-06-02 | 2016-02-01 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
| DE102010021539B4 (de) * | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
| DE102012206153A1 (de) | 2012-04-16 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102017204619A1 (de) | 2016-04-05 | 2017-10-05 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie |
| DE102017211902A1 (de) | 2017-07-12 | 2018-08-02 | Carl Zeiss Smt Gmbh | Projektionsobjektiv für eine Projektionsbelichtungsanlage für die Mikrolithographie |
| JP7197354B2 (ja) * | 2018-12-28 | 2022-12-27 | Hoya株式会社 | レンズユニット及びレンズユニットの製造方法 |
| DE102019209884A1 (de) * | 2019-07-04 | 2021-01-07 | Carl Zeiss Smt Gmbh | Blende, optisches system und lithographieanlage |
| DE102021214140A1 (de) * | 2021-12-10 | 2023-06-15 | Carl Zeiss Smt Gmbh | Fassung für eine linse, anordnung, lithographieanlage sowie verfahren |
| EP4540645A1 (de) * | 2022-06-17 | 2025-04-23 | TRUMPF Lasersystems for Semiconductor Manufacturing GmbH | Vorrichtung zum korrigieren eines astigmatismus eines laserstrahls |
| DE102025100345A1 (de) * | 2025-01-08 | 2025-12-04 | Carl Zeiss Smt Gmbh | Verfahren |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI226453B (en) * | 2001-09-20 | 2005-01-11 | Zeiss Carl Semiconductor Mfg | Catadioptric reduction lens |
| WO2005029152A1 (en) * | 2003-09-19 | 2005-03-31 | Aoti Operating Company, Inc | Focusing system and method |
| US7253971B2 (en) * | 2004-10-20 | 2007-08-07 | Canon Kabushiki Kaisha | Catadioptric projection optical system and exposure apparatus having the same |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4733945A (en) * | 1986-01-15 | 1988-03-29 | The Perkin-Elmer Corporation | Precision lens mounting |
| JPH02136836A (ja) * | 1988-11-18 | 1990-05-25 | Canon Inc | 遮光装置 |
| US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| DE19733490C1 (de) * | 1997-08-01 | 1999-02-25 | Zeiss Carl Fa | Optik-Fassung mit UV-Kleber und Schutzschicht |
| US6097537A (en) * | 1998-04-07 | 2000-08-01 | Nikon Corporation | Catadioptric optical system |
| US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
| JP2001343582A (ja) * | 2000-05-30 | 2001-12-14 | Nikon Corp | 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法 |
| JP2002083766A (ja) * | 2000-06-19 | 2002-03-22 | Nikon Corp | 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置 |
| ATE352052T1 (de) * | 2000-08-18 | 2007-02-15 | Nikon Corp | Haltevorrichtung für optisches element |
| US6831282B2 (en) * | 2001-02-09 | 2004-12-14 | Nikon Corporation | Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus |
| DE10127227A1 (de) * | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| JP2003270506A (ja) * | 2002-03-15 | 2003-09-25 | Fuji Photo Optical Co Ltd | 光学機器および遮光方法 |
| US20030234918A1 (en) * | 2002-06-20 | 2003-12-25 | Nikon Corporation | Adjustable soft mounts in kinematic lens mounting system |
| TWI249082B (en) | 2002-08-23 | 2006-02-11 | Nikon Corp | Projection optical system and method for photolithography and exposure apparatus and method using same |
| US7081278B2 (en) * | 2002-09-25 | 2006-07-25 | Asml Holdings N.V. | Method for protection of adhesives used to secure optics from ultra-violet light |
| JP2004152833A (ja) * | 2002-10-29 | 2004-05-27 | Nikon Corp | 極端紫外線光学鏡筒、極端紫外線反射光学素子、露光装置及び極端紫外線光学系の検査方法 |
| JP2004157348A (ja) * | 2002-11-07 | 2004-06-03 | Chinontec Kk | 投射レンズ装置及びプロジェクタ装置 |
| EP1565769A1 (en) * | 2002-11-21 | 2005-08-24 | Carl Zeiss SMT AG | Projection lens with non- round diaphragm for microlithography |
| JP4717813B2 (ja) | 2003-09-12 | 2011-07-06 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光設備のための照明系 |
| KR20170129271A (ko) | 2004-05-17 | 2017-11-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| JP2006133442A (ja) * | 2004-11-05 | 2006-05-25 | Nikon Corp | レンズ鏡筒およびこれを備えるカメラ |
| TWI308644B (en) * | 2004-12-23 | 2009-04-11 | Zeiss Carl Smt Ag | Hochaperturiges objektiv mlt obskurierter pupille |
| KR101590743B1 (ko) * | 2005-06-02 | 2016-02-01 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
| JP4827481B2 (ja) * | 2005-09-30 | 2011-11-30 | オリンパスメディカルシステムズ株式会社 | 内視鏡 |
| JP2007159836A (ja) * | 2005-12-14 | 2007-06-28 | Pentax Corp | 内視鏡の対物レンズ部 |
| US7715016B2 (en) * | 2005-12-15 | 2010-05-11 | Chung Shan Institute Of Science And Technology | Image invariant optical speckle capturing device and method |
| DE102006045075A1 (de) * | 2006-09-21 | 2008-04-03 | Carl Zeiss Smt Ag | Steuerbares optisches Element |
| DE102010021539B4 (de) * | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
-
2010
- 2010-05-19 DE DE102010021539.2A patent/DE102010021539B4/de not_active Expired - Fee Related
-
2011
- 2011-05-13 US US13/107,011 patent/US8488104B2/en active Active
- 2011-05-19 TW TW107100662A patent/TWI631369B/zh not_active IP Right Cessation
- 2011-05-19 TW TW104117760A patent/TWI615630B/zh not_active IP Right Cessation
- 2011-05-19 JP JP2011126713A patent/JP5622664B2/ja not_active Expired - Fee Related
- 2011-05-19 TW TW100117553A patent/TWI490539B/zh not_active IP Right Cessation
- 2011-05-19 KR KR1020110047417A patent/KR101526638B1/ko not_active Expired - Fee Related
- 2011-05-19 CN CN201110130001.4A patent/CN102253464B/zh active Active
-
2014
- 2014-06-17 JP JP2014124134A patent/JP5982429B2/ja not_active Expired - Fee Related
-
2016
- 2016-08-01 JP JP2016151327A patent/JP6545644B2/ja not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI226453B (en) * | 2001-09-20 | 2005-01-11 | Zeiss Carl Semiconductor Mfg | Catadioptric reduction lens |
| WO2005029152A1 (en) * | 2003-09-19 | 2005-03-31 | Aoti Operating Company, Inc | Focusing system and method |
| US7253971B2 (en) * | 2004-10-20 | 2007-08-07 | Canon Kabushiki Kaisha | Catadioptric projection optical system and exposure apparatus having the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011248366A (ja) | 2011-12-08 |
| US8488104B2 (en) | 2013-07-16 |
| CN102253464B (zh) | 2014-04-02 |
| TW201812384A (zh) | 2018-04-01 |
| CN102253464A (zh) | 2011-11-23 |
| TW201534965A (zh) | 2015-09-16 |
| KR20110127620A (ko) | 2011-11-25 |
| TW201219826A (en) | 2012-05-16 |
| TWI615630B (zh) | 2018-02-21 |
| JP6545644B2 (ja) | 2019-07-17 |
| JP2014209253A (ja) | 2014-11-06 |
| JP5982429B2 (ja) | 2016-08-31 |
| DE102010021539B4 (de) | 2014-10-09 |
| JP2016212436A (ja) | 2016-12-15 |
| TWI490539B (zh) | 2015-07-01 |
| KR101526638B1 (ko) | 2015-06-19 |
| DE102010021539A1 (de) | 2011-11-24 |
| KR101526638B9 (ko) | 2025-01-08 |
| US20110285979A1 (en) | 2011-11-24 |
| JP5622664B2 (ja) | 2014-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI631369B (zh) | 具有光圈之投射物鏡 | |
| US8228483B2 (en) | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate | |
| KR101367074B1 (ko) | 동공 미러를 갖는 반사굴절식 투영 대물렌즈, 투영 노광 장치 및 방법 | |
| JP4373987B2 (ja) | リソグラフィ装置で使用するセンサ | |
| JP6959952B2 (ja) | マイクロリソグラフィのための投影露光方法及び投影露光装置 | |
| TWI802572B (zh) | 校正方法 | |
| TW201908871A (zh) | 具有光瞳鏡（pupil mirror）之反射折射投影物鏡、投影曝光裝置、及投影曝光方法 | |
| JP2011248366A5 (enExample) | ||
| JP2012103724A (ja) | マイクロリソグラフィ露光装置のための照明システム | |
| KR20120091101A (ko) | 편향 미러를 포함하는 반사 굴절식 투영 대물 렌즈 및 투영 노광 방법 | |
| EP2136231A1 (en) | High aperture catadioptric system | |
| US20070258152A1 (en) | Projection Optical System | |
| CN114279690A (zh) | 一种用于微复眼透镜阵列元件测量的傅里叶变换物镜 | |
| US20090086338A1 (en) | High Aperture Folded Catadioptric Projection Objective |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |