CN1021608C - 冷阴极场发射器件 - Google Patents
冷阴极场发射器件 Download PDFInfo
- Publication number
- CN1021608C CN1021608C CN91100961A CN91100961A CN1021608C CN 1021608 C CN1021608 C CN 1021608C CN 91100961 A CN91100961 A CN 91100961A CN 91100961 A CN91100961 A CN 91100961A CN 1021608 C CN1021608 C CN 1021608C
- Authority
- CN
- China
- Prior art keywords
- emitter
- steady resistance
- fed
- field emission
- band
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/44—One or more circuit elements structurally associated with the tube or lamp
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
- H01J3/022—Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/319—Circuit elements associated with the emitters by direct integration
Landscapes
- Cold Cathode And The Manufacture (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Microwave Tubes (AREA)
- Bipolar Transistors (AREA)
Abstract
一种冷阴极场发射器件包括一镇流电阻(202,303,402),它与器件整体形成并与发射极(204,302,403)联接以适当补偿由于制造而造成的发射极场发射的性能变化。
Description
本发明涉及冷阴极场发射器件。
冷阴极场发射器件已是公知技术。一般来说,这类器件至少包括两个电极(一个阴极或叫发射极和一个阳极或叫集电极)或三个电极(前述两个电极及一个栅极)。
人们已提出这类器件的各种结构,其中包括各电极基本上平面配置或非平面配置的器件,不论结构如何,先有技术的场发射器件(FED)通常具有在各发射极尖端出现不均匀的电子发射的缺点,当在一个器件阵列中有多个发射极尖端时,这一问题特别值得注意,这一问题之所以产生部分是由于各发射极尖端的几何尺寸可能同一预定的标准尺寸有很大差别。这些尖端中的某些会成为一总发射极电流中大多数的源,而在某些情况下,由于发射率很高会受到损坏。
因此,需要一个易于制造,成本低和可靠的解决方案。
本发明所公开的冷阴极场发射器件提供了这样一种解决方案,根据本发明,该器件有一与其整体形成的与发射极联接的镇流电阻。将此电阻元件与各发射极尖端串联能使尖端上的电压随发射电流的增加而按比例上升。此电压升高将有效地减少栅极/发射极电位,从而减少发射极表面的增强了的电场。这一过程建立一个平衡和在一这种器件的阵列中就各尖端来说独立的限流功能。
在本发明的一个实施例中,镇流电阻通过选择地扩散杂质而形成在一半导体衬底上,杂质扩散可包括亚磷材料。
本发明可用于平面或非平面几何尺寸的器件。
图1是表示根据本发明构成的场发射器件的符号;
图2a-c是表示本发明的基本上非平面的FED制造步骤的侧剖图;
图3是根据本发明制造的基本上平面的FED的一部分的顶视图;
图4是根据本发明制造的基本上非平面的FED的另一实施例的侧剖图。
图1中参考号100表示一个根据本发明的FED的符号。该器件包括一个整体结构,它由一发射极101、一栅极102、一阳极103以及一与发射极联接的镇流电阻104构成。
下面将参照附图2a-c描述根据本发明的非平面FED的制造过程。首先提供一适当的原始衬底,例如一硅衬底201(图2a),利用本领域人员熟知的适当的半导体制造方法,通过一扩散过程将亚磷材料或其它杂质掺入衬底201的选定部分202(图2b)。通过选择扩散杂质掺入亚磷材料使整体制备的镇流电阻能做在FED上,下面将详细描述。
在图2b中还可看到一初始金属发射极带203,(在另一实施例中,发射极带可通过有选择地直接将适当杂质扩散到衬底中来实现)。
用于完成非平面FED的各种后续处理步骤是本领域公知的,不必在此重复。在图2c中可看到一个完成的非平面FED阵列,其中,各FED包括至少3个电极,即一个发射极204,一个栅极206和一个阳极207,阵列中各FED的发射极204通过一镇
流电阻202与一发射极带联接,镇流电阻由一个具有期望阻抗的镇流电阻构成。
这样的结构使发射极尖端间的不一致性通过与各发射极204串联的镇流电阻202而基本上得到补偿。
现在参照附图3说明根据本发明构成的一基本上为平面形的FED。一硅衬底201提供构造该器件的适当支承介质,通过选择杂质扩散,在衬底201的各部分引入适当的杂质材料,如亚磷材料,以形成镇流电阻303。而后进行金属化过程以淀积一发射极带301以及多个独立的发射极焊块302,在最终完成的器件中,这些焊块将作为发射极的导电区。
如此构造可使由于发射极尖端结构造成的性能变化通过镇流发射极303的作用而在FED中基本上得到补偿,镇流发射极303与FED整体形成在一起。
图4示出了一个基本上非平面的FED的另一实施例。这种构造仍有一个支承衬底,至少一个与发射极带401联接的发射极403,一栅极404,以及一阳极406,在此实施例中,镇流电阻并未构成支承衬底201的一部分。相反,此实施例的几何结构颠倒过来,其中一后续沉积层构成发射极403,可在沉积层中形成一个镇流电阻402以提供发射极403和发射极带401间的适当的阻性串联耦合,这样将使整体形成的镇流发射极402仍起上面所述的作用。
Claims (2)
1、一种冷阴极场发射器件,形成于一个半导件衬底(201)之上并具有一发射极(204)和与之整体形成的并与发射极联接的镇流电阻(202),其特征在于所述的镇流电阻,至少一部分是通过半导体衬底的选择杂质扩散形成的,并且发射极通过该镇流电阻联接到发射极带(203)。
2、一种形成具有联接到发射极的镇流电阻的冷阴极场发射器件的方法,包括下述步骤:
a)提供一半导件衬底;
b)在所述半导体衬底上通过选择杂质扩散形成镇流电阻;
c)在与镇流电阻联接的半导体衬底上形成发射极带;以及
d)在半导件衬底上形成部分冷阴极场发射器件使其发射极与镇流电阻联接并通过镇流电阻联接到发射极带。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US477,695 | 1990-02-09 | ||
US477.695 | 1990-02-09 | ||
US07477695 US5142184B1 (en) | 1990-02-09 | 1990-02-09 | Cold cathode field emission device with integral emitter ballasting |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1056377A CN1056377A (zh) | 1991-11-20 |
CN1021608C true CN1021608C (zh) | 1993-07-14 |
Family
ID=23896966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN91100961A Expired - Fee Related CN1021608C (zh) | 1990-02-09 | 1991-02-08 | 冷阴极场发射器件 |
Country Status (10)
Country | Link |
---|---|
US (1) | US5142184B1 (zh) |
EP (1) | EP0514474B1 (zh) |
JP (1) | JP2711591B2 (zh) |
CN (1) | CN1021608C (zh) |
AT (1) | ATE160053T1 (zh) |
DE (1) | DE69128144T2 (zh) |
DK (1) | DK0514474T3 (zh) |
ES (1) | ES2108044T3 (zh) |
RU (1) | RU2121192C1 (zh) |
WO (1) | WO1991012624A1 (zh) |
Families Citing this family (73)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5247223A (en) * | 1990-06-30 | 1993-09-21 | Sony Corporation | Quantum interference semiconductor device |
JPH0547296A (ja) * | 1991-08-14 | 1993-02-26 | Sharp Corp | 電界放出型電子源及びその製造方法 |
US5536193A (en) * | 1991-11-07 | 1996-07-16 | Microelectronics And Computer Technology Corporation | Method of making wide band gap field emitter |
US5371431A (en) * | 1992-03-04 | 1994-12-06 | Mcnc | Vertical microelectronic field emission devices including elongate vertical pillars having resistive bottom portions |
US5686791A (en) | 1992-03-16 | 1997-11-11 | Microelectronics And Computer Technology Corp. | Amorphic diamond film flat field emission cathode |
US5675216A (en) | 1992-03-16 | 1997-10-07 | Microelectronics And Computer Technololgy Corp. | Amorphic diamond film flat field emission cathode |
US5763997A (en) | 1992-03-16 | 1998-06-09 | Si Diamond Technology, Inc. | Field emission display device |
US5449970A (en) | 1992-03-16 | 1995-09-12 | Microelectronics And Computer Technology Corporation | Diode structure flat panel display |
US5679043A (en) | 1992-03-16 | 1997-10-21 | Microelectronics And Computer Technology Corporation | Method of making a field emitter |
US6127773A (en) | 1992-03-16 | 2000-10-03 | Si Diamond Technology, Inc. | Amorphic diamond film flat field emission cathode |
US5543684A (en) | 1992-03-16 | 1996-08-06 | Microelectronics And Computer Technology Corporation | Flat panel display based on diamond thin films |
US5319233A (en) * | 1992-05-13 | 1994-06-07 | Motorola, Inc. | Field emission device employing a layer of single-crystal silicon |
KR100284830B1 (ko) * | 1992-12-23 | 2001-04-02 | 씨.알. 클라인 쥬니어 | 평면의 필드 방사 음극을 사용하는 3극 진공관 구조 평판 디스플레이 |
KR100307384B1 (ko) * | 1993-01-19 | 2001-12-17 | 레오니드 다니로비치 카르포브 | 전계방출장치 |
AU5897594A (en) * | 1993-06-02 | 1994-12-20 | Microelectronics And Computer Technology Corporation | Amorphic diamond film flat field emission cathode |
US5564959A (en) * | 1993-09-08 | 1996-10-15 | Silicon Video Corporation | Use of charged-particle tracks in fabricating gated electron-emitting devices |
US5559389A (en) * | 1993-09-08 | 1996-09-24 | Silicon Video Corporation | Electron-emitting devices having variously constituted electron-emissive elements, including cones or pedestals |
US7025892B1 (en) | 1993-09-08 | 2006-04-11 | Candescent Technologies Corporation | Method for creating gated filament structures for field emission displays |
US5462467A (en) * | 1993-09-08 | 1995-10-31 | Silicon Video Corporation | Fabrication of filamentary field-emission device, including self-aligned gate |
JP2699827B2 (ja) * | 1993-09-27 | 1998-01-19 | 双葉電子工業株式会社 | 電界放出カソード素子 |
US5466982A (en) * | 1993-10-18 | 1995-11-14 | Honeywell Inc. | Comb toothed field emitter structure having resistive and capacitive coupled input |
JP2743794B2 (ja) * | 1993-10-25 | 1998-04-22 | 双葉電子工業株式会社 | 電界放出カソード及び電界放出カソードの製造方法 |
WO1995012835A1 (en) | 1993-11-04 | 1995-05-11 | Microelectronics And Computer Technology Corporation | Methods for fabricating flat panel display systems and components |
KR100225561B1 (ko) * | 1993-11-29 | 1999-10-15 | 니시무로 아츠시 | 전계방출형 전자원 |
JP2809078B2 (ja) * | 1993-12-28 | 1998-10-08 | 日本電気株式会社 | 電界放出冷陰極およびその製造方法 |
FR2717304B1 (fr) * | 1994-03-09 | 1996-04-05 | Commissariat Energie Atomique | Source d'électrons à cathodes émissives à micropointes. |
US5550426A (en) * | 1994-06-30 | 1996-08-27 | Motorola | Field emission device |
FR2722913B1 (fr) * | 1994-07-21 | 1996-10-11 | Pixel Int Sa | Cathode a micropointes pour ecran plat |
US5698933A (en) * | 1994-07-25 | 1997-12-16 | Motorola, Inc. | Field emission device current control apparatus and method |
DE69513581T2 (de) | 1994-08-01 | 2000-09-07 | Motorola, Inc. | Bogen-Unterdrückungsvorrichtung für eine Feldemissionsvorrichtung |
US6204834B1 (en) | 1994-08-17 | 2001-03-20 | Si Diamond Technology, Inc. | System and method for achieving uniform screen brightness within a matrix display |
EP0700063A1 (en) * | 1994-08-31 | 1996-03-06 | International Business Machines Corporation | Structure and method for fabricating of a field emission device |
US5531880A (en) * | 1994-09-13 | 1996-07-02 | Microelectronics And Computer Technology Corporation | Method for producing thin, uniform powder phosphor for display screens |
US5496200A (en) * | 1994-09-14 | 1996-03-05 | United Microelectronics Corporation | Sealed vacuum electronic devices |
US6417605B1 (en) * | 1994-09-16 | 2002-07-09 | Micron Technology, Inc. | Method of preventing junction leakage in field emission devices |
US5528108A (en) | 1994-09-22 | 1996-06-18 | Motorola | Field emission device arc-suppressor |
US5528098A (en) | 1994-10-06 | 1996-06-18 | Motorola | Redundant conductor electron source |
US5541466A (en) * | 1994-11-18 | 1996-07-30 | Texas Instruments Incorporated | Cluster arrangement of field emission microtips on ballast layer |
US5569975A (en) * | 1994-11-18 | 1996-10-29 | Texas Instruments Incorporated | Cluster arrangement of field emission microtips |
US5536993A (en) * | 1994-11-18 | 1996-07-16 | Texas Instruments Incorporated | Clustered field emission microtips adjacent stripe conductors |
US5557159A (en) * | 1994-11-18 | 1996-09-17 | Texas Instruments Incorporated | Field emission microtip clusters adjacent stripe conductors |
US5644187A (en) | 1994-11-25 | 1997-07-01 | Motorola | Collimating extraction grid conductor and method |
US5578896A (en) * | 1995-04-10 | 1996-11-26 | Industrial Technology Research Institute | Cold cathode field emission display and method for forming it |
US6296740B1 (en) | 1995-04-24 | 2001-10-02 | Si Diamond Technology, Inc. | Pretreatment process for a surface texturing process |
US5628659A (en) * | 1995-04-24 | 1997-05-13 | Microelectronics And Computer Corporation | Method of making a field emission electron source with random micro-tip structures |
US5591352A (en) * | 1995-04-27 | 1997-01-07 | Industrial Technology Research Institute | High resolution cold cathode field emission display method |
US5552677A (en) * | 1995-05-01 | 1996-09-03 | Motorola | Method and control circuit precharging a plurality of columns prior to enabling a row of a display |
US5631518A (en) * | 1995-05-02 | 1997-05-20 | Motorola | Electron source having short-avoiding extraction electrode and method of making same |
US5691600A (en) * | 1995-06-08 | 1997-11-25 | Motorola | Edge electron emitters for an array of FEDS |
US5585301A (en) * | 1995-07-14 | 1996-12-17 | Micron Display Technology, Inc. | Method for forming high resistance resistors for limiting cathode current in field emission displays |
AU6626096A (en) * | 1995-08-04 | 1997-03-05 | Printable Field Emitters Limited | Field electron emission materials and devices |
US6192324B1 (en) | 1995-08-14 | 2001-02-20 | General Motors Corporation | On-board diagnosis of emissions from catalytic converters |
US5688158A (en) * | 1995-08-24 | 1997-11-18 | Fed Corporation | Planarizing process for field emitter displays and other electron source applications |
US5844351A (en) * | 1995-08-24 | 1998-12-01 | Fed Corporation | Field emitter device, and veil process for THR fabrication thereof |
US5828288A (en) * | 1995-08-24 | 1998-10-27 | Fed Corporation | Pedestal edge emitter and non-linear current limiters for field emitter displays and other electron source applications |
US5731660A (en) | 1995-12-18 | 1998-03-24 | Motorola, Inc. | Flat panel display spacer structure |
US6680489B1 (en) | 1995-12-20 | 2004-01-20 | Advanced Technology Materials, Inc. | Amorphous silicon carbide thin film coating |
US6031250A (en) * | 1995-12-20 | 2000-02-29 | Advanced Technology Materials, Inc. | Integrated circuit devices and methods employing amorphous silicon carbide resistor materials |
US5633561A (en) * | 1996-03-28 | 1997-05-27 | Motorola | Conductor array for a flat panel display |
JP2970539B2 (ja) * | 1996-06-27 | 1999-11-02 | 日本電気株式会社 | 電界放出型陰極およびこれを用いた陰極線管 |
JP3026484B2 (ja) * | 1996-08-23 | 2000-03-27 | 日本電気株式会社 | 電界放出型冷陰極 |
US6013986A (en) * | 1997-06-30 | 2000-01-11 | Candescent Technologies Corporation | Electron-emitting device having multi-layer resistor |
US6144144A (en) * | 1997-10-31 | 2000-11-07 | Candescent Technologies Corporation | Patterned resistor suitable for electron-emitting device |
US6710538B1 (en) | 1998-08-26 | 2004-03-23 | Micron Technology, Inc. | Field emission display having reduced power requirements and method |
US6420826B1 (en) * | 2000-01-03 | 2002-07-16 | The Regents Of The University Of California | Flat panel display using Ti-Cr-Al-O thin film |
US6611093B1 (en) | 2000-09-19 | 2003-08-26 | Display Research Laboratories, Inc. | Field emission display with transparent cathode |
US6703252B2 (en) * | 2002-01-31 | 2004-03-09 | Hewlett-Packard Development Company, L.P. | Method of manufacturing an emitter |
US6835947B2 (en) * | 2002-01-31 | 2004-12-28 | Hewlett-Packard Development Company, L.P. | Emitter and method of making |
US6852554B2 (en) | 2002-02-27 | 2005-02-08 | Hewlett-Packard Development Company, L.P. | Emission layer formed by rapid thermal formation process |
US6787792B2 (en) | 2002-04-18 | 2004-09-07 | Hewlett-Packard Development Company, L.P. | Emitter with filled zeolite emission layer |
US7170223B2 (en) | 2002-07-17 | 2007-01-30 | Hewlett-Packard Development Company, L.P. | Emitter with dielectric layer having implanted conducting centers |
US8814622B1 (en) * | 2011-11-17 | 2014-08-26 | Sandia Corporation | Method of manufacturing a fully integrated and encapsulated micro-fabricated vacuum diode |
US9711392B2 (en) * | 2012-07-25 | 2017-07-18 | Infineon Technologies Ag | Field emission devices and methods of making thereof |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3789471A (en) * | 1970-02-06 | 1974-02-05 | Stanford Research Inst | Field emission cathode structures, devices utilizing such structures, and methods of producing such structures |
US3755704A (en) * | 1970-02-06 | 1973-08-28 | Stanford Research Inst | Field emission cathode structures and devices utilizing such structures |
US3812559A (en) * | 1970-07-13 | 1974-05-28 | Stanford Research Inst | Methods of producing field ionizer and field emission cathode structures |
US3894332A (en) * | 1972-02-11 | 1975-07-15 | Westinghouse Electric Corp | Solid state radiation sensitive field electron emitter and methods of fabrication thereof |
JPS5325632B2 (zh) * | 1973-03-22 | 1978-07-27 | ||
US3970887A (en) * | 1974-06-19 | 1976-07-20 | Micro-Bit Corporation | Micro-structure field emission electron source |
JPS5436828B2 (zh) * | 1974-08-16 | 1979-11-12 | ||
US3921022A (en) * | 1974-09-03 | 1975-11-18 | Rca Corp | Field emitting device and method of making same |
US4178531A (en) * | 1977-06-15 | 1979-12-11 | Rca Corporation | CRT with field-emission cathode |
SU855782A1 (ru) * | 1977-06-28 | 1981-08-15 | Предприятие П/Я Г-4468 | Эмиттер электронов |
JPS56130960A (en) * | 1980-03-17 | 1981-10-14 | Fujitsu Ltd | Manufacture of semiconductor integrated circuit |
US4307507A (en) * | 1980-09-10 | 1981-12-29 | The United States Of America As Represented By The Secretary Of The Navy | Method of manufacturing a field-emission cathode structure |
US4578614A (en) * | 1982-07-23 | 1986-03-25 | The United States Of America As Represented By The Secretary Of The Navy | Ultra-fast field emitter array vacuum integrated circuit switching device |
US4513308A (en) * | 1982-09-23 | 1985-04-23 | The United States Of America As Represented By The Secretary Of The Navy | p-n Junction controlled field emitter array cathode |
FR2568394B1 (fr) * | 1984-07-27 | 1988-02-12 | Commissariat Energie Atomique | Dispositif de visualisation par cathodoluminescence excitee par emission de champ |
GB8621600D0 (en) * | 1986-09-08 | 1987-03-18 | Gen Electric Co Plc | Vacuum devices |
FR2604823B1 (fr) * | 1986-10-02 | 1995-04-07 | Etude Surfaces Lab | Dispositif emetteur d'electrons et son application notamment a la realisation d'ecrans plats de television |
US4685996A (en) * | 1986-10-14 | 1987-08-11 | Busta Heinz H | Method of making micromachined refractory metal field emitters |
US4721885A (en) * | 1987-02-11 | 1988-01-26 | Sri International | Very high speed integrated microelectronic tubes |
JP2654013B2 (ja) * | 1987-05-06 | 1997-09-17 | キヤノン株式会社 | 電子放出素子およびその製造方法 |
GB2204991B (en) * | 1987-05-18 | 1991-10-02 | Gen Electric Plc | Vacuum electronic devices |
FR2623013A1 (fr) * | 1987-11-06 | 1989-05-12 | Commissariat Energie Atomique | Source d'electrons a cathodes emissives a micropointes et dispositif de visualisation par cathodoluminescence excitee par emission de champ,utilisant cette source |
US4901028A (en) * | 1988-03-22 | 1990-02-13 | The United States Of America As Represented By The Secretary Of The Navy | Field emitter array integrated distributed amplifiers |
US4874981A (en) * | 1988-05-10 | 1989-10-17 | Sri International | Automatically focusing field emission electrode |
FR2650119A1 (fr) * | 1989-07-21 | 1991-01-25 | Thomson Tubes Electroniques | Dispositif de regulation de courant individuel de pointe dans un reseau plan de microcathodes a effet de champ, et procede de realisation |
-
1990
- 1990-02-09 US US07477695 patent/US5142184B1/en not_active Expired - Lifetime
-
1991
- 1991-01-18 RU SU5053033A patent/RU2121192C1/ru active
- 1991-01-18 WO PCT/US1991/000592 patent/WO1991012624A1/en active IP Right Grant
- 1991-01-18 DK DK91904620T patent/DK0514474T3/da active
- 1991-01-18 DE DE69128144T patent/DE69128144T2/de not_active Expired - Fee Related
- 1991-01-18 ES ES91904620T patent/ES2108044T3/es not_active Expired - Lifetime
- 1991-01-18 JP JP3504871A patent/JP2711591B2/ja not_active Expired - Fee Related
- 1991-01-18 AT AT91904620T patent/ATE160053T1/de not_active IP Right Cessation
- 1991-01-18 EP EP91904620A patent/EP0514474B1/en not_active Expired - Lifetime
- 1991-02-08 CN CN91100961A patent/CN1021608C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH05504022A (ja) | 1993-06-24 |
ATE160053T1 (de) | 1997-11-15 |
EP0514474A4 (en) | 1993-01-27 |
EP0514474B1 (en) | 1997-11-05 |
DE69128144D1 (de) | 1997-12-11 |
CN1056377A (zh) | 1991-11-20 |
ES2108044T3 (es) | 1997-12-16 |
WO1991012624A1 (en) | 1991-08-22 |
EP0514474A1 (en) | 1992-11-25 |
US5142184A (en) | 1992-08-25 |
DK0514474T3 (da) | 1998-07-27 |
RU2121192C1 (ru) | 1998-10-27 |
JP2711591B2 (ja) | 1998-02-10 |
DE69128144T2 (de) | 1998-04-09 |
US5142184B1 (en) | 1995-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1021608C (zh) | 冷阴极场发射器件 | |
US7102277B2 (en) | Field emission cold cathode device of lateral type | |
US4874981A (en) | Automatically focusing field emission electrode | |
US5279682A (en) | Solar cell and method of making same | |
AU621001B2 (en) | Switched anode field emission device | |
US5633560A (en) | Cold cathode field emission display with each microtip having its own ballast resistor | |
JPH09504640A (ja) | 平坦パネル・ディスプレイ・システムと構成部品とを製造する方法 | |
EP1003195A3 (en) | Field emission-type electron source and manufacturing method thereof and display using the electron source | |
WO1998031044A2 (en) | A field emitter device with a current limiter structure | |
JPH04196409A (ja) | 荷電粒子ビーム偏向装置およびその製造方法 | |
EP0957503A3 (en) | Method of manufacturing a field emission cathode | |
WO1998034280B1 (en) | Charge dissipation field emission device | |
JPH0831347A (ja) | マイクロチップ放射陰極電子源 | |
JPH0536345A (ja) | 電界放射型冷陰極の作製方法 | |
RU2187860C2 (ru) | Автоэмиссионный катод и электронный прибор на его основе (варианты) | |
US6572425B2 (en) | Methods for forming microtips in a field emission device | |
US5874808A (en) | Low turn-on voltage volcano-shaped field emitter and integration into an addressable array | |
JP2000138385A (ja) | 太陽電池 | |
JPH01109769A (ja) | 半導体装置 | |
JPS6337657A (ja) | 電力増幅トランジスタとその製造方法 | |
JP3367995B2 (ja) | 複層セラミックスヒーター | |
JPH06349845A (ja) | 半導体集積回路及びその製造方法 | |
JPH0766216A (ja) | 半導体装置 | |
JPS59215771A (ja) | くし形エミツタトランジスタ | |
JPS5987860A (ja) | 高周波トランジスタ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C53 | Correction of patent of invention or patent application | ||
COR | Change of bibliographic data |
Free format text: CORRECT: PATENTEE; FROM: MOTOROLA INC. TO: MOTOROLA, INC. |
|
CP01 | Change in the name or title of a patent holder |
Patentee after: Motorola Inc. Patentee before: Motorola. Inc |
|
C15 | Extension of patent right duration from 15 to 20 years for appl. with date before 31.12.1992 and still valid on 11.12.2001 (patent law change 1993) | ||
OR01 | Other related matters | ||
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |