WO1998034280B1 - Charge dissipation field emission device - Google Patents

Charge dissipation field emission device

Info

Publication number
WO1998034280B1
WO1998034280B1 PCT/US1998/000129 US9800129W WO9834280B1 WO 1998034280 B1 WO1998034280 B1 WO 1998034280B1 US 9800129 W US9800129 W US 9800129W WO 9834280 B1 WO9834280 B1 WO 9834280B1
Authority
WO
WIPO (PCT)
Prior art keywords
cathode
charge
charge dissipation
dielectric layer
field emission
Prior art date
Application number
PCT/US1998/000129
Other languages
French (fr)
Other versions
WO1998034280A1 (en
Filing date
Publication date
Priority claimed from US08/794,559 external-priority patent/US5847407A/en
Application filed filed Critical
Priority to KR1019980707932A priority Critical patent/KR100301603B1/en
Priority to EP98901180A priority patent/EP0901689A4/en
Priority to JP52913098A priority patent/JP3999276B2/en
Publication of WO1998034280A1 publication Critical patent/WO1998034280A1/en
Publication of WO1998034280B1 publication Critical patent/WO1998034280B1/en

Links

Abstract

A charge dissipation field emission device (200, 300, 400) includes a supporting substrate (210, 310, 410), a cathode (215, 315, 415) formed thereon, a dielectric layer (240, 340, 440) formed on the cathode (215, 315, 415) and having emitter wells (260, 360, 460) and a charge dissipation well (252, 352, 452, 453) exposing a charge-collecting surface (248, 348, 448, 449); for bleeding off gaseous positive charge generated during the operation of the charge dissipation field emission device (200, 300, 400), an electron emitter (270, 370, 470) formed in each of the emitter wells (260, 360, 460), and an anode (280, 380, 480) spaced from the dielectric layer (240, 340, 440) for collecting electrons emitted by the electron emitters (270, 370, 470).

Claims

AMENDED CLAIMS[received by the International Bureau on 18 September 1998 (18.09.98); original claims 1-10 amended (3 pages)]
1. A charge dissipation field emission device (300) comprising: a supporting substrate (310) having a major surface; a cathode (315) disposed on the major surface of the supporting substrate (310) and having a charge-collecting surface (348); a dielectric layer (340) disposed on the cathode (315), the dielectric layer (340) defining an emitter well (360), the dielectric layer (340) and the charge-collecting surface (348) of the cathode (315) defining a charge dissipation well (352); an electron emitter (370) disposed in the emitter well (360); and an anode (380) spaced from the dielectric layer (340) to define an interspace region (365) therebetween, the charge dissipation well (352) being in communication with the interspace region (365).
2. A charge dissipation field emission device (200) comprising: a supporting substrate (210) having a major surface; a cathode (215) disposed on the major surface of the supporting substrate (210) and having a charge-collecting surface (248); a dielectric layer (240) disposed on the cathode (215), the dielectric layer (240) defining an emitter well (260), the dielectric layer (240) and the charge-collecting surface (248) of the cathode (215) defining a charge dissipation well (252); an electron emitter (270) disposed in the emitter well (260); a gate extraction electrode (250) electrically isolated from and proximate to the cathode (215) and the electron emitter (270) for effecting electron emission therefrom; and an anode (280) spaced from the gate extraction electrode (250) to define an interspace region (265) therebetween, the charge dissipation well (252) being in communication with the interspace region (265). 17
3. The charge dissipation field emission device (400) as claimed in claim 2, wherein the charge dissipation layer (490) is electrically isolated from the cathode (415).
4. The charge dissipation field emission device (400) as claimed in claim 2, wherein the charge dissipation layer (490) is electrically coupled to the cathode.
5. The charge dissipation field emission device (400) as claimed in claim 4, wherein the charge dissipation layer (490) is made from amorphous silicon.
6. The charge dissipation field emission device (400) as claimed in claim 4. wherein the charge dissipation layer (490) has a sheet resistance within a range of 109- 1012 Ohms/square.
7. A method for reducing charging within a field emission device (200, 300. 400) having a plurality of electron emitters (270, 370, 470), the method including the step of providing a charge-collecting surface (248, 348, 448, 449) proximate to the plurality of electron emitters (270, 370, 470) .
8. A method for reducing charging within a field emission device (200, 300) having a cathode (215, 315), an anode (280, 380), and an interspace region (265, 365) therebetween, the method including the step of providing communication between a portion of the cathode (215, 315) and the interspace region (265, 365).
18 9. The method for reducing charging within a field emission device
(200, 300) as claimed in claim 8, wherein the field emission device (200,
300) further includes a dielectric layer (240, 340) disposed on the cathode
(215, 315) and wherein the step of providing communication between a portion of the cathode (215, 315) and the interspace region (265, 365) includes the step of forming a charge dissipation well (252, 352) in the dielectric layer (240, 340) in registration with the portion of the cathode
(215, 315).
10. A method for reducing charging within a field emission device
(200, 300) comprising the steps of: providing a supporting substrate (210, 310) having a major surface; forming on the major surface of the supporting substrate (210, 310) a cathode (215, 315) having a charge-collecting surface (248, 348); forming a dielectric layer (240, 340) on the cathode (215, 315); forming in the dielectric layer (240, 340) an emitter well (260, 360); forming in the dielectric layer (240, 340) a charge dissipation well (252, 352) in registration with the charge-collecting surface (248, 348) of the cathode (215, 315); providing an electron emitter (270, 370) in the emitter well (260,
360); and providing an anode (280, 380) spaced from the dielectric layer (240, 340) to define an interspace region (265, 365) therebetween so that the charge dissipation well (252, 352) is in communication with the interspace region (265, 365).
PCT/US1998/000129 1997-02-03 1998-01-05 Charge dissipation field emission device WO1998034280A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1019980707932A KR100301603B1 (en) 1997-02-03 1998-01-05 Charge dissipation field emission device
EP98901180A EP0901689A4 (en) 1997-02-03 1998-01-05 Charge dissipation field emission device
JP52913098A JP3999276B2 (en) 1997-02-03 1998-01-05 Charge dissipation type field emission device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/794,559 1997-02-03
US08/794,559 US5847407A (en) 1997-02-03 1997-02-03 Charge dissipation field emission device

Publications (2)

Publication Number Publication Date
WO1998034280A1 WO1998034280A1 (en) 1998-08-06
WO1998034280B1 true WO1998034280B1 (en) 1998-10-29

Family

ID=25162991

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/000129 WO1998034280A1 (en) 1997-02-03 1998-01-05 Charge dissipation field emission device

Country Status (7)

Country Link
US (1) US5847407A (en)
EP (1) EP0901689A4 (en)
JP (1) JP3999276B2 (en)
KR (1) KR100301603B1 (en)
CN (1) CN1114955C (en)
TW (1) TW385467B (en)
WO (1) WO1998034280A1 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929560A (en) * 1996-10-31 1999-07-27 Motorola, Inc. Field emission display having an ion shield
US6075323A (en) * 1998-01-20 2000-06-13 Motorola, Inc. Method for reducing charge accumulation in a field emission display
FR2784225B1 (en) * 1998-10-02 2001-03-09 Commissariat Energie Atomique SOURCE OF ELECTRONS WITH EMISSIVE CATHODES COMPRISING AT LEAST ONE ELECTRODE FOR PROTECTION AGAINST INTERFERENCE EMISSIONS
US6992698B1 (en) * 1999-08-31 2006-01-31 Micron Technology, Inc. Integrated field emission array sensor, display, and transmitter, and apparatus including same
US6905683B2 (en) * 2000-05-03 2005-06-14 Novo Nordisk Healthcare A/G Human coagulation factor VII variants
US6459206B1 (en) 2000-05-31 2002-10-01 Sri International System and method for adjusting the orbit of an orbiting space object using an electrodynamic tether and micro-fabricated field emission device
US6577130B1 (en) 2000-05-31 2003-06-10 Sri International System and method for sensing and controlling potential differences between a space object and its space plasma environment using micro-fabricated field emission devices
AU2001275068A1 (en) * 2000-05-31 2001-12-11 Sri International Systems and methods employing micro-fabricated field emission devices to sense and control potential differences between a space object and its space plasma environment, to emit charge from a space object, and in use with an electrodynamic tether to adjust an orbit of an orbiting space object
US6653625B2 (en) * 2001-03-19 2003-11-25 Gyros Ab Microfluidic system (MS)
TW541561B (en) * 2001-06-29 2003-07-11 Au Optronics Corp Field emission display structure
AU2002322653A1 (en) * 2001-07-24 2003-02-17 Case Western Reserve University X-ray dose control based on patient size
US7071603B2 (en) 2002-02-20 2006-07-04 Cdream Corporation Patterned seed layer suitable for electron-emitting device, and associated fabrication method
US7053538B1 (en) 2002-02-20 2006-05-30 Cdream Corporation Sectioned resistor layer for a carbon nanotube electron-emitting device
US6803708B2 (en) * 2002-08-22 2004-10-12 Cdream Display Corporation Barrier metal layer for a carbon nanotube flat panel display
AU2003304452A1 (en) * 2003-08-20 2005-03-10 Cdream Display Corporation Patterned resistor layer suitable for a carbon nano-tube electron-emitting device, and associated fabrication method
CN101870729A (en) 2003-09-09 2010-10-27 诺和诺德医疗保健公司 Coagulation factor vii polypeptides
US20050236963A1 (en) * 2004-04-15 2005-10-27 Kang Sung G Emitter structure with a protected gate electrode for an electron-emitting device
US20060066217A1 (en) * 2004-09-27 2006-03-30 Son Jong W Cathode structure for field emission device
US8753974B2 (en) * 2007-06-20 2014-06-17 Micron Technology, Inc. Charge dissipation of cavities
WO2009084054A1 (en) * 2007-12-28 2009-07-09 Selex Sistemi Integrati S.P.A. High frequency triode-type field emission device and process for manufacturing the same
US8260174B2 (en) * 2008-06-30 2012-09-04 Xerox Corporation Micro-tip array as a charging device including a system of interconnected air flow channels
KR20130001931A (en) * 2011-06-28 2013-01-07 삼성전자주식회사 Field emission panel
KR20130100630A (en) 2012-03-02 2013-09-11 삼성전자주식회사 Electron emission device and x-ray generator including the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874981A (en) * 1988-05-10 1989-10-17 Sri International Automatically focusing field emission electrode
US5063323A (en) * 1990-07-16 1991-11-05 Hughes Aircraft Company Field emitter structure providing passageways for venting of outgassed materials from active electronic area
US5163328A (en) * 1990-08-06 1992-11-17 Colin Electronics Co., Ltd. Miniature pressure sensor and pressure sensor arrays
US5329207A (en) * 1992-05-13 1994-07-12 Micron Technology, Inc. Field emission structures produced on macro-grain polysilicon substrates
US5374868A (en) * 1992-09-11 1994-12-20 Micron Display Technology, Inc. Method for formation of a trench accessible cold-cathode field emission device
FR2702869B1 (en) * 1993-03-17 1995-04-21 Commissariat Energie Atomique Microtip display device and method of manufacturing the device.
JPH07111868B2 (en) * 1993-04-13 1995-11-29 日本電気株式会社 Field emission cold cathode device
US5559389A (en) * 1993-09-08 1996-09-24 Silicon Video Corporation Electron-emitting devices having variously constituted electron-emissive elements, including cones or pedestals
US5569975A (en) * 1994-11-18 1996-10-29 Texas Instruments Incorporated Cluster arrangement of field emission microtips
US5635791A (en) * 1995-08-24 1997-06-03 Texas Instruments Incorporated Field emission device with circular microtip array
US5693235A (en) * 1995-12-04 1997-12-02 Industrial Technology Research Institute Methods for manufacturing cold cathode arrays
US5698942A (en) * 1996-07-22 1997-12-16 University Of North Carolina Field emitter flat panel display device and method for operating same

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