CN101881914B - 薄膜晶体管阵列面板 - Google Patents
薄膜晶体管阵列面板 Download PDFInfo
- Publication number
- CN101881914B CN101881914B CN201010210445.4A CN201010210445A CN101881914B CN 101881914 B CN101881914 B CN 101881914B CN 201010210445 A CN201010210445 A CN 201010210445A CN 101881914 B CN101881914 B CN 101881914B
- Authority
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- China
- Prior art keywords
- electrode
- pixel electrode
- film transistor
- thin
- transistor display
- Prior art date
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- 239000010409 thin film Substances 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title description 16
- 238000003860 storage Methods 0.000 claims abstract description 84
- 238000009413 insulation Methods 0.000 claims description 24
- 230000008878 coupling Effects 0.000 claims description 23
- 238000010168 coupling process Methods 0.000 claims description 23
- 238000005859 coupling reaction Methods 0.000 claims description 23
- 239000011368 organic material Substances 0.000 claims description 8
- 229910010272 inorganic material Inorganic materials 0.000 claims description 6
- 239000011147 inorganic material Substances 0.000 claims description 6
- 238000002161 passivation Methods 0.000 description 77
- 239000004973 liquid crystal related substance Substances 0.000 description 60
- 239000003990 capacitor Substances 0.000 description 40
- 239000004065 semiconductor Substances 0.000 description 40
- 239000010408 film Substances 0.000 description 35
- 229910021417 amorphous silicon Inorganic materials 0.000 description 29
- 239000004020 conductor Substances 0.000 description 28
- 239000012212 insulator Substances 0.000 description 25
- 229920002120 photoresistant polymer Polymers 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 20
- 239000002184 metal Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 17
- 239000000758 substrate Substances 0.000 description 17
- 230000005684 electric field Effects 0.000 description 14
- 238000005530 etching Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 239000012528 membrane Substances 0.000 description 10
- 230000008859 change Effects 0.000 description 8
- 238000001259 photo etching Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000001039 wet etching Methods 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- 229910001182 Mo alloy Inorganic materials 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 206010047571 Visual impairment Diseases 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 230000010363 phase shift Effects 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 229910001316 Ag alloy Inorganic materials 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 229910001362 Ta alloys Inorganic materials 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 229910000667 (NH4)2Ce(NO3)6 Inorganic materials 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910000583 Nd alloy Inorganic materials 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/02—Materials and properties organic material
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (18)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2005-0015914 | 2005-02-25 | ||
KR1020050015914A KR101251993B1 (ko) | 2005-02-25 | 2005-02-25 | 박막 트랜지스터 표시판 |
KR1020050034964A KR101143000B1 (ko) | 2005-04-27 | 2005-04-27 | 박막 트랜지스터 표시판 및 그 제조 방법 |
KR10-2005-0034964 | 2005-04-27 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006100577531A Division CN1828914B (zh) | 2005-02-25 | 2006-02-27 | 薄膜晶体管阵列面板及其制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101881914A CN101881914A (zh) | 2010-11-10 |
CN101881914B true CN101881914B (zh) | 2014-08-13 |
Family
ID=36931644
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2012104347604A Pending CN103034004A (zh) | 2005-02-25 | 2006-02-27 | 薄膜晶体管阵列面板 |
CN201010210445.4A Active CN101881914B (zh) | 2005-02-25 | 2006-02-27 | 薄膜晶体管阵列面板 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2012104347604A Pending CN103034004A (zh) | 2005-02-25 | 2006-02-27 | 薄膜晶体管阵列面板 |
Country Status (4)
Country | Link |
---|---|
US (2) | US8305507B2 (zh) |
JP (2) | JP5307319B2 (zh) |
CN (2) | CN103034004A (zh) |
TW (1) | TWI423444B (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100831235B1 (ko) * | 2002-06-07 | 2008-05-22 | 삼성전자주식회사 | 박막 트랜지스터 기판 |
US8305507B2 (en) * | 2005-02-25 | 2012-11-06 | Samsung Display Co., Ltd. | Thin film transistor array panel having improved storage capacitance and manufacturing method thereof |
TWI327239B (en) * | 2006-01-20 | 2010-07-11 | Au Optronics Corp | Pixel and liquid crystal display and method for manufacturing the same |
KR20080001181A (ko) * | 2006-06-29 | 2008-01-03 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 어레이 기판과 그 제조방법 |
JP5213587B2 (ja) * | 2008-08-26 | 2013-06-19 | 株式会社ジャパンディスプレイウェスト | 液晶表示装置 |
US8471973B2 (en) * | 2009-06-12 | 2013-06-25 | Au Optronics Corporation | Pixel designs of improving the aperture ratio in an LCD |
KR101765545B1 (ko) * | 2010-07-07 | 2017-08-08 | 삼성디스플레이 주식회사 | 표시 장치 |
KR101778009B1 (ko) * | 2010-08-19 | 2017-09-27 | 삼성디스플레이 주식회사 | 표시 기판 및 그 제조 방법 |
KR101909139B1 (ko) * | 2011-02-07 | 2018-12-19 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
CN102998859B (zh) * | 2012-12-14 | 2016-03-02 | 京东方科技集团股份有限公司 | 一种阵列基板及其制备方法和显示装置 |
TW201427893A (zh) | 2013-01-07 | 2014-07-16 | 群康科技(深圳)有限公司 | 圖案化色轉換膜及應用其之顯示裝置 |
CN103197480B (zh) * | 2013-03-22 | 2015-07-01 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示面板 |
TWI511303B (zh) * | 2013-08-30 | 2015-12-01 | Ye Xin Technology Consulting Co Ltd | 液晶顯示器的陣列基板 |
KR20150047399A (ko) * | 2013-10-24 | 2015-05-04 | 삼성디스플레이 주식회사 | 액정표시패널 |
KR102140815B1 (ko) | 2013-12-09 | 2020-08-04 | 삼성디스플레이 주식회사 | 액정 표시 장치 |
KR102132445B1 (ko) * | 2013-12-31 | 2020-07-09 | 엘지디스플레이 주식회사 | 액정 디스플레이 패널 및 이의 제조 방법 |
CN105097552A (zh) * | 2015-08-14 | 2015-11-25 | 京东方科技集团股份有限公司 | 薄膜晶体管及阵列基板的制备方法、阵列基板及显示装置 |
JP2019066719A (ja) * | 2017-10-03 | 2019-04-25 | シャープ株式会社 | 表示パネル |
CN114460782B (zh) * | 2020-10-30 | 2023-10-20 | 京东方科技集团股份有限公司 | 阵列基板及其制备方法、显示装置 |
Citations (4)
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CN1261181A (zh) * | 1999-01-19 | 2000-07-26 | 国际商业机器公司 | 自动进行音频内容分析的系统和方法 |
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US6271543B1 (en) * | 1998-02-26 | 2001-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Active matrix type display device and method of manufacturing the same |
CN100543561C (zh) * | 2003-06-10 | 2009-09-23 | 三星电子株式会社 | 具有多个区域的液晶显示器及用于该显示器的面板 |
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JPH0926603A (ja) * | 1995-05-08 | 1997-01-28 | Semiconductor Energy Lab Co Ltd | 表示装置 |
JPH1010581A (ja) * | 1996-06-25 | 1998-01-16 | Semiconductor Energy Lab Co Ltd | 表示装置 |
JPH1048664A (ja) | 1996-07-19 | 1998-02-20 | Lg Electron Inc | 液晶表示装置及びその製造方法 |
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2011
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Also Published As
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CN103034004A (zh) | 2013-04-10 |
US20060192906A1 (en) | 2006-08-31 |
JP2012073647A (ja) | 2012-04-12 |
JP5703208B2 (ja) | 2015-04-15 |
JP2006235635A (ja) | 2006-09-07 |
TWI423444B (zh) | 2014-01-11 |
US20130153906A1 (en) | 2013-06-20 |
TW200638548A (en) | 2006-11-01 |
CN101881914A (zh) | 2010-11-10 |
JP5307319B2 (ja) | 2013-10-02 |
US8305507B2 (en) | 2012-11-06 |
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