CN101827642A - 用于处理包含四氟化硅和氯化氢的气流的方法 - Google Patents

用于处理包含四氟化硅和氯化氢的气流的方法 Download PDF

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Publication number
CN101827642A
CN101827642A CN200880109341A CN200880109341A CN101827642A CN 101827642 A CN101827642 A CN 101827642A CN 200880109341 A CN200880109341 A CN 200880109341A CN 200880109341 A CN200880109341 A CN 200880109341A CN 101827642 A CN101827642 A CN 101827642A
Authority
CN
China
Prior art keywords
perhaps
hydrogen chloride
air
flow
described method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200880109341A
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English (en)
Chinese (zh)
Inventor
维塔尔·雷万卡尔
贾米勒·伊布拉希姆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SunEdison Inc
Original Assignee
SunEdison Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SunEdison Inc filed Critical SunEdison Inc
Publication of CN101827642A publication Critical patent/CN101827642A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/40—Acidic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/40—Alkaline earth metal or magnesium compounds
    • B01D2251/402—Alkaline earth metal or magnesium compounds of magnesium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/60—Inorganic bases or salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/26—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2045—Hydrochloric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
  • Silicon Compounds (AREA)
  • Drying Of Gases (AREA)
CN200880109341A 2007-09-04 2008-09-02 用于处理包含四氟化硅和氯化氢的气流的方法 Pending CN101827642A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US96983607P 2007-09-04 2007-09-04
US60/969,836 2007-09-04
PCT/US2008/075048 WO2009032819A1 (en) 2007-09-04 2008-09-02 Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Publications (1)

Publication Number Publication Date
CN101827642A true CN101827642A (zh) 2010-09-08

Family

ID=40076566

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880109341A Pending CN101827642A (zh) 2007-09-04 2008-09-02 用于处理包含四氟化硅和氯化氢的气流的方法

Country Status (8)

Country Link
US (2) US7691351B2 (enExample)
EP (1) EP2188039A1 (enExample)
JP (1) JP2010537947A (enExample)
KR (1) KR101447310B1 (enExample)
CN (1) CN101827642A (enExample)
MY (1) MY150562A (enExample)
TW (1) TW200927271A (enExample)
WO (1) WO2009032819A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108455616A (zh) * 2017-12-20 2018-08-28 湖北瓮福蓝天化工有限公司 一种氟硅酸除氯方法及装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride
EP2583944A4 (en) * 2010-06-15 2013-12-04 Kyowa Chem Ind Co Ltd Composite magnesium hydroxide, method for producing same, and adsorbent
US9440218B2 (en) 2013-06-13 2016-09-13 Clariant Corporation Methods and active materials for reducing halide concentration in gas streams
CN114345106B (zh) * 2021-12-30 2023-12-12 湖北瓮福蓝天化工有限公司 一种无水氟化氢生产过程中去除氯元素的方法及系统

Family Cites Families (19)

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JPS59162122A (ja) * 1983-03-08 1984-09-13 Mitsui Toatsu Chem Inc 四弗化ケイ素の精製法
US4557921A (en) * 1984-06-27 1985-12-10 Ethyl Corporation Purification of halide
AT388882B (de) * 1987-07-29 1989-09-11 Andritz Ag Maschf Verfahren zur reinigung von salzsaeure und schwefeldioxid enthaltenden abgasen von verbrennungsanlagen, insbesondere muellverbrennungsanlagen
DE69120682T2 (de) * 1990-11-21 1997-02-27 Lhoist Recherche Et Developpement S.A., Ottignies-Louvain-La-Neuve Kalzium- und/oder magnesiumhydroxid, verfahren zu dessen herstellung und dessen anwendung
US5378444A (en) 1991-12-11 1995-01-03 Japan Pionics Co., Ltd. Process for cleaning harmful gas
JPH06239610A (ja) * 1992-12-22 1994-08-30 Mitsui Toatsu Chem Inc フルオロシラン
JP3123698B2 (ja) * 1994-07-13 2001-01-15 セントラル硝子株式会社 フッ化シランの製造法
US5988165A (en) * 1997-10-01 1999-11-23 Invacare Corporation Apparatus and method for forming oxygen-enriched gas and compression thereof for high-pressure mobile storage utilization
JP3730767B2 (ja) * 1997-10-08 2006-01-05 セントラル硝子株式会社 フッ化シランの精製法
JPH11128675A (ja) * 1997-11-05 1999-05-18 Mitsui Chem Inc 塩素または塩素化合物の除害方法および装置
US8062521B2 (en) * 1998-05-29 2011-11-22 Crystaphase Products, Inc. Filtering medium and method for contacting solids-containing feeds for chemical reactors
US6649082B2 (en) * 2000-05-26 2003-11-18 Showa Denko K.K. Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof
JP3909385B2 (ja) * 2001-07-12 2007-04-25 昭和電工株式会社 テトラフルオロシランの製造方法およびその用途
US7666379B2 (en) * 2001-07-16 2010-02-23 Voltaix, Inc. Process and apparatus for removing Bronsted acid impurities in binary halides
JP4111137B2 (ja) * 2001-10-12 2008-07-02 旭硝子株式会社 ハロゲン系ガスの除去方法
US6805728B2 (en) 2002-12-09 2004-10-19 Advanced Technology Materials, Inc. Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
US20050126338A1 (en) * 2003-02-24 2005-06-16 Nanoproducts Corporation Zinc comprising nanoparticles and related nanotechnology
US20070116620A1 (en) * 2005-11-21 2007-05-24 Kanazirev Vladislav I Halide scavengers for high temperature applications
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108455616A (zh) * 2017-12-20 2018-08-28 湖北瓮福蓝天化工有限公司 一种氟硅酸除氯方法及装置

Also Published As

Publication number Publication date
EP2188039A1 (en) 2010-05-26
KR101447310B1 (ko) 2014-10-06
US20090092530A1 (en) 2009-04-09
KR20100061832A (ko) 2010-06-09
TW200927271A (en) 2009-07-01
US7691351B2 (en) 2010-04-06
US20100178225A1 (en) 2010-07-15
MY150562A (en) 2014-01-30
WO2009032819A1 (en) 2009-03-12
JP2010537947A (ja) 2010-12-09

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Application publication date: 20100908