JP2010537947A - 四フッ化ケイ素及び塩化水素を含有するガス流の処理方法 - Google Patents

四フッ化ケイ素及び塩化水素を含有するガス流の処理方法 Download PDF

Info

Publication number
JP2010537947A
JP2010537947A JP2010524115A JP2010524115A JP2010537947A JP 2010537947 A JP2010537947 A JP 2010537947A JP 2010524115 A JP2010524115 A JP 2010524115A JP 2010524115 A JP2010524115 A JP 2010524115A JP 2010537947 A JP2010537947 A JP 2010537947A
Authority
JP
Japan
Prior art keywords
gas stream
ppm
psig
hydrogen chloride
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010524115A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010537947A5 (enExample
Inventor
ビタル・レバンカル
ジャミール・イブラヒム
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SunEdison Inc
Original Assignee
MEMC Electronic Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MEMC Electronic Materials Inc filed Critical MEMC Electronic Materials Inc
Publication of JP2010537947A publication Critical patent/JP2010537947A/ja
Publication of JP2010537947A5 publication Critical patent/JP2010537947A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/40—Acidic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/40—Alkaline earth metal or magnesium compounds
    • B01D2251/402—Alkaline earth metal or magnesium compounds of magnesium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/60—Inorganic bases or salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/26—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2045—Hydrochloric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
  • Silicon Compounds (AREA)
  • Drying Of Gases (AREA)
JP2010524115A 2007-09-04 2008-09-02 四フッ化ケイ素及び塩化水素を含有するガス流の処理方法 Pending JP2010537947A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US96983607P 2007-09-04 2007-09-04
PCT/US2008/075048 WO2009032819A1 (en) 2007-09-04 2008-09-02 Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Publications (2)

Publication Number Publication Date
JP2010537947A true JP2010537947A (ja) 2010-12-09
JP2010537947A5 JP2010537947A5 (enExample) 2011-09-22

Family

ID=40076566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010524115A Pending JP2010537947A (ja) 2007-09-04 2008-09-02 四フッ化ケイ素及び塩化水素を含有するガス流の処理方法

Country Status (8)

Country Link
US (2) US7691351B2 (enExample)
EP (1) EP2188039A1 (enExample)
JP (1) JP2010537947A (enExample)
KR (1) KR101447310B1 (enExample)
CN (1) CN101827642A (enExample)
MY (1) MY150562A (enExample)
TW (1) TW200927271A (enExample)
WO (1) WO2009032819A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride
JP5656298B2 (ja) * 2010-06-15 2015-01-21 協和化学工業株式会社 複合水酸化マグネシウム、その製造方法および吸着剤
US9440218B2 (en) 2013-06-13 2016-09-13 Clariant Corporation Methods and active materials for reducing halide concentration in gas streams
CN108455616A (zh) * 2017-12-20 2018-08-28 湖北瓮福蓝天化工有限公司 一种氟硅酸除氯方法及装置
CN114345106B (zh) * 2021-12-30 2023-12-12 湖北瓮福蓝天化工有限公司 一种无水氟化氢生产过程中去除氯元素的方法及系统

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162122A (ja) * 1983-03-08 1984-09-13 Mitsui Toatsu Chem Inc 四弗化ケイ素の精製法
JPS6443333A (en) * 1987-07-29 1989-02-15 Andritz Ag Maschf Purification of waste gas containing hydrochloric acid and sulfur dioxide
JPH06239610A (ja) * 1992-12-22 1994-08-30 Mitsui Toatsu Chem Inc フルオロシラン
JPH0826715A (ja) * 1994-07-13 1996-01-30 Central Glass Co Ltd フッ化シランの製造法およびその精製法
JPH11116230A (ja) * 1997-10-08 1999-04-27 Central Glass Co Ltd フッ化シランの精製法
JPH11128675A (ja) * 1997-11-05 1999-05-18 Mitsui Chem Inc 塩素または塩素化合物の除害方法および装置
JP2003095636A (ja) * 2001-07-12 2003-04-03 Showa Denko Kk テトラフルオロシランの製造方法およびその用途

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4557921A (en) * 1984-06-27 1985-12-10 Ethyl Corporation Purification of halide
CA2096536C (fr) 1990-11-21 2001-07-03 Philippe Dumont Hydroxyde de calcium et/ou de magnesium, sa preparation et son utilisation
US5378444A (en) * 1991-12-11 1995-01-03 Japan Pionics Co., Ltd. Process for cleaning harmful gas
US5988165A (en) * 1997-10-01 1999-11-23 Invacare Corporation Apparatus and method for forming oxygen-enriched gas and compression thereof for high-pressure mobile storage utilization
US8062521B2 (en) * 1998-05-29 2011-11-22 Crystaphase Products, Inc. Filtering medium and method for contacting solids-containing feeds for chemical reactors
US6649082B2 (en) * 2000-05-26 2003-11-18 Showa Denko K.K. Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof
US7666379B2 (en) * 2001-07-16 2010-02-23 Voltaix, Inc. Process and apparatus for removing Bronsted acid impurities in binary halides
CN100344345C (zh) * 2001-10-12 2007-10-24 旭硝子株式会社 卤素类气体的除去方法
US6805728B2 (en) 2002-12-09 2004-10-19 Advanced Technology Materials, Inc. Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
US20050126338A1 (en) * 2003-02-24 2005-06-16 Nanoproducts Corporation Zinc comprising nanoparticles and related nanotechnology
US20070116620A1 (en) * 2005-11-21 2007-05-24 Kanazirev Vladislav I Halide scavengers for high temperature applications
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162122A (ja) * 1983-03-08 1984-09-13 Mitsui Toatsu Chem Inc 四弗化ケイ素の精製法
JPS6443333A (en) * 1987-07-29 1989-02-15 Andritz Ag Maschf Purification of waste gas containing hydrochloric acid and sulfur dioxide
JPH06239610A (ja) * 1992-12-22 1994-08-30 Mitsui Toatsu Chem Inc フルオロシラン
JPH0826715A (ja) * 1994-07-13 1996-01-30 Central Glass Co Ltd フッ化シランの製造法およびその精製法
JPH11116230A (ja) * 1997-10-08 1999-04-27 Central Glass Co Ltd フッ化シランの精製法
JPH11128675A (ja) * 1997-11-05 1999-05-18 Mitsui Chem Inc 塩素または塩素化合物の除害方法および装置
JP2003095636A (ja) * 2001-07-12 2003-04-03 Showa Denko Kk テトラフルオロシランの製造方法およびその用途

Also Published As

Publication number Publication date
MY150562A (en) 2014-01-30
US20090092530A1 (en) 2009-04-09
WO2009032819A1 (en) 2009-03-12
TW200927271A (en) 2009-07-01
KR20100061832A (ko) 2010-06-09
KR101447310B1 (ko) 2014-10-06
CN101827642A (zh) 2010-09-08
EP2188039A1 (en) 2010-05-26
US20100178225A1 (en) 2010-07-15
US7691351B2 (en) 2010-04-06

Similar Documents

Publication Publication Date Title
US5120515A (en) Simultaneous dehydration and removal of residual impurities from gaseous hydrocarbons
US4156598A (en) Purification of nitrogen trifluoride atmospheres
US3721066A (en) Process for recovery of acid gases
KR101812532B1 (ko) 아산화질소의 정제 방법
JP2010537947A (ja) 四フッ化ケイ素及び塩化水素を含有するガス流の処理方法
JP4423199B2 (ja) ポリスルファンの変換法
US5190908A (en) Racked bed for removal of residual mercury from gaseous hydrocarbons
CN101189185A (zh) 三氟化氮的纯化
CN105579129A (zh) 二氧化碳流股的纯化
US4009241A (en) Method of removing mercury vapor from gases contaminated therewith
US1989004A (en) Purification of gases
JP3539434B2 (ja) 高性能炭素材料の製造方法
CN111770892B (zh) 从粗一氧化碳气体除去氧的方法和一氧化碳气体的精制方法
JP3650588B2 (ja) パーフルオロコンパウンドのリサイクル利用方法
KR100684201B1 (ko) 불소 포함 배기가스의 처리방법 및 이의 방법을 사용하기위한 흡착 컬럼 장치
US5209913A (en) Process for the production of natural gas condensate having a reduced amount of mercury from a mercury-containing natural gas wellstream
JPS6035172B2 (ja) アルカリ土類金属ふつ化物上での吸収によるガス混合物からのふつ化水素除去
JP2024099966A (ja) フッ素固定剤、フッ素固定方法、フッ素回収方法及び半導体製造装置の排ガスの処理方法
US3337302A (en) Desulfurization of chlorine
JP2009167050A (ja) 高純度アルカリ金属炭酸塩水溶液の製造方法
JPH1135305A (ja) 精製過酸化水素水溶液の製造方法
JP2002324785A (ja) パーフルオロコンパウンドのリサイクル利用方法
JPH0471842B2 (enExample)
CA3240251A1 (en) Purification of organic solvents
JP2010120807A (ja) フロン破壊ガス、または、ドライエッチング排ガス中の塩素およびフッ素の選択的固定化と回収物のリサイクル

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110802

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110802

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20131008

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140107

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140115

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140207

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140217

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140513