TW200927271A - Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride - Google Patents

Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride Download PDF

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Publication number
TW200927271A
TW200927271A TW097133985A TW97133985A TW200927271A TW 200927271 A TW200927271 A TW 200927271A TW 097133985 A TW097133985 A TW 097133985A TW 97133985 A TW97133985 A TW 97133985A TW 200927271 A TW200927271 A TW 200927271A
Authority
TW
Taiwan
Prior art keywords
ppm
gas stream
psig
metal
hydrogen
Prior art date
Application number
TW097133985A
Other languages
English (en)
Chinese (zh)
Inventor
Vithal Revankar
Jameel Ibrahim
Original Assignee
Memc Electronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Memc Electronic Materials filed Critical Memc Electronic Materials
Publication of TW200927271A publication Critical patent/TW200927271A/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/40—Acidic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/40—Alkaline earth metal or magnesium compounds
    • B01D2251/402—Alkaline earth metal or magnesium compounds of magnesium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/60—Inorganic bases or salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/26—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2045—Hydrochloric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
  • Silicon Compounds (AREA)
  • Drying Of Gases (AREA)
TW097133985A 2007-09-04 2008-09-04 Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride TW200927271A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US96983607P 2007-09-04 2007-09-04

Publications (1)

Publication Number Publication Date
TW200927271A true TW200927271A (en) 2009-07-01

Family

ID=40076566

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097133985A TW200927271A (en) 2007-09-04 2008-09-04 Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Country Status (8)

Country Link
US (2) US7691351B2 (enExample)
EP (1) EP2188039A1 (enExample)
JP (1) JP2010537947A (enExample)
KR (1) KR101447310B1 (enExample)
CN (1) CN101827642A (enExample)
MY (1) MY150562A (enExample)
TW (1) TW200927271A (enExample)
WO (1) WO2009032819A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride
JP5656298B2 (ja) * 2010-06-15 2015-01-21 協和化学工業株式会社 複合水酸化マグネシウム、その製造方法および吸着剤
US9440218B2 (en) 2013-06-13 2016-09-13 Clariant Corporation Methods and active materials for reducing halide concentration in gas streams
CN108455616A (zh) * 2017-12-20 2018-08-28 湖北瓮福蓝天化工有限公司 一种氟硅酸除氯方法及装置
CN114345106B (zh) * 2021-12-30 2023-12-12 湖北瓮福蓝天化工有限公司 一种无水氟化氢生产过程中去除氯元素的方法及系统

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162122A (ja) * 1983-03-08 1984-09-13 Mitsui Toatsu Chem Inc 四弗化ケイ素の精製法
US4557921A (en) * 1984-06-27 1985-12-10 Ethyl Corporation Purification of halide
AT388882B (de) * 1987-07-29 1989-09-11 Andritz Ag Maschf Verfahren zur reinigung von salzsaeure und schwefeldioxid enthaltenden abgasen von verbrennungsanlagen, insbesondere muellverbrennungsanlagen
CA2096536C (fr) 1990-11-21 2001-07-03 Philippe Dumont Hydroxyde de calcium et/ou de magnesium, sa preparation et son utilisation
US5378444A (en) * 1991-12-11 1995-01-03 Japan Pionics Co., Ltd. Process for cleaning harmful gas
JPH06239610A (ja) * 1992-12-22 1994-08-30 Mitsui Toatsu Chem Inc フルオロシラン
JP3123698B2 (ja) * 1994-07-13 2001-01-15 セントラル硝子株式会社 フッ化シランの製造法
US5988165A (en) * 1997-10-01 1999-11-23 Invacare Corporation Apparatus and method for forming oxygen-enriched gas and compression thereof for high-pressure mobile storage utilization
JP3730767B2 (ja) * 1997-10-08 2006-01-05 セントラル硝子株式会社 フッ化シランの精製法
JPH11128675A (ja) * 1997-11-05 1999-05-18 Mitsui Chem Inc 塩素または塩素化合物の除害方法および装置
US8062521B2 (en) * 1998-05-29 2011-11-22 Crystaphase Products, Inc. Filtering medium and method for contacting solids-containing feeds for chemical reactors
US6649082B2 (en) * 2000-05-26 2003-11-18 Showa Denko K.K. Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof
JP3909385B2 (ja) * 2001-07-12 2007-04-25 昭和電工株式会社 テトラフルオロシランの製造方法およびその用途
US7666379B2 (en) * 2001-07-16 2010-02-23 Voltaix, Inc. Process and apparatus for removing Bronsted acid impurities in binary halides
CN100344345C (zh) * 2001-10-12 2007-10-24 旭硝子株式会社 卤素类气体的除去方法
US6805728B2 (en) 2002-12-09 2004-10-19 Advanced Technology Materials, Inc. Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
US20050126338A1 (en) * 2003-02-24 2005-06-16 Nanoproducts Corporation Zinc comprising nanoparticles and related nanotechnology
US20070116620A1 (en) * 2005-11-21 2007-05-24 Kanazirev Vladislav I Halide scavengers for high temperature applications
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Also Published As

Publication number Publication date
MY150562A (en) 2014-01-30
US20090092530A1 (en) 2009-04-09
WO2009032819A1 (en) 2009-03-12
JP2010537947A (ja) 2010-12-09
KR20100061832A (ko) 2010-06-09
KR101447310B1 (ko) 2014-10-06
CN101827642A (zh) 2010-09-08
EP2188039A1 (en) 2010-05-26
US20100178225A1 (en) 2010-07-15
US7691351B2 (en) 2010-04-06

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