KR101447310B1 - 사불화규소 및 염화수소를 함유하는 기체 스트림의 처리 방법 - Google Patents

사불화규소 및 염화수소를 함유하는 기체 스트림의 처리 방법 Download PDF

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KR101447310B1
KR101447310B1 KR1020107007329A KR20107007329A KR101447310B1 KR 101447310 B1 KR101447310 B1 KR 101447310B1 KR 1020107007329 A KR1020107007329 A KR 1020107007329A KR 20107007329 A KR20107007329 A KR 20107007329A KR 101447310 B1 KR101447310 B1 KR 101447310B1
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South Korea
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gas stream
hydrogen chloride
metal
psig
metal source
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English (en)
Korean (ko)
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KR20100061832A (ko
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비탈 레반카르
자밀 이브라힘
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엠이엠씨 일렉트로닉 머티리얼즈, 인크.
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/40—Acidic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/40—Alkaline earth metal or magnesium compounds
    • B01D2251/402—Alkaline earth metal or magnesium compounds of magnesium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/60—Inorganic bases or salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/26—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2045—Hydrochloric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
  • Silicon Compounds (AREA)
  • Drying Of Gases (AREA)
KR1020107007329A 2007-09-04 2008-09-02 사불화규소 및 염화수소를 함유하는 기체 스트림의 처리 방법 Expired - Fee Related KR101447310B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US96983607P 2007-09-04 2007-09-04
US60/969,836 2007-09-04
PCT/US2008/075048 WO2009032819A1 (en) 2007-09-04 2008-09-02 Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Publications (2)

Publication Number Publication Date
KR20100061832A KR20100061832A (ko) 2010-06-09
KR101447310B1 true KR101447310B1 (ko) 2014-10-06

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Family Applications (1)

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KR1020107007329A Expired - Fee Related KR101447310B1 (ko) 2007-09-04 2008-09-02 사불화규소 및 염화수소를 함유하는 기체 스트림의 처리 방법

Country Status (8)

Country Link
US (2) US7691351B2 (enExample)
EP (1) EP2188039A1 (enExample)
JP (1) JP2010537947A (enExample)
KR (1) KR101447310B1 (enExample)
CN (1) CN101827642A (enExample)
MY (1) MY150562A (enExample)
TW (1) TW200927271A (enExample)
WO (1) WO2009032819A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride
JP5656298B2 (ja) * 2010-06-15 2015-01-21 協和化学工業株式会社 複合水酸化マグネシウム、その製造方法および吸着剤
US9440218B2 (en) 2013-06-13 2016-09-13 Clariant Corporation Methods and active materials for reducing halide concentration in gas streams
CN108455616A (zh) * 2017-12-20 2018-08-28 湖北瓮福蓝天化工有限公司 一种氟硅酸除氯方法及装置
CN114345106B (zh) * 2021-12-30 2023-12-12 湖北瓮福蓝天化工有限公司 一种无水氟化氢生产过程中去除氯元素的方法及系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992009528A1 (fr) 1990-11-21 1992-06-11 Lhoist Recherche Et Developpement S.A. Hydroxyde de calcium et/ou de magnesium, sa preparation et son utilisation
US5597540A (en) 1991-12-11 1997-01-28 Japan Pionics Co., Ltd. Process for cleaning harmful gas
US20030082918A1 (en) * 2000-05-26 2003-05-01 Yuji Hayasaka Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof
US20040107833A1 (en) 2002-12-09 2004-06-10 Sweeney Joseph D Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162122A (ja) * 1983-03-08 1984-09-13 Mitsui Toatsu Chem Inc 四弗化ケイ素の精製法
US4557921A (en) * 1984-06-27 1985-12-10 Ethyl Corporation Purification of halide
AT388882B (de) * 1987-07-29 1989-09-11 Andritz Ag Maschf Verfahren zur reinigung von salzsaeure und schwefeldioxid enthaltenden abgasen von verbrennungsanlagen, insbesondere muellverbrennungsanlagen
JPH06239610A (ja) * 1992-12-22 1994-08-30 Mitsui Toatsu Chem Inc フルオロシラン
JP3123698B2 (ja) * 1994-07-13 2001-01-15 セントラル硝子株式会社 フッ化シランの製造法
US5988165A (en) * 1997-10-01 1999-11-23 Invacare Corporation Apparatus and method for forming oxygen-enriched gas and compression thereof for high-pressure mobile storage utilization
JP3730767B2 (ja) * 1997-10-08 2006-01-05 セントラル硝子株式会社 フッ化シランの精製法
JPH11128675A (ja) * 1997-11-05 1999-05-18 Mitsui Chem Inc 塩素または塩素化合物の除害方法および装置
US8062521B2 (en) * 1998-05-29 2011-11-22 Crystaphase Products, Inc. Filtering medium and method for contacting solids-containing feeds for chemical reactors
JP3909385B2 (ja) * 2001-07-12 2007-04-25 昭和電工株式会社 テトラフルオロシランの製造方法およびその用途
US7666379B2 (en) * 2001-07-16 2010-02-23 Voltaix, Inc. Process and apparatus for removing Bronsted acid impurities in binary halides
CN100344345C (zh) * 2001-10-12 2007-10-24 旭硝子株式会社 卤素类气体的除去方法
US20050126338A1 (en) * 2003-02-24 2005-06-16 Nanoproducts Corporation Zinc comprising nanoparticles and related nanotechnology
US20070116620A1 (en) * 2005-11-21 2007-05-24 Kanazirev Vladislav I Halide scavengers for high temperature applications
EP2188039A1 (en) * 2007-09-04 2010-05-26 MEMC Electronic Materials, Inc. Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992009528A1 (fr) 1990-11-21 1992-06-11 Lhoist Recherche Et Developpement S.A. Hydroxyde de calcium et/ou de magnesium, sa preparation et son utilisation
US5597540A (en) 1991-12-11 1997-01-28 Japan Pionics Co., Ltd. Process for cleaning harmful gas
US20030082918A1 (en) * 2000-05-26 2003-05-01 Yuji Hayasaka Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof
US20040107833A1 (en) 2002-12-09 2004-06-10 Sweeney Joseph D Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream

Also Published As

Publication number Publication date
MY150562A (en) 2014-01-30
US20090092530A1 (en) 2009-04-09
WO2009032819A1 (en) 2009-03-12
TW200927271A (en) 2009-07-01
JP2010537947A (ja) 2010-12-09
KR20100061832A (ko) 2010-06-09
CN101827642A (zh) 2010-09-08
EP2188039A1 (en) 2010-05-26
US20100178225A1 (en) 2010-07-15
US7691351B2 (en) 2010-04-06

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