JP6196434B2 - 一酸化窒素の精製方法 - Google Patents
一酸化窒素の精製方法 Download PDFInfo
- Publication number
- JP6196434B2 JP6196434B2 JP2012215065A JP2012215065A JP6196434B2 JP 6196434 B2 JP6196434 B2 JP 6196434B2 JP 2012215065 A JP2012215065 A JP 2012215065A JP 2012215065 A JP2012215065 A JP 2012215065A JP 6196434 B2 JP6196434 B2 JP 6196434B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorbent
- nitric oxide
- adsorption
- aqueous solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 title claims description 74
- 238000000034 method Methods 0.000 title claims description 50
- 238000000746 purification Methods 0.000 title description 36
- 239000007789 gas Substances 0.000 claims description 99
- 238000001179 sorption measurement Methods 0.000 claims description 65
- 239000003463 adsorbent Substances 0.000 claims description 59
- 239000007864 aqueous solution Substances 0.000 claims description 37
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims description 26
- 239000012535 impurity Substances 0.000 claims description 19
- 239000002253 acid Substances 0.000 claims description 15
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 15
- 239000011707 mineral Substances 0.000 claims description 15
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims description 11
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims description 11
- 239000003513 alkali Substances 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 10
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 8
- 229910017604 nitric acid Inorganic materials 0.000 claims description 8
- 239000000243 solution Substances 0.000 claims description 6
- 230000002378 acidificating effect Effects 0.000 claims description 5
- -1 inorganic acid salt Chemical class 0.000 claims description 5
- 239000007788 liquid Substances 0.000 description 27
- 239000002994 raw material Substances 0.000 description 23
- 239000006227 byproduct Substances 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000002250 absorbent Substances 0.000 description 7
- 230000002745 absorbent Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000010457 zeolite Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910021536 Zeolite Inorganic materials 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910002651 NO3 Inorganic materials 0.000 description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001868 water Inorganic materials 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/20—Nitrogen oxides; Oxyacids of nitrogen; Salts thereof
- C01B21/24—Nitric oxide (NO)
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1456—Removing acid components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1456—Removing acid components
- B01D53/1481—Removing sulfur dioxide or sulfur trioxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2252/00—Absorbents, i.e. solvents and liquid materials for gas absorption
- B01D2252/10—Inorganic absorbents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/80—Water
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Drying Of Gases (AREA)
- Gas Separation By Absorption (AREA)
Description
本実施例では、上記実施形態に係る吸着管2を使用して、本NO精製方法における吸着工程を実行した。本実施例では、無機系吸着剤として活性アルミナ(商品名:KHD−12,住友化学(株)製)を用いた。吸着剤の前処理として、18.6gの当該活性アルミナを0.3規定の硝酸水溶液と40℃で2時間混合攪拌し、その後60℃で6時間真空乾燥した。このようにして得られた前処理済吸着剤を、吸着管2(内径7.5mm,長さ500mmのステンレス製円筒吸着管)に充填した。その後、吸着管2を150℃まで昇温するとともに開閉弁4A〜4Dを閉状態とし且つ開閉弁4Eを開状態とし、真空ポンプ8を稼働させて、吸着管2内の圧力が270Pa(abs)となるように約2時間真空吸引した。次いで、原料ガスとしての粗NOガス(H2O含量=100ppm、NO2含量=500ppm、N2O含量=50ppm)を0.15MPaGの圧力のもと、25℃にて吸着管2に通流した。吸着管2への原料ガス通流量は60ml/minとした。このようにして、吸着工程を行なった。通流開始後1時間経過した時に、吸着管2から導出する非吸着ガスを露点計およびFT−IRで分析した結果、H2O含量=1ppm、NO2含量=30ppm、N2O含量=65ppmであり、通流前後でのN2O含量増分は15ppmであった。
本実施例では、無機系吸着剤として、実施例1の活性アルミナに代えて、モレキュラシーブ4A(商品名:ゼオラムA−4,東ソー(株)製)を使用した。無機系吸着剤の変更以外は実施例1と同様にして、NO精製(前処理および吸着工程)を行なった。吸着管2への原料ガス通流開始後1時間経過した時に、吸着管2から導出する非吸着ガスを分析した結果、H2O含量=1ppm、NO2含量=25ppm、N2O含量=60ppmであり、通流前後でのN2O含量増分は10ppmであった。
本実施例では、吸着剤の前処理として、内容量300mlの耐圧3Mpaのステンレス製オートクレイブに活性アルミナ(商品名:KHD−12、住友化学(株)製)を150ml仕込み、NO/NO2=1/1の混合ガスを1.5MpaGになるまで添加した。40℃で4時間保持したのち、ガスをパージし、再度NO/NO2=1/1のガスを1.5MpaGになるまで添加し30℃で5時間保持した。このようにして前処理した吸着剤を実施例1と同様の吸着管2に充填し、実施例1と同様の原料ガス供給態様にて精製を行なった。通流開始後1時間経過した時に、吸着管2から導出する非吸着ガスを分析した結果、H2O含量=1ppm、NO2含量=30ppm、N2O含量=63ppmであり、通流前後でのN2O含量増分は13ppmであった。
本実施例では、上記実施形態に係る吸収液接触装置1および吸着管2を使用して、本NO精製方法におけるアルカリ洗浄工程および吸着工程を実施した。本実施例では、容積1000mlの吸収液接触装置1に、アルカリ水溶液として1重量%の水酸化ナトリウム水溶液500mlを充填した。吸着管2に、実施例1と同様に前処理を行った活性アルミナを充填し、昇温と真空引きを行った。次いで、原料ガスとしての粗NOガス(H2O含量=100ppm、NO2含量=500ppm、SO2含量=500ppm、N2O含量=50ppm)を0.15MPaGの圧力のもと、25℃にて吸収液接触装置1および吸着管2に通流した。吸収液接触装置1および吸着管2への原料ガス通流開始後1時間経過した時に、吸着管2から導出する非吸着ガスを分析した結果、H2O含量=1ppm、NO2含量=10ppm、SO2含量=1ppm未満、N2O含量=63ppmであり、通流前後でのN2O含量増分は13ppmであった。
本比較例では、実施例1と同様の吸着管2および無機系吸着剤を用い、前処理を行なわずにNO精製を行なった。吸着管2に活性アルミナ(商品名:KHD−12,住友化学(株)製)を18.6g充填し、吸着管2を150℃まで昇温するとともに開閉弁4A〜4Dを閉状態とし且つ開閉弁4Eを開状態とし、真空ポンプ8を稼働させて、吸着管2内の圧力が270Pa(abs)となるように約2時間真空吸引した。次いで、原料ガスとしての粗NOガス(H2O含量=100ppm、NO2含量=500ppm、N2O含量=50ppm)を1.5MPaGの圧力のもと、25℃にて吸着管2に通流した。吸着管2への原料ガス通流量は60ml/minとした。このようにして、吸着工程を行なった。即ち、本比較例では、前処理の不実施以外は実施例1と同様にして、NO精製を行なった。吸着管2への原料ガス通流開始後1時間経過した時に、吸着管2から導出する非吸着ガスを分析した結果、H2O含量=1ppm、NO2含量=30ppm、N2O含量=250ppmであり、通流前後でのN2O含量増分は200ppmであった。
Y1 NOシリンダー
1 吸収接触装置
2 吸着管
3 圧力調整弁
4A〜4E 開閉弁
5 製品NO導出口
6 パージガス導入口
7 ガス排出口
8 真空ポンプ
Claims (3)
- 少なくとも一酸化窒素および水分を含む混合ガスを、無機系吸着剤に通流させて水分を当該吸着剤に吸着させるための吸着工程を含む一酸化窒素精製方法であって、
上記無機系吸着剤として、前処理にて、鉱酸水溶液または酸性ガスとしての二酸化窒素あるいは二酸化硫黄を上記無機系吸着剤と接触させて無機酸塩を生成した前処理済吸着剤を用いることを特徴とする、一酸化窒素精製方法。 - 上記鉱酸水溶液は硝酸水溶液である、請求項1に記載の一酸化窒素精製方法。
- 上記混合ガスは、不純物として二酸化窒素および二酸化硫黄の少なくとも一方を含み、
上記混合ガスを上記吸着工程行う前に、当該混合ガスをアルカリ水溶液に接触させて上記不純物を吸収除去するためのアルカリ洗浄工程を更に含む請求項1または2に記載の一酸化窒素精製方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012215065A JP6196434B2 (ja) | 2012-09-27 | 2012-09-27 | 一酸化窒素の精製方法 |
TW102125341A TWI619674B (zh) | 2012-09-27 | 2013-07-16 | 一氧化氮之精製方法 |
KR1020130106887A KR102101999B1 (ko) | 2012-09-27 | 2013-09-05 | 일산화질소의 정제방법 |
CN201310445107.2A CN103693629B (zh) | 2012-09-27 | 2013-09-26 | 一氧化氮的精制方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012215065A JP6196434B2 (ja) | 2012-09-27 | 2012-09-27 | 一酸化窒素の精製方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014069977A JP2014069977A (ja) | 2014-04-21 |
JP2014069977A5 JP2014069977A5 (ja) | 2015-08-27 |
JP6196434B2 true JP6196434B2 (ja) | 2017-09-13 |
Family
ID=50355328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012215065A Active JP6196434B2 (ja) | 2012-09-27 | 2012-09-27 | 一酸化窒素の精製方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6196434B2 (ja) |
KR (1) | KR102101999B1 (ja) |
CN (1) | CN103693629B (ja) |
TW (1) | TWI619674B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111547690B (zh) * | 2020-06-19 | 2024-03-29 | 大连大特气体有限公司 | 一种高纯度的电子级一氧化氮生产装置 |
CN112591722B (zh) * | 2020-12-16 | 2022-05-17 | 四川金象赛瑞化工股份有限公司 | 一种工业级硝酸与电子级硝酸的联产方法 |
CN113753868A (zh) * | 2021-10-14 | 2021-12-07 | 苏州金宏气体股份有限公司 | 一氧化氮气体的提纯方法、提纯装置和生产装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4153429A (en) | 1975-05-21 | 1979-05-08 | Union Carbide Corporation | Selective adsorption of NOx from gas streams |
US5328673A (en) * | 1992-11-23 | 1994-07-12 | Olin Corporation | Process for removal of NOx and SOx oxides from waste gases with chloric acid |
JPH07163837A (ja) * | 1993-12-14 | 1995-06-27 | Kobe Steel Ltd | 窒素酸化物の除去法 |
US5514204A (en) * | 1994-07-07 | 1996-05-07 | The Boc Group, Inc. | Process for the purification of nitric oxide |
JP2004305869A (ja) * | 2003-04-04 | 2004-11-04 | Idemitsu Kosan Co Ltd | 硫黄化合物除去用吸着剤及び燃料電池用水素の製造方法 |
JP4641255B2 (ja) * | 2005-12-22 | 2011-03-02 | 住友精化株式会社 | 一酸化窒素精製方法 |
KR100978805B1 (ko) | 2008-07-11 | 2010-08-30 | (주)이노메이트 | 극저온 냉동 트랩을 이용한 고순도 일산화질소 제조방법 및그의 제조장치 |
-
2012
- 2012-09-27 JP JP2012215065A patent/JP6196434B2/ja active Active
-
2013
- 2013-07-16 TW TW102125341A patent/TWI619674B/zh active
- 2013-09-05 KR KR1020130106887A patent/KR102101999B1/ko active IP Right Grant
- 2013-09-26 CN CN201310445107.2A patent/CN103693629B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP2014069977A (ja) | 2014-04-21 |
CN103693629A (zh) | 2014-04-02 |
KR20140041339A (ko) | 2014-04-04 |
CN103693629B (zh) | 2017-06-13 |
TWI619674B (zh) | 2018-04-01 |
KR102101999B1 (ko) | 2020-04-17 |
TW201420495A (zh) | 2014-06-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4315666B2 (ja) | 合成ガス精製方法 | |
KR102278991B1 (ko) | 액체상 극저온 흡착을 통한 아르곤의 정제 | |
JP2006512186A (ja) | 物質流から一酸化炭素を除去する吸着組成物、及びその除去方法 | |
TW200536786A (en) | Ingredient and process for producing copper (I) chloride, adsorbent and adsorbing method for reductive gas each with the use of copper (I) chloride, and recovering method of carbon monoxide gas | |
JP2008537720A (ja) | 三フッ化窒素の精製 | |
JP6196434B2 (ja) | 一酸化窒素の精製方法 | |
JP2010227936A (ja) | アンモニアから水を除去する方法 | |
KR101812532B1 (ko) | 아산화질소의 정제 방법 | |
JP2007500123A (ja) | ホスゲン製造方法及び装置 | |
JP2019512390A (ja) | 温度スイング吸着プロセス | |
JP2017501869A (ja) | 酸性ガスの改善された吸着 | |
JP6298676B2 (ja) | 塩化水素精製方法 | |
JPH01164418A (ja) | 二酸化炭素の除去方法 | |
TW201938487A (zh) | 由粗一氧化碳氣體去除氧的方法及一氧化碳氣體的純化方法 | |
JPS63182206A (ja) | 高純度窒素製造方法及び装置 | |
TWI793793B (zh) | 去除氧分子之方法及一氧化碳之純化方法 | |
JP2000140549A (ja) | 二酸化炭酸の除去方法 | |
JPS63123417A (ja) | メタンガスの精製法 | |
JP2013194004A (ja) | 溶解アセチレンの精製方法 | |
JP2004300035A (ja) | メタンガスの分離方法および装置 | |
WO2016075033A1 (en) | Process for removing a small-molecule contaminant from a chlorine compound stream | |
JP2024152220A (ja) | 二酸化炭素回収システムおよび二酸化炭素の回収方法 | |
JPH0243916A (ja) | 圧力スイング吸着方法及び装置 | |
KR20020051315A (ko) | 고순도 아르곤가스 제조방법 | |
MXPA06007046A (es) | Extraccion regenerativa de trazas de monoxido de carbono |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150710 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150710 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20151216 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151222 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160222 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20160329 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160629 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20160706 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20160729 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170509 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170818 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6196434 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |