CN101669285B - 弹性波元件 - Google Patents
弹性波元件 Download PDFInfo
- Publication number
- CN101669285B CN101669285B CN2008800139924A CN200880013992A CN101669285B CN 101669285 B CN101669285 B CN 101669285B CN 2008800139924 A CN2008800139924 A CN 2008800139924A CN 200880013992 A CN200880013992 A CN 200880013992A CN 101669285 B CN101669285 B CN 101669285B
- Authority
- CN
- China
- Prior art keywords
- elastic wave
- oxide film
- silicon oxide
- wave device
- piezoelectric substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/0222—Details of interface-acoustic, boundary, pseudo-acoustic or Stonely wave devices
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (3)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007138591 | 2007-05-25 | ||
JP138591/2007 | 2007-05-25 | ||
JP082801/2008 | 2008-03-27 | ||
JP2008082801 | 2008-03-27 | ||
PCT/JP2008/001165 WO2008146449A1 (ja) | 2007-05-25 | 2008-05-09 | 弾性波素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101669285A CN101669285A (zh) | 2010-03-10 |
CN101669285B true CN101669285B (zh) | 2013-01-02 |
Family
ID=40074727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008800139924A Active CN101669285B (zh) | 2007-05-25 | 2008-05-09 | 弹性波元件 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7928633B2 (zh) |
EP (1) | EP2109218A4 (zh) |
JP (2) | JP4868063B2 (zh) |
CN (1) | CN101669285B (zh) |
WO (1) | WO2008146449A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010116995A1 (ja) * | 2009-04-07 | 2010-10-14 | 株式会社村田製作所 | 弾性境界波共振子及びラダー型フィルタ |
JP5625648B2 (ja) * | 2010-09-08 | 2014-11-19 | 株式会社村田製作所 | 酸窒化シリコン膜の成膜方法及び弾性境界波装置の製造方法 |
US9065424B2 (en) | 2011-03-25 | 2015-06-23 | Skyworks Panasonic Filter Solutions Japan Co., Ltd | Acoustic wave device with reduced higher order transverse modes |
EP2744107B1 (en) * | 2011-08-08 | 2020-01-15 | Murata Manufacturing Co., Ltd. | Elastic wave device |
US11522515B2 (en) | 2017-03-16 | 2022-12-06 | Skyworks Solutions, Inc. | Acoustic wave device including interdigital electrodes covered by silicon oxynitride film |
JP2018182354A (ja) * | 2017-04-03 | 2018-11-15 | 株式会社村田製作所 | 弾性波装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003198321A (ja) * | 2001-10-17 | 2003-07-11 | Murata Mfg Co Ltd | 弾性表面波装置およびその製造方法 |
CN1617311A (zh) * | 2003-11-12 | 2005-05-18 | 松下电器产业株式会社 | 半导体器件的制造方法 |
JP2005348139A (ja) * | 2004-06-03 | 2005-12-15 | Murata Mfg Co Ltd | 弾性波装置及びその製造方法 |
CN1764335A (zh) * | 2004-10-22 | 2006-04-26 | 精工爱普生株式会社 | 有机电致发光装置的制造方法和有机电致发光装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3293408B2 (ja) * | 1995-06-01 | 2002-06-17 | 松下電器産業株式会社 | Sawデバイスおよびその製造方法 |
JP2914282B2 (ja) * | 1996-03-25 | 1999-06-28 | 日本電気株式会社 | 半導体装置の製造方法 |
JP3445971B2 (ja) * | 2000-12-14 | 2003-09-16 | 富士通株式会社 | 弾性表面波素子 |
JP4109877B2 (ja) | 2001-03-04 | 2008-07-02 | 和彦 山之内 | 弾性表面波機能素子 |
EP1239588A2 (en) * | 2001-03-04 | 2002-09-11 | Kazuhiko Yamanouchi | Surface acoustic wave substrate and surface acoustic wave functional element |
WO2002082644A1 (fr) * | 2001-03-30 | 2002-10-17 | Mitsubishi Denki Kabushiki Kaisha | Dispositif d'onde acoustique et procede de fabrication correspondant |
CN100563100C (zh) * | 2004-03-02 | 2009-11-25 | 株式会社村田制作所 | 表面声波装置 |
JP2007028297A (ja) * | 2005-07-19 | 2007-02-01 | Seiko Epson Corp | Sawデバイスの製造方法 |
JP5125729B2 (ja) * | 2008-04-28 | 2013-01-23 | パナソニック株式会社 | 弾性波素子と、これを用いたフィルタ及び電子機器 |
-
2008
- 2008-05-09 WO PCT/JP2008/001165 patent/WO2008146449A1/ja active Application Filing
- 2008-05-09 EP EP08751689A patent/EP2109218A4/en not_active Withdrawn
- 2008-05-09 US US12/532,426 patent/US7928633B2/en active Active
- 2008-05-09 CN CN2008800139924A patent/CN101669285B/zh active Active
- 2008-05-09 JP JP2009516166A patent/JP4868063B2/ja active Active
-
2011
- 2011-09-07 JP JP2011194510A patent/JP5278513B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003198321A (ja) * | 2001-10-17 | 2003-07-11 | Murata Mfg Co Ltd | 弾性表面波装置およびその製造方法 |
CN1617311A (zh) * | 2003-11-12 | 2005-05-18 | 松下电器产业株式会社 | 半导体器件的制造方法 |
JP2005348139A (ja) * | 2004-06-03 | 2005-12-15 | Murata Mfg Co Ltd | 弾性波装置及びその製造方法 |
CN1764335A (zh) * | 2004-10-22 | 2006-04-26 | 精工爱普生株式会社 | 有机电致发光装置的制造方法和有机电致发光装置 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2008146449A1 (ja) | 2010-08-19 |
JP5278513B2 (ja) | 2013-09-04 |
JP4868063B2 (ja) | 2012-02-01 |
CN101669285A (zh) | 2010-03-10 |
US7928633B2 (en) | 2011-04-19 |
WO2008146449A1 (ja) | 2008-12-04 |
EP2109218A4 (en) | 2012-11-28 |
US20100060101A1 (en) | 2010-03-11 |
EP2109218A1 (en) | 2009-10-14 |
JP2011254549A (ja) | 2011-12-15 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SKYWORKS PANASONIC FILTRATE SOLUTIONS JAPAN CO., L Free format text: FORMER OWNER: MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. Effective date: 20150126 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150126 Address after: Osaka Japan Patentee after: PANASONIC CORPORATION Address before: Osaka Japan Patentee before: Matsushita Electric Industrial Co., Ltd. |
|
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: Osaka Japan Patentee after: Japan Industrial Co., Ltd. Address before: Osaka Japan Patentee before: PANASONIC CORPORATION |