CN101616743A - 无定形亚微米颗粒 - Google Patents
无定形亚微米颗粒 Download PDFInfo
- Publication number
- CN101616743A CN101616743A CN200780046474A CN200780046474A CN101616743A CN 101616743 A CN101616743 A CN 101616743A CN 200780046474 A CN200780046474 A CN 200780046474A CN 200780046474 A CN200780046474 A CN 200780046474A CN 101616743 A CN101616743 A CN 101616743A
- Authority
- CN
- China
- Prior art keywords
- grinding
- clasfficiator
- gas
- grading wheel
- aeropulverizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title claims abstract description 134
- 238000000034 method Methods 0.000 claims abstract description 74
- 239000007787 solid Substances 0.000 claims abstract description 67
- 238000000227 grinding Methods 0.000 claims description 130
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 106
- 239000007789 gas Substances 0.000 claims description 50
- 239000000463 material Substances 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 37
- 238000001035 drying Methods 0.000 claims description 22
- 238000010438 heat treatment Methods 0.000 claims description 18
- 229910002027 silica gel Inorganic materials 0.000 claims description 16
- 239000000741 silica gel Substances 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 15
- 239000011148 porous material Substances 0.000 claims description 15
- 238000011010 flushing procedure Methods 0.000 claims description 13
- 239000000017 hydrogel Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 230000002776 aggregation Effects 0.000 claims description 10
- 239000000499 gel Substances 0.000 claims description 10
- 238000004220 aggregation Methods 0.000 claims description 9
- 239000012530 fluid Substances 0.000 claims description 9
- 230000010354 integration Effects 0.000 claims description 9
- 230000003321 amplification Effects 0.000 claims description 7
- 238000009833 condensation Methods 0.000 claims description 7
- 230000005494 condensation Effects 0.000 claims description 7
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 6
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 239000012065 filter cake Substances 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 230000006837 decompression Effects 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 description 44
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 22
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 239000000047 product Substances 0.000 description 18
- 239000000523 sample Substances 0.000 description 17
- 230000008569 process Effects 0.000 description 16
- 238000000926 separation method Methods 0.000 description 16
- 238000004458 analytical method Methods 0.000 description 12
- 238000002360 preparation method Methods 0.000 description 12
- 238000013461 design Methods 0.000 description 11
- 239000006185 dispersion Substances 0.000 description 11
- 239000000725 suspension Substances 0.000 description 11
- 238000009826 distribution Methods 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 8
- 235000013325 dietary fiber Nutrition 0.000 description 8
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 8
- 239000003513 alkali Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 235000019353 potassium silicate Nutrition 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 6
- 230000002349 favourable effect Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000012937 correction Methods 0.000 description 5
- 239000008187 granular material Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000032683 aging Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000003556 assay Methods 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000011164 primary particle Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000001238 wet grinding Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000009837 dry grinding Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 229960004592 isopropanol Drugs 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000012216 screening Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000005029 sieve analysis Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000012085 test solution Substances 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- RNAMYOYQYRYFQY-UHFFFAOYSA-N 2-(4,4-difluoropiperidin-1-yl)-6-methoxy-n-(1-propan-2-ylpiperidin-4-yl)-7-(3-pyrrolidin-1-ylpropoxy)quinazolin-4-amine Chemical compound N1=C(N2CCC(F)(F)CC2)N=C2C=C(OCCCN3CCCC3)C(OC)=CC2=C1NC1CCN(C(C)C)CC1 RNAMYOYQYRYFQY-UHFFFAOYSA-N 0.000 description 1
- CVOFKRWYWCSDMA-UHFFFAOYSA-N 2-chloro-n-(2,6-diethylphenyl)-n-(methoxymethyl)acetamide;2,6-dinitro-n,n-dipropyl-4-(trifluoromethyl)aniline Chemical compound CCC1=CC=CC(CC)=C1N(COC)C(=O)CCl.CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O CVOFKRWYWCSDMA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009933 burial Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000003703 image analysis method Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- ZSDSQXJSNMTJDA-UHFFFAOYSA-N trifluralin Chemical compound CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O ZSDSQXJSNMTJDA-UHFFFAOYSA-N 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C19/00—Other disintegrating devices or methods
- B02C19/18—Use of auxiliary physical effects, e.g. ultrasonics, irradiation, for disintegrating
- B02C19/186—Use of cold or heat for disintegrating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C19/00—Other disintegrating devices or methods
- B02C19/06—Jet mills
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C19/00—Other disintegrating devices or methods
- B02C19/0012—Devices for disintegrating materials by collision of these materials against a breaking surface or breaking body and/or by friction between the material particles (also for grain)
- B02C19/005—Devices for disintegrating materials by collision of these materials against a breaking surface or breaking body and/or by friction between the material particles (also for grain) the materials to be pulverised being disintegrated by collision of, or friction between, the material particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C19/00—Other disintegrating devices or methods
- B02C19/06—Jet mills
- B02C19/068—Jet mills of the fluidised-bed type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C21/00—Disintegrating plant with or without drying of the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C23/00—Auxiliary methods or auxiliary devices or accessories specially adapted for crushing or disintegrating not provided for in preceding groups or not specially adapted to apparatus covered by a single preceding group
- B02C23/08—Separating or sorting of material, associated with crushing or disintegrating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/259—Silicic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Abstract
Description
实施例 | 实施例1 | 实施例2 | 实施例3a | 实施例3b | 实施例3c | |
原料 | 二氧化硅1 | 二氧化硅2 | 二氧化硅3a | 二氧化硅3b | 二氧化硅3c | |
喷嘴直径 | [mm] | 2.5 | 2.5 | 2.5 | 2.5 | 2.5 |
喷嘴类型 | Laval | Laval | Laval | Laval | Laval | |
数量 | [个] | 3 | 3 | 3 | 3 | 3 |
研磨机内部压力 | [巴abs.] | 1.306 | 1.305 | 1.305 | 1.304 | 1.305 |
入口压力 | [巴abs.] | 37.9 | 37.5 | 36.9 | 37.0 | 37.0 |
入口温度 | [℃] | 325 | 284 | 327 | 324 | 326 |
研磨机出口温度 | [℃] | 149.8 | 117 | 140.3 | 140.1 | 139.7 |
分机器转速 | [min-1] | 5619 | 5500 | 5491 | 5497 | 5516 |
分级器电流 | [A%] | 54.5 | 53.9 | 60.2 | 56.0 | 56.5 |
汲取管直径 | [mm] | 100 | 100 | 100 | 100 | 100 |
实施例1 | 实施例2 | 实施例3a | 实施例3b | 实施例3c | ||
d50 1) | nm | 125 | 106 | 136 | 140 | 89 |
d90 1) | nm | 275 | 175 | 275 | 250 | 200 |
d99 1) | nm | 525 | 300 | 575 | 850 | 625 |
BET表面积 | m2/g | 122 | 354 | 345 | 539 | 421 |
N2孔体积 | ml/g | n.b. | 1.51 | 1.77 | 0.36 | 0.93 |
平均孔径 | nm | n.b. | 17.1 | 20.5 | 2.7 | 8.8 |
DBP(无水的) | g/100g | 235 | 293 | 306 | 124 | 202 |
振实密度 | g/l | 42 | 39 | 36 | 224 | 96 |
干燥损失 | % | 4.4 | 6.1 | 5.5 | 6.3 | 6.4 |
Claims (27)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006048850A DE102006048850A1 (de) | 2006-10-16 | 2006-10-16 | Amorphe submicron Partikel |
DE102006048850.4 | 2006-10-16 | ||
PCT/EP2007/060306 WO2008046727A2 (de) | 2006-10-16 | 2007-09-28 | Amorphe submicron partikel |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101616743A true CN101616743A (zh) | 2009-12-30 |
CN101616743B CN101616743B (zh) | 2014-03-05 |
Family
ID=38783519
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200780046474.8A Active CN101616743B (zh) | 2006-10-16 | 2007-09-28 | 无定形亚微米颗粒 |
CNA2007103071850A Pending CN101244402A (zh) | 2006-10-16 | 2007-10-15 | 无定形亚微米颗粒 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2007103071850A Pending CN101244402A (zh) | 2006-10-16 | 2007-10-15 | 无定形亚微米颗粒 |
Country Status (19)
Country | Link |
---|---|
US (2) | US7850102B2 (zh) |
EP (1) | EP2089163B1 (zh) |
JP (1) | JP5511384B2 (zh) |
KR (1) | KR101503936B1 (zh) |
CN (2) | CN101616743B (zh) |
BR (1) | BRPI0717334B1 (zh) |
CA (1) | CA2666099A1 (zh) |
DE (1) | DE102006048850A1 (zh) |
ES (1) | ES2658825T3 (zh) |
HU (1) | HUE038516T2 (zh) |
MX (1) | MX2009003984A (zh) |
NO (1) | NO20091880L (zh) |
PL (1) | PL2089163T3 (zh) |
PT (1) | PT2089163T (zh) |
RU (1) | RU2458741C2 (zh) |
TW (1) | TWI446970B (zh) |
UA (1) | UA98627C2 (zh) |
WO (1) | WO2008046727A2 (zh) |
ZA (1) | ZA200902603B (zh) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004005411A1 (de) * | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophobe Fällungskieselsäure für Entschäumerformulierungen |
DE102004029069A1 (de) | 2004-06-16 | 2005-12-29 | Degussa Ag | Oberflächenmodifizierte Silicagele |
US7276156B2 (en) * | 2005-05-26 | 2007-10-02 | Tony Mason Lockerman | Storm drain filter |
US7767180B2 (en) | 2006-05-26 | 2010-08-03 | Degussa Gmbh | Precipitated silicas having special surface properties |
DE102006024590A1 (de) * | 2006-05-26 | 2007-11-29 | Degussa Gmbh | Hydrophile Kieselsäure für Dichtungsmassen |
EP1894906A1 (en) * | 2006-08-28 | 2008-03-05 | Bruker BioSpin AG | Superconducting element containing MgB2 |
DE102007052269A1 (de) | 2007-11-02 | 2009-05-07 | Evonik Degussa Gmbh | Fällungskieselsäuren für lagerstabile RTV-1 Siliconkautschukformulierungen ohne Stabilisator |
US7985292B2 (en) | 2007-11-26 | 2011-07-26 | Evonik Degussa Corporation | Precipitated silica for thickening and creating thixotropic behavior in liquid systems |
US8235314B2 (en) * | 2009-02-12 | 2012-08-07 | Linde Aktiengesellschaft | Nonequilibrium humidity control for jet milling |
ES2424219T3 (es) | 2009-02-13 | 2013-09-30 | Evonik Degussa Gmbh | Un material de aislamiento térmico que comprende sílice precipitada |
DE102009045104A1 (de) | 2009-09-29 | 2011-03-31 | Evonik Degussa Gmbh | Neuartige Mattierungsmittel für UV-Lacke |
DE102009045116A1 (de) * | 2009-09-29 | 2011-03-31 | Evonik Degussa Gmbh | Niederdruckvermahlungsverfahren |
IT1398853B1 (it) * | 2010-03-23 | 2013-03-21 | Lb Officine Meccaniche Spa | Metodo per preparare materiale ceramico in polvere alla propria formatura |
DE102010029513A1 (de) * | 2010-05-31 | 2011-02-24 | Wacker Chemie Ag | Dämmung mit Schichtaufbau |
DE102010029945A1 (de) | 2010-06-10 | 2011-12-15 | Evonik Degussa Gmbh | Neuartige Mattierungsmittel für UV-Überdrucklacke |
DE102011102614A1 (de) * | 2011-05-27 | 2012-11-29 | Roland Nied | Verfahren zum Betrieb einer Strahlmühle sowie Strahlmühle |
US20120325942A1 (en) * | 2011-06-27 | 2012-12-27 | General Electric Company | Jet milling of boron powder using inert gases to meet purity requirements |
RU2508947C1 (ru) * | 2012-08-07 | 2014-03-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Национальный исследовательский Томский государственный университет" (ТГУ) | Способ получения ультрадисперсных порошков с узким фракционным составом |
HUE042852T2 (hu) | 2012-10-26 | 2019-07-29 | Fujifilm Wako Pure Chemical Corp | Térhálósított poliakrilsav alkalmazása kötõanyagban lítium akkumulátorhoz |
DE102013000426A1 (de) * | 2013-01-14 | 2014-07-17 | Roland Nied | Verfahren zur Strahlmahlung sowie Strahlmühle dafür |
DE102013208274A1 (de) | 2013-05-06 | 2014-11-20 | Wacker Chemie Ag | Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium |
CN103464262A (zh) * | 2013-08-12 | 2013-12-25 | 华尔润玻璃产业股份有限公司 | 一种石油焦制粉用蒸汽磨机及其应用 |
KR101933208B1 (ko) * | 2014-12-23 | 2018-12-31 | 주식회사 엘지화학 | 수분산 에어로젤 및 그 제조 방법 |
CN105126986A (zh) * | 2015-01-14 | 2015-12-09 | 华能桐乡燃机热电有限责任公司 | 磨煤机用螺旋旋流式煤粉收集装置 |
WO2018082789A1 (de) | 2016-11-07 | 2018-05-11 | Wacker Chemie Ag | Verfahren zum mahlen von silizium enthaltenden feststoffen |
CN109906201B (zh) * | 2016-11-07 | 2022-08-09 | 瓦克化学股份公司 | 用于研磨含硅固体的方法 |
CN106378247B (zh) * | 2016-12-10 | 2018-11-09 | 江西金辉再生资源股份有限公司 | 一种气流式锂长石粉碎加工装置 |
DE102017209874A1 (de) | 2017-06-12 | 2018-12-13 | Evonik Degussa Gmbh | Verfahren zur Herstellung von wachsbeschichteter Kieselsäure |
DE102018008127B4 (de) | 2018-10-13 | 2022-06-09 | Hosokawa Alpine Aktiengesellschaft | Blaskopf und Verfahren zur Herstellung einer Mehrschichtschlauchfolie |
DE102018009632B4 (de) | 2018-12-11 | 2021-12-09 | Hosokawa Alpine Aktiengesellschaft | Vorrichtung zum Aufwickeln und Wickelwechsel von bahnförmigem Material und ein Verfahren dafür |
CN109806531B (zh) * | 2019-01-30 | 2020-04-24 | 河南理工大学 | 一种低碳气体水合物粉碎抑爆装置 |
CN112337637A (zh) * | 2019-08-07 | 2021-02-09 | 赣州力信达冶金科技有限公司 | 一种用于解决物料经气流粉碎后不夹粗的方法 |
CN110788005B (zh) * | 2019-11-06 | 2021-01-15 | 中国矿业大学 | 一种用于超细粉体的离心式空气分级机 |
EP4132713A4 (en) * | 2020-04-30 | 2024-04-17 | Vectis Pty Ltd as trustee for JJB Trust | CRUSHER ROTOR |
DE102020006008B3 (de) | 2020-10-01 | 2022-03-31 | Hosokawa Alpine Aktiengesellschaft | Fließbettgegenstrahlmühle zur Erzeugung feinster Partikel aus Aufgabegut geringer Schüttdichte und Verfahren dafür |
DE102021002671A1 (de) | 2021-05-21 | 2022-11-24 | Hosokawa Alpine Aktiengesellschaft | Verfahren zur Ermittlung des optimalen Düsenabstands in Strahlmühlen und Mahlverfahren zur Erzeugung feinster Partikel |
CN114405633A (zh) * | 2022-01-25 | 2022-04-29 | 鸡西德立重工金属结构制造有限公司 | 一种机械磨粉碎机 |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2856268A (en) * | 1954-05-27 | 1958-10-14 | Grace W R & Co | Method of preparing low density gels |
NL6411993A (zh) * | 1963-10-18 | 1965-04-20 | ||
DE3303078C1 (de) * | 1983-01-29 | 1984-05-30 | Alpine Ag, 8900 Augsburg | Windsichter fuer den Feinstbereich |
DE3338138C2 (de) * | 1983-10-20 | 1986-01-16 | Alpine Ag, 8900 Augsburg | Fließbett-Gegenstrahlmühle |
JPS618145A (ja) * | 1984-06-25 | 1986-01-14 | 株式会社トクヤマ | 砕料の微粉砕方法 |
US5252110A (en) * | 1990-08-01 | 1993-10-12 | Roland Nied | Preferably vertical air separator |
DE4041827A1 (de) | 1990-12-24 | 1992-07-02 | Degussa | Faellungskieselsaeurepaste |
DE4202023A1 (de) | 1992-01-25 | 1993-07-29 | Degussa | Haftpromoter fuer kautschuk- und kunststoffmischungen |
JP3025609B2 (ja) * | 1994-02-23 | 2000-03-27 | 日本シリカ工業株式会社 | 濾過助剤用シリカゲル及びその製造方法 |
JPH0824702A (ja) * | 1994-07-20 | 1996-01-30 | Hosokawa Micron Corp | 原液から微粉末を製造する方法及びその装置 |
DE19527278A1 (de) | 1995-07-26 | 1997-01-30 | Degussa | Fällungskieselsäure |
US6191122B1 (en) | 1996-03-29 | 2001-02-20 | DEGUSSA HüLS AKTIENGESELLSCHAFT | Partially hydrophobic precipitated silicas |
JP3093158B2 (ja) * | 1996-12-18 | 2000-10-03 | ホソカワミクロン株式会社 | 微粉製造装置 |
JPH11138067A (ja) * | 1997-11-13 | 1999-05-25 | Hitachi Techno Eng Co Ltd | 降雨装置 |
DE10058616A1 (de) | 2000-11-25 | 2002-05-29 | Degussa | Fällungskieselsäuren mit hoher Struktur |
RU2272616C2 (ru) * | 2000-12-22 | 2006-03-27 | Бакстер Интернэшнл Инк. | Способ получения суспензий субмикронных частиц |
DE10138492A1 (de) | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad |
DE10138491A1 (de) | 2001-08-04 | 2003-02-13 | Degussa | Verfahren zur Herstellung einer hydrophoben Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme |
DE10138490A1 (de) | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme |
EP1295906A1 (de) | 2001-09-20 | 2003-03-26 | Degussa AG | Silikonkautschukformulierungen mit hydrophoben Kieselsäuren |
DE10203500A1 (de) | 2002-01-30 | 2003-08-07 | Degussa | Raumtemperaturvernetzende Einkomponenten-Silikonkautschukformulierungen mit hydrophoben Kieselsäuren |
DE10352039B4 (de) * | 2002-11-12 | 2006-03-30 | Kronos International, Inc. | Spiralstrahlmühle |
JP2005052826A (ja) * | 2003-07-18 | 2005-03-03 | Takeda Chem Ind Ltd | 粉体の処理方法と処理装置および粉体の製造方法 |
DE102004005409A1 (de) | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophile Fällungskieselsäure für Entschäumerformulierungen |
DE102004005411A1 (de) | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophobe Fällungskieselsäure für Entschäumerformulierungen |
JP2005272494A (ja) * | 2004-03-23 | 2005-10-06 | Dokai Chemical Industries Co Ltd | 着色シリカ被膜形成用コーティング組成物 |
DE102004029069A1 (de) | 2004-06-16 | 2005-12-29 | Degussa Ag | Oberflächenmodifizierte Silicagele |
US7767180B2 (en) | 2006-05-26 | 2010-08-03 | Degussa Gmbh | Precipitated silicas having special surface properties |
DE102006024590A1 (de) | 2006-05-26 | 2007-11-29 | Degussa Gmbh | Hydrophile Kieselsäure für Dichtungsmassen |
DE102006048865A1 (de) * | 2006-10-16 | 2008-04-17 | Roland Dr. Nied | Verfahren zur Erzeugung feinster Partikel und Strahlmühle dafür sowie Windsichter und Betriebsverfahren davon |
-
2006
- 2006-10-16 DE DE102006048850A patent/DE102006048850A1/de not_active Withdrawn
-
2007
- 2007-09-28 PT PT78206935T patent/PT2089163T/pt unknown
- 2007-09-28 WO PCT/EP2007/060306 patent/WO2008046727A2/de active Application Filing
- 2007-09-28 MX MX2009003984A patent/MX2009003984A/es not_active Application Discontinuation
- 2007-09-28 HU HUE07820693A patent/HUE038516T2/hu unknown
- 2007-09-28 EP EP07820693.5A patent/EP2089163B1/de active Active
- 2007-09-28 BR BRPI0717334-2A patent/BRPI0717334B1/pt not_active IP Right Cessation
- 2007-09-28 ES ES07820693.5T patent/ES2658825T3/es active Active
- 2007-09-28 PL PL07820693T patent/PL2089163T3/pl unknown
- 2007-09-28 CA CA002666099A patent/CA2666099A1/en not_active Abandoned
- 2007-09-28 UA UAA200904748A patent/UA98627C2/ru unknown
- 2007-09-28 JP JP2009532755A patent/JP5511384B2/ja active Active
- 2007-09-28 KR KR1020097009936A patent/KR101503936B1/ko active IP Right Grant
- 2007-09-28 RU RU2009118341/13A patent/RU2458741C2/ru active
- 2007-09-28 CN CN200780046474.8A patent/CN101616743B/zh active Active
- 2007-10-11 TW TW096138007A patent/TWI446970B/zh active
- 2007-10-15 CN CNA2007103071850A patent/CN101244402A/zh active Pending
- 2007-10-16 US US11/872,955 patent/US7850102B2/en active Active
-
2009
- 2009-04-15 ZA ZA200902603A patent/ZA200902603B/xx unknown
- 2009-05-13 NO NO20091880A patent/NO20091880L/no not_active Application Discontinuation
-
2010
- 2010-07-21 US US12/840,816 patent/US8039105B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
HUE038516T2 (hu) | 2018-10-29 |
EP2089163A2 (de) | 2009-08-19 |
BRPI0717334A2 (pt) | 2013-12-10 |
EP2089163B1 (de) | 2017-12-27 |
JP2010506708A (ja) | 2010-03-04 |
ZA200902603B (en) | 2010-04-28 |
US20100285317A1 (en) | 2010-11-11 |
TW200902153A (en) | 2009-01-16 |
WO2008046727A2 (de) | 2008-04-24 |
DE102006048850A1 (de) | 2008-04-17 |
MX2009003984A (es) | 2009-04-28 |
US20080173739A1 (en) | 2008-07-24 |
KR20090080971A (ko) | 2009-07-27 |
CN101616743B (zh) | 2014-03-05 |
PL2089163T3 (pl) | 2018-06-29 |
KR101503936B1 (ko) | 2015-03-18 |
PT2089163T (pt) | 2018-02-06 |
RU2458741C2 (ru) | 2012-08-20 |
RU2009118341A (ru) | 2010-11-27 |
UA98627C2 (ru) | 2012-06-11 |
US8039105B2 (en) | 2011-10-18 |
TWI446970B (zh) | 2014-08-01 |
CN101244402A (zh) | 2008-08-20 |
US7850102B2 (en) | 2010-12-14 |
CA2666099A1 (en) | 2008-04-24 |
NO20091880L (no) | 2009-07-14 |
BRPI0717334B1 (pt) | 2019-05-21 |
JP5511384B2 (ja) | 2014-06-04 |
ES2658825T3 (es) | 2018-03-12 |
WO2008046727A3 (de) | 2008-07-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101616743B (zh) | 无定形亚微米颗粒 | |
US7866582B2 (en) | Method for generating finest particles and jet mill therefor as well as classifier and operating method thereof | |
US8074907B2 (en) | Method for generating finest particles and jet mill therefor as well as classifier and operating method thereof | |
CN102317231B (zh) | 包含沉淀二氧化硅的隔热材料 | |
US8864056B2 (en) | Low-pressure milling process | |
KR102203601B1 (ko) | 할로이사이트 분말 및 할로이사이트 분말의 제조 방법 | |
CN101918313B (zh) | 用于不含稳定剂而可稳定储存的rtv-1硅橡胶配制物的沉淀二氧化硅 | |
Brems et al. | The transport disengagement height of fine and coarse particles |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
REG | Reference to a national code |
Ref country code: HK Ref legal event code: DE Ref document number: 1139893 Country of ref document: HK |
|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
REG | Reference to a national code |
Ref country code: HK Ref legal event code: WD Ref document number: 1139893 Country of ref document: HK |
|
CP01 | Change in the name or title of a patent holder |
Address after: Essen, Germany Patentee after: Evonik Operations Limited Address before: Essen, Germany Patentee before: EVONIK DEGUSSA GmbH |
|
CP01 | Change in the name or title of a patent holder |