PL2089163T3 - Amorficzne cząstki submikronowe - Google Patents

Amorficzne cząstki submikronowe

Info

Publication number
PL2089163T3
PL2089163T3 PL07820693T PL07820693T PL2089163T3 PL 2089163 T3 PL2089163 T3 PL 2089163T3 PL 07820693 T PL07820693 T PL 07820693T PL 07820693 T PL07820693 T PL 07820693T PL 2089163 T3 PL2089163 T3 PL 2089163T3
Authority
PL
Poland
Prior art keywords
submicron particles
amorphous submicron
amorphous
particles
submicron
Prior art date
Application number
PL07820693T
Other languages
English (en)
Inventor
Karl Meier
Ulrich Brinkmann
Christian Panz
Doris Misselich
Christian Götz
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Publication of PL2089163T3 publication Critical patent/PL2089163T3/pl

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C19/00—Other disintegrating devices or methods
    • B02C19/06—Jet mills
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C19/00—Other disintegrating devices or methods
    • B02C19/18—Use of auxiliary physical effects, e.g. ultrasonics, irradiation, for disintegrating
    • B02C19/186—Use of cold or heat for disintegrating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C19/00—Other disintegrating devices or methods
    • B02C19/0012—Devices for disintegrating materials by collision of these materials against a breaking surface or breaking body and/or by friction between the material particles (also for grain)
    • B02C19/005—Devices for disintegrating materials by collision of these materials against a breaking surface or breaking body and/or by friction between the material particles (also for grain) the materials to be pulverised being disintegrated by collision of, or friction between, the material particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C19/00—Other disintegrating devices or methods
    • B02C19/06—Jet mills
    • B02C19/068—Jet mills of the fluidised-bed type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C21/00—Disintegrating plant with or without drying of the material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C23/00—Auxiliary methods or auxiliary devices or accessories specially adapted for crushing or disintegrating not provided for in preceding groups or not specially adapted to apparatus covered by a single preceding group
    • B02C23/08—Separating or sorting of material, associated with crushing or disintegrating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/259—Silicic material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
PL07820693T 2006-10-16 2007-09-28 Amorficzne cząstki submikronowe PL2089163T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006048850A DE102006048850A1 (de) 2006-10-16 2006-10-16 Amorphe submicron Partikel
PCT/EP2007/060306 WO2008046727A2 (de) 2006-10-16 2007-09-28 Amorphe submicron partikel
EP07820693.5A EP2089163B1 (de) 2006-10-16 2007-09-28 Amorphe submicron partikel

Publications (1)

Publication Number Publication Date
PL2089163T3 true PL2089163T3 (pl) 2018-06-29

Family

ID=38783519

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07820693T PL2089163T3 (pl) 2006-10-16 2007-09-28 Amorficzne cząstki submikronowe

Country Status (19)

Country Link
US (2) US7850102B2 (pl)
EP (1) EP2089163B1 (pl)
JP (1) JP5511384B2 (pl)
KR (1) KR101503936B1 (pl)
CN (2) CN101616743B (pl)
BR (1) BRPI0717334B1 (pl)
CA (1) CA2666099A1 (pl)
DE (1) DE102006048850A1 (pl)
ES (1) ES2658825T3 (pl)
HU (1) HUE038516T2 (pl)
MX (1) MX2009003984A (pl)
NO (1) NO20091880L (pl)
PL (1) PL2089163T3 (pl)
PT (1) PT2089163T (pl)
RU (1) RU2458741C2 (pl)
TW (1) TWI446970B (pl)
UA (1) UA98627C2 (pl)
WO (1) WO2008046727A2 (pl)
ZA (1) ZA200902603B (pl)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004005411A1 (de) * 2004-02-03 2005-08-18 Degussa Ag Hydrophobe Fällungskieselsäure für Entschäumerformulierungen
DE102004029069A1 (de) 2004-06-16 2005-12-29 Degussa Ag Oberflächenmodifizierte Silicagele
US7276156B2 (en) * 2005-05-26 2007-10-02 Tony Mason Lockerman Storm drain filter
US7767180B2 (en) 2006-05-26 2010-08-03 Degussa Gmbh Precipitated silicas having special surface properties
DE102006024590A1 (de) * 2006-05-26 2007-11-29 Degussa Gmbh Hydrophile Kieselsäure für Dichtungsmassen
EP1894906A1 (en) * 2006-08-28 2008-03-05 Bruker BioSpin AG Superconducting element containing MgB2
DE102007052269A1 (de) 2007-11-02 2009-05-07 Evonik Degussa Gmbh Fällungskieselsäuren für lagerstabile RTV-1 Siliconkautschukformulierungen ohne Stabilisator
US7985292B2 (en) 2007-11-26 2011-07-26 Evonik Degussa Corporation Precipitated silica for thickening and creating thixotropic behavior in liquid systems
US8235314B2 (en) * 2009-02-12 2012-08-07 Linde Aktiengesellschaft Nonequilibrium humidity control for jet milling
ES2424219T3 (es) 2009-02-13 2013-09-30 Evonik Degussa Gmbh Un material de aislamiento térmico que comprende sílice precipitada
DE102009045104A1 (de) 2009-09-29 2011-03-31 Evonik Degussa Gmbh Neuartige Mattierungsmittel für UV-Lacke
DE102009045116A1 (de) * 2009-09-29 2011-03-31 Evonik Degussa Gmbh Niederdruckvermahlungsverfahren
IT1398853B1 (it) * 2010-03-23 2013-03-21 Lb Officine Meccaniche Spa Metodo per preparare materiale ceramico in polvere alla propria formatura
DE102010029513A1 (de) * 2010-05-31 2011-02-24 Wacker Chemie Ag Dämmung mit Schichtaufbau
DE102010029945A1 (de) 2010-06-10 2011-12-15 Evonik Degussa Gmbh Neuartige Mattierungsmittel für UV-Überdrucklacke
DE102011102614A1 (de) * 2011-05-27 2012-11-29 Roland Nied Verfahren zum Betrieb einer Strahlmühle sowie Strahlmühle
US20120325942A1 (en) * 2011-06-27 2012-12-27 General Electric Company Jet milling of boron powder using inert gases to meet purity requirements
RU2508947C1 (ru) * 2012-08-07 2014-03-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Национальный исследовательский Томский государственный университет" (ТГУ) Способ получения ультрадисперсных порошков с узким фракционным составом
HUE042852T2 (hu) 2012-10-26 2019-07-29 Fujifilm Wako Pure Chemical Corp Térhálósított poliakrilsav alkalmazása kötõanyagban lítium akkumulátorhoz
DE102013000426A1 (de) * 2013-01-14 2014-07-17 Roland Nied Verfahren zur Strahlmahlung sowie Strahlmühle dafür
DE102013208274A1 (de) 2013-05-06 2014-11-20 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium
CN103464262A (zh) * 2013-08-12 2013-12-25 华尔润玻璃产业股份有限公司 一种石油焦制粉用蒸汽磨机及其应用
KR101933208B1 (ko) * 2014-12-23 2018-12-31 주식회사 엘지화학 수분산 에어로젤 및 그 제조 방법
CN105126986A (zh) * 2015-01-14 2015-12-09 华能桐乡燃机热电有限责任公司 磨煤机用螺旋旋流式煤粉收集装置
WO2018082789A1 (de) 2016-11-07 2018-05-11 Wacker Chemie Ag Verfahren zum mahlen von silizium enthaltenden feststoffen
CN109906201B (zh) * 2016-11-07 2022-08-09 瓦克化学股份公司 用于研磨含硅固体的方法
CN106378247B (zh) * 2016-12-10 2018-11-09 江西金辉再生资源股份有限公司 一种气流式锂长石粉碎加工装置
DE102017209874A1 (de) 2017-06-12 2018-12-13 Evonik Degussa Gmbh Verfahren zur Herstellung von wachsbeschichteter Kieselsäure
DE102018008127B4 (de) 2018-10-13 2022-06-09 Hosokawa Alpine Aktiengesellschaft Blaskopf und Verfahren zur Herstellung einer Mehrschichtschlauchfolie
DE102018009632B4 (de) 2018-12-11 2021-12-09 Hosokawa Alpine Aktiengesellschaft Vorrichtung zum Aufwickeln und Wickelwechsel von bahnförmigem Material und ein Verfahren dafür
CN109806531B (zh) * 2019-01-30 2020-04-24 河南理工大学 一种低碳气体水合物粉碎抑爆装置
CN112337637A (zh) * 2019-08-07 2021-02-09 赣州力信达冶金科技有限公司 一种用于解决物料经气流粉碎后不夹粗的方法
CN110788005B (zh) * 2019-11-06 2021-01-15 中国矿业大学 一种用于超细粉体的离心式空气分级机
EP4132713A4 (en) * 2020-04-30 2024-04-17 Vectis Pty Ltd as trustee for JJB Trust CRUSHER ROTOR
DE102020006008B3 (de) 2020-10-01 2022-03-31 Hosokawa Alpine Aktiengesellschaft Fließbettgegenstrahlmühle zur Erzeugung feinster Partikel aus Aufgabegut geringer Schüttdichte und Verfahren dafür
DE102021002671A1 (de) 2021-05-21 2022-11-24 Hosokawa Alpine Aktiengesellschaft Verfahren zur Ermittlung des optimalen Düsenabstands in Strahlmühlen und Mahlverfahren zur Erzeugung feinster Partikel
CN114405633A (zh) * 2022-01-25 2022-04-29 鸡西德立重工金属结构制造有限公司 一种机械磨粉碎机

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2856268A (en) * 1954-05-27 1958-10-14 Grace W R & Co Method of preparing low density gels
NL6411993A (pl) * 1963-10-18 1965-04-20
DE3303078C1 (de) * 1983-01-29 1984-05-30 Alpine Ag, 8900 Augsburg Windsichter fuer den Feinstbereich
DE3338138C2 (de) * 1983-10-20 1986-01-16 Alpine Ag, 8900 Augsburg Fließbett-Gegenstrahlmühle
JPS618145A (ja) * 1984-06-25 1986-01-14 株式会社トクヤマ 砕料の微粉砕方法
US5252110A (en) * 1990-08-01 1993-10-12 Roland Nied Preferably vertical air separator
DE4041827A1 (de) 1990-12-24 1992-07-02 Degussa Faellungskieselsaeurepaste
DE4202023A1 (de) 1992-01-25 1993-07-29 Degussa Haftpromoter fuer kautschuk- und kunststoffmischungen
JP3025609B2 (ja) * 1994-02-23 2000-03-27 日本シリカ工業株式会社 濾過助剤用シリカゲル及びその製造方法
JPH0824702A (ja) * 1994-07-20 1996-01-30 Hosokawa Micron Corp 原液から微粉末を製造する方法及びその装置
DE19527278A1 (de) 1995-07-26 1997-01-30 Degussa Fällungskieselsäure
US6191122B1 (en) 1996-03-29 2001-02-20 DEGUSSA HüLS AKTIENGESELLSCHAFT Partially hydrophobic precipitated silicas
JP3093158B2 (ja) * 1996-12-18 2000-10-03 ホソカワミクロン株式会社 微粉製造装置
JPH11138067A (ja) * 1997-11-13 1999-05-25 Hitachi Techno Eng Co Ltd 降雨装置
DE10058616A1 (de) 2000-11-25 2002-05-29 Degussa Fällungskieselsäuren mit hoher Struktur
RU2272616C2 (ru) * 2000-12-22 2006-03-27 Бакстер Интернэшнл Инк. Способ получения суспензий субмикронных частиц
DE10138492A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad
DE10138491A1 (de) 2001-08-04 2003-02-13 Degussa Verfahren zur Herstellung einer hydrophoben Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
DE10138490A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
EP1295906A1 (de) 2001-09-20 2003-03-26 Degussa AG Silikonkautschukformulierungen mit hydrophoben Kieselsäuren
DE10203500A1 (de) 2002-01-30 2003-08-07 Degussa Raumtemperaturvernetzende Einkomponenten-Silikonkautschukformulierungen mit hydrophoben Kieselsäuren
DE10352039B4 (de) * 2002-11-12 2006-03-30 Kronos International, Inc. Spiralstrahlmühle
JP2005052826A (ja) * 2003-07-18 2005-03-03 Takeda Chem Ind Ltd 粉体の処理方法と処理装置および粉体の製造方法
DE102004005409A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophile Fällungskieselsäure für Entschäumerformulierungen
DE102004005411A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophobe Fällungskieselsäure für Entschäumerformulierungen
JP2005272494A (ja) * 2004-03-23 2005-10-06 Dokai Chemical Industries Co Ltd 着色シリカ被膜形成用コーティング組成物
DE102004029069A1 (de) 2004-06-16 2005-12-29 Degussa Ag Oberflächenmodifizierte Silicagele
US7767180B2 (en) 2006-05-26 2010-08-03 Degussa Gmbh Precipitated silicas having special surface properties
DE102006024590A1 (de) 2006-05-26 2007-11-29 Degussa Gmbh Hydrophile Kieselsäure für Dichtungsmassen
DE102006048865A1 (de) * 2006-10-16 2008-04-17 Roland Dr. Nied Verfahren zur Erzeugung feinster Partikel und Strahlmühle dafür sowie Windsichter und Betriebsverfahren davon

Also Published As

Publication number Publication date
HUE038516T2 (hu) 2018-10-29
CN101616743A (zh) 2009-12-30
EP2089163A2 (de) 2009-08-19
BRPI0717334A2 (pt) 2013-12-10
EP2089163B1 (de) 2017-12-27
JP2010506708A (ja) 2010-03-04
ZA200902603B (en) 2010-04-28
US20100285317A1 (en) 2010-11-11
TW200902153A (en) 2009-01-16
WO2008046727A2 (de) 2008-04-24
DE102006048850A1 (de) 2008-04-17
MX2009003984A (es) 2009-04-28
US20080173739A1 (en) 2008-07-24
KR20090080971A (ko) 2009-07-27
CN101616743B (zh) 2014-03-05
KR101503936B1 (ko) 2015-03-18
PT2089163T (pt) 2018-02-06
RU2458741C2 (ru) 2012-08-20
RU2009118341A (ru) 2010-11-27
UA98627C2 (ru) 2012-06-11
US8039105B2 (en) 2011-10-18
TWI446970B (zh) 2014-08-01
CN101244402A (zh) 2008-08-20
US7850102B2 (en) 2010-12-14
CA2666099A1 (en) 2008-04-24
NO20091880L (no) 2009-07-14
BRPI0717334B1 (pt) 2019-05-21
JP5511384B2 (ja) 2014-06-04
ES2658825T3 (es) 2018-03-12
WO2008046727A3 (de) 2008-07-17

Similar Documents

Publication Publication Date Title
ZA200902603B (en) Amorphous submicron particles
EP2155397A4 (en) PARTICLE REDUCTION DEVICE
GB0607866D0 (en) Nanostructures
EP2128597A4 (en) FINE PARTICLE DETECTOR
GB2442942B (en) Shredder
PL2059558T3 (pl) Nowe nanocząstki
EP2075615A4 (en) MICROSCOPE
EP1973837A4 (en) LIPID NANOPARTICLES
GB2441659B (en) Electrostatic chuck
ZA200902508B (en) Particle formation
GB2441228B (en) Modelling
EP2042526A4 (en) DEODORIZING PARTICLE
EP2047843A4 (en) hydrogel
TWI318894B (en) System for fabricating nano particles
EP2005968A4 (en) NANOCOMPOSITE PARTICLE
TWI372139B (en) Pelletized silica particles
EP1977992A4 (en) NANOSEMICONDUCTOR PARTICLE
EP2190793A4 (en) MODIFIED SURFACES WITH NANOSCOPIC INORGANIC OXID PARTICLES
EP2156837A4 (en) PARTICLES OF CRYSTALLINE MICROPOUDER
GB2442541B (en) Pushchairs
GB0708968D0 (en) Secure receptacle
GB0625626D0 (en) Particles
GB0723190D0 (en) Nanocomposite particles
GB0606513D0 (en) Nano particle disinfectant
AU2007902223A0 (en) Particle reduction device