CN101600517A - 再生装置以及再生方法 - Google Patents

再生装置以及再生方法 Download PDF

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Publication number
CN101600517A
CN101600517A CNA2007800483113A CN200780048311A CN101600517A CN 101600517 A CN101600517 A CN 101600517A CN A2007800483113 A CNA2007800483113 A CN A2007800483113A CN 200780048311 A CN200780048311 A CN 200780048311A CN 101600517 A CN101600517 A CN 101600517A
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CN
China
Prior art keywords
cleaning fluid
unit
regeneration
regenerating
treating apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007800483113A
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English (en)
Chinese (zh)
Inventor
高本德男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirata Corp
Original Assignee
Hirata Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirata Corp filed Critical Hirata Corp
Publication of CN101600517A publication Critical patent/CN101600517A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/42—Regulation; Control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
CNA2007800483113A 2006-12-27 2007-12-27 再生装置以及再生方法 Pending CN101600517A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPPCT/JP2006/326079 2006-12-27
PCT/JP2006/326079 WO2008081508A1 (fr) 2006-12-27 2006-12-27 Appareil et méthode de régénération

Publications (1)

Publication Number Publication Date
CN101600517A true CN101600517A (zh) 2009-12-09

Family

ID=39588199

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007800483113A Pending CN101600517A (zh) 2006-12-27 2007-12-27 再生装置以及再生方法

Country Status (4)

Country Link
KR (1) KR101126588B1 (fr)
CN (1) CN101600517A (fr)
TW (1) TWI373362B (fr)
WO (2) WO2008081508A1 (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103167916A (zh) * 2010-10-11 2013-06-19 Tms运输及装配系统有限公司 用于清洁工业制造的构件的清洁设备及方法
CN104056798A (zh) * 2014-05-21 2014-09-24 上海和辉光电有限公司 清洗液的回收和供给设备及方法
CN104858178A (zh) * 2014-09-15 2015-08-26 杜正阔 一种清洗液可以汽化加压液化再生的超声清洗机技术
JP2016072445A (ja) * 2014-09-30 2016-05-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
US10580668B2 (en) 2014-03-17 2020-03-03 SCREEN Holdings Co., Ltd. Substrate processing apparatus and substrate processing method using substrate processing apparatus
CN110871192A (zh) * 2019-10-30 2020-03-10 宁波兰羚钢铁实业有限公司 一种纵剪加工减少钢卷表面重涂油和油污的方法
CN113426752A (zh) * 2021-06-28 2021-09-24 北京七星华创集成电路装备有限公司 掩膜板的清洗设备

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6748150B2 (ja) * 2018-06-14 2020-08-26 ファナック株式会社 ガルバノミラー及びレーザ加工装置
KR102598967B1 (ko) * 2020-09-07 2023-11-06 현대자동차주식회사 피처리액 처리장치 및 처리방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2758813B2 (ja) * 1993-11-04 1998-05-28 出光興産株式会社 細管の洗浄方法および装置
JP3117871B2 (ja) * 1994-06-17 2000-12-18 大同特殊鋼株式会社 鋼材の酸洗方法および酸洗装置
JP3168928B2 (ja) * 1996-11-29 2001-05-21 住友金属工業株式会社 鋼板の洗浄装置
US6354310B1 (en) * 1998-11-12 2002-03-12 General Electric Company Apparatus and process to clean and strip coatings from hardware
JP2000292932A (ja) * 1999-04-09 2000-10-20 Seiko Epson Corp レジスト処理装置
JP2000334400A (ja) * 1999-05-31 2000-12-05 Nakajima Kogyo:Kk 洗浄システム
JP3697123B2 (ja) * 1999-11-19 2005-09-21 三菱重工業株式会社 印刷機の廃液再生装置
JP2002180278A (ja) * 2000-12-07 2002-06-26 Sanyo Special Steel Co Ltd 鋼材塩酸酸洗槽の塩酸濃度制御方法および鋼材の酸洗方法
JP4733855B2 (ja) * 2001-04-27 2011-07-27 株式会社野坂電機 廃酸溶液の酸回収方法
JP4557742B2 (ja) * 2005-02-15 2010-10-06 三洋電機株式会社 溶剤回収機能付き蒸留装置
KR100753629B1 (ko) * 2006-05-26 2007-08-29 세메스 주식회사 기판 처리 장치 및 방법

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103167916A (zh) * 2010-10-11 2013-06-19 Tms运输及装配系统有限公司 用于清洁工业制造的构件的清洁设备及方法
CN103167916B (zh) * 2010-10-11 2015-09-30 特莫式启钥制造方案工程有限公司 用于清洁工业制造的构件的清洁设备及方法
US10580668B2 (en) 2014-03-17 2020-03-03 SCREEN Holdings Co., Ltd. Substrate processing apparatus and substrate processing method using substrate processing apparatus
CN104056798A (zh) * 2014-05-21 2014-09-24 上海和辉光电有限公司 清洗液的回收和供给设备及方法
CN104056798B (zh) * 2014-05-21 2016-02-03 上海和辉光电有限公司 清洗液的回收和供给设备及方法
CN104858178A (zh) * 2014-09-15 2015-08-26 杜正阔 一种清洗液可以汽化加压液化再生的超声清洗机技术
JP2016072445A (ja) * 2014-09-30 2016-05-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN110871192A (zh) * 2019-10-30 2020-03-10 宁波兰羚钢铁实业有限公司 一种纵剪加工减少钢卷表面重涂油和油污的方法
CN113426752A (zh) * 2021-06-28 2021-09-24 北京七星华创集成电路装备有限公司 掩膜板的清洗设备

Also Published As

Publication number Publication date
TW200918147A (en) 2009-05-01
KR101126588B1 (ko) 2012-03-27
TWI373362B (en) 2012-10-01
WO2008081508A1 (fr) 2008-07-10
WO2008081872A1 (fr) 2008-07-10
KR20090097912A (ko) 2009-09-16

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Application publication date: 20091209