JP5001638B2
(ja)
*
|
2006-12-22 |
2012-08-15 |
株式会社オーク製作所 |
露光データ作成装置
|
US7788630B2
(en)
*
|
2007-03-21 |
2010-08-31 |
Synopsys, Inc. |
Method and apparatus for determining an optical model that models the effect of optical proximity correction
|
US7707538B2
(en)
*
|
2007-06-15 |
2010-04-27 |
Brion Technologies, Inc. |
Multivariable solver for optical proximity correction
|
US7711504B2
(en)
*
|
2007-07-23 |
2010-05-04 |
The Board Of Regents, University Of Texas System |
Method and system for performing optical proximity correction with process variations considerations
|
US8239786B2
(en)
*
|
2008-12-30 |
2012-08-07 |
Asml Netherlands B.V. |
Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
|
US8103984B1
(en)
*
|
2009-02-23 |
2012-01-24 |
Cadence Design Systems, Inc. |
System and method for compressed design phase contour data
|
JP2011028098A
(ja)
*
|
2009-07-28 |
2011-02-10 |
Toshiba Corp |
パターン評価方法、パターン作成方法およびパターン評価プログラム
|
US9507250B2
(en)
*
|
2009-12-17 |
2016-11-29 |
International Business Machines Corporation |
Optical proximity correction for improved electrical characteristics
|
KR101833017B1
(ko)
|
2011-02-15 |
2018-04-13 |
삼성전자 주식회사 |
포토 마스크의 제조 방법
|
NL2008966A
(en)
|
2011-07-01 |
2013-01-07 |
Asml Netherlands Bv |
Method and apparatus for cost function based simultaneous opc and sbar optimization.
|
US10133184B2
(en)
*
|
2012-04-25 |
2018-11-20 |
Nikon Corporation |
Using customized lens pupil optimization to enhance lithographic imaging in a source-mask optimization scheme
|
US20140013286A1
(en)
*
|
2012-07-05 |
2014-01-09 |
Macronix International Co., Ltd. |
Method for manufacturing a mask
|
US8745550B2
(en)
*
|
2012-07-09 |
2014-06-03 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Fracture aware OPC
|
JP2014041976A
(ja)
*
|
2012-08-23 |
2014-03-06 |
Toshiba Corp |
レシピ管理装置
|
US9165095B2
(en)
*
|
2013-11-15 |
2015-10-20 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Target point generation for optical proximity correction
|
US9189588B2
(en)
*
|
2013-12-10 |
2015-11-17 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Polygon-based optical proximity correction
|
JP2015146398A
(ja)
*
|
2014-02-04 |
2015-08-13 |
株式会社東芝 |
加工変換差予測装置、加工変換差予測方法および加工変換差予測プログラム
|
US10430543B2
(en)
|
2014-10-04 |
2019-10-01 |
Synopsys, Inc. |
Matrix reduction for lithography simulation
|
KR102343850B1
(ko)
*
|
2015-05-06 |
2021-12-28 |
삼성전자주식회사 |
광 근접 보정에서 공통의 바이어스 값을 이용하여 마스크를 제작하는 방법
|
US10527928B2
(en)
|
2016-12-20 |
2020-01-07 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Optical proximity correction methodology using pattern classification for target placement
|
US11380516B2
(en)
|
2017-04-13 |
2022-07-05 |
Fractilia, Llc |
System and method for generating and analyzing roughness measurements and their use for process monitoring and control
|
US10176966B1
(en)
|
2017-04-13 |
2019-01-08 |
Fractilia, Llc |
Edge detection system
|
US10522322B2
(en)
|
2017-04-13 |
2019-12-31 |
Fractilia, Llc |
System and method for generating and analyzing roughness measurements
|
US11561477B2
(en)
|
2017-09-08 |
2023-01-24 |
Asml Netherlands B.V. |
Training methods for machine learning assisted optical proximity error correction
|
JP7438105B2
(ja)
|
2017-09-27 |
2024-02-26 |
エーエスエムエル ネザーランズ ビー.ブイ. |
デバイス製造方法の制御パラメータを決定する方法、コンピュータプログラム、および、基板にデバイスを製造するためのシステム
|
KR102440220B1
(ko)
|
2017-10-11 |
2022-09-06 |
에이에스엠엘 네델란즈 비.브이. |
패터닝 공정을 위한 최적화의 흐름
|
US10671052B2
(en)
*
|
2017-11-15 |
2020-06-02 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Synchronized parallel tile computation for large area lithography simulation
|
WO2019115426A1
(en)
|
2017-12-13 |
2019-06-20 |
Asml Netherlands B.V. |
Prediction of out of specification physical items
|
US11422472B2
(en)
|
2017-12-22 |
2022-08-23 |
Asml Netherlands B.V. |
Patterning process improvement involving optical aberration
|
US11079687B2
(en)
|
2017-12-22 |
2021-08-03 |
Asml Netherlands B.V. |
Process window based on defect probability
|
WO2019158682A1
(en)
|
2018-02-18 |
2019-08-22 |
Asml Netherlands B.V. |
Binarization method and freeform mask optimization flow
|
KR102641864B1
(ko)
|
2018-03-19 |
2024-02-29 |
에이에스엠엘 네델란즈 비.브이. |
패터닝 디바이스에 대한 곡선적 패턴들을 결정하는 방법
|
WO2019214909A1
(en)
|
2018-05-07 |
2019-11-14 |
Asml Netherlands B.V. |
Method for determining an electromagnetic field associated with a computational lithography mask model
|
CN118011743A
(zh)
|
2018-06-04 |
2024-05-10 |
Asml荷兰有限公司 |
利用模型基础对准来改善边缘放置量测准确度
|
EP3588191A1
(en)
|
2018-06-29 |
2020-01-01 |
ASML Netherlands B.V. |
Tuning patterning apparatus based on optical characteristic
|
EP3594750A1
(en)
|
2018-07-10 |
2020-01-15 |
ASML Netherlands B.V. |
Hidden defect detection and epe estimation based on the extracted 3d information from e-beam images
|
KR102609413B1
(ko)
|
2018-07-12 |
2023-12-04 |
에이에스엠엘 네델란즈 비.브이. |
자동으로 sem 윤곽 측정 정확성 및 안정성을 개선하기 위한 패턴 인식 활용
|
WO2020035285A1
(en)
|
2018-08-15 |
2020-02-20 |
Asml Netherlands B.V. |
Utilize machine learning in selecting high quality averaged sem images from raw images automatically
|
KR20200028169A
(ko)
*
|
2018-09-06 |
2020-03-16 |
삼성전자주식회사 |
Opc 방법, 및 그 opc 방법을 이용한 마스크 제조방법
|
KR102653951B1
(ko)
*
|
2018-09-06 |
2024-04-02 |
삼성전자주식회사 |
반도체 소자의 레이아웃 패턴 분할 방법 및 이를 포함하는 광 근접 보정 방법
|
TWI794544B
(zh)
|
2018-10-09 |
2023-03-01 |
荷蘭商Asml荷蘭公司 |
用於高數值孔徑穿縫源光罩最佳化之方法
|
WO2020078844A1
(en)
|
2018-10-19 |
2020-04-23 |
Asml Netherlands B.V. |
Method to create the ideal source spectra with source and mask optimization
|
WO2020094387A1
(en)
|
2018-11-05 |
2020-05-14 |
Asml Holding N.V. |
A method to manufacture nano ridges in hard ceramic coatings
|
WO2020094385A1
(en)
|
2018-11-08 |
2020-05-14 |
Asml Netherlands B.V. |
Prediction of out of specification based on spatial characteristic of process variability
|
JP7209835B2
(ja)
|
2018-11-30 |
2023-01-20 |
エーエスエムエル ネザーランズ ビー.ブイ. |
機械学習モデル予測における不確実性を減少させる方法
|
EP3660744A1
(en)
|
2018-11-30 |
2020-06-03 |
ASML Netherlands B.V. |
Method for decreasing uncertainty in machine learning model predictions
|
CN113168085A
(zh)
|
2018-11-30 |
2021-07-23 |
Asml荷兰有限公司 |
用于基于可制造性确定图案形成装置图案的方法
|
EP3663855A1
(en)
|
2018-12-04 |
2020-06-10 |
ASML Netherlands B.V. |
Sem fov fingerprint in stochastic epe and placement measurements in large fov sem devices
|
US11797748B2
(en)
|
2018-12-28 |
2023-10-24 |
Asml Netherlands B.V. |
Method for generating patterning device pattern at patch boundary
|
US11561478B2
(en)
|
2018-12-31 |
2023-01-24 |
Asml Netherlands B.V. |
Determining subset of components of an optical characteristic of patterning apparatus
|
TWI738169B
(zh)
|
2019-01-29 |
2021-09-01 |
荷蘭商Asml荷蘭公司 |
用於為佈局圖案化程序判定訓練圖案之方法及相關的電腦程式產品
|
US11086230B2
(en)
|
2019-02-01 |
2021-08-10 |
Asml Netherlands B.V. |
Method and apparatus for source mask optimization configured to increase scanner throughput for a patterning process
|
NL2024815A
(en)
|
2019-02-19 |
2020-08-27 |
Asml Holding Nv |
Laser roughening: engineering the roughness of the burl top
|
KR102642972B1
(ko)
|
2019-02-27 |
2024-03-04 |
에이에스엠엘 네델란즈 비.브이. |
모델 캘리브레이션을 위한 게이지 선택의 향상
|
WO2020177979A1
(en)
|
2019-03-03 |
2020-09-10 |
Asml Netherlands B.V. |
Method and apparatus for imaging using narrowed bandwidth
|
CN113544592A
(zh)
|
2019-03-08 |
2021-10-22 |
Asml荷兰有限公司 |
用于衍射图案引导的源掩模优化的方法和设备
|
CN113614638A
(zh)
|
2019-03-21 |
2021-11-05 |
Asml荷兰有限公司 |
用于机器学习辅助的光学邻近效应误差校正的训练方法
|
EP3742229A1
(en)
|
2019-05-21 |
2020-11-25 |
ASML Netherlands B.V. |
Systems and methods for adjusting prediction models between facility locations
|
KR102648599B1
(ko)
|
2019-04-09 |
2024-03-15 |
에이에스엠엘 네델란즈 비.브이. |
설비 위치들 사이에서 예측 모델을 조절하기 위한 시스템 및 방법
|
EP3734365A1
(en)
|
2019-04-30 |
2020-11-04 |
ASML Netherlands B.V. |
Method and apparatus for photolithographic imaging
|
EP3963404B1
(en)
|
2019-04-30 |
2023-01-25 |
ASML Netherlands B.V. |
Method and apparatus for photolithographic imaging
|
US20220276563A1
(en)
|
2019-07-10 |
2022-09-01 |
Asml Netherlands B.V. |
Prediction data selection for model calibration to reduce model prediction uncertainty
|
US20220276564A1
(en)
|
2019-08-08 |
2022-09-01 |
Asml Netherlands B.V. |
Method and apparatus for photolithographic imaging
|
CN112415855B
(zh)
*
|
2019-08-22 |
2022-04-12 |
长鑫存储技术有限公司 |
Opc修正方法及opc修正装置
|
KR20220038167A
(ko)
|
2019-08-30 |
2022-03-25 |
에이에스엠엘 네델란즈 비.브이. |
반도체 디바이스 지오메트리 방법 및 시스템
|
EP3789923A1
(en)
|
2019-09-06 |
2021-03-10 |
ASML Netherlands B.V. |
Method for increasing certainty in parameterized model predictions
|
CN114341885A
(zh)
|
2019-09-06 |
2022-04-12 |
Asml荷兰有限公司 |
用于增加参数化模型预测的确定性的方法
|
WO2021083608A1
(en)
|
2019-11-01 |
2021-05-06 |
Asml Netherlands B.V. |
Machine learning based image generation for model base alignments
|
WO2021099408A1
(en)
|
2019-11-19 |
2021-05-27 |
Asml Holding N.V. |
Optimization using a non-uniform illumination intensity profile
|
TWI729593B
(zh)
*
|
2019-11-27 |
2021-06-01 |
台灣積體電路製造股份有限公司 |
積體電路之製造方法
|
CN112882348B
(zh)
*
|
2019-11-29 |
2022-10-21 |
长鑫存储技术有限公司 |
一种光学临近效应修正方法及装置
|
CN114787715A
(zh)
|
2019-12-02 |
2022-07-22 |
西默有限公司 |
用于增强成像到衬底上的图案的目标特征的方法和系统
|
WO2021140020A2
(en)
|
2020-01-07 |
2021-07-15 |
Asml Netherlands B.V. |
High brightness low energy spread pulsed electron source
|
EP3848953A1
(en)
|
2020-01-07 |
2021-07-14 |
ASML Netherlands B.V. |
High brightness electron source
|
US20230100578A1
(en)
|
2020-02-12 |
2023-03-30 |
Asml Netherlands B.V. |
Method for determining a mask pattern comprising optical proximity corrections using a trained machine learning model
|
CN115104068A
(zh)
|
2020-02-21 |
2022-09-23 |
Asml荷兰有限公司 |
用于以基于缺陷的过程窗口为基础的校准模拟过程的方法
|
EP3872567A1
(en)
|
2020-02-25 |
2021-09-01 |
ASML Netherlands B.V. |
Systems and methods for process metric aware process control
|
CN115190985A
(zh)
|
2020-03-03 |
2022-10-14 |
Asml荷兰有限公司 |
基于机器学习的亚分辨率辅助特征放置
|
US20230161269A1
(en)
|
2020-05-09 |
2023-05-25 |
Asml Netherlands B.V. |
Determining metrics for a portion of a pattern on a substrate
|
WO2021244830A1
(en)
|
2020-06-02 |
2021-12-09 |
Asml Netherlands B.V. |
Verifying freeform curvilinear features of a mask design
|
KR20230005381A
(ko)
|
2020-06-03 |
2023-01-09 |
에이에스엠엘 네델란즈 비.브이. |
패터닝 디바이스 및 이에 대한 패턴을 생성하는 시스템, 제품, 및 방법
|
CN115715381A
(zh)
|
2020-06-10 |
2023-02-24 |
Asml荷兰有限公司 |
像差影响系统、模型和制造过程
|
EP3951496A1
(en)
|
2020-08-07 |
2022-02-09 |
ASML Netherlands B.V. |
Apparatus and method for selecting informative patterns for training machine learning models
|
EP4200671A1
(en)
|
2020-08-19 |
2023-06-28 |
ASML Netherlands B.V. |
Systems, products, and methods for image-based pattern selection
|
KR20230051509A
(ko)
|
2020-08-19 |
2023-04-18 |
에이에스엠엘 네델란즈 비.브이. |
원시 이미지들로부터 고품질 이미지들을 자동으로 선택하는 장치 및 방법
|
WO2022064016A1
(en)
|
2020-09-25 |
2022-03-31 |
Asml Netherlands B.V. |
Optimization of scanner throughput and imaging quality for a patterning process
|
WO2022069420A1
(en)
|
2020-09-30 |
2022-04-07 |
Asml Netherlands B.V. |
Vacuum system for mitigating damage due to a vacuum pump malfunction
|
WO2022083977A1
(en)
|
2020-10-23 |
2022-04-28 |
Asml Netherlands B.V. |
Method for generating mask pattern
|
KR20220078124A
(ko)
|
2020-12-03 |
2022-06-10 |
삼성전자주식회사 |
Opc 방법 및 이를 이용한 반도체 소자의 제조 방법
|
US20240004305A1
(en)
|
2020-12-18 |
2024-01-04 |
Asml Netherlands B.V. |
Method for determining mask pattern and training machine learning model
|
CN116635785A
(zh)
|
2020-12-21 |
2023-08-22 |
Asml荷兰有限公司 |
用于图案区域的基于特征的单元提取
|
KR20230147096A
(ko)
|
2021-02-23 |
2023-10-20 |
에이에스엠엘 네델란즈 비.브이. |
타겟 패턴 및 기준 층 패턴을 사용하여 마스크에 대한 광 근접 보정을 결정하는 기계 학습 모델
|
WO2022189180A1
(en)
|
2021-03-08 |
2022-09-15 |
Asml Netherlands B.V. |
Method of pattern selection for a semiconductor manufacturing related process
|
TWI833241B
(zh)
|
2021-06-18 |
2024-02-21 |
荷蘭商Asml荷蘭公司 |
使用機器學習模型產生輔助特徵之非暫時性電腦可讀媒體
|
WO2022268434A1
(en)
|
2021-06-23 |
2022-12-29 |
Asml Netherlands B.V. |
Etch simulation model including a correlation between etch biases and curvatures of contours
|
WO2023280511A1
(en)
|
2021-07-06 |
2023-01-12 |
Asml Netherlands B.V. |
Determining localized image prediction errors to improve a machine learning model in predicting an image
|
KR20240031314A
(ko)
|
2021-07-13 |
2024-03-07 |
에이에스엠엘 네델란즈 비.브이. |
소스 마스크 최적화 및 타겟 최적화를 위한 패턴 선택
|
WO2023001459A1
(en)
|
2021-07-21 |
2023-01-26 |
Asml Netherlands B.V. |
Systems and methods for thermally stable mounting of optical columns
|
WO2023006346A1
(en)
|
2021-07-30 |
2023-02-02 |
Asml Netherlands B.V. |
Method for generating mask pattern
|
KR20240044432A
(ko)
|
2021-08-10 |
2024-04-04 |
에이에스엠엘 네델란즈 비.브이. |
메트롤로지 마크 및 디바이스 패턴의 수차 민감도 매칭
|
KR20240063109A
(ko)
|
2021-09-02 |
2024-05-09 |
에이에스엠엘 네델란즈 비.브이. |
선택된 패턴 세트를 평가하는 방법
|
KR20240064651A
(ko)
|
2021-09-22 |
2024-05-13 |
에이에스엠엘 네델란즈 비.브이. |
패턴 선택 시스템들 및 방법들
|
WO2023084063A1
(en)
|
2021-11-15 |
2023-05-19 |
Asml Netherlands B.V. |
Generating augmented data to train machine learning models to preserve physical trends
|
WO2023088649A1
(en)
|
2021-11-17 |
2023-05-25 |
Asml Netherlands B.V. |
Determining an etch effect based on an etch bias direction
|
WO2023088641A1
(en)
|
2021-11-19 |
2023-05-25 |
Asml Netherlands B.V. |
Simulation model stability determination method
|
WO2023110401A1
(en)
|
2021-12-14 |
2023-06-22 |
Asml Netherlands B.V. |
Thermal control systems, models, and manufacturing processes in lithography
|
WO2023110346A1
(en)
|
2021-12-14 |
2023-06-22 |
Asml Netherlands B.V. |
Methods, software, and systems for determination of constant-width sub-resolution assist features
|
WO2023131570A1
(en)
|
2022-01-05 |
2023-07-13 |
Asml Netherlands B.V. |
Software, methods, and systems for determination of a local focus point
|
WO2023169806A1
(en)
|
2022-03-09 |
2023-09-14 |
Asml Netherlands B.V. |
Methods, systems, and software for determination of failure rates of lithographic processes
|
WO2023180020A1
(en)
|
2022-03-22 |
2023-09-28 |
Asml Netherlands B.V. |
Lithographic pattern representation with curvilinear elements
|
WO2023222368A1
(en)
|
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