SG148945A1 - Multivariable solver for optical proximity correction - Google Patents

Multivariable solver for optical proximity correction

Info

Publication number
SG148945A1
SG148945A1 SG200804437-2A SG2008044372A SG148945A1 SG 148945 A1 SG148945 A1 SG 148945A1 SG 2008044372 A SG2008044372 A SG 2008044372A SG 148945 A1 SG148945 A1 SG 148945A1
Authority
SG
Singapore
Prior art keywords
optical proximity
layout
proximity correction
edge segment
multivariable
Prior art date
Application number
SG200804437-2A
Other languages
English (en)
Inventor
William S Wong
Chen Been Der
Li Jiangwei
Nishibe Tatsuo
Lu Yen-Wen
Original Assignee
Brion Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brion Tech Inc filed Critical Brion Tech Inc
Publication of SG148945A1 publication Critical patent/SG148945A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200804437-2A 2007-06-15 2008-06-11 Multivariable solver for optical proximity correction SG148945A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/764,128 US7707538B2 (en) 2007-06-15 2007-06-15 Multivariable solver for optical proximity correction

Publications (1)

Publication Number Publication Date
SG148945A1 true SG148945A1 (en) 2009-01-29

Family

ID=39930743

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200804437-2A SG148945A1 (en) 2007-06-15 2008-06-11 Multivariable solver for optical proximity correction

Country Status (7)

Country Link
US (4) US7707538B2 (zh)
EP (1) EP2053460A2 (zh)
JP (2) JP4746649B2 (zh)
KR (1) KR100982800B1 (zh)
CN (2) CN102221776B (zh)
SG (1) SG148945A1 (zh)
TW (2) TWI396055B (zh)

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