CN100587996C - 固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法 - Google Patents

固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法 Download PDF

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Publication number
CN100587996C
CN100587996C CN03142457A CN03142457A CN100587996C CN 100587996 C CN100587996 C CN 100587996C CN 03142457 A CN03142457 A CN 03142457A CN 03142457 A CN03142457 A CN 03142457A CN 100587996 C CN100587996 C CN 100587996C
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Prior art keywords
substrate
mask
magnet
pressing plate
described substrate
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Expired - Lifetime
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CN03142457A
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Chinese (zh)
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CN1462160A (zh
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姜敞皓
张容源
金兑承
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Samsung Display Co Ltd
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Samsung Mobile Display Co Ltd
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN03142457A 2002-05-31 2003-06-02 固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法 Expired - Lifetime CN100587996C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR30613/2002 2002-05-31
KR1020020030613A KR100838065B1 (ko) 2002-05-31 2002-05-31 박막증착기용 고정장치와 이를 이용한 고정방법
KR30613/02 2002-05-31

Publications (2)

Publication Number Publication Date
CN1462160A CN1462160A (zh) 2003-12-17
CN100587996C true CN100587996C (zh) 2010-02-03

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CN03142457A Expired - Lifetime CN100587996C (zh) 2002-05-31 2003-06-02 固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法

Country Status (4)

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US (2) US7097750B2 (enExample)
JP (1) JP4545393B2 (enExample)
KR (1) KR100838065B1 (enExample)
CN (1) CN100587996C (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108060388A (zh) * 2017-12-18 2018-05-22 信利（惠州）智能显示有限公司 一种基板和掩膜板的对位方法

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KR100583522B1 (ko) * 2005-01-05 2006-05-25 삼성에스디아이 주식회사 기판 고정 트레이, 이를 이용한 기판 정렬 시스템 및 그방법
JP2006199998A (ja) * 2005-01-20 2006-08-03 Seiko Epson Corp 成膜装置、成膜方法
JP4609754B2 (ja) * 2005-02-23 2011-01-12 三井造船株式会社 マスククランプの移動機構および成膜装置
KR100696554B1 (ko) * 2005-12-16 2007-03-19 삼성에스디아이 주식회사 증착 장치
KR100721056B1 (ko) * 2006-01-06 2007-05-25 한국원자력연구원 자성체가 적용되는 물리적 구조물을 이용하여 임의의금속막 패턴을 소재 표면에 형성하는 장치 및 방법
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JP5297046B2 (ja) * 2008-01-16 2013-09-25 キヤノントッキ株式会社 成膜装置
KR101517020B1 (ko) * 2008-05-15 2015-05-04 삼성디스플레이 주식회사 유기전계발광표시장치의 제조장치 및 제조방법
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KR101049804B1 (ko) * 2009-02-19 2011-07-15 삼성모바일디스플레이주식회사 증착 장치용 마스크 밀착 수단 및 이를 이용한 증착 장치
JP2011233510A (ja) * 2010-04-05 2011-11-17 Canon Inc 蒸着装置
SG10201608512QA (en) * 2012-04-19 2016-12-29 Intevac Inc Dual-mask arrangement for solar cell fabrication
TWI518832B (zh) 2012-04-26 2016-01-21 因特瓦克公司 真空處理系統架構
US10062600B2 (en) 2012-04-26 2018-08-28 Intevac, Inc. System and method for bi-facial processing of substrates
KR102112751B1 (ko) * 2013-02-01 2020-05-19 삼성디스플레이 주식회사 레이저 빔을 이용한 마스크 제조 방법 및 마스크 제조 장치
KR102103176B1 (ko) * 2013-07-17 2020-04-22 주식회사 선익시스템 기판 탈부착 장치
KR102270080B1 (ko) * 2013-10-30 2021-06-29 삼성디스플레이 주식회사 박막 증착 장치
KR102218644B1 (ko) * 2013-12-19 2021-02-23 삼성디스플레이 주식회사 증착 장치
TWI662646B (zh) 2014-08-05 2019-06-11 美商因特瓦克公司 植入用遮罩及其對準
KR102091560B1 (ko) * 2015-06-12 2020-03-20 가부시키가이샤 아루박 기판 보지 장치, 성막 장치 및 기판 보지 방법
CN104993070A (zh) * 2015-07-02 2015-10-21 深圳市华星光电技术有限公司 一种制作柔性oled显示器件的方法
CN106337164A (zh) * 2015-07-08 2017-01-18 上海和辉光电有限公司 一种蒸镀装置
KR102396758B1 (ko) * 2015-08-07 2022-05-13 (주)선익시스템 마스크를 이용하는 공정챔버용 처킹시스템
KR102339616B1 (ko) * 2015-08-17 2021-12-17 (주)선익시스템 마스크를 이용하는 공정챔버용 처킹시스템
CN105154830B (zh) * 2015-09-06 2017-04-19 京东方科技集团股份有限公司 一种固定方法和蒸镀方法
JP6298138B2 (ja) * 2015-11-25 2018-03-20 キヤノントッキ株式会社 成膜システム、磁性体部及び膜の製造方法
KR101702785B1 (ko) * 2015-12-02 2017-02-07 에스엔유 프리시젼 주식회사 박막 증착장치
JP6309048B2 (ja) * 2016-07-01 2018-04-11 キヤノントッキ株式会社 マスク吸着装置
CN106756779B (zh) * 2017-01-03 2019-09-06 京东方科技集团股份有限公司 一种磁控溅射台以及磁控溅射装置
JP6785171B2 (ja) * 2017-03-08 2020-11-18 株式会社日本製鋼所 成膜方法および電子装置の製造方法並びにプラズマ原子層成長装置
JP6857522B2 (ja) * 2017-03-17 2021-04-14 株式会社日本製鋼所 成膜方法および電子装置の製造方法並びにマスク保持体
KR102411538B1 (ko) * 2017-09-04 2022-06-22 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
KR102489336B1 (ko) * 2017-12-26 2023-01-19 삼성디스플레이 주식회사 증착 장치 및 이를 이용한 표시 장치의 제조 방법
KR101963982B1 (ko) * 2017-12-27 2019-03-29 캐논 톡키 가부시키가이샤 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법
KR102036523B1 (ko) * 2017-12-29 2019-10-25 주식회사 에스에프에이 기판 증착장치
KR102020766B1 (ko) * 2017-12-29 2019-09-11 주식회사 에스에프에이 기판 증착장치
CN108110092A (zh) * 2018-02-28 2018-06-01 北京创昱科技有限公司 一种基片装夹装置
KR102591646B1 (ko) * 2018-06-29 2023-10-20 삼성디스플레이 주식회사 증착 장치 및 증착 장치의 마그넷 플레이트 얼라인 방법
CN110004407B (zh) * 2019-05-21 2021-03-02 京东方科技集团股份有限公司 掩膜版组件及其制备方法
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CN112853273B (zh) * 2020-12-31 2022-12-16 南京深光科技有限公司 一种柔性amoled掩模版表面镀膜设备
CN114112574B (zh) * 2021-11-15 2022-06-24 哈尔滨工业大学（威海） 用于介观尺度弯曲试样力学性能测试的磁控溅射成形装置
CN114112573B (zh) * 2021-11-15 2022-06-10 哈尔滨工业大学（威海） 用于介观尺度拉伸试样力学性能测试的磁控溅射成形装置

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US4011143A (en) * 1973-06-25 1977-03-08 Honeywell Inc. Material deposition masking for microcircuit structures
US4599970A (en) * 1985-03-11 1986-07-15 Rca Corporation Apparatus for coating a selected area of the surface of an object
US4915057A (en) * 1985-10-23 1990-04-10 Gte Products Corporation Apparatus and method for registration of shadow masked thin-film patterns
US6143143A (en) * 1993-08-18 2000-11-07 Applied Vision Limited Masking means and cleaning techniques for surfaces of substrates
US5833823A (en) * 1993-10-13 1998-11-10 Balzers Aktiengesellschaft Sputter source with a target arrangement and a holding device
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108060388A (zh) * 2017-12-18 2018-05-22 信利（惠州）智能显示有限公司 一种基板和掩膜板的对位方法

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Publication number Publication date
CN1462160A (zh) 2003-12-17
KR20030092789A (ko) 2003-12-06
US20030224109A1 (en) 2003-12-04
US7097750B2 (en) 2006-08-29
US7695596B2 (en) 2010-04-13
US20060201618A1 (en) 2006-09-14
JP4545393B2 (ja) 2010-09-15
KR100838065B1 (ko) 2008-06-16
JP2004003030A (ja) 2004-01-08

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