CN100514543C - 基板的处理装置 - Google Patents

基板的处理装置 Download PDF

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Publication number
CN100514543C
CN100514543C CNB2005101051270A CN200510105127A CN100514543C CN 100514543 C CN100514543 C CN 100514543C CN B2005101051270 A CNB2005101051270 A CN B2005101051270A CN 200510105127 A CN200510105127 A CN 200510105127A CN 100514543 C CN100514543 C CN 100514543C
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CN
China
Prior art keywords
treatment trough
substrate
mentioned
processing unit
suction tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CNB2005101051270A
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English (en)
Chinese (zh)
Other versions
CN1753150A (zh
Inventor
末吉秀树
矶明典
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of CN1753150A publication Critical patent/CN1753150A/zh
Application granted granted Critical
Publication of CN100514543C publication Critical patent/CN100514543C/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D29/00—Details, component parts, or accessories
    • F04D29/40—Casings; Connections of working fluid
    • F04D29/52—Casings; Connections of working fluid for axial pumps
    • F04D29/522—Casings; Connections of working fluid for axial pumps especially adapted for elastic fluid pumps
    • F04D29/526—Details of the casing section radially opposing blade tips
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)
  • Tables And Desks Characterized By Structural Shape (AREA)
CNB2005101051270A 2004-09-22 2005-09-22 基板的处理装置 Active CN100514543C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004275755 2004-09-22
JP2004275755A JP4641168B2 (ja) 2004-09-22 2004-09-22 基板の処理装置

Publications (2)

Publication Number Publication Date
CN1753150A CN1753150A (zh) 2006-03-29
CN100514543C true CN100514543C (zh) 2009-07-15

Family

ID=36234027

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005101051270A Active CN100514543C (zh) 2004-09-22 2005-09-22 基板的处理装置

Country Status (4)

Country Link
JP (1) JP4641168B2 (ko)
KR (1) KR101160535B1 (ko)
CN (1) CN100514543C (ko)
TW (1) TWI389185B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008079710A2 (en) 2006-12-20 2008-07-03 Saint-Gobain Ceramics & Plastics, Inc. Composite materials having improved thermal performance
JP2009266962A (ja) * 2008-04-23 2009-11-12 Hitachi Kokusai Electric Inc 基板処理装置および半導体装置の製造方法
JP5490395B2 (ja) * 2008-10-07 2014-05-14 大日本スクリーン製造株式会社 基板処理装置及びその製造方法
JP2010225687A (ja) * 2009-03-19 2010-10-07 Shibaura Mechatronics Corp 基板の処理装置
JP2013026490A (ja) * 2011-07-22 2013-02-04 Tokyo Electron Ltd 基板処理装置
JP6732213B2 (ja) * 2016-11-16 2020-07-29 日本電気硝子株式会社 ガラス基板の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03284386A (ja) * 1990-03-30 1991-12-16 Shibaura Eng Works Co Ltd 洗浄用処理槽
JPH08318169A (ja) * 1995-05-26 1996-12-03 Sanyo Electric Co Ltd ドラフト装置
JP3211147B2 (ja) * 1996-05-29 2001-09-25 株式会社荏原製作所 装置の排気構造
JP3556110B2 (ja) * 1998-12-22 2004-08-18 大日本スクリーン製造株式会社 基板処理装置
KR100574140B1 (ko) * 1999-07-02 2006-04-25 동경 엘렉트론 주식회사 반도체 제조 설비, 반도체 제조 장치 및 반도체 제조 방법
JP2003260422A (ja) * 2002-03-12 2003-09-16 J P C:Kk 部品洗浄システム
JP4136826B2 (ja) * 2002-08-19 2008-08-20 住友精密工業株式会社 昇降式基板処理装置及びこれを備えた基板処理システム

Also Published As

Publication number Publication date
CN1753150A (zh) 2006-03-29
KR20060051450A (ko) 2006-05-19
TWI389185B (zh) 2013-03-11
KR101160535B1 (ko) 2012-06-28
JP2006093339A (ja) 2006-04-06
JP4641168B2 (ja) 2011-03-02
TW200616057A (en) 2006-05-16

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