TW200616057A - Apparatus for treating substrates (2) - Google Patents
Apparatus for treating substrates (2)Info
- Publication number
- TW200616057A TW200616057A TW094130357A TW94130357A TW200616057A TW 200616057 A TW200616057 A TW 200616057A TW 094130357 A TW094130357 A TW 094130357A TW 94130357 A TW94130357 A TW 94130357A TW 200616057 A TW200616057 A TW 200616057A
- Authority
- TW
- Taiwan
- Prior art keywords
- processing tank
- substrate
- take
- face
- reinforcement frame
- Prior art date
Links
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Liquid Crystal (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Tables And Desks Characterized By Structural Shape (AREA)
Abstract
The objective of the present invention is to provide a processor whose rigidity improved without thickening a plate forming a processing tank. The processor for processing a substrate is provided with: the processing tank which is formed in a box shape where an upper face is opened by the plate, and in which a take-in port of the substrate is made on one side face and a take-out port on the other side face; a reinforcement frame which is integrally installed along an outer peripheral face at an upper part of the processing tank and forms the processing tank; and a lid member which is fitted to the reinforcement frame so that it can turn and opens/closes an upper opening of the processing tank.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004275755A JP4641168B2 (en) | 2004-09-22 | 2004-09-22 | Substrate processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200616057A true TW200616057A (en) | 2006-05-16 |
TWI389185B TWI389185B (en) | 2013-03-11 |
Family
ID=36234027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094130357A TWI389185B (en) | 2004-09-22 | 2005-09-05 | Apparatus for treating substrates |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4641168B2 (en) |
KR (1) | KR101160535B1 (en) |
CN (1) | CN100514543C (en) |
TW (1) | TWI389185B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MX2009006723A (en) | 2006-12-20 | 2009-06-30 | Saint Gobain Ceramics | Composite materials having improved thermal performance. |
JP2009266962A (en) * | 2008-04-23 | 2009-11-12 | Hitachi Kokusai Electric Inc | Substrate processing apparatus and method for manufacturing semiconductor device |
JP5490395B2 (en) * | 2008-10-07 | 2014-05-14 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and manufacturing method thereof |
JP2010225687A (en) * | 2009-03-19 | 2010-10-07 | Shibaura Mechatronics Corp | Apparatus for processing of substrate |
JP2013026490A (en) * | 2011-07-22 | 2013-02-04 | Tokyo Electron Ltd | Substrate processor |
JP6732213B2 (en) * | 2016-11-16 | 2020-07-29 | 日本電気硝子株式会社 | Glass substrate manufacturing method |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03284386A (en) * | 1990-03-30 | 1991-12-16 | Shibaura Eng Works Co Ltd | Cleaning tank |
JPH08318169A (en) * | 1995-05-26 | 1996-12-03 | Sanyo Electric Co Ltd | Draft device |
JP3211147B2 (en) * | 1996-05-29 | 2001-09-25 | 株式会社荏原製作所 | Equipment exhaust structure |
JP3556110B2 (en) * | 1998-12-22 | 2004-08-18 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
KR100574140B1 (en) * | 1999-07-02 | 2006-04-25 | 동경 엘렉트론 주식회사 | Semiconductor manufacture equipment, and method and apparatus for semiconductor manufacture |
JP2003260422A (en) * | 2002-03-12 | 2003-09-16 | J P C:Kk | Part cleaning system |
JP4136826B2 (en) * | 2002-08-19 | 2008-08-20 | 住友精密工業株式会社 | Elevating type substrate processing apparatus and substrate processing system having the same |
-
2004
- 2004-09-22 JP JP2004275755A patent/JP4641168B2/en active Active
-
2005
- 2005-09-05 TW TW094130357A patent/TWI389185B/en active
- 2005-09-21 KR KR1020050087548A patent/KR101160535B1/en active IP Right Grant
- 2005-09-22 CN CNB2005101051270A patent/CN100514543C/en active Active
Also Published As
Publication number | Publication date |
---|---|
TWI389185B (en) | 2013-03-11 |
JP4641168B2 (en) | 2011-03-02 |
KR20060051450A (en) | 2006-05-19 |
KR101160535B1 (en) | 2012-06-28 |
CN1753150A (en) | 2006-03-29 |
CN100514543C (en) | 2009-07-15 |
JP2006093339A (en) | 2006-04-06 |
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