TW200731391A - Vacuum chamber and vacuum processing apparatus - Google Patents
Vacuum chamber and vacuum processing apparatusInfo
- Publication number
- TW200731391A TW200731391A TW095132454A TW95132454A TW200731391A TW 200731391 A TW200731391 A TW 200731391A TW 095132454 A TW095132454 A TW 095132454A TW 95132454 A TW95132454 A TW 95132454A TW 200731391 A TW200731391 A TW 200731391A
- Authority
- TW
- Taiwan
- Prior art keywords
- vacuum
- main frame
- vacuum chamber
- chamber
- processing apparatus
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
To provide a vacuum chamber in which strength as a vacuum container can be ensured while employing a division structure, and to provide a vacuum processing device equipped with the vacuum chamber. A vacuum chamber, i.e. a conveyance chamber 20, comprises a main frame 201 formed in rectangle, a pair of reinforcing frames 202a and 202b joined to the opposing long sides of the main frame 201, a top plate 203 joined removably to the upper surface of the main frame 201, and a conveyance mechanism (not shown) wherein the main frame 201 and the reinforcing frames 202a and 202b form a space for conveying a substrate S integrally.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005255294A JP4791110B2 (en) | 2005-09-02 | 2005-09-02 | Vacuum chamber and vacuum processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200731391A true TW200731391A (en) | 2007-08-16 |
TWI406332B TWI406332B (en) | 2013-08-21 |
Family
ID=37817679
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095132454A TWI406332B (en) | 2005-09-02 | 2006-09-01 | Vacuum chamber and vacuum treatment device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4791110B2 (en) |
KR (1) | KR100856145B1 (en) |
CN (1) | CN100421212C (en) |
TW (1) | TWI406332B (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7018517B2 (en) | 2002-06-21 | 2006-03-28 | Applied Materials, Inc. | Transfer chamber for vacuum processing system |
KR101101757B1 (en) * | 2005-11-07 | 2012-01-05 | 주성엔지니어링(주) | Vacuum chamber which economizes manufacturing cost |
WO2009078351A1 (en) * | 2007-12-14 | 2009-06-25 | Ulvac, Inc. | Chamber and film-forming apparatus |
JP5551346B2 (en) * | 2008-06-10 | 2014-07-16 | 東京エレクトロン株式会社 | Chamber and processing apparatus |
CN102272350B (en) * | 2009-01-14 | 2014-12-24 | 株式会社爱发科 | Plasma cvd apparatus |
FI122940B (en) * | 2009-02-09 | 2012-09-14 | Beneq Oy | reaction chamber |
KR20110067939A (en) * | 2009-12-15 | 2011-06-22 | 주식회사 테스 | Load lock chamber |
KR101598176B1 (en) * | 2010-03-30 | 2016-02-26 | 주식회사 원익아이피에스 | Vacuum chamber |
JP5526988B2 (en) * | 2010-04-28 | 2014-06-18 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing system |
KR101363064B1 (en) * | 2012-05-22 | 2014-02-14 | 박종민 | Vacuum chamber structure |
US9717147B2 (en) * | 2013-09-26 | 2017-07-25 | Applied Materials, Inc. | Electronic device manufacturing system |
JP7023097B2 (en) * | 2016-12-28 | 2022-02-21 | 東京エレクトロン株式会社 | How to lock the vacuum chamber and the door of the vacuum chamber |
JP6625597B2 (en) * | 2017-11-13 | 2019-12-25 | 平田機工株式会社 | Transfer chamber |
JP7277137B2 (en) * | 2018-12-28 | 2023-05-18 | 株式会社Screenホールディングス | Substrate processing equipment and transfer module |
KR102193096B1 (en) | 2019-01-31 | 2020-12-21 | (주)에프티엘 | Jig apparatus for welding for rib of vaccum chamber |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3608065B2 (en) * | 1996-10-31 | 2005-01-05 | 東京エレクトロン株式会社 | Vertical heat treatment apparatus and maintenance method for boat and heat insulation cylinder |
US5914493A (en) * | 1997-02-21 | 1999-06-22 | Nikon Corporation | Charged-particle-beam exposure apparatus and methods with substrate-temperature control |
US6241117B1 (en) * | 1997-11-26 | 2001-06-05 | Steven R. Wickins | Pressure differential containment structure |
JP4253107B2 (en) * | 2000-08-24 | 2009-04-08 | キヤノンアネルバ株式会社 | Substrate processing apparatus and expansion method thereof |
JP4003412B2 (en) * | 2001-06-20 | 2007-11-07 | 株式会社島津製作所 | Vacuum chamber and liquid crystal injection apparatus using the vacuum chamber |
JP2003077974A (en) * | 2001-08-31 | 2003-03-14 | Hitachi Kokusai Electric Inc | Substrate processing device and manufacturing method of semiconductor device |
JP2003188226A (en) * | 2001-12-18 | 2003-07-04 | Anelva Corp | Vacuum conveyance treating apparatus |
JP2004089872A (en) * | 2002-08-30 | 2004-03-25 | Tsukishima Kikai Co Ltd | Vacuum device |
JP2004311640A (en) * | 2003-04-04 | 2004-11-04 | Tokyo Electron Ltd | Treatment vessel |
SG115678A1 (en) * | 2003-04-22 | 2005-10-28 | Asml Netherlands Bv | Substrate carrier and method for making a substrate carrier |
JP2004335743A (en) * | 2003-05-08 | 2004-11-25 | Ulvac Japan Ltd | Vacuum chamber for vacuum processing apparatus |
KR100441875B1 (en) * | 2003-06-02 | 2004-07-27 | 주성엔지니어링(주) | Separable type transfer chamber |
JP4833512B2 (en) * | 2003-06-24 | 2011-12-07 | 東京エレクトロン株式会社 | To-be-processed object processing apparatus, to-be-processed object processing method, and to-be-processed object conveyance method |
JP4767574B2 (en) * | 2005-03-31 | 2011-09-07 | 東京エレクトロン株式会社 | Processing chamber and processing apparatus |
JP4079157B2 (en) * | 2005-04-12 | 2008-04-23 | 東京エレクトロン株式会社 | Gate valve device and processing system |
-
2005
- 2005-09-02 JP JP2005255294A patent/JP4791110B2/en not_active Expired - Fee Related
-
2006
- 2006-08-31 KR KR1020060083845A patent/KR100856145B1/en active IP Right Grant
- 2006-09-01 TW TW095132454A patent/TWI406332B/en active
- 2006-09-04 CN CNB2006101289226A patent/CN100421212C/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN100421212C (en) | 2008-09-24 |
KR20070026215A (en) | 2007-03-08 |
TWI406332B (en) | 2013-08-21 |
KR100856145B1 (en) | 2008-09-03 |
JP4791110B2 (en) | 2011-10-12 |
JP2007073542A (en) | 2007-03-22 |
CN1925111A (en) | 2007-03-07 |
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