TW200631083A - Apparatus for treating substrates - Google Patents
Apparatus for treating substratesInfo
- Publication number
- TW200631083A TW200631083A TW094136304A TW94136304A TW200631083A TW 200631083 A TW200631083 A TW 200631083A TW 094136304 A TW094136304 A TW 094136304A TW 94136304 A TW94136304 A TW 94136304A TW 200631083 A TW200631083 A TW 200631083A
- Authority
- TW
- Taiwan
- Prior art keywords
- brush
- spindles
- pair
- rotatably supporting
- treatment apparatus
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Cleaning In General (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
Abstract
To provide a treatment apparatus in which a pair of spindles rotatably supporting both ends of a brush can be provided along the width direction of a treating tank without axial displacement. This treatment apparatus treats substrates transported in the treating tank, with the brush unit 11 provided in the tank. The brush unit 11 is equipped with: a frame 12 having a first mounting part 17 and a second mounting part 18 separated from each other with a given space in the horizontal direction on the same vertical plane; a first upper brush 32 and a first lower brush 33 disposed in a vertical direction with axes in parallel; a first pair of spindles 27 mounted on the first and second mounting parts and rotatably supporting both axial ends of the first upper brush; and a second pair of spindles 28 mounted on the first and second mounting parts and rotatably supporting both axial ends of the second lower brush.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004308377A JP4537826B2 (en) | 2004-10-22 | 2004-10-22 | Substrate processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200631083A true TW200631083A (en) | 2006-09-01 |
TWI421924B TWI421924B (en) | 2014-01-01 |
Family
ID=36534848
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094136304A TWI421924B (en) | 2004-10-22 | 2005-10-18 | Apparatus for treating substrates |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4537826B2 (en) |
KR (1) | KR101116713B1 (en) |
CN (1) | CN1778478B (en) |
TW (1) | TWI421924B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4919733B2 (en) * | 2006-08-24 | 2012-04-18 | 株式会社日立ハイテクノロジーズ | Substrate cleaning apparatus, substrate cleaning method, and substrate manufacturing method |
CN101722476B (en) * | 2008-10-27 | 2012-05-23 | 中芯国际集成电路制造(上海)有限公司 | Chemically mechanical polishing and cleaning machine |
CN102479669B (en) * | 2010-11-29 | 2013-09-11 | 中芯国际集成电路制造(上海)有限公司 | Wafer brush cleaning device and wafer brush cleaning method |
CN102274844B (en) * | 2011-06-24 | 2013-01-16 | 张家港青尼罗河曼迪科机械有限公司 | Arrangement structure for brush rolls of brushing device in metal plate production line |
CN102962215A (en) * | 2012-11-13 | 2013-03-13 | 江西稀有稀土金属钨业集团有限公司 | Steel strip cleaning device |
CN103785633B (en) * | 2013-11-13 | 2016-07-13 | 东莞市佳的自动化设备科技有限公司 | A kind of battery pole piece brush dust device |
KR102156741B1 (en) * | 2013-12-27 | 2020-09-16 | 세메스 주식회사 | Apparatus for treating substrate |
KR102250364B1 (en) * | 2014-07-08 | 2021-05-13 | 세메스 주식회사 | Apparatus and Method for treating substrate |
KR102634033B1 (en) * | 2019-04-05 | 2024-02-08 | 주식회사 디엠에스 | Apparatus for adjusting gap of substrate processing unit and substrate processing apparatus using the same |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5475889A (en) * | 1994-07-15 | 1995-12-19 | Ontrak Systems, Inc. | Automatically adjustable brush assembly for cleaning semiconductor wafers |
JP2963963B2 (en) * | 1996-01-12 | 1999-10-18 | 極東産機株式会社 | Tatami cleaning equipment |
US6230753B1 (en) * | 1996-07-15 | 2001-05-15 | Lam Research Corporation | Wafer cleaning apparatus |
US5924154A (en) * | 1996-08-29 | 1999-07-20 | Ontrak Systems, Inc. | Brush assembly apparatus |
JP3533884B2 (en) * | 1997-06-03 | 2004-05-31 | 日立電子エンジニアリング株式会社 | Substrate cleaning device |
JP3185753B2 (en) * | 1998-05-22 | 2001-07-11 | 日本電気株式会社 | Method for manufacturing semiconductor device |
US6055694A (en) * | 1998-11-30 | 2000-05-02 | Tsk America, Inc. | Wafer scrubbing machine |
DE19910790C1 (en) * | 1999-03-11 | 2000-07-13 | Wesumat Gmbh | Vehicle washing assembly has an additional spray jet for each side spray assembly mounted to the horizontal brush carrier to follow the contour of the vehicle roof with a spray angle to cover the roof and sides |
US6711775B2 (en) * | 1999-06-10 | 2004-03-30 | Lam Research Corporation | System for cleaning a semiconductor wafer |
JP4602567B2 (en) * | 2000-12-15 | 2010-12-22 | 芝浦メカトロニクス株式会社 | Substrate cleaning device |
JP2003145060A (en) * | 2001-11-15 | 2003-05-20 | Shibaura Mechatronics Corp | Cleaning brush and cleaning device |
-
2004
- 2004-10-22 JP JP2004308377A patent/JP4537826B2/en active Active
-
2005
- 2005-10-18 TW TW094136304A patent/TWI421924B/en active
- 2005-10-20 KR KR1020050099168A patent/KR101116713B1/en active IP Right Grant
- 2005-10-21 CN CN2005101142689A patent/CN1778478B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN1778478A (en) | 2006-05-31 |
JP2006116465A (en) | 2006-05-11 |
KR101116713B1 (en) | 2012-02-22 |
TWI421924B (en) | 2014-01-01 |
KR20060049096A (en) | 2006-05-18 |
CN1778478B (en) | 2010-11-03 |
JP4537826B2 (en) | 2010-09-08 |
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